JP2011502783A - ガス及びこれから得られる組成物の回収隔離システム及び方法 - Google Patents
ガス及びこれから得られる組成物の回収隔離システム及び方法 Download PDFInfo
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- JP2011502783A JP2011502783A JP2010534226A JP2010534226A JP2011502783A JP 2011502783 A JP2011502783 A JP 2011502783A JP 2010534226 A JP2010534226 A JP 2010534226A JP 2010534226 A JP2010534226 A JP 2010534226A JP 2011502783 A JP2011502783 A JP 2011502783A
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- JIWAALDUIFCBLV-UHFFFAOYSA-N oxoosmium Chemical compound [Os]=O JIWAALDUIFCBLV-UHFFFAOYSA-N 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229940049953 phenylacetate Drugs 0.000 description 1
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- YTZVWGRNMGHDJE-UHFFFAOYSA-N tetralithium;silicate Chemical compound [Li+].[Li+].[Li+].[Li+].[O-][Si]([O-])([O-])[O-] YTZVWGRNMGHDJE-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/62—Carbon oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/73—After-treatment of removed components
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
- C01D7/00—Carbonates of sodium, potassium or alkali metals in general
- C01D7/07—Preparation from the hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F11/00—Compounds of calcium, strontium, or barium
- C01F11/18—Carbonates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B40/00—Processes, in general, for influencing or modifying the properties of mortars, concrete or artificial stone compositions, e.g. their setting or hardening ability
- C04B40/02—Selection of the hardening environment
- C04B40/0231—Carbon dioxide hardening
- C04B40/0236—Carbon dioxide post-treatment of already hardened material
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B40/00—Processes, in general, for influencing or modifying the properties of mortars, concrete or artificial stone compositions, e.g. their setting or hardening ability
- C04B40/02—Selection of the hardening environment
- C04B40/0263—Hardening promoted by a rise in temperature
- C04B40/0268—Heating up to sintering temperatures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/40—Alkaline earth metal or magnesium compounds
