JP2011527663A - 絶縁層およびその製造方法 - Google Patents
絶縁層およびその製造方法 Download PDFInfo
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- JP2011527663A JP2011527663A JP2011517598A JP2011517598A JP2011527663A JP 2011527663 A JP2011527663 A JP 2011527663A JP 2011517598 A JP2011517598 A JP 2011517598A JP 2011517598 A JP2011517598 A JP 2011517598A JP 2011527663 A JP2011527663 A JP 2011527663A
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0054—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing PbO, SnO2, B2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5022—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with vitreous materials
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/86—Glazes; Cold glazes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2207/00—Compositions specially applicable for the manufacture of vitreous enamels
- C03C2207/04—Compositions specially applicable for the manufacture of vitreous enamels for steel
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/90—Electrical properties
- C04B2111/92—Electrically insulating materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/169,881 US20100009203A1 (en) | 2008-07-09 | 2008-07-09 | Insulation layer and method for producing thereof |
| US12/169,881 | 2008-07-09 | ||
| PCT/US2009/050037 WO2010006116A1 (en) | 2008-07-09 | 2009-07-09 | Insulation layer and method for producing thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011527663A true JP2011527663A (ja) | 2011-11-04 |
| JP2011527663A5 JP2011527663A5 (https=) | 2012-08-23 |
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Family Applications (1)
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|---|---|---|---|
| JP2011517598A Pending JP2011527663A (ja) | 2008-07-09 | 2009-07-09 | 絶縁層およびその製造方法 |
Country Status (3)
| Country | Link |
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| US (1) | US20100009203A1 (https=) |
| JP (1) | JP2011527663A (https=) |
| WO (1) | WO2010006116A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015105203A (ja) * | 2013-11-29 | 2015-06-08 | 日本電気硝子株式会社 | ガラス組成物、粉末材料及び粉末材料ペースト |
| KR20150135227A (ko) | 2013-03-29 | 2015-12-02 | 니혼 야마무라가라스 가부시키가이샤 | 절연층 형성용 재료, 절연층 형성용 페이스트 |
| JP2017028019A (ja) * | 2015-07-17 | 2017-02-02 | 株式会社神戸製鋼所 | 放熱基板、デバイス及び放熱基板の製造方法 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110195540A1 (en) * | 2010-02-05 | 2011-08-11 | Hitachi Chemical Company, Ltd. | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell |
| KR101921191B1 (ko) * | 2013-10-28 | 2019-02-13 | 훼로코오포레이션 | 알루미늄 기판용 유전체 페이스트 |
| US11019317B2 (en) | 2014-05-30 | 2021-05-25 | Shutterfly, Llc | System and method for automated detection and replacement of photographic scenes |
| RU2598657C1 (ru) * | 2015-06-10 | 2016-09-27 | Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") | Жаростойкое покрытие |
| DE102015110831A1 (de) | 2015-07-06 | 2017-01-12 | Friedrich-Schiller-Universität Jena | Keramiken und Glaskeramiken mit niedriger oder negativer thermischer Dehnung |
| CN106356343A (zh) * | 2015-07-17 | 2017-01-25 | 株式会社神户制钢所 | 散热基板、装置及散热基板的制造方法 |
| US10952785B2 (en) | 2016-08-01 | 2021-03-23 | Medtronic Advanced Energy, Llc | Device for medical lead extraction |
| CN109715571A (zh) * | 2016-11-14 | 2019-05-03 | 美敦力先进能量有限公司 | 用于电外科工具的受控光学性能釉瓷组合物 |
| US11795117B2 (en) | 2018-02-27 | 2023-10-24 | Zyp Coatings, Inc. | Refractory foam |
| US11142652B2 (en) | 2018-02-27 | 2021-10-12 | Zyp Coatings, Inc. | Solvent-based coating refractory coatings for ferrous metals |
| US11629094B2 (en) | 2018-02-27 | 2023-04-18 | Zyp Coatings, Inc. | Flexible ceramic coatings for metals and methods of making same |
| US11057576B2 (en) | 2019-02-15 | 2021-07-06 | Shutterfly, Llc | System and method for automated detection and replacement of photographic scenes |
| CN117303746B (zh) * | 2023-09-22 | 2025-11-21 | 雷索新材料(苏州)有限公司 | 一种玻璃浆料及其制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4933824B1 (https=) * | 1969-03-17 | 1974-09-10 | ||
| JPS5788039A (en) * | 1980-11-14 | 1982-06-01 | Takara Standard Kk | Frip composition for enameled substrate |
| JPH06247742A (ja) * | 1993-02-19 | 1994-09-06 | Asahi Glass Co Ltd | 電子部品 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2510136B2 (ja) * | 1987-08-27 | 1996-06-26 | 日本電気硝子株式会社 | 絶縁層用ガラス組成物 |
| JP2832374B2 (ja) * | 1989-08-07 | 1998-12-09 | 山村硝子株式会社 | 絶縁体ガラス組成物 |
| FR2732960B1 (fr) * | 1995-04-14 | 1997-06-20 | Eurokera | Nouveaux emaux sans plomb pour la decoration de vitroceramiques a faible dilatation |
| JP3647130B2 (ja) * | 1996-02-06 | 2005-05-11 | 昭栄化学工業株式会社 | 絶縁体ガラス組成物とこれを用いた厚膜多層回路絶縁層用ガラス組成物 |
| JP2000044332A (ja) * | 1998-07-31 | 2000-02-15 | Sumitomo Metal Mining Co Ltd | 配線基板用ガラスセラミック組成物および半導体素子収納用パッケージ |
| US6348427B1 (en) * | 1999-02-01 | 2002-02-19 | Kyocera Corporation | High-thermal-expansion glass ceramic sintered product |
-
2008
- 2008-07-09 US US12/169,881 patent/US20100009203A1/en not_active Abandoned
-
2009
- 2009-07-09 JP JP2011517598A patent/JP2011527663A/ja active Pending
- 2009-07-09 WO PCT/US2009/050037 patent/WO2010006116A1/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4933824B1 (https=) * | 1969-03-17 | 1974-09-10 | ||
| JPS5788039A (en) * | 1980-11-14 | 1982-06-01 | Takara Standard Kk | Frip composition for enameled substrate |
| JPH06247742A (ja) * | 1993-02-19 | 1994-09-06 | Asahi Glass Co Ltd | 電子部品 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150135227A (ko) | 2013-03-29 | 2015-12-02 | 니혼 야마무라가라스 가부시키가이샤 | 절연층 형성용 재료, 절연층 형성용 페이스트 |
| US9352998B2 (en) | 2013-03-29 | 2016-05-31 | Nihon Yamamura Glass Co., Ltd. | Insulating layer forming material, insulating layer forming paste |
| JP2015105203A (ja) * | 2013-11-29 | 2015-06-08 | 日本電気硝子株式会社 | ガラス組成物、粉末材料及び粉末材料ペースト |
| JP2017028019A (ja) * | 2015-07-17 | 2017-02-02 | 株式会社神戸製鋼所 | 放熱基板、デバイス及び放熱基板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010006116A1 (en) | 2010-01-14 |
| US20100009203A1 (en) | 2010-01-14 |
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