JP2011211139A - 液体噴射ヘッド及びそれを用いた液体噴射装置並びに圧電素子 - Google Patents
液体噴射ヘッド及びそれを用いた液体噴射装置並びに圧電素子 Download PDFInfo
- Publication number
- JP2011211139A JP2011211139A JP2010114761A JP2010114761A JP2011211139A JP 2011211139 A JP2011211139 A JP 2011211139A JP 2010114761 A JP2010114761 A JP 2010114761A JP 2010114761 A JP2010114761 A JP 2010114761A JP 2011211139 A JP2011211139 A JP 2011211139A
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- Prior art keywords
- piezoelectric
- piezoelectric element
- liquid ejecting
- piezoelectric layer
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000007788 liquid Substances 0.000 title claims abstract description 40
- 239000011734 sodium Substances 0.000 claims abstract description 48
- 239000010955 niobium Substances 0.000 claims abstract description 41
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 35
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 35
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 34
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 33
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 28
- KTMLBHVBHVXWKQ-UHFFFAOYSA-N dibismuth dioxido(dioxo)manganese Chemical compound [Bi+3].[Bi+3].[O-][Mn]([O-])(=O)=O.[O-][Mn]([O-])(=O)=O.[O-][Mn]([O-])(=O)=O KTMLBHVBHVXWKQ-UHFFFAOYSA-N 0.000 claims abstract description 21
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 14
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 14
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011591 potassium Substances 0.000 claims abstract description 14
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 13
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000006104 solid solution Substances 0.000 claims abstract description 7
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 claims description 16
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- 238000000034 method Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
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- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 5
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
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- 238000000018 DNA microarray Methods 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
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- 229910052738 indium Inorganic materials 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- CVMIVKAWUQZOBP-UHFFFAOYSA-L manganic acid Chemical compound O[Mn](O)(=O)=O CVMIVKAWUQZOBP-UHFFFAOYSA-L 0.000 description 1
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- 239000011148 porous material Substances 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