- B01D2251/404—Alkaline earth metal or magnesium compounds of calcium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/50—Carbon oxides
- B01D2257/504—Carbon dioxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/151—Reduction of greenhouse gas [GHG] emissions, e.g. CO2
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/10—Production of cement, e.g. improving or optimising the production methods; Cement grinding
- Y02P40/18—Carbon capture and storage [CCS]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
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- Analytical Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
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- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Structural Engineering (AREA)
- Toxicology (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Gas Separation By Absorption (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
- Carbon And Carbon Compounds (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Abstract
Description
本願は、2007年11月15日出願の米国仮特許出願第60/988,122号に基づいて優先権を主張するものであり、その全体が参照により本明細書に組み込まれる。
本明細書に引用された全ての参照文献は、その全体が、参照により組み込まれる。
水熱液相焼結(HLPS)の好ましい実施形態において、「未焼結」又は部分的に焼結され、隣接する格子間気孔を有する多孔質の固体マトリックスは、液相浸透媒体の作用によって、焼結セラミックに転換する。HLPSは、比較的温和な条件下で実行され、稼働中のオートクレーブ内で生じる温度及び圧力を超えることは殆どない。HLPSは、広範な温度及び圧力で行われる。例えば、ある実施形態において、HLPS条件には、約2000℃未満の温度(例えば、約1000℃未満、約500℃未満、約200℃未満、約100℃未満、約50℃未満、室温未満など)が含まれる。反応圧力は、約100000psi(約689MPa)未満(例えば、70000psi未満、約50000psi未満、約10000psi未満、約5000psi未満、約1000psi未満、約500psi未満、約100psi未満、約50psi未満、約10psi未満など)とすることができる。一実施形態において、水熱焼結処理は、約80℃から約180℃の範囲の温度及び約1気圧から約3気圧(1気圧は約15psi(約0.103MPa))の範囲の圧力で行われる。
水熱反応作用は、溶解・再析出機構により起こる。または、水熱反応は、イオン置換反応により生ずる。前者では、圧縮された多孔質固体マトリックスのごく一部により、溶浸材溶液中のイオンと反応可能な供給溶存種が溶解されるが、この場合、溶浸材溶液中のイオンは金属イオンとすることができる。一実施形態では、添加される溶浸材の量は、単一ステップで反応を終了させるのに十分な量である。または、複数のステップが含まれてもよい。例えば、複数の溶浸材が含まれる。一実施形態では、チタン酸ストロンチウムが、チタニアマトリックスから形成され、その後、別の溶浸材によって、チタン酸ストロンチウムが、ストロンチウムアパタイトを形成することができる。または、複数の溶浸材によって、炭酸塩が形成され、その後、炭酸塩がシュウ酸塩保護層を形成することができる。別の実施形態では、成形体を部分的に浸透及び乾燥させ、最終生成物が生成されるまで、その浸透ステップが繰り返される。
