JP2011519050A5 - - Google Patents
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- Publication number
- JP2011519050A5 JP2011519050A5 JP2010550667A JP2010550667A JP2011519050A5 JP 2011519050 A5 JP2011519050 A5 JP 2011519050A5 JP 2010550667 A JP2010550667 A JP 2010550667A JP 2010550667 A JP2010550667 A JP 2010550667A JP 2011519050 A5 JP2011519050 A5 JP 2011519050A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- silica particles
- group
- imageable
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 125000001165 hydrophobic group Chemical group 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 150000003254 radicals Chemical class 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910021485 fumed silica Inorganic materials 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229920005596 polymer binder Polymers 0.000 claims 1
- 239000002491 polymer binding agent Substances 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/048,452 | 2008-03-14 | ||
| US12/048,452 US8043787B2 (en) | 2008-03-14 | 2008-03-14 | Negative-working imageable elements with improved abrasion resistance |
| PCT/US2009/000896 WO2009114056A1 (en) | 2008-03-14 | 2009-02-12 | Negative-working imageable elements with improved abrasion resistance |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011519050A JP2011519050A (ja) | 2011-06-30 |
| JP2011519050A5 true JP2011519050A5 (enExample) | 2012-03-08 |
| JP5336525B2 JP5336525B2 (ja) | 2013-11-06 |
Family
ID=40666769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010550667A Expired - Fee Related JP5336525B2 (ja) | 2008-03-14 | 2009-02-12 | 改善された耐磨耗性を備えたネガ型画像形成性要素 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8043787B2 (enExample) |
| EP (1) | EP2260351B1 (enExample) |
| JP (1) | JP5336525B2 (enExample) |
| CN (1) | CN101971095B (enExample) |
| AT (1) | ATE545065T1 (enExample) |
| WO (1) | WO2009114056A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010102322A (ja) * | 2008-09-26 | 2010-05-06 | Fujifilm Corp | 平版印刷版の製版方法 |
| CN102033427A (zh) * | 2009-09-30 | 2011-04-27 | 富士胶片株式会社 | 紫外线激光用着色感光性树脂组合物、图案形成方法、滤色器及其制造方法、显示装置 |
| JP5622564B2 (ja) * | 2010-06-30 | 2014-11-12 | 富士フイルム株式会社 | 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子 |
| EP2522509A3 (en) * | 2011-05-12 | 2013-12-04 | E. I. du Pont de Nemours and Company | Printing form and process for preparing the printing form with curable composition having epoxy novolac resin |
| US20120285342A1 (en) * | 2011-05-12 | 2012-11-15 | E.I. Du Pont De Nemours And Company | Printing form and process for preparing the printing form with curable composition having bisphenol-based epoxy resin |
| US20130105440A1 (en) * | 2011-11-01 | 2013-05-02 | Az Electronic Materials Usa Corp. | Nanocomposite negative photosensitive composition and use thereof |
| KR101498440B1 (ko) * | 2012-03-12 | 2015-03-03 | 코니카 미놀타 가부시키가이샤 | λ/4 위상차 필름 및 유기 일렉트로루미네센스 화상 표시 장치 |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| US9229325B2 (en) | 2014-02-25 | 2016-01-05 | Eastman Kodak Company | Method for making lithographic printing plates |
| US9417524B1 (en) | 2015-03-10 | 2016-08-16 | Eastman Kodak Company | Infrared radiation-sensitive lithographic printing plate precursors |
| EP3330096A4 (en) * | 2015-07-30 | 2018-07-18 | FUJIFILM Corporation | Planographic printing plate original, planographic printing plate manufacturing method, and organic-inorganic hybrid particles |
| US9588429B1 (en) | 2015-09-03 | 2017-03-07 | Eastman Kodak Company | Lithographic developer composition and method of use |
| US11926755B2 (en) | 2018-09-13 | 2024-03-12 | Avery Dennison Corporation | Universal printable topcoat for graphics |
| CN111324014B (zh) * | 2018-12-17 | 2024-04-30 | 乐凯华光印刷科技有限公司 | 一种紫激光光聚合平版印刷版前体 |
| WO2020203063A1 (ja) * | 2019-03-29 | 2020-10-08 | 富士フイルム株式会社 | 組成物、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット、修飾シリカ粒子、修飾シリカ粒子の製造方法 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| WO2021193770A1 (ja) * | 2020-03-27 | 2021-09-30 | 積水ポリマテック株式会社 | 光硬化性組成物、硬化体及び硬化体を用いたガスケット並びに防水構造及びガスケットの製造方法 |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5280022A (en) | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
