JP2012028659A - 真空処理装置 - Google Patents
真空処理装置 Download PDFInfo
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- JP2012028659A JP2012028659A JP2010167689A JP2010167689A JP2012028659A JP 2012028659 A JP2012028659 A JP 2012028659A JP 2010167689 A JP2010167689 A JP 2010167689A JP 2010167689 A JP2010167689 A JP 2010167689A JP 2012028659 A JP2012028659 A JP 2012028659A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
【解決手段】大気搬送容器の背面側に接続されたロック室の後方側で連結され内部に前記ウエハを搬送する第一のロボットを有する第一の搬送容器と、この第一の搬送室の後方側に配置されて該第一の搬送室と連結され内部に前記ウエハを搬送する第二のロボットを有する第二の搬送容器と、前記第一の搬送容器と第二の搬送容器との間を連結して内部に前記ウエハが前記第一及び第二のロボットとの間で受け渡される収納部を備えた中継容器と、第二の搬送容器の周囲の前記中継容器と略直角の側に連結され内部の処理室で前記ウエハが処理される処理容器とを備え、前記第一のロボットは、各々が独立して回転軸を挟んだ両側の方向に伸縮する二つのアームを有し、前記第二のロボットは、各々が回転軸周りの同一の方向に伸縮する二つのアームを有した真空処理装置。
【選択図】 図1
Description
102 真空側ブロック
103 真空処理室
104 第一の真空搬送室
105 ロック室
106 筐体
107 カセット台
108 独立型真空搬送ロボット
109 連結型真空搬送ロボット
110 大気側搬送ロボット
111 第二の真空搬送室
112 真空搬送中間室
120 バルブ
201,203 第一アーム
202,204 第二アーム
Claims (5)
- 内部に処理対象のウエハが収納されるカセットが載せられるカセット台が前面側に配置され内部を前記ウエハが大気圧下で搬送される大気搬送容器と、この大気搬送容器の背面側でこれに接続されて並列に配置されて前記ウエハを収納可能な内部の圧力を大気圧と減圧された圧力との間で調節可能な少なくとも1つのロック室と、前記ロック室の後方側でこれと連結され所定の真空度に減圧された内部に前記ウエハを搬送する第一のロボットを有する第一の搬送容器と、
この第一の搬送室の後方側に配置されて該第一の搬送室と連結され前記真空度に減圧された内部に前記ウエハを搬送する第二のロボットを有する第二の搬送容器と、前記第一の搬送容器と第二の搬送容器との間の前記第一の搬送容器を挟んで前記ロック室の反対の側でこれらを連結して配置されて気密に封止された内部に前記ウエハが前記第一及び第二のロボットとの間で受け渡される収納部を備えた中継容器と、第二の搬送容器の周囲の前記中継容器と略直角の側に連結され内部の処理室で前記ウエハが処理される処理容器とを備え、
前記第一のロボットは、各々が根元部が前記第一の搬送容器内に配置された軸周りに回転可能に配置され先端部にウエハ保持部を備えて前記軸を挟んだ両側の方向に伸縮して前記ウエハ保持部を移動させる二つのアームを有し、前記第二のロボットは、各々が根元部が前記第二の搬送容器内に配置された軸周りに回転可能に配置され先端部にウエハ保持部を備えて前記軸周りの同一の方向に伸縮して前記ウエハ保持部を移動させる二つのアームを有した真空処理装置。 - 請求項1に記載の真空処理装置であって、
前記第一または第二のロボットの前記二つのアームの前記ウエハ保持部が上下方向に位置を異ならせて配置された真空処理装置。 - 請求項1または2に記載の真空処理装置であって、
前記第一のロボットが二つのウエハ保持部上の各々にウエハを保持して前記中継室及び前記ロック室に対して並行してウエハを搬入または搬出する真空処理装置。 - 請求項1乃至3の何れかに記載の真空処理装置であって、
前記何れか一方のアームのウエハ保持部に処理前のウエハを保持した前記第二のロボットが他方のアームを伸縮させてそのウエハ保持部に前記処理室内の処理済のウエハを受け取った後前記一方のアームを伸縮して前記未処理のウエハを前記処理室内に受け渡して前記処理前及び処理済のウエハを入れ換える真空処理装置。 - 請求項1乃至4の何れかに記載の真空処理装置であって、
前記処理容器と前記第二の搬送容器との間及び前記第一,第二の搬送容器の間に配置されこれらの間を連通する通路を開放または気密に閉塞する複数のバルブを備え、これらのバルブが前記処理容器内部を排他的に開放するように動作が調節される真空処理装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010167689A JP2012028659A (ja) | 2010-07-27 | 2010-07-27 | 真空処理装置 |
TW099127567A TWI447838B (zh) | 2010-07-27 | 2010-08-18 | Vacuum processing device |
KR1020100080456A KR20120010945A (ko) | 2010-07-27 | 2010-08-19 | 진공처리장치 |
CN2010102606997A CN102347256A (zh) | 2010-07-27 | 2010-08-20 | 真空处理装置 |
US12/805,837 US20120027542A1 (en) | 2010-07-27 | 2010-08-20 | Vacuum processor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010167689A JP2012028659A (ja) | 2010-07-27 | 2010-07-27 | 真空処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012028659A true JP2012028659A (ja) | 2012-02-09 |
JP2012028659A5 JP2012028659A5 (ja) | 2013-09-12 |