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- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8542—Alkali metal based oxides, e.g. lithium, sodium or potassium niobates
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
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- B41J2/01—Ink jet
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- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14491—Electrical connection
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
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- B41J2202/01—Embodiments of or processes related to ink-jet heads
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- C04B2235/3208—Calcium oxide or oxide-forming salts thereof, e.g. lime
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-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8561—Bismuth-based oxides
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Coating Apparatus (AREA)
Abstract
【解決手段】液滴を噴射するノズル開口に連通した圧力発生室と、圧電体層および前記圧電体層に電圧を印加する電極を有する圧電素子と、を具備し、前記圧電体層は、ナトリウム、カリウム、リチウム、ニオブ及びタンタルを含有するペロブスカイト型酸化物及びマンガン酸ビスマスを含む固溶体からなる液体噴射ヘッドとする。
【選択図】なし
Description
かかる態様では、tanδが小さく耐久性に優れ、且つ、環境への負荷が小さい圧電素子を有する液体噴射ヘッドとなる。また、耐水性にも優れた圧電素子を有する液体噴射ヘッドとなる。
図1は、本発明の実施形態1に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2は、インクジェット式記録ヘッドの断面図である。
(Kx,Nay,Li1-x-y)(Nbz,Ta1-z)O3-m[BiMnO3]-n[CaZrO3] (1)
(0.420≦x≦0.480、0.475≦y≦0.520、0.80≦z≦0.85、0.0025≦m≦0.01、0.01≦n≦0.04)
Na2CO3、K2CO3、Li2CO3、Nb2O5の粉末を120℃で乾燥させた状態で秤量した後、エタノール等を添加してボールミルで混合・粉砕して原料混合物とした。さらに、この原料混合物を乾燥させた後、800℃で仮焼成することで、K、Na、Li及びNbを有する複合酸化物の粉末を形成した。
Na2CO3、K2CO3、Li2CO3、Nb2O5の粉末にさらにTa2O5の粉末を混合してK、Na、Li、Nb及びTaを有する複合酸化物の粉末を形成したこと、及び、焼結温度を1120℃2時間とした以外は、試料1と同様の操作を行って、表1の試料2及び試料3に示すx、y、z、m及びnの上記式(1)で表される圧電体層を作製し、試料2及び試料3の圧電素子を得た。
Na2CO3、K2CO3、Li2CO3、Nb2O5及びTa2O5の粉末を120℃で乾燥させた状態で秤量した後、エタノール等を添加してボールミルで混合・粉砕して原料混合物とした。さらに、この原料混合物を乾燥させた後、850℃で仮焼成することで、K、Na、Li、Nb及びTaを有する複合酸化物の粉末を形成した。
Bi2O3粉末及びMnO2粉末を添加する際に、さらにCaZrO3粉末を添加したこと、及び、焼結温度を試料11及び試料14では1130℃2時間とし、試料12及び試料13では1160℃2時間とし、試料15及び試料16では1150℃2時間とした以外は、試料4〜10と同様の操作を行って、表1の試料11〜16に示すx、y、z、m及びnの上記式(1)で表される圧電体層を作製し、試料11〜16の圧電素子を得た。
Na2CO3、K2CO3、Li2CO3、Nb2O5及びTa2O5の粉末にさらにSb2O5を混合してK、Na、Li、Nb、Ta及びSbを有する複合酸化物の粉末を形成したこと以外は、試料4〜10と同様の操作を行って、表1の試料17及び試料18に示すx、y、z及びmで、w=0.03の下記式(2)で表される圧電体層を作製し、試料17〜18の圧電素子を得た。なお、式(2)において、(Kx,Nay,Li1−x−y)(Nbz,SbwTa1−z−w)O3:BiMnO3=1:m(モル比)の割合である。
(Kx,Nay,Li1-x-y)(Nbz,SbwTa1-z-w)O3-m[BiMnO3] (2)
このようにして形成された試料1〜18の分極方向の圧電定数d33(変位特性)、誘電損失(tanδ)、密度、誘電率εrを測定した。結果を表1に示す。なお、d33はUK PIEZOTEST製ピエゾd33メーターで測定し、tanδはヒューレット・パッカード製HP4294Aで測定し、密度はARCHIMIDES法で25℃で測定した。また、誘電率εrはヒューレット・パッカード製HP4294Aで25℃で測定した。また、試料1〜10については、3日間水中に浸漬した後のd33も測定し、浸漬する前のd33に対する浸漬した後のd33の減少率を求めた。結果を表2に示す。