| US4394434A (en) * | 1980-12-08 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Plating resist with improved resistance to extraneous plating |
| JPS59223428A (ja) * | 1983-06-02 | 1984-12-15 | Okamoto Kagaku Kogyo Kk | 感光性印刷版の製造方法 |
| JPS6088942A (ja) | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPH0296755A (ja) | 1988-10-03 | 1990-04-09 | Konica Corp | 感光性組成物 |
| JP3004378B2 (ja) | 1991-04-01 | 2000-01-31 | 富士写真フイルム株式会社 | 平版印刷版の製造方法 |
| EP0725037B2 (de) * | 1995-02-04 | 2012-04-25 | Evonik Degussa GmbH | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| US5633117A (en) * | 1995-04-27 | 1997-05-27 | Imation Corp. | Providing imagewise variation in glossiness to a receptor |
| EP0950516B1 (en) | 1998-04-15 | 2004-05-06 | Agfa-Gevaert | A heat mode sensitive imaging element for making positive working printing plates |
| US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| DE60033468T2 (de) | 1999-06-04 | 2007-10-31 | Fujifilm Corp. | Vorläufer für eine lithographische Druckplatte sowie Verfahren zu seiner Herstellung |
| US6071675A (en) * | 1999-06-05 | 2000-06-06 | Teng; Gary Ganghui | On-press development of a lithographic plate comprising dispersed solid particles |
| US6653043B1 (en) | 1999-11-01 | 2003-11-25 | Kansai Research Institute, Inc. | Active particle, photosensitive resin composition, and process for forming pattern |
| US6300038B1 (en) | 1999-11-19 | 2001-10-09 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
| JP2001305722A (ja) | 2000-04-18 | 2001-11-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP2002079772A (ja) | 2000-09-05 | 2002-03-19 | Fuji Photo Film Co Ltd | 平版印刷版用原版及びそれを用いた平版印刷版の製版、印刷方法 |
| US6534235B1 (en) * | 2000-10-31 | 2003-03-18 | Kansai Research Institute, Inc. | Photosensitive resin composition and process for forming pattern |
| DE10113926A1 (de) * | 2001-03-21 | 2002-09-26 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung von Flexodruckplatten mittels Lasergravur |
| JP2003066621A (ja) | 2001-08-24 | 2003-03-05 | Fuji Photo Film Co Ltd | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
| JP2003255563A (ja) | 2002-03-06 | 2003-09-10 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| CA2386098C (en) * | 2002-05-13 | 2010-07-06 | Bayer Inc. | Silica-filled elastomeric compounds |
| US7217502B2 (en) * | 2003-03-27 | 2007-05-15 | Eastman Kodak Company | Nanopastes for use as patterning compositions |
| DE60320747D1 (de) | 2003-03-28 | 2008-06-19 | Agfa Graphics Nv | Positiv-arbeitender, wärmeempfindlicher Flachdruckplattenvorläufer |
| EP1462252A1 (en) | 2003-03-28 | 2004-09-29 | Agfa-Gevaert | Positive working heat-sensitive lithographic printing plate precursor |
| JP2005028774A (ja) | 2003-07-07 | 2005-02-03 | Fuji Photo Film Co Ltd | 平版印刷版用原版および平版印刷方法 |
| US20050040562A1 (en) * | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
| JP4359156B2 (ja) * | 2003-08-21 | 2009-11-04 | 株式会社日本触媒 | フォトレジスト用組成物およびその用途 |
| JP5090631B2 (ja) * | 2005-05-12 | 2012-12-05 | イーストマン コダック カンパニー | 変性シリカ粒子並びにそれを含む感光性組成物及び感光性平版印刷版 |
| JP4759343B2 (ja) * | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| DE602005008442D1 (de) | 2005-10-20 | 2008-09-04 | Agfa Graphics Nv | Verfahren zum Herstellen eines Lithographiedruckformvorläufers |
| US20070134596A1 (en) * | 2005-12-08 | 2007-06-14 | Adrian Lungu | Photosensitive printing element having nanoparticles and method for preparing the printing element |
| JP2007272143A (ja) | 2006-03-31 | 2007-10-18 | Fujifilm Corp | 平版印刷版原版およびその積層体 |
| US7348062B2 (en) * | 2006-06-10 | 2008-03-25 | Solutia Incorporated | Interlayers comprising modified fumed silica |
| CN101511599B (zh) | 2006-09-06 | 2011-06-01 | 旭化成电子材料株式会社 | 感光性树脂组合物 |
| WO2008108390A1 (ja) * | 2007-03-07 | 2008-09-12 | Ube Industries, Ltd. | 光硬化性組成物およびこれを用いた硬化物 |
-
2008
- 2008-03-14 US US12/048,452 patent/US8043787B2/en not_active Expired - Fee Related
-
2009
- 2009-02-12 WO PCT/US2009/000896 patent/WO2009114056A1/en not_active Ceased
- 2009-02-12 AT AT09720351T patent/ATE545065T1/de active
- 2009-02-12 EP EP09720351A patent/EP2260351B1/en not_active Not-in-force
- 2009-02-12 CN CN2009801090093A patent/CN101971095B/zh active Active
- 2009-02-12 JP JP2010550667A patent/JP5336525B2/ja not_active Expired - Fee Related
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