JP2011207751A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011207751A5 JP2011207751A5 JP2011051537A JP2011051537A JP2011207751A5 JP 2011207751 A5 JP2011207751 A5 JP 2011207751A5 JP 2011051537 A JP2011051537 A JP 2011051537A JP 2011051537 A JP2011051537 A JP 2011051537A JP 2011207751 A5 JP2011207751 A5 JP 2011207751A5
- Authority
- JP
- Japan
- Prior art keywords
- silica
- group
- alkoxysilanes
- alkoxysilane compound
- compound selected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 84
- 239000000377 silicon dioxide Substances 0.000 claims description 42
- 150000001875 compounds Chemical class 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 239000003960 organic solvent Substances 0.000 claims description 13
- 239000012528 membrane Substances 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 239000002243 precursor Substances 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 239000003595 mist Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011051537A JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010054735 | 2010-03-11 | ||
| JP2010054735 | 2010-03-11 | ||
| JP2011051537A JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011207751A JP2011207751A (ja) | 2011-10-20 |
| JP2011207751A5 true JP2011207751A5 (https=) | 2014-04-24 |
| JP5652270B2 JP5652270B2 (ja) | 2015-01-14 |
Family
ID=44939219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011051537A Active JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5652270B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016001200A (ja) * | 2012-10-15 | 2016-01-07 | 旭硝子株式会社 | 防汚性反射防止膜、物品およびその製造方法 |
| JP2016001711A (ja) * | 2014-06-12 | 2016-01-07 | 日本電信電話株式会社 | 熱電変換材料およびその製造方法 |
| JPWO2018101277A1 (ja) * | 2016-11-30 | 2019-10-24 | 富士フイルム株式会社 | 塗布組成物、反射防止膜、積層体及び積層体の製造方法、並びに、太陽電池モジュール |
| CN111656085A (zh) * | 2018-01-26 | 2020-09-11 | 日东电工株式会社 | Led照明器具用膜、led照明器具 |
| CN111656087A (zh) * | 2018-02-02 | 2020-09-11 | 日东电工株式会社 | Led背光源用膜、led背光源 |
| JP2024016433A (ja) * | 2022-07-26 | 2024-02-07 | ハニー化成株式会社 | 防眩防汚積層処理の工程短縮および耐久性向上を実現する処理剤および塗装方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001118841A (ja) * | 1999-10-22 | 2001-04-27 | Asahi Kasei Corp | 多孔性シリカ |
| JPWO2006132351A1 (ja) * | 2005-06-09 | 2009-01-08 | 日立化成工業株式会社 | 反射防止膜の形成方法 |
| WO2008111636A1 (ja) * | 2007-03-13 | 2008-09-18 | Mitsubishi Chemical Corporation | シリカ多孔質体、光学用途積層体及び組成物、並びに、シリカ多孔質体の製造方法 |
| JP5437662B2 (ja) * | 2008-03-03 | 2014-03-12 | 学校法人慶應義塾 | 反射防止膜及びその形成方法 |
-
2011
- 2011-03-09 JP JP2011051537A patent/JP5652270B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011207751A5 (https=) | ||
| CN109642112B (zh) | 斥水膜形成用组合物、斥水膜、具有斥水膜的基体以及物品 | |
| CN105694711B (zh) | 一种超光滑自洁涂层及其制备方法 | |
| US20080241373A1 (en) | Anti-reflective coating for photovoltaic glass panel | |
| JP2018207108A5 (https=) | ||
| JP2016066658A5 (https=) | ||
| CN107406327A (zh) | 含二氧化硅气凝胶的毡的制备方法和使用该制备方法制备的含二氧化硅气凝胶的毡 | |
| CN108473321A (zh) | 用于超高温的二氧化硅气凝胶毡、其制造方法和其构建方法 | |
| JP2012518010A5 (https=) | ||
| TW201329219A (zh) | 保護膜形成用藥液之調製方法 | |
| JP2014506185A5 (https=) | ||
| KR20140116540A (ko) | 불소-함유 실란계 막을 갖는 물품의 제조 방법 | |
| JP2012519950A5 (https=) | ||
| RU2014117616A (ru) | Нанесение оксида кремния путем химического осаждения из паровой фазы при атмосферном давлении | |
| JP2013543433A5 (https=) | ||
| CN102029116A (zh) | 一种聚乙烯醇渗透汽化杂化膜的制备方法 | |
| TWI404778B (zh) | A coating liquid for forming a low refractive index film, a method for producing the same, and an antireflection material | |
| JP5666254B2 (ja) | 拡散剤組成物および不純物拡散層の形成方法 | |
| CN114164499A (zh) | 一种抗冷凝失效的铠甲化超疏水表面及其制备方法 | |
| KR20180076473A (ko) | 비불소계 발수 코팅액의 제조방법 및 이를 이용한 발수 코팅막의 제조방법 | |
| JP2011046595A (ja) | フッ化マグネシウム膜の製造方法、反射防止膜および光学素子 | |
| TW201339249A (zh) | 作為硬罩幕抗反射塗覆材料之以二叔丁氧基雙乙醯氧基矽烷為主之倍半矽氧烷樹脂及其製造方法 | |
| CN102040338A (zh) | 一种自清洁钢化玻璃的制备方法 | |
| JP2014024288A (ja) | 撥水膜付き基板 | |
| JP2010250069A (ja) | 反射防止膜、及びこれを有する光学素子 |