固体マトリックスは、難溶性の物質を含んで構成されてよい。一実施形態では、多孔質固体マトリックスは、粉末から得られる。この粉末は、いかなる種類のものであってもよい。例えば、金属酸化物粉末である。適切な金属酸化物粉末の例には、ベリリウムの酸化物(例えば、BeO)、マグネシウムの酸化物(例えば、MgO)、カルシウムの酸化物(例えば、CaO,CaO2)、ストロンチウムの酸化物(例えば、SrO)、バリウムの酸化物(例えば、BaO)、スカンジウムの酸化物(例えば、Sc2O3)、チタンの酸化物(例えば、TiO,TiO2,Ti2O3)、アルミニウムの酸化物(例えば、Al2O3)、バナジウムの酸化物(例えば、VO,V2O3,VO2,V2O5)、クロムの酸化物(例えば、CrO,Cr2O3,CrO3,CrO2)、マンガンの酸化物(例えば、MnO,Mn2O3,MnO2,Mn2O7)、鉄の酸化物(例えば、FeO,Fe2O3)、コバルトの酸化物(例えば、CoO,Co2O3,Co3O4)、ニッケルの酸化物(例えば、NiO,Ni2O3)、銅の酸化物(例えば、CuO,Cu2O)、亜鉛の酸化物(例えば、ZnO)、ガリウムの酸化物(例えば、Ga2O3,Ga2O)、ゲルマニウムの酸化物(例えば、GeO,GeO2)、スズの酸化物(例えば、SnO,SnO2)、アンチモンの酸化物(例えば、Sb2O3,Sb2O5)、インジウムの酸化物(例えば、In2O3)、カドミウムの酸化物(例えば、CdO)、銀の酸化物(例えば、Ag2O)、ビスマスの酸化物(例えば、Bi2O3,Bi2O5,Bi2O4,Bi2O3,BiO)、金の酸化物(例えば、Au2O3,Au2O)、鉛の酸化物(例えば、PbO,PbO2,Pb3O4,Pb2O3,Pb2O)、ロジウムの酸化物(例えば、RhO2,Rh2O3)、イットリウムの酸化物(例えば、Y2O3)、ルテニウムの酸化物(例えば、RuO2,RuO4)、テクネチウムの酸化物(例えば、Tc2O,Tc2O3)、モリブデンの酸化物(例えば、MoO2,Mo2O5,Mo2O3,MoO3)、ネオジムの酸化物(例えば、Nd2O3)、ジルコニウムの酸化物(例えば、ZrO2)、ランタンの酸化物(例えば、La2O3)、ハフニウムの酸化物(例えば、HfO2)、タンタルの酸化物(例えば、TaO2,Ta2O5)、タングステンの酸化物(例えば、WO2,W2O5)、レニウムの酸化物(例えば、ReO2,Re2O3)、オスミウムの酸化物(例えば、PdO,PdO2)、イリジウムの酸化物(例えば、IrO2,Ir2O3)、白金の酸化物(例えば、PtO,PtO2,PtO3,Pt2O3,Pt3O4)、水銀の酸化物(例えば、HgO,Hg2O)、タリウムの酸化物(例えば、TlO2,Tl2O3)、パラジウムの酸化物(例えば、PdO,PdO2)、ランタノイド系列の酸化物、アクチノイド系列の酸化物、及びこれらと同種のもの、が含まれる。さらに、金属酸化物の混合は、関連する特殊な用途に応じて、母材形成に用いられる。
前述されたように、水熱焼結は、含水媒体又は非含水媒体を使用する。液状溶媒は、浸透媒体の一部である溶浸材種に基づいて選択される。溶浸材種は、水熱焼結処理の条件下では、液状溶媒に溶け易い。例えば、溶浸材種がイオン性の場合には、液状溶媒は水であってもよい。また、ある非イオン性溶浸材が、水性媒体に対して十分な可溶性を有していてもよい。
(焼結物質の気孔率)
HLPSは、極めて均質、かつ、極めて細かい微細構造を備えた焼結生成物を生成する。焼結物質の気孔率は、例えば、約15%未満(例えば、約10%未満、約5%未満、又は実用上十分に緻密)である。成形体の総気孔率は、標準的な技術、例えば、水銀圧入式測定装置を用いて測定される。密度は、例えば、アルキメデス法による水銀圧入式測定装置などの従来技術を用いて測定される。
HLPS処理を経た焼結物質の一特徴は、出発圧粉体と同一形状、又は同一サイズでさえあるということである。一実施形態では、この場合、生成物にはモル体積変化が殆ど無く、結果として、圧粉体には、多くのセラミック製造過程にあるような収縮が起こらない。したがって、焼結物質の機械加工は殆ど又は全く必要とされない。
実施例に図示されるように、焼結物質の生成には、広範な化学成分を用いることができる。また、焼結物質の形成に関与する種々の金属酸化物及び金属塩の数を、いかなる特定の方法にも限定する必要はない。さらに、最終生成物の化学量論は、圧粉体及び溶浸材媒体に存在する反応物質のモル比率により決まる。焼結物質の成分は、定量X線回折(QXRD)及び誘導結合プラズマ(ICP)を用いて評価される。
