JP2011512019A5 - - Google Patents

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Publication number
JP2011512019A5
JP2011512019A5 JP2010536930A JP2010536930A JP2011512019A5 JP 2011512019 A5 JP2011512019 A5 JP 2011512019A5 JP 2010536930 A JP2010536930 A JP 2010536930A JP 2010536930 A JP2010536930 A JP 2010536930A JP 2011512019 A5 JP2011512019 A5 JP 2011512019A5
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JP
Japan
Prior art keywords
template
force
substrate
pressure
contact boundary
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JP2010536930A
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English (en)
Japanese (ja)
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JP2011512019A (ja
JP5433584B2 (ja
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Priority claimed from US12/327,618 external-priority patent/US8945444B2/en
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JP2010536930A 2007-12-04 2008-12-04 接触線運動トラッキング制御に基づく高スループット・インプリント Active JP5433584B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US529707P 2007-12-04 2007-12-04
US61/005,297 2007-12-04
US12/327,618 US8945444B2 (en) 2007-12-04 2008-12-03 High throughput imprint based on contact line motion tracking control
US12/327,618 2008-12-03
PCT/US2008/013362 WO2009073200A1 (en) 2007-12-04 2008-12-04 High throughput imprint based on contact line motion tracking control

Publications (3)

Publication Number Publication Date
JP2011512019A JP2011512019A (ja) 2011-04-14
JP2011512019A5 true JP2011512019A5 (https=) 2013-12-12
JP5433584B2 JP5433584B2 (ja) 2014-03-05

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JP2010536930A Active JP5433584B2 (ja) 2007-12-04 2008-12-04 接触線運動トラッキング制御に基づく高スループット・インプリント

Country Status (7)

Country Link
US (2) US8945444B2 (https=)
EP (1) EP2227720B1 (https=)
JP (1) JP5433584B2 (https=)
KR (1) KR101519017B1 (https=)
CN (1) CN101884019B (https=)
TW (1) TWI391257B (https=)
WO (1) WO2009073200A1 (https=)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4940262B2 (ja) * 2009-03-25 2012-05-30 株式会社東芝 インプリントパターン形成方法
JP5563243B2 (ja) * 2009-06-01 2014-07-30 キヤノン株式会社 インプリント装置、および、物品の製造方法
JP5284212B2 (ja) * 2009-07-29 2013-09-11 株式会社東芝 半導体装置の製造方法
NL2005265A (en) * 2009-10-07 2011-04-11 Asml Netherlands Bv Imprint lithography apparatus and method.
JP5419634B2 (ja) * 2009-10-26 2014-02-19 株式会社東芝 パターン形成方法
JP5893303B2 (ja) 2011-09-07 2016-03-23 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6166516B2 (ja) * 2012-07-17 2017-07-19 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
US10105883B2 (en) * 2013-03-15 2018-10-23 Nanonex Corporation Imprint lithography system and method for manufacturing
WO2014145826A2 (en) * 2013-03-15 2014-09-18 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
JP6221461B2 (ja) * 2013-07-25 2017-11-01 大日本印刷株式会社 欠陥解析方法、凹凸パターン構造体の製造方法及びインプリントシステム
JP6282069B2 (ja) * 2013-09-13 2018-02-21 キヤノン株式会社 インプリント装置、インプリント方法、検出方法及びデバイス製造方法
US10088747B2 (en) 2014-03-31 2018-10-02 Koninklijke Philips N.V. Imprinting method, computer program product and apparatus for the same
JP6472189B2 (ja) * 2014-08-14 2019-02-20 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6659104B2 (ja) * 2014-11-11 2020-03-04 キヤノン株式会社 インプリント方法、インプリント装置、型、および物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method
US10747106B2 (en) * 2014-12-09 2020-08-18 Canon Kabushiki Kaisha Imprint apparatus
JP6674218B2 (ja) * 2014-12-09 2020-04-01 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6478635B2 (ja) * 2015-01-05 2019-03-06 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
US10248018B2 (en) * 2015-03-30 2019-04-02 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP6403627B2 (ja) * 2015-04-14 2018-10-10 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6585521B2 (ja) * 2016-02-16 2019-10-02 東芝メモリ株式会社 テンプレート、インプリント方法およびインプリント装置
JP6706983B2 (ja) * 2016-07-12 2020-06-10 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6954436B2 (ja) * 2016-09-12 2021-10-27 大日本印刷株式会社 レプリカモールドの製造方法及びインプリント装置
JP6784108B2 (ja) * 2016-09-12 2020-11-11 大日本印刷株式会社 レプリカモールドの製造方法及びインプリント装置
JP6801349B2 (ja) * 2016-10-04 2020-12-16 大日本印刷株式会社 パターン構造体の製造方法およびインプリント用モールドの製造方法
US10578984B2 (en) * 2016-12-20 2020-03-03 Canon Kabushiki Kaisha Adaptive chucking system
US10534259B2 (en) * 2017-03-28 2020-01-14 Canon Kabushiki Kaisha Method and system for imprint force control
US10866510B2 (en) * 2017-07-31 2020-12-15 Canon Kabushiki Kaisha Overlay improvement in nanoimprint lithography
CN111247623B (zh) * 2017-10-17 2024-03-08 佳能株式会社 压印装置和物品制造方法
US10996561B2 (en) * 2017-12-26 2021-05-04 Canon Kabushiki Kaisha Nanoimprint lithography with a six degrees-of-freedom imprint head module
JP7233174B2 (ja) * 2018-05-17 2023-03-06 キヤノン株式会社 インプリント装置、物品製造方法、平坦化層形成装置、情報処理装置、及び、決定方法
JP7305430B2 (ja) * 2018-06-29 2023-07-10 キヤノン株式会社 情報処理装置、プログラム、リソグラフィ装置、リソグラフィシステム、および物品の製造方法
JP7134055B2 (ja) * 2018-10-09 2022-09-09 キヤノン株式会社 成形装置、および物品の製造方法
US11243466B2 (en) 2019-01-31 2022-02-08 Canon Kabushiki Kaisha Template with mass velocity variation features, nanoimprint lithography apparatus that uses the template, and methods that use the template
US11442359B2 (en) 2019-03-11 2022-09-13 Canon Kabushiki Kaisha Method of separating a template from a shaped film on a substrate
KR102766183B1 (ko) 2019-07-24 2025-02-12 캐논 가부시끼가이샤 임프린트 장치, 임프린트 방법 및 물품 제조 방법
US11480871B2 (en) 2020-03-30 2022-10-25 Canon Kabushiki Kaisha Apparatus and method for improving accuracy of imprint force application in imprint lithography
US11590687B2 (en) 2020-06-30 2023-02-28 Canon Kabushiki Kaisha Systems and methods for reducing pressure while shaping a film
JP7507641B2 (ja) * 2020-09-08 2024-06-28 キヤノン株式会社 成形装置及び物品の製造方法
US11587795B2 (en) 2020-09-28 2023-02-21 Canon Kabushiki Kaisha Planarization apparatus including superstrate chuck with bendable periphery
US11728203B2 (en) * 2020-10-13 2023-08-15 Canon Kabushiki Kaisha Chuck assembly, planarization process, apparatus and method of manufacturing an article
US11994797B2 (en) 2020-10-28 2024-05-28 Canon Kabushiki Kaisha System and method for shaping a film with a scaled calibration measurement parameter
US11869813B2 (en) * 2020-12-15 2024-01-09 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11776833B2 (en) 2020-12-22 2023-10-03 Canon Kabushiki Kaisha Method for improving accuracy of imprint force application in imprint lithography
US20220197134A1 (en) * 2020-12-23 2022-06-23 Canon Kabushiki Kaisha System and Method of Determining Shaping Parameters Based on Contact Line Motion
US12366800B2 (en) 2021-11-12 2025-07-22 Canon Kabushiki Kaisha Method for improving accuracy of imprint force application in imprint lithography
CN118315325B (zh) * 2024-06-11 2024-09-20 华芯(嘉兴)智能装备有限公司 一种晶圆吸附控制方法与系统