試料11〜16について、25℃、50℃、100℃、150℃、200℃、250℃、300℃、350℃、400℃、450℃の各温度で、5分間加熱した後のd33も測定し、d33の温度変化を調べた。結果の一例を、図5(試料15)に示す。この結果、試料11〜16のd33は、200℃に加熱しても、加熱前とほとんど変わらず、試料11〜16は温度安定性が優れていることが確認された。
試料1〜18の表面等を5000倍の走査電子顕微鏡(SEM)により観察した。結果の一例を、図6(a)(試料3の表面)、図6(b)(試料3の断面)、図7(a)(試料7の表面)、図7(b)(試料7の断面)、図8(試料15)に示す。図6〜8に示すように、BiMnO3を添加した試料7は、BiMnO3を添加しない試料3よりも、粒径が小さく、気孔が減少しており、緻密であった。
以上、本発明の実施形態例を説明したが、本発明の基本的構成は上述したものに限定されるものではない。例えば、実施形態1では、圧電体層44として、固相法等で作製するいわゆるバルクの圧電体層を例示したが、ゾル−ゲル法やMOD法等の圧電体前駆体溶液を塗布等して形成した圧電体前駆体膜を加熱して結晶化する化学溶液法や、スパッタリング法等の気相法で作製される、例えば厚さが0.3〜1.5μm程度の薄膜の圧電体層としてもよい。
Claims (7)
- 液滴を噴射するノズル開口に連通した圧力発生室と、
圧電体層および前記圧電体層に電圧を印加する電極を有する圧電素子と、を具備し、
前記圧電体層は、ナトリウム、カリウム、リチウム、ニオブ及びタンタルを含有するペロブスカイト型酸化物及びマンガン酸ビスマスを含む固溶体からなることを特徴とする液体噴射ヘッド。 - 前記マンガン酸ビスマスは、前記ナトリウム、カリウム、リチウム、ニオブ及びタンタルを含有するペロブスカイト型酸化物に対して0.25mol%以上1mol%以下含まれることを特徴とする請求項1に記載の液体噴射ヘッド。
- 前記圧電体層は、ジルコン酸カルシウムをさらに含むことを特徴とする請求項1または2に記載の液体噴射ヘッド。
- 前記ジルコン酸カルシウムは、前記ナトリウム、カリウム、リチウム、ニオブ及びタンタルを含有するペロブスカイト型酸化物に対して1mol%以上4mol%以下含まれることを特徴とする請求項3に記載の液体噴射ヘッド。
- 請求項1〜4のいずれか一項に記載の液体噴射ヘッドを備えたことを特徴とする液体噴射装置。
- 圧電体層および前記圧電体層に電圧を印加する電極を有し、前記圧電体層は、ナトリウム、カリウム、リチウム、ニオブ及びタンタルを含有するペロブスカイト型酸化物及びマンガン酸ビスマスを含む固溶体からなることを特徴とする圧電素子。
- 前記圧電体層は、ジルコン酸カルシウムをさらに含むことを特徴とする請求項6に記載の圧電素子。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013128651A1 (ja) * | 2012-03-02 | 2013-09-06 | 本多電子株式会社 | 圧電磁器組成物及びその製造方法 |
JP2016025193A (ja) * | 2014-07-18 | 2016-02-08 | 国立研究開発法人産業技術総合研究所 | 広帯域化高感度aeセンサー |
JP2020123649A (ja) * | 2019-01-30 | 2020-08-13 | セイコーエプソン株式会社 | 圧電素子、液体吐出ヘッド、およびプリンター |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015167529A1 (en) * | 2014-04-30 | 2015-11-05 | Hewlett-Packard Development Company, L.P. | Electrocaloric heating and cooling device |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11228225A (ja) * | 1998-02-18 | 1999-08-24 | Murata Mfg Co Ltd | 圧電磁器組成物 |
JPH11228227A (ja) * | 1998-02-18 | 1999-08-24 | Murata Mfg Co Ltd | 圧電磁器組成物 |
JP2007116091A (ja) * | 2005-09-26 | 2007-05-10 | Fujifilm Corp | 圧電素子及びその駆動方法、圧電装置、液体吐出装置 |
WO2008152851A1 (ja) * | 2007-06-15 | 2008-12-18 | Murata Manufacturing Co., Ltd. | 圧電磁器組成物、及び圧電セラミック電子部品 |
JP2009132598A (ja) * | 2007-11-08 | 2009-06-18 | Ngk Insulators Ltd | 圧電/電歪体、及び圧電/電歪素子 |
JP2009256182A (ja) * | 2008-03-21 | 2009-11-05 | Ngk Insulators Ltd | 圧電/電歪磁器組成物の製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW429636B (en) * | 1998-02-18 | 2001-04-11 | Murata Manufacturing Co | Piezoelectric ceramic composition |
JP4051654B2 (ja) | 2000-02-08 | 2008-02-27 | セイコーエプソン株式会社 | 圧電体素子、インクジェット式記録ヘッド及びこれらの製造方法並びにインクジェットプリンタ |
JP4398635B2 (ja) * | 2002-09-24 | 2010-01-13 | 株式会社ノリタケカンパニーリミテド | 圧電セラミックス |
