JP2011527663A5 - - Google Patents

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Publication number
JP2011527663A5
JP2011527663A5 JP2011517598A JP2011517598A JP2011527663A5 JP 2011527663 A5 JP2011527663 A5 JP 2011527663A5 JP 2011517598 A JP2011517598 A JP 2011517598A JP 2011517598 A JP2011517598 A JP 2011517598A JP 2011527663 A5 JP2011527663 A5 JP 2011527663A5
Authority
JP
Japan
Prior art keywords
insulating layer
glass
layer according
paste
tce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011517598A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011527663A (ja
Filing date
Publication date
Priority claimed from US12/169,881 external-priority patent/US20100009203A1/en
Application filed filed Critical
Publication of JP2011527663A publication Critical patent/JP2011527663A/ja
Publication of JP2011527663A5 publication Critical patent/JP2011527663A5/ja
Pending legal-status Critical Current

Links

JP2011517598A 2008-07-09 2009-07-09 絶縁層およびその製造方法 Pending JP2011527663A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/169,881 US20100009203A1 (en) 2008-07-09 2008-07-09 Insulation layer and method for producing thereof
US12/169,881 2008-07-09
PCT/US2009/050037 WO2010006116A1 (en) 2008-07-09 2009-07-09 Insulation layer and method for producing thereof

Publications (2)

Publication Number Publication Date
JP2011527663A JP2011527663A (ja) 2011-11-04
JP2011527663A5 true JP2011527663A5 (https=) 2012-08-23

Family

ID=41058597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011517598A Pending JP2011527663A (ja) 2008-07-09 2009-07-09 絶縁層およびその製造方法

Country Status (3)

Country Link
US (1) US20100009203A1 (https=)
JP (1) JP2011527663A (https=)
WO (1) WO2010006116A1 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110195540A1 (en) * 2010-02-05 2011-08-11 Hitachi Chemical Company, Ltd. Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell
WO2014157679A1 (ja) 2013-03-29 2014-10-02 日本山村硝子株式会社 絶縁層形成用材料、絶縁層形成用ペースト
KR101921191B1 (ko) * 2013-10-28 2019-02-13 훼로코오포레이션 알루미늄 기판용 유전체 페이스트
JP6315403B2 (ja) * 2013-11-29 2018-04-25 日本電気硝子株式会社 粉末材料及び粉末材料ペースト
US11019317B2 (en) 2014-05-30 2021-05-25 Shutterfly, Llc System and method for automated detection and replacement of photographic scenes
RU2598657C1 (ru) * 2015-06-10 2016-09-27 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Жаростойкое покрытие
DE102015110831A1 (de) 2015-07-06 2017-01-12 Friedrich-Schiller-Universität Jena Keramiken und Glaskeramiken mit niedriger oder negativer thermischer Dehnung
CN106356343A (zh) * 2015-07-17 2017-01-25 株式会社神户制钢所 散热基板、装置及散热基板的制造方法
JP6517103B2 (ja) * 2015-07-17 2019-05-22 株式会社神戸製鋼所 放熱基板、デバイス及び放熱基板の製造方法
US10952785B2 (en) 2016-08-01 2021-03-23 Medtronic Advanced Energy, Llc Device for medical lead extraction
CN109715571A (zh) * 2016-11-14 2019-05-03 美敦力先进能量有限公司 用于电外科工具的受控光学性能釉瓷组合物
US11795117B2 (en) 2018-02-27 2023-10-24 Zyp Coatings, Inc. Refractory foam
US11142652B2 (en) 2018-02-27 2021-10-12 Zyp Coatings, Inc. Solvent-based coating refractory coatings for ferrous metals
US11629094B2 (en) 2018-02-27 2023-04-18 Zyp Coatings, Inc. Flexible ceramic coatings for metals and methods of making same
US11057576B2 (en) 2019-02-15 2021-07-06 Shutterfly, Llc System and method for automated detection and replacement of photographic scenes
CN117303746B (zh) * 2023-09-22 2025-11-21 雷索新材料(苏州)有限公司 一种玻璃浆料及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933824B1 (https=) * 1969-03-17 1974-09-10
JPS5788039A (en) * 1980-11-14 1982-06-01 Takara Standard Kk Frip composition for enameled substrate
JP2510136B2 (ja) * 1987-08-27 1996-06-26 日本電気硝子株式会社 絶縁層用ガラス組成物
JP2832374B2 (ja) * 1989-08-07 1998-12-09 山村硝子株式会社 絶縁体ガラス組成物
JPH06247742A (ja) * 1993-02-19 1994-09-06 Asahi Glass Co Ltd 電子部品
FR2732960B1 (fr) * 1995-04-14 1997-06-20 Eurokera Nouveaux emaux sans plomb pour la decoration de vitroceramiques a faible dilatation
JP3647130B2 (ja) * 1996-02-06 2005-05-11 昭栄化学工業株式会社 絶縁体ガラス組成物とこれを用いた厚膜多層回路絶縁層用ガラス組成物
JP2000044332A (ja) * 1998-07-31 2000-02-15 Sumitomo Metal Mining Co Ltd 配線基板用ガラスセラミック組成物および半導体素子収納用パッケージ
US6348427B1 (en) * 1999-02-01 2002-02-19 Kyocera Corporation High-thermal-expansion glass ceramic sintered product

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