HLPS処理から生成された焼結生成物は、網状の相互接続ネットワークに略類似する微細組織を有する。また、HLPS処理から得られるモノリス(monolith)は、例えば、コア−シェル構造などの複合構造を示す。さらに、焼結生成物は、例えば、高引張強度、高圧縮強度、及び望ましい引張係数などといった、優れた機械的特性を有している。この強化は、イオン置換、イオン添加、オストワルト熟成(すなわち、新たなネットワークの形成可能な再結晶)、又はこれらの組み合わせ、により、物理的に結合された粒子間のプロセス中に形成される化学結合から生じる。一実施形態では、オストワルト熟成には、アルカリ性媒体中の炭酸塩物質の時効処理が含まれる。さらに、正のモル体積変化がある場合、前述のように緻密化がなされる。
通常、セメントは、2つのステップで製造される。すなわち、(i)セメントは、高温処理によって合成され、(ii)その後、水と混合及び化合して一体構造を形成する。
HLPS処理によって、ガスは、大気から回収され、大理石やセメントなどの様々なセラミックを形成する反応で用いられる。ガスは、例えば、二酸化炭素を含んだ温室効果ガス、又は、一般的に、炭素、硫黄、リン、窒素、水素、酸素、若しくはこれらの組み合わせを含んだガス、などのいかなる種類のガスであってもよい。
FeO + CO2 → FeCO3 (図1)
Ca(OH)2 + CO2 → CaCO3 + H2O (図2)
FeTiO3 + CO2 → FeCO3 + TiO2 (図3)
Fe3O4 + CO2 → FeCO3 + Fe2O3 (図4)
CaSO4 + K2CO3 → CaCO3 + K2SO4 (図5)
Ca(OH)2 + K2CO3 → CaCO3 + 2KOH (図6)
MO + M´2CO3 + H2O → MCO3 + 2M´OH
ここで、M = Na+, K+, NH4 +
Mg2+ + K2CO3 + CaCO3 → MgCO3/CaCO3 + 2K+
一実施形態では、2モルのCO2は、多座配位子(例えばシュウ酸塩のC2O4 2-など)を用いて隔離される。この反応物質は、炭素−炭素単結合(C−C)で結合された2モルのCO2を含んで構成される。以下のシュウ酸塩系についてシミュレーションを行って、前述の実現可能性を判断した。各結果は図中に示される。
(H2C2O4)
CaSO4 + H2C2O4 → CaC2O4・H2O + H2SO4 (図7)
MgO + H2C2O4 + 2H2O → MgC2O4・2H2O + H2O (図8)
Ca(OH)2 + H2C2O4 → CaC2O4・H2O + H2O (図9)
(K2C2O4)
CaSO4 + K2C2O4 + H2O → CaC2O4・H2O + K2SO4 (図10)
Ca(OH)2 + K2C2O4 + H2O → CaC2O4・H2O + 2KOH (図11)
CaCO3 + H2C2O4 → CaC2O4・H2O + CO2 (図12)
CaCO3 + K2C2O4 → CaC2O4・H2O + K2CO3 (図13)
HLPS処理により温室効果ガスを回収及び/又は隔離する間にセラミックを形成する1つの利点は、処理の多用途性である。例えば、いかなる時にも、反応が始まるので、現地において構造物の迅速な設置が可能である。例えば、蒸気とCO2の混合物が焼結反応を開始する間に、蒸気ローラタイプの装置を用いて圧粉し、続いてそのシステムを加熱する。または、炭酸塩溶液が、多孔質層(porous bed)に噴射され、続いてローラーによる圧密及び加熱がなされる。埋設型枠は、ポリマーライナー(polymer liners)を含んで構成され、導波路マイクロ波エネルギーが水を局所的に加熱して反応を開始、終了させることができる。この場合、圧縮構造体における局所的な圧力は、未臨界又は超臨界状態に相当する。この多用途性により、建設計画には、材料硬化の時間が殆ど必要とされないか、又は不要となる。また、HLPS処理は現地で水を添加することができるため、運搬を必要とする建設材料の重量を低減し、これにより、コスト及びエネルギー消費を削減することができる。しかも、HLPSの場合、水は、例えば、従来のセメントにおける反応物質としてよりも、むしろ浸透媒体のための溶媒として用いられる。特に、HLPSにおける水は、再利用されるか、又は生態系に還元される。
カルボン酸塩(例えば、金属炭酸塩及び金属シュウ酸塩など)は、HLPS処理における燃焼後二酸化炭素の回収に用いられる。炭酸イオンは、以下のような最初の反応を介して、CO2分子から形成される。
CO2 + 2OH- → CO3 2- + H2O
xM2+ + CO3 2- → Mx(CO3)
2CO2 + 2e- → C2O4 2-
CaCO3 → CaO + CO2
CaCO3 + K2C2O4 + H2O→ CaC2O4・H2O + K2CO3
CaCO3 + H2C2O4 → CaC2O4・H2O + CO2
Ca(OH)2 + CO2 → CaCO3 + H2O
Ca(OH)2 + H2C2O4 → CaC2O4・H2O + H2O
又は、
Ca(OH)2 + K2C2O4 + H2O → CaC2O4・H2O + 2KOH