GB2398672A (en) * | 2003-02-19 | 2004-08-25 | Qinetiq Ltd | Group IIIA nitride buffer layers |
CN100335415C (zh) * | 2003-02-28 | 2007-09-05 | 新加坡纳米材料科技有限公司 | 一种制备各种晶态钙钛矿类化合物粉体的方法 |
EP1642875A3 (en) * | 2004-09-29 | 2009-01-28 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive porcelain composition, piezoelectric/electrostrictive article, and piezoelectric/electrostrictive film type element |
JP2007049025A (ja) | 2005-08-11 | 2007-02-22 | Seiko Epson Corp | アクチュエータ装置及び液体噴射ヘッド並びに液体噴射装置 |
US8092706B2 (en) | 2006-02-28 | 2012-01-10 | Konica Minolta Holdings, Inc. | Piezoelectric ceramic composition |
JP2008050206A (ja) | 2006-08-24 | 2008-03-06 | Seiko Epson Corp | 圧電材料およびその製造方法、並びに、圧電素子 |
JP4266036B2 (ja) * | 2007-04-26 | 2009-05-20 | 富士フイルム株式会社 | 圧電体、圧電素子、及び液体吐出装置 |
WO2008143160A1 (ja) * | 2007-05-16 | 2008-11-27 | National Institute Of Advanced Industrial Science And Technology | 圧電セラミックス及びこれを用いた圧電・誘電・焦電素子 |
US7911117B2 (en) | 2007-11-08 | 2011-03-22 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive body, and piezoelectric/electrostrictive element |
JP2011037148A (ja) * | 2009-08-12 | 2011-02-24 | Seiko Epson Corp | 液体噴射ヘッド及びそれを用いた液体噴射装置 |
-
2010
- 2010-05-18 JP JP2010114761A patent/JP5614531B2/ja active Active
-
2011
- 2011-03-09 EP EP20110157440 patent/EP2364852B1/en active Active
- 2011-03-11 US US13/046,517 patent/US9209384B2/en active Active
- 2011-03-11 CN CN201110061743.6A patent/CN102205720B/zh active Active
-
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- 2015-03-26 US US14/669,680 patent/US9318690B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11228225A (ja) * | 1998-02-18 | 1999-08-24 | Murata Mfg Co Ltd | 圧電磁器組成物 |
JPH11228227A (ja) * | 1998-02-18 | 1999-08-24 | Murata Mfg Co Ltd | 圧電磁器組成物 |
JP2007116091A (ja) * | 2005-09-26 | 2007-05-10 | Fujifilm Corp | 圧電素子及びその駆動方法、圧電装置、液体吐出装置 |
WO2008152851A1 (ja) * | 2007-06-15 | 2008-12-18 | Murata Manufacturing Co., Ltd. | 圧電磁器組成物、及び圧電セラミック電子部品 |
JP2009132598A (ja) * | 2007-11-08 | 2009-06-18 | Ngk Insulators Ltd | 圧電/電歪体、及び圧電/電歪素子 |
JP2009256182A (ja) * | 2008-03-21 | 2009-11-05 | Ngk Insulators Ltd | 圧電/電歪磁器組成物の製造方法 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013128651A1 (ja) * | 2012-03-02 | 2013-09-06 | 本多電子株式会社 | 圧電磁器組成物及びその製造方法 |
US9172026B2 (en) | 2012-03-02 | 2015-10-27 | Honda Electronics Co., Ltd. | Piezoceramic composition and method for manufacturing the same |
JP2016025193A (ja) * | 2014-07-18 | 2016-02-08 | 国立研究開発法人産業技術総合研究所 | 広帯域化高感度aeセンサー |
JP2020123649A (ja) * | 2019-01-30 | 2020-08-13 | セイコーエプソン株式会社 | 圧電素子、液体吐出ヘッド、およびプリンター |
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