JP2011513709A5 - - Google Patents
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- Publication number
- JP2011513709A5 JP2011513709A5 JP2010547736A JP2010547736A JP2011513709A5 JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5 JP 2010547736 A JP2010547736 A JP 2010547736A JP 2010547736 A JP2010547736 A JP 2010547736A JP 2011513709 A5 JP2011513709 A5 JP 2011513709A5
- Authority
- JP
- Japan
- Prior art keywords
- bias voltage
- anode
- pressure
- ionization
- electron source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- 150000002500 ions Chemical class 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 4
- 230000005596 ionic collisions Effects 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6663108P | 2008-02-21 | 2008-02-21 | |
| US61/066,631 | 2008-02-21 | ||
| PCT/US2009/034460 WO2009105506A1 (en) | 2008-02-21 | 2009-02-19 | Ionization gauge with operational parameters and geometry designed for high pressure operation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011513709A JP2011513709A (ja) | 2011-04-28 |
| JP2011513709A5 true JP2011513709A5 (cg-RX-API-DMAC7.html) | 2012-03-29 |
| JP5728728B2 JP5728728B2 (ja) | 2015-06-03 |
Family
ID=40985893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010547736A Active JP5728728B2 (ja) | 2008-02-21 | 2009-02-19 | 高圧力動作用に設計された動作パラメータと形状とを有する電離真空計 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8648604B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2252869B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5728728B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN101990630B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2009105506A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009085165A2 (en) * | 2007-12-19 | 2009-07-09 | Brooks Automation, Inc. | Ionization gauge having electron multiplier cold emmission source |
| CN101990630B (zh) | 2008-02-21 | 2013-08-14 | 布鲁克机械公司 | 具有设计用于高压操作的操作参数和几何形状的电离计 |
| WO2012078403A1 (en) * | 2010-12-07 | 2012-06-14 | 3M Innovative Properties Company | Ionization balance device with shielded capacitor circuit for ion balance measurements and adjustments |
| KR102082168B1 (ko) * | 2012-02-08 | 2020-02-27 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 압력을 측정하는 이온화 게이지 및 이를 이용한 압력 측정 방법 |
| US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
| DE102014205695B4 (de) * | 2014-03-27 | 2016-01-28 | Christof-Herbert Diener | Niederdruckplasmaanlage mit sequentieller Steuerung |
| US9588004B2 (en) | 2014-11-07 | 2017-03-07 | Mks Instruments, Inc. | Long lifetime cold cathode ionization vacuum gauge design |
| TWI739300B (zh) | 2015-01-15 | 2021-09-11 | 美商Mks儀器公司 | 離子化計及其製造方法 |
| JP6227836B2 (ja) * | 2015-03-23 | 2017-11-08 | 株式会社アルバック | 三極管型電離真空計 |
| US9927317B2 (en) * | 2015-07-09 | 2018-03-27 | Mks Instruments, Inc. | Ionization pressure gauge with bias voltage and emission current control and measurement |
| US10969290B2 (en) * | 2016-12-13 | 2021-04-06 | Mks Instruments, Inc. | Anode electrode shield for inverted magnetron cold cathode ionization gauge |
| US10983538B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
| CN107993908B (zh) * | 2017-11-27 | 2019-11-15 | 温州大学 | 一种基于场发射阴极电子源的电离真空计及其应用方法 |
| US10928265B2 (en) * | 2018-05-29 | 2021-02-23 | Mks Instruments, Inc. | Gas analysis with an inverted magnetron source |
| US10566168B1 (en) * | 2018-08-10 | 2020-02-18 | John Bennett | Low voltage electron transparent pellicle |
| CN110082420B (zh) * | 2019-04-23 | 2021-06-11 | 上海交通大学 | 基于正弦宽频电场下空间电荷测量的电介质陷阱检测系统 |
| US11187827B1 (en) * | 2019-07-26 | 2021-11-30 | Board Of Regents, The University Of Texas System | Spinning aperture neutral drift sensor (SANDS) |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2605431A (en) | 1950-03-30 | 1952-07-29 | Westinghouse Electric Corp | Ionization vacuum gauge |
| US3353048A (en) * | 1964-11-23 | 1967-11-14 | Gen Telephone & Elect | Ionization gauge for monitoring the flow of evaporant material |
| US4093913A (en) * | 1976-03-24 | 1978-06-06 | Varian Associates, Inc. | Vacuum measuring ionization apparatus control |
