JP2011138745A - パターン形成方法及び有機発光素子の製造方法 - Google Patents
パターン形成方法及び有機発光素子の製造方法 Download PDFInfo
- Publication number
- JP2011138745A JP2011138745A JP2010149903A JP2010149903A JP2011138745A JP 2011138745 A JP2011138745 A JP 2011138745A JP 2010149903 A JP2010149903 A JP 2010149903A JP 2010149903 A JP2010149903 A JP 2010149903A JP 2011138745 A JP2011138745 A JP 2011138745A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern
- heating
- pattern forming
- forming material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 112
- 238000010438 heat treatment Methods 0.000 claims abstract description 79
- 238000000059 patterning Methods 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 39
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 230000008569 process Effects 0.000 abstract description 15
- 239000010410 layer Substances 0.000 description 20
- 239000010408 film Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
【解決手段】電流が流れる位置を選択的に制御することによって、熱が発生する位置を選択的に制御できる加熱基板を提供するステップと、加熱基板の一面にパターン形成物質を形成するステップと、パターンが形成されるパターニング基板を加熱基板の一面に対向して整列させるステップと、加熱基板に選択的に電流を加えることによって、パターン形成物質の一部をパターニング基板に転写するステップと、を含むパターン形成方法及び有機発光素子の製造方法である。これにより、加熱基板に形成されたパターン形成物質を加熱する方式でパターンを転写することによって、マスクの使用なしに大型基板に精度の高いパターンを実現でき、工程後に加熱基板に残存するパターン形成物質を再使用することもできる。
【選択図】図6
Description
11 基板
12 電熱線
20 パターニング基板
40 パターン形成物質
50 パターン
Claims (10)
- 電流が流れる位置を選択的に制御することによって、熱が発生する位置を選択的に制御できる加熱基板を提供するステップと、
前記加熱基板の一面にパターン形成物質を形成するステップと、
パターンが形成されるパターニング基板を前記加熱基板の一面に対向して整列させるステップと、
前記加熱基板に選択的に電流を加えることによって、前記パターン形成物質の一部を前記パターニング基板に転写するステップと、を含むパターン形成方法。 - 前記加熱基板には、複数の電熱線が結合され、前記複数の電熱線には、選択的に電流が流れることを特徴とする請求項1に記載のパターン形成方法。
- 前記電熱線は、前記パターニング基板に形成されるパターンに対応する位置で熱を発生させるパターンであることを特徴とする請求項2に記載のパターン形成方法。
- 前記加熱基板の一面にパターン形成物質を形成するステップは、
前記パターン形成物質を前記加熱基板の一面に蒸着させるか、またはスパッタリングすることによって行われることを特徴とする請求項1に記載のパターン形成方法。 - 前記パターン形成物質は、前記加熱基板で発生する熱により昇華されることを特徴とする請求項1に記載のパターン形成方法。
- 電流が流れる位置を選択的に制御することによって、熱が発生する位置を選択的に制御できる加熱基板を提供するステップと、
前記加熱基板の一面にパターン形成物質を形成するステップと、
複数の画素電極が備えられたパターニング基板を前記加熱基板の一面に対向して整列させるステップと、
前記加熱基板に選択的に電流を加えることによって、前記パターン形成物質の一部を前記パターニング基板に転写するステップと、を含む有機発光素子の製造方法。 - 前記加熱基板には、複数の電熱線が結合され、前記複数の電熱線には、選択的に電流が流れることを特徴とする請求項6に記載の有機発光素子の製造方法。
- 前記電熱線は、前記パターニング基板に形成されるパターンに対応する位置で熱を発生させるパターンであることを特徴とする請求項7に記載の有機発光素子の製造方法。
- 前記加熱基板の一面にパターン形成物質を形成するステップは、
前記パターン形成物質を前記加熱基板の一面に蒸着させるか、またはスパッタリングすることによって行われることを特徴とする請求項6に記載の有機発光素子の製造方法。 - 前記パターン形成物質は、前記加熱基板で発生する熱により昇華されることを特徴とする請求項6に記載の有機発光素子の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090132824A KR101193185B1 (ko) | 2009-12-29 | 2009-12-29 | 패턴 형성 방법 및 유기 발광 소자의 제조방법 |
KR10-2009-0132824 | 2009-12-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011138745A true JP2011138745A (ja) | 2011-07-14 |
JP5119428B2 JP5119428B2 (ja) | 2013-01-16 |
Family
ID=44187882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010149903A Active JP5119428B2 (ja) | 2009-12-29 | 2010-06-30 | パターン形成方法及び有機発光素子の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8647707B2 (ja) |
JP (1) | JP5119428B2 (ja) |
KR (1) | KR101193185B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017033903A (ja) * | 2015-08-06 | 2017-02-09 | 株式会社ブイ・テクノロジー | 有機el素子の製造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140071091A (ko) * | 2012-12-03 | 2014-06-11 | 삼성디스플레이 주식회사 | 마스크 기판의 제조 방법 및 이를 이용하여 유기전계발광 표시장치를 제조하는 방법 |
KR102065763B1 (ko) | 2013-03-27 | 2020-01-14 | 삼성디스플레이 주식회사 | 승화형 열전사 방법을 이용하는 유기 전계 발광 표시 장치의 유기 발광 패턴 형성 방법 및 유기 발광 패턴 형성 장치 |
US20150016083A1 (en) * | 2013-07-05 | 2015-01-15 | Stephen P. Nootens | Thermocompression bonding apparatus and method |
JP2016201257A (ja) * | 2015-04-10 | 2016-12-01 | 株式会社ジャパンディスプレイ | 表示装置の製造方法 |
CN108231824B (zh) * | 2016-12-16 | 2024-04-23 | 京东方科技集团股份有限公司 | 一种oled显示面板及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001295027A (ja) * | 2000-04-18 | 2001-10-26 | Victor Co Of Japan Ltd | 蒸着源、パターン形成方法、及び電子デバイスの製造方法 |
