CN101971095B - 具有改进的耐磨损性的负性工作可成像元件 - Google Patents

具有改进的耐磨损性的负性工作可成像元件 Download PDF

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Publication number
CN101971095B
CN101971095B CN2009801090093A CN200980109009A CN101971095B CN 101971095 B CN101971095 B CN 101971095B CN 2009801090093 A CN2009801090093 A CN 2009801090093A CN 200980109009 A CN200980109009 A CN 200980109009A CN 101971095 B CN101971095 B CN 101971095B
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China
Prior art keywords
imageable
groups
substituted
radiation
weight
Prior art date
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CN2009801090093A
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English (en)
Chinese (zh)
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CN101971095A (zh
Inventor
G·豪克
C·萨瓦里亚-豪克
U·德瓦斯
H·鲍曼
B·施特勒默尔
C·辛普森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
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Eastman Kodak Co
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Publication of CN101971095A publication Critical patent/CN101971095A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/266—Polyurethanes; Polyureas

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Silicon Compounds (AREA)
CN2009801090093A 2008-03-14 2009-02-12 具有改进的耐磨损性的负性工作可成像元件 Active CN101971095B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/048452 2008-03-14
US12/048,452 US8043787B2 (en) 2008-03-14 2008-03-14 Negative-working imageable elements with improved abrasion resistance
PCT/US2009/000896 WO2009114056A1 (en) 2008-03-14 2009-02-12 Negative-working imageable elements with improved abrasion resistance

Publications (2)

Publication Number Publication Date
CN101971095A CN101971095A (zh) 2011-02-09
CN101971095B true CN101971095B (zh) 2013-09-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801090093A Active CN101971095B (zh) 2008-03-14 2009-02-12 具有改进的耐磨损性的负性工作可成像元件

Country Status (6)

Country Link
US (1) US8043787B2 (enExample)
EP (1) EP2260351B1 (enExample)
JP (1) JP5336525B2 (enExample)
CN (1) CN101971095B (enExample)
AT (1) ATE545065T1 (enExample)
WO (1) WO2009114056A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102322A (ja) * 2008-09-26 2010-05-06 Fujifilm Corp 平版印刷版の製版方法
CN102033427A (zh) * 2009-09-30 2011-04-27 富士胶片株式会社 紫外线激光用着色感光性树脂组合物、图案形成方法、滤色器及其制造方法、显示装置
JP5622564B2 (ja) * 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
EP2522509A3 (en) * 2011-05-12 2013-12-04 E. I. du Pont de Nemours and Company Printing form and process for preparing the printing form with curable composition having epoxy novolac resin
US20120285342A1 (en) * 2011-05-12 2012-11-15 E.I. Du Pont De Nemours And Company Printing form and process for preparing the printing form with curable composition having bisphenol-based epoxy resin
US20130105440A1 (en) * 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite negative photosensitive composition and use thereof
KR101498440B1 (ko) * 2012-03-12 2015-03-03 코니카 미놀타 가부시키가이샤 λ／４ 위상차 필름 및 유기 일렉트로루미네센스 화상 표시 장치
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
US9229325B2 (en) 2014-02-25 2016-01-05 Eastman Kodak Company Method for making lithographic printing plates
US9417524B1 (en) 2015-03-10 2016-08-16 Eastman Kodak Company Infrared radiation-sensitive lithographic printing plate precursors
EP3330096A4 (en) * 2015-07-30 2018-07-18 FUJIFILM Corporation Planographic printing plate original, planographic printing plate manufacturing method, and organic-inorganic hybrid particles
US9588429B1 (en) 2015-09-03 2017-03-07 Eastman Kodak Company Lithographic developer composition and method of use
US11926755B2 (en) 2018-09-13 2024-03-12 Avery Dennison Corporation Universal printable topcoat for graphics
CN111324014B (zh) * 2018-12-17 2024-04-30 乐凯华光印刷科技有限公司 一种紫激光光聚合平版印刷版前体
WO2020203063A1 (ja) * 2019-03-29 2020-10-08 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット、修飾シリカ粒子、修飾シリカ粒子の製造方法
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
WO2021193770A1 (ja) * 2020-03-27 2021-09-30 積水ポリマテック株式会社 光硬化性組成物、硬化体及び硬化体を用いたガスケット並びに防水構造及びガスケットの製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6534235B1 (en) * 2000-10-31 2003-03-18 Kansai Research Institute, Inc. Photosensitive resin composition and process for forming pattern
CN1458180A (zh) * 2002-05-13 2003-11-26 拜尔公司 二氧化硅充填的弹性体配混料
EP1508834A3 (en) * 2003-08-19 2006-05-17 3D Systems, Inc. Nanoparticle-filled stereolithographic resins
EP1754597A2 (en) * 2005-08-19 2007-02-21 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing process
EP1795964A2 (en) * 2005-12-08 2007-06-13 E.I. Dupont De Nemours And Company Photosensitive printing element having silica nanoparticles and method for preparing the printing element