(実施例1.水酸化カルシウム及び炭酸カリウムからの炭酸カルシウム)
5g以下の酸化カルシウム粉末は、室温で100ml以下の純水と反応して、テフロン(登録商標)瓶にCa(OH)2を形成した。水酸化カルシウムと水の混合液は、室温まで冷却された。その後、混合液は振動を加えられ、コロイダルプレス(colloidal press)に、その容器の大体約75%を満たすまで注入された。コロイダルプレスに7000ポンド(約3175kg)の負荷を徐々に加えた。テフロン(登録商標)瓶は、200mlの純水で満たされ、30gのK2CO3が、その中で溶解された。湿ったCa(OH)2ペレットは、テフロン(登録商標)トレー上に置かれ、そして、テフロン(登録商標)瓶中に置かれた。瓶の蓋は密閉され、4日間室温に保たれた。その後、ペレットは取り出され、純水で洗浄された。反応生成物は、X線回折を受け、少量のCa(OH)2を伴った主にCaCO3を含んで構成されていることが判明した。試料はその形状を維持し、破壊に対して対抗できる十分な機械的強度を有した。
5g以下の酸化カルシウム粉末は、室温で100ml以下の純水と反応して、テフロン(登録商標)瓶にCa(OH)2を形成した。水酸化カルシウムと水の混合液は、室温まで冷却された。その後、混合液は振動を加えられ、1インチ径のコロイダル(フィルタ)プレスに、その容器の大体約75%を満たすまで注入された。コロイダルプレスに7000ポンドの負荷を徐々に加えた。テフロン(登録商標)瓶は、200mlの純水で満たされ、30gのH2C2O4が混合された。湿ったCa(OH)2ペレットは、テフロン(登録商標)トレー上に置かれ、そして、テフロン(登録商標)瓶中に置かれた。瓶の蓋は密閉され、4日間室温に保たれた。その後、ペレットは取り出され、純水で洗浄された。X線回折により、CaC2O4・H2O及びCa(OH)2の両方の存在が明らかとなった。試料は、プレスされても形状及びサイズを維持し、水熱液相焼結後も寸法が変化しなかった。その物質は、機械的に安定している。プレスの間、純水を用いるよりもシュウ酸を用いてCa(OH)2と混合した方が、より完全な反応及びより高強度な物質となろう。
Claims (40)
- (i)温室効果ガスと反応可能な第1の薬剤を運搬する溶液を提供することと、
(ii)少なくとも前記第1の薬剤と前記温室効果ガスとの間の反応を促進することにより、少なくとも第1の反応物質が生成されるという条件下で、前記溶液を前記温室効果ガスに接触させることと、
(iii)格子間空間を有し、かつ、少なくとも第2の反応物質を含んで構成された、
多孔質マトリックスを提供することと、
(iv)少なくとも前記第1の反応物質と少なくとも前記第2の反応物質との間の反応を促進することにより、少なくとも第1の生成物が提供されるという条件下で、少なくとも前記第1の反応物質を運搬する溶液を、前記多孔質マトリックスの前記格子間空間の少なくとも相当部分に浸透可能とすることと、
(v)少なくとも前記第1の生成物が、前記多孔質マトリックスの少なくとも一部の前記格子間空間を形成及び充填し、これにより、前記温室効果ガスの隔離を可能とすることと、
を含んで構成された温室効果ガス隔離の方法。 - 前記温室効果ガスは、二酸化炭素を含んで構成された、請求項1に記載の方法。
- 前記温室効果ガスは、硫黄、リン、窒素、又はこれらの組み合わせ、を含んで構成された、請求項1に記載の方法。
- 前記ステップ(v)後の前記固体マトリックスは、前記ステップ(v)前のモル体積と略等しいモル体積を有する、請求項1に記載の方法。
- 前記ステップ(v)後の前記固体マトリックスは、前記ステップ(v)前のモル体積よりも大きいモル体積を有する、請求項1に記載の方法。
- 前記ステップ(v)後の前記固体マトリックスは、前記ステップ(v)前のモル体積よりも小さいモル体積を有する、請求項1に記載の方法。
- 前記ステップ(v)後の前記固体マトリックスは、前記ステップ(v)前の密度よりも大きい密度を有する、請求項1に記載の方法。
- 前記温室効果ガスは、工場により発生した、請求項1に記載の方法。
- 前記第2の反応物質は、金属酸化物、金属水酸化物、金属硫化物、金属フッ化物、チタン酸金属塩、又はこれらの組み合わせ、を含んで構成された、請求項1に記載の方法。
- 前記第2の反応物質は、金属を含んで構成された、請求項1に記載の方法。
- 前記第1の反応物質は、シュウ酸塩、炭酸塩、硫酸塩、リン酸塩、クエン酸塩、金属イオン、又はこれらの組み合わせ、を含んで構成された、請求項1に記載の方法。
- 前記第1の生成物は、析出により形成された、請求項1に記載の方法。
- 前記第1の生成物は、炭酸カルシウムを含んで構成された、請求項1に記載の方法。
- 前記第1の生成物は、カルボン酸塩を含んで構成された、請求項1に記載の方法。
