JP2011527115A5 - - Google Patents

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JP2011527115A5
JP2011527115A5 JP2011516640A JP2011516640A JP2011527115A5 JP 2011527115 A5 JP2011527115 A5 JP 2011527115A5 JP 2011516640 A JP2011516640 A JP 2011516640A JP 2011516640 A JP2011516640 A JP 2011516640A JP 2011527115 A5 JP2011527115 A5 JP 2011527115A5
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JP2011516640A 2008-06-30 2009-06-25 ポジティブフォトレジストを使用するダブルパターニングにより高密度柱構造を製造する方法 Expired - Fee Related JP5336589B2 (ja)

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Application Number Priority Date Filing Date Title
US12/216,108 US7732235B2 (en) 2008-06-30 2008-06-30 Method for fabricating high density pillar structures by double patterning using positive photoresist
US12/216,108 2008-06-30
PCT/US2009/048584 WO2010002683A2 (en) 2008-06-30 2009-06-25 Method for fabricating high density pillar structures by double patterning using positive photoresist

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JP2011527115A JP2011527115A (ja) 2011-10-20
JP2011527115A5 true JP2011527115A5 (enExample) 2012-07-12
JP5336589B2 JP5336589B2 (ja) 2013-11-06

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US (3) US7732235B2 (enExample)
EP (1) EP2294615B1 (enExample)
JP (1) JP5336589B2 (enExample)
KR (1) KR101487288B1 (enExample)
CN (1) CN102077346B (enExample)
TW (1) TWI500070B (enExample)
WO (1) WO2010002683A2 (enExample)

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US7981592B2 (en) * 2008-04-11 2011-07-19 Sandisk 3D Llc Double patterning method
US7713818B2 (en) * 2008-04-11 2010-05-11 Sandisk 3D, Llc Double patterning method
US7786015B2 (en) * 2008-04-28 2010-08-31 Sandisk 3D Llc Method for fabricating self-aligned complementary pillar structures and wiring
US7732235B2 (en) * 2008-06-30 2010-06-08 Sandisk 3D Llc Method for fabricating high density pillar structures by double patterning using positive photoresist

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