JP2011504522A5 - - Google Patents
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- JP2011504522A5 JP2011504522A5 JP2010532631A JP2010532631A JP2011504522A5 JP 2011504522 A5 JP2011504522 A5 JP 2011504522A5 JP 2010532631 A JP2010532631 A JP 2010532631A JP 2010532631 A JP2010532631 A JP 2010532631A JP 2011504522 A5 JP2011504522 A5 JP 2011504522A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- silane
- hydrocarbon
- solvent
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000463 material Substances 0.000 claims 21
- 125000003118 aryl group Chemical group 0.000 claims 19
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 15
- 229910000077 silane Inorganic materials 0.000 claims 15
- 125000000217 alkyl group Chemical group 0.000 claims 13
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 13
- 239000000203 mixture Substances 0.000 claims 12
- 239000000178 monomer Substances 0.000 claims 12
- 229910052739 hydrogen Inorganic materials 0.000 claims 11
- 239000001257 hydrogen Substances 0.000 claims 11
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 11
- 239000002904 solvent Substances 0.000 claims 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 10
- 125000003545 alkoxy group Chemical group 0.000 claims 10
- 125000003342 alkenyl group Chemical group 0.000 claims 9
- 125000000304 alkynyl group Chemical group 0.000 claims 9
- 229910052710 silicon Inorganic materials 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 7
- 125000001424 substituent group Chemical group 0.000 claims 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 6
- 239000010410 layer Substances 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 239000000047 product Substances 0.000 claims 6
- 239000005046 Chlorosilane Substances 0.000 claims 5
- 239000006117 anti-reflective coating Substances 0.000 claims 5
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims 5
- 125000003367 polycyclic group Chemical group 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 5
- 229920002554 vinyl polymer Polymers 0.000 claims 5
- 239000004215 Carbon black (E152) Substances 0.000 claims 4
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 4
- 125000004423 acyloxy group Chemical group 0.000 claims 4
- 125000004429 atom Chemical group 0.000 claims 4
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 4
- 229930195733 hydrocarbon Natural products 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 239000004593 Epoxy Substances 0.000 claims 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 2
- -1 9-phenanthrenyl Chemical group 0.000 claims 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000007859 condensation product Substances 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- 150000002430 hydrocarbons Chemical class 0.000 claims 2
- 230000003301 hydrolyzing effect Effects 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 238000012643 polycondensation polymerization Methods 0.000 claims 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 2
- 239000011541 reaction mixture Substances 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000003944 tolyl group Chemical group 0.000 claims 2
- UCMZDKNUMKBJAA-UHFFFAOYSA-N 2,2-diethoxyethenyl(methyl)silane Chemical compound C[SiH2]C=C(OCC)OCC UCMZDKNUMKBJAA-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- IVSPVXKJEGPQJP-UHFFFAOYSA-N 2-silylethylsilane Chemical compound [SiH3]CC[SiH3] IVSPVXKJEGPQJP-UHFFFAOYSA-N 0.000 claims 1
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims 1
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 claims 1
- 125000003917 carbamoyl group Chemical class [H]N([H])C(*)=O 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- DMZWVCJEOLBQCZ-UHFFFAOYSA-N chloro(ethenyl)silane Chemical compound Cl[SiH2]C=C DMZWVCJEOLBQCZ-UHFFFAOYSA-N 0.000 claims 1