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5926690A (en) * 1997-05-28 1999-07-20 Advanced Micro Devices, Inc. Run-to-run control process for controlling critical dimensions
US6424407B1 (en) * 1998-03-09 2002-07-23 Otm Technologies Ltd. Optical translation measurement
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US7796801B2 (en) * 1999-08-26 2010-09-14 Nanogeometry Research Inc. Pattern inspection apparatus and method
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7432634B2 (en) * 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
IL133352A (en) * 1999-12-07 2004-02-08 Eci Telecom Ltd Method for routing in loaded telecommunication networks
SG142150A1 (en) * 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
KR100827741B1 (ko) * 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
AU2001286573A1 (en) * 2000-08-21 2002-03-04 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
AU2000275480A1 (en) 2000-10-05 2002-04-15 Khalil Michel Feghali Low-cost and rapid production of molds
US20050274219A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
CN100365507C (zh) * 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US7387508B2 (en) * 2004-06-01 2008-06-17 Molecular Imprints Inc. Compliant device for nano-scale manufacturing
US20060005657A1 (en) * 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
AU2003217184A1 (en) * 2002-01-11 2003-09-02 Massachusetts Institute Of Technology Microcontact printing
US6926929B2 (en) * 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US6951173B1 (en) * 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050275311A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Compliant device for nano-scale manufacturing
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
JP4574240B2 (ja) 2004-06-11 2010-11-04 キヤノン株式会社 加工装置、加工方法、デバイス製造方法
US7126674B2 (en) * 2004-06-14 2006-10-24 Asml Netherlands B.V. Positioning device and device manufacturing method
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
KR20070086766A (ko) * 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
US7635263B2 (en) * 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
JP4773729B2 (ja) * 2005-02-28 2011-09-14 キヤノン株式会社 転写装置およびデバイス製造方法
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
JP4533358B2 (ja) * 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP4923924B2 (ja) * 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US7649613B2 (en) * 2006-03-03 2010-01-19 Asml Netherlands B.V. Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
US7854867B2 (en) * 2006-04-21 2010-12-21 Molecular Imprints, Inc. Method for detecting a particle in a nanoimprint lithography system
JP4854383B2 (ja) * 2006-05-15 2012-01-18 アピックヤマダ株式会社 インプリント方法およびナノ・インプリント装置
WO2008068701A2 (en) * 2006-12-04 2008-06-12 Koninklijke Philips Electronics N.V. Method and apparatus for applying a sheet to a substrate
WO2008099795A2 (en) * 2007-02-06 2008-08-21 Canon Kabushiki Kaisha Imprint method and imprint apparatus
US7837907B2 (en) * 2007-07-20 2010-11-23 Molecular Imprints, Inc. Alignment system and method for a substrate in a nano-imprint process
JP4940262B2 (ja) * 2009-03-25 2012-05-30 株式会社東芝 インプリントパターン形成方法
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置

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