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5280022A (en) 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
US4394434A (en) * 1980-12-08 1983-07-19 Minnesota Mining And Manufacturing Company Plating resist with improved resistance to extraneous plating
JPS59223428A (ja) * 1983-06-02 1984-12-15 Okamoto Kagaku Kogyo Kk 感光性印刷版の製造方法
JPS6088942A (ja) 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPH0296755A (ja) 1988-10-03 1990-04-09 Konica Corp 感光性組成物
JP3004378B2 (ja) 1991-04-01 2000-01-31 富士写真フイルム株式会社 平版印刷版の製造方法
EP0725037B2 (de) * 1995-02-04 2012-04-25 Evonik Degussa GmbH Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US5633117A (en) * 1995-04-27 1997-05-27 Imation Corp. Providing imagewise variation in glossiness to a receptor
EP0950516B1 (en) 1998-04-15 2004-05-06 Agfa-Gevaert A heat mode sensitive imaging element for making positive working printing plates
US6352811B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
DE60033468T2 (de) 1999-06-04 2007-10-31 Fujifilm Corp. Vorläufer für eine lithographische Druckplatte sowie Verfahren zu seiner Herstellung
US6071675A (en) * 1999-06-05 2000-06-06 Teng; Gary Ganghui On-press development of a lithographic plate comprising dispersed solid particles
US6653043B1 (en) 1999-11-01 2003-11-25 Kansai Research Institute, Inc. Active particle, photosensitive resin composition, and process for forming pattern
US6300038B1 (en) 1999-11-19 2001-10-09 Kodak Polychrome Graphics Llc Articles having imagable coatings
JP2001305722A (ja) 2000-04-18 2001-11-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP2002079772A (ja) 2000-09-05 2002-03-19 Fuji Photo Film Co Ltd 平版印刷版用原版及びそれを用いた平版印刷版の製版、印刷方法
DE10113926A1 (de) * 2001-03-21 2002-09-26 Basf Drucksysteme Gmbh Verfahren zur Herstellung von Flexodruckplatten mittels Lasergravur
JP2003066621A (ja) 2001-08-24 2003-03-05 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液及び平版印刷版の製版方法
JP2003255563A (ja) 2002-03-06 2003-09-10 Fuji Photo Film Co Ltd 平版印刷版の製版方法
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
DE60320747D1 (de) 2003-03-28 2008-06-19 Agfa Graphics Nv Positiv-arbeitender, wärmeempfindlicher Flachdruckplattenvorläufer
EP1462252A1 (en) 2003-03-28 2004-09-29 Agfa-Gevaert Positive working heat-sensitive lithographic printing plate precursor
JP2005028774A (ja) 2003-07-07 2005-02-03 Fuji Photo Film Co Ltd 平版印刷版用原版および平版印刷方法
JP4359156B2 (ja) * 2003-08-21 2009-11-04 株式会社日本触媒 フォトレジスト用組成物およびその用途
JP5090631B2 (ja) * 2005-05-12 2012-12-05 イーストマン コダック カンパニー 変性シリカ粒子並びにそれを含む感光性組成物及び感光性平版印刷版
DE602005008442D1 (de) 2005-10-20 2008-09-04 Agfa Graphics Nv Verfahren zum Herstellen eines Lithographiedruckformvorläufers
JP2007272143A (ja) 2006-03-31 2007-10-18 Fujifilm Corp 平版印刷版原版およびその積層体
US7348062B2 (en) * 2006-06-10 2008-03-25 Solutia Incorporated Interlayers comprising modified fumed silica
CN101511599B (zh) 2006-09-06 2011-06-01 旭化成电子材料株式会社 感光性树脂组合物
WO2008108390A1 (ja) * 2007-03-07 2008-09-12 Ube Industries, Ltd. 光硬化性組成物およびこれを用いた硬化物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6534235B1 (en) * 2000-10-31 2003-03-18 Kansai Research Institute, Inc. Photosensitive resin composition and process for forming pattern
CN1458180A (zh) * 2002-05-13 2003-11-26 拜尔公司 二氧化硅充填的弹性体配混料
EP1508834A3 (en) * 2003-08-19 2006-05-17 3D Systems, Inc. Nanoparticle-filled stereolithographic resins
EP1754597A2 (en) * 2005-08-19 2007-02-21 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing process
EP1795964A2 (en) * 2005-12-08 2007-06-13 E.I. Dupont De Nemours And Company Photosensitive printing element having silica nanoparticles and method for preparing the printing element

Also Published As

Publication number Publication date
JP5336525B2 (ja) 2013-11-06
ATE545065T1 (de) 2012-02-15
CN101971095A (zh) 2011-02-09
EP2260351B1 (en) 2012-02-08
WO2009114056A1 (en) 2009-09-17
EP2260351A1 (en) 2010-12-15
US8043787B2 (en) 2011-10-25
US20090233227A1 (en) 2009-09-17
JP2011519050A (ja) 2011-06-30

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