JP2011207126A - 機能性フィルムの製造方法 - Google Patents
機能性フィルムの製造方法 Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/14—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length
- B29C39/18—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length incorporating preformed parts or layers, e.g. casting around inserts or for coating articles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/243—Coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B2038/0052—Other operations not otherwise provided for
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2310/00—Treatment by energy or chemical effects
- B32B2310/08—Treatment by energy or chemical effects by wave energy or particle radiation
- B32B2310/0806—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation
- B32B2310/0831—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation using UV radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】機能性フィルムの製造方法は、無機膜16と支持体12の間に、無機膜16と支持体12の間に滑り性を付与し、無機膜16の厚さ以下の中心線平均粗さ(Ra)を有するラミネートフィルム20を介在させて、減圧下で支持体12をフィルムロール48に巻き取る工程を含む。
【選択図】 図2
Description
以下、実施例を挙げてさらに具体的に説明する。以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り、適宜、変更することができる。したがって、本発明の範囲は以下に示す具体例に限定されるものではない。
支持体の裏面にラミネートフィルムを貼り付けなかった。支持体の表面に、有機膜、無機膜をこの順で成膜した。
支持体の裏面に、中心線平均粗さ(Ra)20nmのPEのラミネートフィルムを貼り付けた。ヤング率を0.2(GPa)とした。支持体の表面に、有機膜、無機膜をこの順で成膜した。無機膜の厚さを75nmとした。
ラミネートフィルムの中心線平均粗さ(Ra)を30nmとした以外は、条件2と同様の条件とした。
ラミネートフィルムの中心線平均粗さ(Ra)を50nmとした以外は、条件2と同様の条件とした。
ラミネートフィルムの中心線平均粗さ(Ra)を75nmとした以外は、条件2と同様の条件とした。
ラミネートフィルムの中心線平均粗さ(Ra)を5nmとした以外は、条件2と同様の条件とした。
ラミネートフィルムの中心線平均粗さ(Ra)を2nmとした以外は、条件2と同様の条件とした。
支持体の裏面に、中心線平均粗さ(Ra)20nmのPETのラミネートフィルムを貼り付けた。ヤング率を5(GPa)とした。支持体の表面に有機膜、無機膜をこの順で成膜した。無機膜の厚さを75nmとした。
支持体の裏面に、中心線平均粗さ(Ra)20nmのPENのラミネートフィルムを貼り付けた。ヤング率を6(GPa)とした。支持体の表面に有機膜、無機膜をこの順で成膜した。無機膜の厚さを75nmとした。
無機膜の厚さを20nmとし、中心線平均粗さ(Ra)5nmとした以外は、条件2と同様の条件とした。
無機膜の厚さを100nmとし、中心線平均粗さ(Ra)75nmとした以外は、条件2と同様の条件とした。
無機膜の厚さを150nmとし、中心線平均粗さ(Ra)75nmとした以外は、条件2と同様の条件とした。
PEのラミネートフィルムを無機膜の表面に貼り付けた以外は、条件2と同様とした。
条件1について、ラミネートフィルムを備えていないので、評価結果、巻きシワ程度が共に×の評価であった。条件2〜4、6について、ラミネートフィルムの中心線平均粗さ(Ra)が2nm以上で無機膜の膜厚以下であった。その結果、評価結果、巻きシワ程度が共に○以上の評価を得た。条件5は、中心線平均粗さ(Ra)が無機膜の膜厚と同じであった。そのため、巻き取りでの粗さによる無機膜へのつきぬけが発生し、バリア性が低下し、評価結果が△であった。
Claims (9)
- 機能性フィルムの製造方法であって、
長尺の支持体を連続的に供給する工程と、
前記支持体の表面側に無機膜を減圧下で成膜する工程と、
前記無機膜と前記支持体の間に、前記無機膜と前記支持体の間に滑り性を付与し、かつ前記無機膜の厚さ以下の中心線平均粗さ(Ra)を有するラミネートフィルムを介在させて、減圧下で前記支持体をロールに巻き取る工程を、含む機能性フィルムの製造方法。 - 請求項1記載の機能性フィルムの製造方法であって、前記無機膜は20nm〜150nmの厚さを有し、前記ラミネートフィルムが2nm〜75nmの中心線平均粗さ(Ra)を有する機能性フィルムの製造方法。
- 請求項1又は2記載の機能性フィルムの製造方法であって、前記ラミネートフィルムは6Gpa以下のヤング率を有する機能性フィルムの製造方法。
- 請求項1〜3の何れか記載の機能性フィルムの製造方法であって、前記無機膜を成膜する工程の前に、前記支持体の表面側に有機膜を成膜する工程を、さらに有する機能性フィルムの製造方法。
- 請求項1〜4の何れか記載の機能性フィルムの製造方法であって、前記ラミネートフィルムが前記無機膜の表面側に貼り付けられた後、前記支持体がロールに巻き取られる機能性フィルムの製造方法。
- 請求項1〜4の何れか記載の機能性フィルムの製造方法であって、前記ラミネートフィルムが前記支持体の裏面側に貼り付けられた後、前記支持体がロールに巻き取られる機能性フィルムの製造方法。
- 請求項6記載の機能性フィルムの製造方法であって、前記ラミネートフィルムが、前記有機膜を成膜する前に前記支持体の裏面側に貼り付けられる機能性フィルムの製造方法。
- 請求項1〜7の何れか記載の機能性フィルムの製造方法であって、前記無機膜が金属、金属酸化物、金属窒化物、金属炭化物、金属フッ化物、若しくはその複合物から成る群から選択された一つを含む機能性フィルムの製造方法。
- 請求項4〜8の何れか記載の機能性フィルムの製造方法であって、前記有機膜が放射線硬化性のモノマー、及びオリゴマーの一つを含む機能性フィルムの製造方法。
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JP2010078480A JP5318020B2 (ja) | 2010-03-30 | 2010-03-30 | 機能性フィルムの製造方法 |
US13/075,747 US20110240211A1 (en) | 2010-03-30 | 2011-03-30 | Method for producing functional film |
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US11052642B2 (en) | 2017-09-06 | 2021-07-06 | Fujifilm Corporation | Gas barrier film and method for producing gas barrier film |
KR20210133247A (ko) | 2019-03-27 | 2021-11-05 | 후지필름 가부시키가이샤 | 기능성 필름 및 기능성 필름의 제조 방법 |
US11203180B2 (en) | 2017-05-19 | 2021-12-21 | Fujifilm Corporation | Gas barrier film and method for producing gas barrier film |
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JP6485455B2 (ja) * | 2014-04-25 | 2019-03-20 | コニカミノルタ株式会社 | ガスバリアーフィルム及びガスバリアーフィルムの製造方法 |
JP7092504B6 (ja) | 2015-04-30 | 2022-08-01 | ソシエテ・デ・プロデュイ・ネスレ・エス・アー | 飲料又は食品を調製するためのシステムのコード配置及び容器 |
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US11203180B2 (en) | 2017-05-19 | 2021-12-21 | Fujifilm Corporation | Gas barrier film and method for producing gas barrier film |
US11052642B2 (en) | 2017-09-06 | 2021-07-06 | Fujifilm Corporation | Gas barrier film and method for producing gas barrier film |
KR20210133247A (ko) | 2019-03-27 | 2021-11-05 | 후지필름 가부시키가이샤 | 기능성 필름 및 기능성 필름의 제조 방법 |
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JP5318020B2 (ja) | 2013-10-16 |
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