JP2011513709A5 - - Google Patents

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Publication number
JP2011513709A5
JP2011513709A5 JP2010547736A JP2010547736A JP2011513709A5 JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5 JP 2010547736 A JP2010547736 A JP 2010547736A JP 2010547736 A JP2010547736 A JP 2010547736A JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5
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JP
Japan
Prior art keywords
bias voltage
anode
pressure
ionization
electron source
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JP2010547736A
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English (en)
Japanese (ja)
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JP2011513709A (ja
JP5728728B2 (ja
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Priority claimed from PCT/US2009/034460 external-priority patent/WO2009105506A1/en
Publication of JP2011513709A publication Critical patent/JP2011513709A/ja
Publication of JP2011513709A5 publication Critical patent/JP2011513709A5/ja
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Publication of JP5728728B2 publication Critical patent/JP5728728B2/ja
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JP2010547736A 2008-02-21 2009-02-19 高圧力動作用に設計された動作パラメータと形状とを有する電離真空計 Active JP5728728B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6663108P 2008-02-21 2008-02-21
US61/066,631 2008-02-21
PCT/US2009/034460 WO2009105506A1 (en) 2008-02-21 2009-02-19 Ionization gauge with operational parameters and geometry designed for high pressure operation

Publications (3)

Publication Number Publication Date
JP2011513709A JP2011513709A (ja) 2011-04-28
JP2011513709A5 true JP2011513709A5 (cg-RX-API-DMAC7.html) 2012-03-29
JP5728728B2 JP5728728B2 (ja) 2015-06-03

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ID=40985893

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JP2010547736A Active JP5728728B2 (ja) 2008-02-21 2009-02-19 高圧力動作用に設計された動作パラメータと形状とを有する電離真空計

Country Status (5)

Country Link
US (2) US8648604B2 (cg-RX-API-DMAC7.html)
EP (1) EP2252869B1 (cg-RX-API-DMAC7.html)
JP (1) JP5728728B2 (cg-RX-API-DMAC7.html)
CN (1) CN101990630B (cg-RX-API-DMAC7.html)
WO (1) WO2009105506A1 (cg-RX-API-DMAC7.html)

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WO2012078403A1 (en) * 2010-12-07 2012-06-14 3M Innovative Properties Company Ionization balance device with shielded capacitor circuit for ion balance measurements and adjustments
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US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
DE102014205695B4 (de) * 2014-03-27 2016-01-28 Christof-Herbert Diener Niederdruckplasmaanlage mit sequentieller Steuerung
US9588004B2 (en) 2014-11-07 2017-03-07 Mks Instruments, Inc. Long lifetime cold cathode ionization vacuum gauge design
TWI739300B (zh) 2015-01-15 2021-09-11 美商Mks儀器公司 離子化計及其製造方法
JP6227836B2 (ja) * 2015-03-23 2017-11-08 株式会社アルバック 三極管型電離真空計
US9927317B2 (en) * 2015-07-09 2018-03-27 Mks Instruments, Inc. Ionization pressure gauge with bias voltage and emission current control and measurement
US10969290B2 (en) * 2016-12-13 2021-04-06 Mks Instruments, Inc. Anode electrode shield for inverted magnetron cold cathode ionization gauge
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
CN107993908B (zh) * 2017-11-27 2019-11-15 温州大学 一种基于场发射阴极电子源的电离真空计及其应用方法
US10928265B2 (en) * 2018-05-29 2021-02-23 Mks Instruments, Inc. Gas analysis with an inverted magnetron source
US10566168B1 (en) * 2018-08-10 2020-02-18 John Bennett Low voltage electron transparent pellicle
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