JP2012026041A5 - - Google Patents

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Publication number
JP2012026041A5
JP2012026041A5 JP2011236147A JP2011236147A JP2012026041A5 JP 2012026041 A5 JP2012026041 A5 JP 2012026041A5 JP 2011236147 A JP2011236147 A JP 2011236147A JP 2011236147 A JP2011236147 A JP 2011236147A JP 2012026041 A5 JP2012026041 A5 JP 2012026041A5
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JP
Japan
Prior art keywords
vapor
vapor deposition
deposition apparatus
chamber
processing chamber
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Application number
JP2011236147A
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English (en)
Japanese (ja)
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JP5511767B2 (ja
JP2012026041A (ja
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Priority to JP2011236147A priority Critical patent/JP5511767B2/ja
Priority claimed from JP2011236147A external-priority patent/JP5511767B2/ja
Publication of JP2012026041A publication Critical patent/JP2012026041A/ja
Publication of JP2012026041A5 publication Critical patent/JP2012026041A5/ja
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Publication of JP5511767B2 publication Critical patent/JP5511767B2/ja
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JP2011236147A 2011-10-27 2011-10-27 蒸着装置 Active JP5511767B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011236147A JP5511767B2 (ja) 2011-10-27 2011-10-27 蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011236147A JP5511767B2 (ja) 2011-10-27 2011-10-27 蒸着装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006269085A Division JP5173175B2 (ja) 2006-09-29 2006-09-29 蒸着装置

Publications (3)

Publication Number Publication Date
JP2012026041A JP2012026041A (ja) 2012-02-09
JP2012026041A5 true JP2012026041A5 (enrdf_load_stackoverflow) 2012-12-13
JP5511767B2 JP5511767B2 (ja) 2014-06-04

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ID=45779301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011236147A Active JP5511767B2 (ja) 2011-10-27 2011-10-27 蒸着装置

Country Status (1)

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JP (1) JP5511767B2 (enrdf_load_stackoverflow)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308082A (ja) * 2000-04-20 2001-11-02 Nec Corp 液体有機原料の気化方法及び絶縁膜の成長方法
JP3684343B2 (ja) * 2001-09-25 2005-08-17 株式会社日本ビーテック 薄膜堆積用分子線源セル
JP2003193224A (ja) * 2001-12-21 2003-07-09 Sharp Corp 薄膜製造装置とその装置を用いた薄膜積層装置並びに薄膜製造方法
JP2004010990A (ja) * 2002-06-10 2004-01-15 Sony Corp 薄膜形成装置
US7067170B2 (en) * 2002-09-23 2006-06-27 Eastman Kodak Company Depositing layers in OLED devices using viscous flow
JP4013859B2 (ja) * 2003-07-17 2007-11-28 富士電機ホールディングス株式会社 有機薄膜の製造装置
JP4366226B2 (ja) * 2004-03-30 2009-11-18 東北パイオニア株式会社 有機ｅｌパネルの製造方法、有機ｅｌパネルの成膜装置
JP2006057173A (ja) * 2004-08-24 2006-03-02 Tohoku Pioneer Corp 成膜源、真空成膜装置、有機ｅｌパネルの製造方法
JP2006104497A (ja) * 2004-10-01 2006-04-20 Hitachi Zosen Corp 蒸着装置

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