JP2012017997A5 - - Google Patents
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- Publication number
- JP2012017997A5 JP2012017997A5 JP2010153828A JP2010153828A JP2012017997A5 JP 2012017997 A5 JP2012017997 A5 JP 2012017997A5 JP 2010153828 A JP2010153828 A JP 2010153828A JP 2010153828 A JP2010153828 A JP 2010153828A JP 2012017997 A5 JP2012017997 A5 JP 2012017997A5
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline silicon
- silicon rod
- producing
- peak frequency
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 239000012808 vapor phase Substances 0.000 claims 2
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010153828A JP5238762B2 (ja) | 2010-07-06 | 2010-07-06 | 多結晶シリコン棒および多結晶シリコン棒の製造方法 |
| PCT/JP2011/003800 WO2012004968A1 (ja) | 2010-07-06 | 2011-07-04 | 多結晶シリコン棒および多結晶シリコン棒の製造方法 |
| AU2011275287A AU2011275287B2 (en) | 2010-07-06 | 2011-07-04 | Polycrystalline silicon rod and production method for polycrystalline silicon rod |
| CN201180033481.0A CN102971624B (zh) | 2010-07-06 | 2011-07-04 | 多晶硅棒以及多晶硅棒的制造方法 |
| EP11803307.5A EP2594933A4 (en) | 2010-07-06 | 2011-07-04 | Polycrystalline silicon rod and production method for polycrystalline silicon rod |
| US13/808,404 US9006002B2 (en) | 2010-07-06 | 2011-07-04 | Polycrystalline silicon rod and method for manufacturing polycrystalline silicon rod |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010153828A JP5238762B2 (ja) | 2010-07-06 | 2010-07-06 | 多結晶シリコン棒および多結晶シリコン棒の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012017997A JP2012017997A (ja) | 2012-01-26 |
| JP2012017997A5 true JP2012017997A5 (https=) | 2012-03-08 |
| JP5238762B2 JP5238762B2 (ja) | 2013-07-17 |
Family
ID=45440960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010153828A Active JP5238762B2 (ja) | 2010-07-06 | 2010-07-06 | 多結晶シリコン棒および多結晶シリコン棒の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9006002B2 (https=) |
| EP (1) | EP2594933A4 (https=) |
| JP (1) | JP5238762B2 (https=) |
| CN (1) | CN102971624B (https=) |
| AU (1) | AU2011275287B2 (https=) |
| WO (1) | WO2012004968A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5828795B2 (ja) | 2012-04-04 | 2015-12-09 | 信越化学工業株式会社 | 多結晶シリコンの結晶配向度評価方法、多結晶シリコン棒の選択方法、および単結晶シリコンの製造方法 |
| JP2014001096A (ja) | 2012-06-18 | 2014-01-09 | Shin Etsu Chem Co Ltd | 多結晶シリコンの結晶配向度評価方法、多結晶シリコン棒の選択方法、多結晶シリコン棒、多結晶シリコン塊、および、単結晶シリコンの製造方法 |
| JP5868286B2 (ja) * | 2012-08-10 | 2016-02-24 | 信越化学工業株式会社 | 多結晶シリコン棒の選択方法、多結晶シリコン塊の製造方法、及び、単結晶シリコンの製造方法 |
| DE102013207251A1 (de) * | 2013-04-22 | 2014-10-23 | Wacker Chemie Ag | Verfahren zur Herstellung von polykristallinem Silicium |
| JP6181620B2 (ja) | 2014-09-04 | 2017-08-16 | 信越化学工業株式会社 | 多結晶シリコン製造用反応炉、多結晶シリコン製造装置、多結晶シリコンの製造方法、及び、多結晶シリコン棒または多結晶シリコン塊 |
| CN108168868A (zh) * | 2017-12-29 | 2018-06-15 | 绍兴文理学院 | 一种检测型钢构件自振频率的方法 |
| CN108225955B (zh) * | 2017-12-30 | 2024-01-12 | 洛阳阿特斯光伏科技有限公司 | 一种硅棒的硬度评估方法 |
| CN108732307A (zh) * | 2018-05-04 | 2018-11-02 | 扬州连城金晖金刚线切片研发有限公司 | 一种金刚线切片的单、多晶硅棒检验方法 |
| US11655541B2 (en) | 2018-12-17 | 2023-05-23 | Wacker Chemie Ag | Process for producing polycrystalline silicon |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4062229A (en) * | 1977-02-22 | 1977-12-13 | General Electric Company | Method of testing the integrity of installed rock bolts |
| JP2001021543A (ja) | 1999-07-06 | 2001-01-26 | Sumitomo Sitix Of Amagasaki Inc | シリコン塊の探傷方法 |
| JP2001235451A (ja) * | 2000-02-25 | 2001-08-31 | Mitsubishi Electric Corp | 試料の欠陥測定装置及び方法 |
| JP2001294416A (ja) * | 2000-04-07 | 2001-10-23 | Mitsubishi Materials Polycrystalline Silicon Corp | 多結晶シリコンの製造装置 |
| JP4768927B2 (ja) | 2001-05-11 | 2011-09-07 | 新日本製鐵株式会社 | 打音検査物の非破壊検査方法、及び品質管理方法 |
| JP2004149324A (ja) * | 2002-10-28 | 2004-05-27 | Sumitomo Mitsubishi Silicon Corp | 多結晶シリコンロッド及びその製造方法、並びにそのロッドの製造に使用されるシリコン芯材 |
| US6941811B2 (en) * | 2003-08-04 | 2005-09-13 | Nan Ya Technology Corporation | Method and apparatus for detecting wafer flaw |
| JP4575886B2 (ja) | 2006-02-14 | 2010-11-04 | シャープ株式会社 | 多結晶半導体ウエハの割れ検査装置および割れ検査方法 |
| DE102006040486A1 (de) | 2006-08-30 | 2008-03-13 | Wacker Chemie Ag | Verfahren zur zerstörungsfreien Materialprüfung von hochreinem polykristallinen Silicium |
-
2010
- 2010-07-06 JP JP2010153828A patent/JP5238762B2/ja active Active
-
2011
- 2011-07-04 CN CN201180033481.0A patent/CN102971624B/zh active Active
- 2011-07-04 US US13/808,404 patent/US9006002B2/en not_active Expired - Fee Related
- 2011-07-04 EP EP11803307.5A patent/EP2594933A4/en not_active Withdrawn
- 2011-07-04 AU AU2011275287A patent/AU2011275287B2/en not_active Ceased
- 2011-07-04 WO PCT/JP2011/003800 patent/WO2012004968A1/ja not_active Ceased
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