- 229910021419 crystalline silicon Inorganic materials 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- GGYBGSBSJFBQER-UHFFFAOYSA-N diethoxy-phenanthren-9-yl-(2-triethoxysilylethyl)silane Chemical compound C1=CC=C2C([Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC)=CC3=CC=CC=C3C2=C1 GGYBGSBSJFBQER-UHFFFAOYSA-N 0.000 claims 1
- SYHKCPPMADKIMF-UHFFFAOYSA-N diethoxy-phenyl-(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)C1=CC=CC=C1 SYHKCPPMADKIMF-UHFFFAOYSA-N 0.000 claims 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 239000012467 final product Substances 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 239000002861 polymer material Substances 0.000 claims 1
- 239000002243 precursor Substances 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Chemical group CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 claims 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical group CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical group CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical group CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 claims 1
- KURDMYBBAGBMGG-UHFFFAOYSA-N trichloro-[2-[dichloro(phenanthren-9-yl)silyl]ethyl]silane Chemical compound C1=CC=C2C([Si](Cl)(Cl)CC[Si](Cl)(Cl)Cl)=CC3=CC=CC=C3C2=C1 KURDMYBBAGBMGG-UHFFFAOYSA-N 0.000 claims 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98584507P | 2007-11-06 | 2007-11-06 | |
| PCT/FI2008/050637 WO2009060125A1 (en) | 2007-11-06 | 2008-11-06 | Carbosilane polymer compositions for anti-reflective coatings |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014040694A Division JP5902216B2 (ja) | 2007-11-06 | 2014-03-03 | 反射防止コーティング用カルボシランポリマー組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011504522A JP2011504522A (ja) | 2011-02-10 |
| JP2011504522A5 true JP2011504522A5 (OSRAM) | 2011-12-01 |
Family
ID=40474837
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010532631A Pending JP2011504522A (ja) | 2007-11-06 | 2008-11-06 | 反射防止コーティング用カルボシランポリマー組成物 |
| JP2014040694A Expired - Fee Related JP5902216B2 (ja) | 2007-11-06 | 2014-03-03 | 反射防止コーティング用カルボシランポリマー組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014040694A Expired - Fee Related JP5902216B2 (ja) | 2007-11-06 | 2014-03-03 | 反射防止コーティング用カルボシランポリマー組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8765899B2 (OSRAM) |
| EP (1) | EP2209839A1 (OSRAM) |
| JP (2) | JP2011504522A (OSRAM) |
| TW (1) | TWI452069B (OSRAM) |
| WO (1) | WO2009060125A1 (OSRAM) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050156353A1 (en) * | 2004-01-15 | 2005-07-21 | Watts Michael P. | Method to improve the flow rate of imprinting material |
| US9051491B2 (en) | 2006-06-13 | 2015-06-09 | Braggone Oy | Carbosilane polymer compositions for anti-reflective coatings |
| US8431670B2 (en) * | 2009-08-31 | 2013-04-30 | International Business Machines Corporation | Photo-patternable dielectric materials and formulations and methods of use |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| KR101432607B1 (ko) | 2011-08-11 | 2014-08-21 | 제일모직주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 반도체 집적회로 디바이스의 제조방법 |
| US9348228B2 (en) * | 2013-01-03 | 2016-05-24 | Globalfoundries Inc. | Acid-strippable silicon-containing antireflective coating |
| US10170297B2 (en) * | 2013-08-22 | 2019-01-01 | Versum Materials Us, Llc | Compositions and methods using same for flowable oxide deposition |
| KR101780977B1 (ko) | 2014-06-24 | 2017-10-23 | (주)디엔에프 | 실리콘 전구체, 이의 제조방법 및 이를 이용한 실리콘함유 유전막의 제조방법 |
| WO2016049154A1 (en) * | 2014-09-23 | 2016-03-31 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Carbosilane substituted amine precursors for deposition of si-containing films and methods thereof |