- 前記第1の生成物は、金属炭酸塩、金属シュウ酸塩、又はこれらの組み合わせ、を含んで構成された、請求項1に記載の方法。
- 前記第1の生成物は、少なくとも約1000℃の分解温度を有する、請求項1に記載の方法。
- 前記第1の生成物は、相互接続するネットワーク微細構造を有する、請求項1に記載の方法。
- 前記第1の薬剤は、水性形態である、請求項1に記載の方法。
- 前記方法は、約300℃未満の温度で行われる、請求項1に記載の方法。
- 前記方法は、室温で行われる、請求項1に記載の方法。
- 炭素回収処理、炭素隔離処理、又はこれらの組み合わせ、により生成されるセラミックであって、
前記処理は、多孔質マトリックスの少なくとも1つの成分が、浸透媒体により運搬される少なくとも第1の反応物質との反応を経て、少なくとも第1の生成物を提供し、前記反応中、前記多孔質マトリックスの残りが、前記反応混合物からの前記第1の生成物の形成を容易にする骨格として機能し、これによりセラミックの生成を可能にすることを含んで構成された、セラミック。 - 前記セラミックは、水硬性結合を略含まずに構成された、請求項21に記載のセラミック。
- 前記セラミックは、主にセラミック結合を含んで構成された、請求項21に記載のセラミック。
- 前記セラミックの形状と前記固体マトリックスの形状が略等しい、請求項21に記載のセラミック。
- 前記セラミックは、少なくとも約1000℃の分解温度を有する、請求項21に記載のセラミック。
- 前記セラミックは、少なくとも約2000℃の分解温度を有する、請求項21に記載のセラミック。
- 前記第1の生成物は、イオン置換、イオン添加、不均化、又はこれらの組み合わせ、により生成される、請求項21に記載のセラミック。
- 前記第1の生成物は、析出により生成される、請求項21に記載のセラミック。
- 前記セラミックは、セメントである、請求項21に記載のセラミック。
- 前記第1の生成物は、カルボン酸塩を含んで構成された、請求項21に記載の方法。
- セラミックの製造方法であって、
(i)格子間空間を有し、かつ、少なくとも第1の反応物質を含んで構成される、多孔質マトリックスを提供することと、
(ii)前記多孔質マトリックスを、少なくとも第2の反応物質を運搬し、温室効果ガスを含んで構成された浸透媒体に接触させることと、
(iii)少なくとも前記第1の反応物質と少なくとも前記第2の反応物質との間の反応を促進することにより、少なくとも第1の生成物が提供されるという条件下で、前記浸透媒体を前記多孔質マトリックスの少なくとも一部の前記格子間空間に浸透可能とすることと、
(iv)少なくとも前記第1の生成物が、前記多孔質マトリックスの少なくとも一部の前記格子間空間を形成及び充填し、これによりセラミックの生産を可能とすることと、
を含んで構成され、
前記方法は、多量の前記温室効果ガスを消費し、かつ、排出しない、セラミックの製造方法。 - 前記ステップ(ii)から(iv)までは、少なくとも1度繰り返される、請求項31に記載の方法。
- 前記セラミックは、水硬性結合を略含まない、請求項31に記載の方法。
- 前記セラミックは、多量のチタン酸バリウムを含まない、請求項31に記載の方法。
- 前記温室効果ガスは、工場から得られる、請求項31に記載の方法。
- 前記セラミックは、殆どき裂を含まない、請求項31に記載の方法。
- 水硬性結合を略含まずに構成されたセメント。
- セラミック結合を含んで構成され、
前記セラミックは、相互接続のネットワーク微細構造を含んで構成されたセラミック。 - (i)少なくとも1つの温室効果ガスを第1の反応物質として運搬する溶液を提供することと、
(ii)格子間空間を有し、かつ、少なくとも第2の反応物質を含んで構成された、多孔質マトリックスを提供することと、
(iii)少なくとも前記第1の反応物質と少なくとも前記第2の反応物質との間の反応を促進することにより、少なくとも第1の生成物が提供されるという条件下で、少なくとも前記第1の反応物質を運搬する前記溶液を、前記多孔質マトリックスの前記格子間空間の少なくとも相当部分に浸透可能とすることと、
(iv)少なくとも前記第1の生成物が、前記多孔質マトリックスの少なくとも一部の前記格子間空間を形成及び充填し、これにより、前記温室効果ガスの隔離を可能とすることと、
を含んで構成された温室効果ガス隔離の方法。 - 前記温室効果ガスは、前記溶液に溶解する、請求項39に記載の方法。
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JP2022039025A (ja) * | 2020-08-27 | 2022-03-10 | 株式会社ジョンクェルコンサルティング | 二酸化炭素の処理方法、およびそれで使用する水分散体 |
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