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JP2010167689A Pending JP2012028659A (ja) | 2010-07-27 | 2010-07-27 | 真空処理装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20120027542A1 (ja) |
JP (1) | JP2012028659A (ja) |
KR (1) | KR20120010945A (ja) |
CN (1) | CN102347256A (ja) |
TW (1) | TWI447838B (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5785712B2 (ja) * | 2010-12-28 | 2015-09-30 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
KR102392186B1 (ko) * | 2011-03-11 | 2022-04-28 | 브룩스 오토메이션 인코퍼레이티드 | 기판 처리 툴 |
JP2014036025A (ja) * | 2012-08-07 | 2014-02-24 | Hitachi High-Technologies Corp | 真空処理装置または真空処理装置の運転方法 |
JP6120621B2 (ja) * | 2013-03-14 | 2017-04-26 | 株式会社日立ハイテクノロジーズ | 真空処理装置及びその運転方法 |
CN106162906B (zh) * | 2015-03-31 | 2019-01-15 | 中兴通讯股份有限公司 | 调度信息发送、接收方法及装置 |
US9889567B2 (en) | 2015-04-24 | 2018-02-13 | Applied Materials, Inc. | Wafer swapper |
US11077535B2 (en) * | 2018-02-14 | 2021-08-03 | Samsung Electronics Co., Ltd. | Process system having locking pin and locking pin |
JP7115879B2 (ja) | 2018-03-23 | 2022-08-09 | 株式会社日立ハイテク | 真空処理装置の運転方法 |
US10998209B2 (en) | 2019-05-31 | 2021-05-04 | Applied Materials, Inc. | Substrate processing platforms including multiple processing chambers |
WO2021192001A1 (ja) | 2020-03-24 | 2021-09-30 | 株式会社日立ハイテク | 真空処理装置 |
US11749542B2 (en) | 2020-07-27 | 2023-09-05 | Applied Materials, Inc. | Apparatus, system, and method for non-contact temperature monitoring of substrate supports |
US11817331B2 (en) | 2020-07-27 | 2023-11-14 | Applied Materials, Inc. | Substrate holder replacement with protective disk during pasting process |
US11600507B2 (en) | 2020-09-09 | 2023-03-07 | Applied Materials, Inc. | Pedestal assembly for a substrate processing chamber |
US11610799B2 (en) | 2020-09-18 | 2023-03-21 | Applied Materials, Inc. | Electrostatic chuck having a heating and chucking capabilities |
CN112249685B (zh) * | 2020-10-27 | 2022-04-01 | 光驰科技(上海)有限公司 | 进行基板快速交互搬送的机构及其搬送方法 |
US11674227B2 (en) | 2021-02-03 | 2023-06-13 | Applied Materials, Inc. | Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure |
US12002668B2 (en) | 2021-06-25 | 2024-06-04 | Applied Materials, Inc. | Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool |
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2010
- 2010-07-27 JP JP2010167689A patent/JP2012028659A/ja active Pending
- 2010-08-18 TW TW099127567A patent/TWI447838B/zh not_active IP Right Cessation
- 2010-08-19 KR KR1020100080456A patent/KR20120010945A/ko active Search and Examination
- 2010-08-20 CN CN2010102606997A patent/CN102347256A/zh active Pending
- 2010-08-20 US US12/805,837 patent/US20120027542A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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TW201205710A (en) | 2012-02-01 |
TWI447838B (zh) | 2014-08-01 |
CN102347256A (zh) | 2012-02-08 |
KR20120010945A (ko) | 2012-02-06 |
US20120027542A1 (en) | 2012-02-02 |
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