| TWI716333B (zh) | 2015-03-30 | 2021-01-11 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 碳矽烷與氨、胺類及脒類之觸媒去氫耦合 |
| US10544329B2 (en) | 2015-04-13 | 2020-01-28 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| TWI724141B (zh) | 2016-03-23 | 2021-04-11 | 法商液態空氣喬治斯克勞帝方法硏究開發股份有限公司 | 形成含矽膜之組成物及其製法與用途 |
| US10186424B2 (en) * | 2017-06-14 | 2019-01-22 | Rohm And Haas Electronic Materials Llc | Silicon-based hardmask |
| KR102198801B1 (ko) * | 2017-12-07 | 2021-01-05 | 삼성에스디아이 주식회사 | 색 변환 패널 및 색 변환 패널의 제조 방법 |
| US11280937B2 (en) * | 2017-12-10 | 2022-03-22 | Magic Leap, Inc. | Anti-reflective coatings on optical waveguides |
| KR102761610B1 (ko) | 2017-12-20 | 2025-01-31 | 매직 립, 인코포레이티드 | 증강 현실 뷰잉 디바이스용 인서트 |
| US10604618B2 (en) | 2018-06-20 | 2020-03-31 | Shin-Etsu Chemical Co., Ltd. | Compound, method for manufacturing the compound, and composition for forming organic film |
| US20210398796A1 (en) * | 2018-10-03 | 2021-12-23 | Versum Materials Us, Llc | Methods for making silicon and nitrogen containing films |
| US11737832B2 (en) | 2019-11-15 | 2023-08-29 | Magic Leap, Inc. | Viewing system for use in a surgical environment |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2603590B1 (fr) * | 1986-02-25 | 1991-05-24 | Kansai Paint Co Ltd | Procede de preparation d'une resine contenant un polysiloxane |
| JP2718620B2 (ja) * | 1993-09-01 | 1998-02-25 | 東芝シリコーン株式会社 | ポリオルガノシランの製造方法 |
| EP0669363B1 (en) * | 1994-02-28 | 1999-08-18 | Toshiba Silicone Co., Ltd. | Process for preparing polyorganosilane |
| US5607824A (en) * | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
| JP4096138B2 (ja) | 1999-04-12 | 2008-06-04 | Ｊｓｒ株式会社 | レジスト下層膜用組成物の製造方法 |
| DE60021476T2 (de) * | 1999-06-04 | 2006-05-24 | Jsr Corp. | Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten |
| US6841256B2 (en) * | 1999-06-07 | 2005-01-11 | Honeywell International Inc. | Low dielectric constant polyorganosilicon materials generated from polycarbosilanes |
| JP3951124B2 (ja) * | 2002-12-06 | 2007-08-01 | Ｊｓｒ株式会社 | 絶縁膜 |
| JP4818582B2 (ja) * | 2002-12-24 | 2011-11-16 | 信越化学工業株式会社 | 高分子化合物、反射防止膜材料及びパターン形成方法 |
| US7172849B2 (en) * | 2003-08-22 | 2007-02-06 | International Business Machines Corporation | Antireflective hardmask and uses thereof |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US20050214674A1 (en) * | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
| JP4491283B2 (ja) * | 2004-06-10 | 2010-06-30 | 信越化学工業株式会社 | 反射防止膜形成用組成物を用いたパターン形成方法 |
| JP4355939B2 (ja) * | 2004-07-23 | 2009-11-04 | Ｊｓｒ株式会社 | 半導体装置の絶縁膜形成用組成物およびシリカ系膜の形成方法 |
| US7504470B2 (en) * | 2004-08-31 | 2009-03-17 | Silecs Oy | Polyorganosiloxane dielectric materials |
| JP4756128B2 (ja) * | 2004-10-20 | 2011-08-24 | 日揮触媒化成株式会社 | 半導体加工用保護膜形成用塗布液、その調製方法およびこれより得られる半導体加工用保護膜 |
| EP1691238A3 (en) * | 2005-02-05 | 2009-01-21 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| US20060293482A1 (en) * | 2005-06-13 | 2006-12-28 | Rantala Juha T | Organo functionalized silane monomers and siloxane polymers of the same |
| US9051491B2 (en) | 2006-06-13 | 2015-06-09 | Braggone Oy | Carbosilane polymer compositions for anti-reflective coatings |
| CN101622296B (zh) * | 2007-02-27 | 2013-10-16 | Az电子材料美国公司 | 硅基抗反射涂料组合物 |
-
2008
- 2008-11-06 JP JP2010532631A patent/JP2011504522A/ja active Pending
- 2008-11-06 WO PCT/FI2008/050637 patent/WO2009060125A1/en not_active Ceased
- 2008-11-06 US US12/741,708 patent/US8765899B2/en not_active Expired - Fee Related
- 2008-11-06 TW TW097142886A patent/TWI452069B/zh not_active IP Right Cessation
- 2008-11-06 EP EP08848270A patent/EP2209839A1/en not_active Withdrawn
-
2014
- 2014-03-03 JP JP2014040694A patent/JP5902216B2/ja not_active Expired - Fee Related
- 2014-05-05 US US14/269,697 patent/US9158195B2/en active Active
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