| US4270091A (en) * | 1978-01-25 | 1981-05-26 | Varian Associates, Inc. | Apparatus and method for measuring pressures and indicating leaks with optical analysis |
| US4307323A (en) * | 1980-04-04 | 1981-12-22 | Granville-Phillips Company | Vacuum gauge |
| US4714891A (en) * | 1985-09-23 | 1987-12-22 | Granville-Phillips Company | Method and apparatus for improving the safety and extending the range of ionization gauge systems |
| JPS62218834A (ja) * | 1986-03-20 | 1987-09-26 | Seiko Instr & Electronics Ltd | 気体圧力計 |
| US5422573A (en) * | 1990-04-11 | 1995-06-06 | Granville-Phillips Company | Ionization gauge and method of using and calibrating same |
| US5128617A (en) * | 1990-04-11 | 1992-07-07 | Granville-Phillips Company | Ionization vacuum gauge with emission of electrons in parallel paths |
| FR2679653B1 (fr) * | 1991-07-23 | 1993-09-24 | Commissariat Energie Atomique | Vacumetre a ionisation. |
| US5866901A (en) * | 1996-12-05 | 1999-02-02 | Mks Instruments, Inc. | Apparatus for and method of ion detection using electron multiplier over a range of high pressures |
| JPH10213509A (ja) * | 1997-01-27 | 1998-08-11 | Ulvac Japan Ltd | 圧力測定装置 |
| JP3833776B2 (ja) * | 1997-04-08 | 2006-10-18 | 株式会社アルバック | 広帯域電離真空計 |
| JP2002508836A (ja) * | 1997-05-09 | 2002-03-19 | ザ フレデリックス カンパニー | X−線効果を中和したバヤード−アルパート(bayard−alpert)型真空ゲージ |
| JP4339948B2 (ja) * | 1999-02-25 | 2009-10-07 | キヤノンアネルバ株式会社 | 熱陰極電離真空計 |
| JP4493139B2 (ja) * | 2000-02-02 | 2010-06-30 | キヤノンアネルバ株式会社 | 電離真空計 |
| US6566884B2 (en) * | 2001-09-13 | 2003-05-20 | Duniway Stockroom Corporation | Ionization vacuum pressure gauge |
| GB2381652A (en) * | 2001-11-01 | 2003-05-07 | Boc Group Plc | Cold cathode ionisation vacuum gauge |
| US6756785B2 (en) * | 2002-07-25 | 2004-06-29 | Mks Instruments, Inc. | Pressure controlled degas system for hot cathode ionization pressure gauges |
| CN1176355C (zh) * | 2002-10-17 | 2004-11-17 | 上海交通大学 | 屏蔽罩静电荷灭弧室真空度检测方法及其装置 |
| JP4199050B2 (ja) * | 2003-05-22 | 2008-12-17 | 株式会社アルバック | 四重極型質量分析計とそれを有する真空装置 |
| ITTO20030626A1 (it) * | 2003-08-08 | 2005-02-09 | Varian Spa | Vacuometro a ionizzazione. |
| CN100555552C (zh) * | 2004-07-30 | 2009-10-28 | 清华大学 | 真空规管 |
| EP1698878A1 (en) * | 2005-03-04 | 2006-09-06 | Inficon GmbH | Electrode configuration and pressure measuring apparatus |
| JP2006266854A (ja) * | 2005-03-23 | 2006-10-05 | Shinku Jikkenshitsu:Kk | 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置 |
| EP1890124A4 (en) * | 2005-05-09 | 2012-08-22 | Ampere Inc | IONISIERUNGSUNTERDRUCKMESSVORRICHTUNG |
| JP4141472B2 (ja) | 2005-12-28 | 2008-08-27 | シャープ株式会社 | 画像処理装置、画像処理方法、及びプログラム |
| US7525101B2 (en) * | 2006-05-26 | 2009-04-28 | Thermo Niton Analyzers Llc | Neutron and gamma ray monitor |
| US7429863B2 (en) * | 2006-07-18 | 2008-09-30 | Brooks Automation, Inc. | Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments |
| CN101303264B (zh) * | 2007-05-09 | 2010-05-26 | 清华大学 | 电离规 |
| US7768267B2 (en) * | 2007-07-11 | 2010-08-03 | Brooks Automation, Inc. | Ionization gauge with a cold electron source |
| JP5158585B2 (ja) * | 2007-10-12 | 2013-03-06 | 株式会社ネットコムセック | 電源装置及び高周波回路システム |
| CN101990630B (zh) | 2008-02-21 | 2013-08-14 | 布鲁克机械公司 | 具有设计用于高压操作的操作参数和几何形状的电离计 |
| US7906971B2 (en) * | 2008-10-14 | 2011-03-15 | Itt Manufacturing Enterprises, Inc. | Molecular shield for an ionizaton vacuum gauge |
| JP2010213509A (ja) | 2009-03-11 | 2010-09-24 | Univ Of Fukui | 横磁束型同期機 |
| JP2010281911A (ja) | 2009-06-02 | 2010-12-16 | Seiko Epson Corp | 電気光学装置 |
-
2009
- 2009-02-19 CN CN2009801125552A patent/CN101990630B/zh active Active
- 2009-02-19 EP EP09713559.4A patent/EP2252869B1/en active Active
- 2009-02-19 WO PCT/US2009/034460 patent/WO2009105506A1/en not_active Ceased
- 2009-02-19 JP JP2010547736A patent/JP5728728B2/ja active Active
-
2010
- 2010-08-20 US US12/860,050 patent/US8648604B2/en active Active
-
2014
- 2014-02-06 US US14/174,386 patent/US9404827B2/en active Active
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