JP2011513709A5 - - Google Patents

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Publication number
JP2011513709A5
JP2011513709A5 JP2010547736A JP2010547736A JP2011513709A5 JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5 JP 2010547736 A JP2010547736 A JP 2010547736A JP 2010547736 A JP2010547736 A JP 2010547736A JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5
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JP
Japan
Prior art keywords
bias voltage
anode
pressure
ionization
electron source
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JP2010547736A
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English (en)
Japanese (ja)
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JP2011513709A (ja
JP5728728B2 (ja
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Priority claimed from PCT/US2009/034460 external-priority patent/WO2009105506A1/en
Publication of JP2011513709A publication Critical patent/JP2011513709A/ja
Publication of JP2011513709A5 publication Critical patent/JP2011513709A5/ja
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Publication of JP5728728B2 publication Critical patent/JP5728728B2/ja
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JP2010547736A 2008-02-21 2009-02-19 高圧力動作用に設計された動作パラメータと形状とを有する電離真空計 Active JP5728728B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6663108P 2008-02-21 2008-02-21
US61/066,631 2008-02-21
PCT/US2009/034460 WO2009105506A1 (en) 2008-02-21 2009-02-19 Ionization gauge with operational parameters and geometry designed for high pressure operation

Publications (3)

Publication Number Publication Date
JP2011513709A JP2011513709A (ja) 2011-04-28
JP2011513709A5 true JP2011513709A5 (https=) 2012-03-29
JP5728728B2 JP5728728B2 (ja) 2015-06-03

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ID=40985893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010547736A Active JP5728728B2 (ja) 2008-02-21 2009-02-19 高圧力動作用に設計された動作パラメータと形状とを有する電離真空計

Country Status (5)

Country Link
US (2) US8648604B2 (https=)
EP (1) EP2252869B1 (https=)
JP (1) JP5728728B2 (https=)
CN (1) CN101990630B (https=)
WO (1) WO2009105506A1 (https=)

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CN101990630B (zh) 2008-02-21 2013-08-14 布鲁克机械公司 具有设计用于高压操作的操作参数和几何形状的电离计
CN103250312A (zh) * 2010-12-07 2013-08-14 3M创新有限公司 用于离子平衡测量和调节的具有隔离的电容器电路的离子化平衡装置
US9593996B2 (en) 2012-02-08 2017-03-14 Mks Instruments, Inc. Ionization gauge for high pressure operation
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
DE102014205695B4 (de) * 2014-03-27 2016-01-28 Christof-Herbert Diener Niederdruckplasmaanlage mit sequentieller Steuerung
US9588004B2 (en) 2014-11-07 2017-03-07 Mks Instruments, Inc. Long lifetime cold cathode ionization vacuum gauge design
TWI739300B (zh) * 2015-01-15 2021-09-11 美商Ｍｋｓ儀器公司 離子化計及其製造方法
WO2016151997A1 (ja) * 2015-03-23 2016-09-29 株式会社アルバック 三極管型電離真空計
US9927317B2 (en) * 2015-07-09 2018-03-27 Mks Instruments, Inc. Ionization pressure gauge with bias voltage and emission current control and measurement
EP3555904A1 (en) * 2016-12-13 2019-10-23 MKS Instruments, Inc. Anode electrode shield for inverted magnetron cold cathode ionization gauge
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
CN107993908B (zh) * 2017-11-27 2019-11-15 温州大学 一种基于场发射阴极电子源的电离真空计及其应用方法
US10928265B2 (en) * 2018-05-29 2021-02-23 Mks Instruments, Inc. Gas analysis with an inverted magnetron source
US10566168B1 (en) * 2018-08-10 2020-02-18 John Bennett Low voltage electron transparent pellicle
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US11187827B1 (en) * 2019-07-26 2021-11-30 Board Of Regents, The University Of Texas System Spinning aperture neutral drift sensor (SANDS)

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