JP2002302759A (ja) * | 2001-04-05 | 2002-10-18 | Sony Corp | 薄膜パターンの形成方法および有機電界発光表示装置の製造方法 |
JP2008174783A (ja) * | 2007-01-17 | 2008-07-31 | Fuji Electric Holdings Co Ltd | パターン状の蒸着膜の製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55132291A (en) * | 1979-04-02 | 1980-10-14 | Canon Inc | Recording device |
US5937272A (en) * | 1997-06-06 | 1999-08-10 | Eastman Kodak Company | Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate |
JP4288732B2 (ja) | 1998-11-16 | 2009-07-01 | カシオ計算機株式会社 | 発光素子を製造するための転写体の製造方法 |
JP2001284046A (ja) * | 2000-03-31 | 2001-10-12 | Sanyo Electric Co Ltd | エレクトロルミネッセンス表示装置の製造方法 |
JP4053302B2 (ja) * | 2002-02-01 | 2008-02-27 | パイオニア株式会社 | 有機エレクトロルミネッセンス表示パネルの製造装置及び製造方法 |
KR100456657B1 (ko) | 2003-03-11 | 2004-11-10 | 테크노세미켐 주식회사 | 평판디스플레이의 박막트랜지스터 형성을 위한 금속전극용식각액 조성물 |
JP4168443B2 (ja) | 2003-07-30 | 2008-10-22 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 |
KR100721563B1 (ko) | 2004-08-23 | 2007-05-23 | 삼성에스디아이 주식회사 | 도너 기판 및 상기 도너 기판을 사용하는 레이저 열전사방법 |
KR101206162B1 (ko) | 2005-10-06 | 2012-11-29 | 황창훈 | 하향식 열적 유도 증착에 의한 선형의 대면적 유기소자양산장비 |
JP5325471B2 (ja) * | 2007-07-06 | 2013-10-23 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
JP2009043572A (ja) | 2007-08-09 | 2009-02-26 | Sony Corp | 蒸発源、蒸発源の製造方法、及び有機el表示装置の製造方法 |
WO2009107548A1 (en) * | 2008-02-29 | 2009-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
-
2009
- 2009-12-29 KR KR1020090132824A patent/KR101193185B1/ko active IP Right Grant
-
2010
- 2010-06-30 JP JP2010149903A patent/JP5119428B2/ja active Active
- 2010-12-16 US US12/969,727 patent/US8647707B2/en active Active
-
2014
- 2014-01-28 US US14/166,678 patent/US20140144378A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001295027A (ja) * | 2000-04-18 | 2001-10-26 | Victor Co Of Japan Ltd | 蒸着源、パターン形成方法、及び電子デバイスの製造方法 |
JP2002302759A (ja) * | 2001-04-05 | 2002-10-18 | Sony Corp | 薄膜パターンの形成方法および有機電界発光表示装置の製造方法 |
JP2008174783A (ja) * | 2007-01-17 | 2008-07-31 | Fuji Electric Holdings Co Ltd | パターン状の蒸着膜の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017033903A (ja) * | 2015-08-06 | 2017-02-09 | 株式会社ブイ・テクノロジー | 有機el素子の製造方法 |
WO2017022404A1 (ja) * | 2015-08-06 | 2017-02-09 | 株式会社ブイ・テクノロジー | 有機el素子の製造方法 |
US10276836B2 (en) | 2015-08-06 | 2019-04-30 | V. Technology Co., Ltd. | Method of manufacturing organic EL element |
Also Published As
Publication number | Publication date |
---|---|
KR101193185B1 (ko) | 2012-10-19 |
JP5119428B2 (ja) | 2013-01-16 |
US8647707B2 (en) | 2014-02-11 |
US20110159201A1 (en) | 2011-06-30 |
US20140144378A1 (en) | 2014-05-29 |
KR20110076186A (ko) | 2011-07-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5119428B2 (ja) | パターン形成方法及び有機発光素子の製造方法 | |
JP6154572B2 (ja) | 薄膜蒸着用のマスクフレームアセンブリー | |
TWI545740B (zh) | 有機發光顯示裝置及製造其之方法 | |
KR100838086B1 (ko) | 유기 발광 디스플레이 장치 및 그 제조방법 | |
JP5020276B2 (ja) | 薄膜トランジスタ及びそれを備える平板表示装置 | |
TWI731840B (zh) | 顯示裝置及其製造方法 | |
TWI483344B (zh) | 陣列基板及其製作方法 | |
US20090179210A1 (en) | Patterning method for light-emitting devices | |
CN104022138A (zh) | 有机发光显示装置及其制造方法 | |
US9722202B2 (en) | Display apparatus having auxiliary line and method for manufacturing the same | |
CN107732031A (zh) | 有机发光显示面板的制备方法及有机发光显示面板 | |
US9246138B2 (en) | Light-emitting panel, manufacturing method of light-emitting panel, and film forming system | |
JP5017430B2 (ja) | パターンの形成方法及び有機発光素子の製造方法 | |
KR101119046B1 (ko) | 유기전계발광표시장치 및 그의 제조방법 | |
JP6527304B2 (ja) | パターニングスリットシートフレーム・アセンブリ | |
KR102122598B1 (ko) | 유기전계발광소자 및 그의 제조방법 | |
JP5271063B2 (ja) | マイクロヒーター、その製造方法、及びマイクロヒーターを利用したパターン形成方法 | |
JP2014110132A (ja) | 有機el表示装置 | |
JP5276716B2 (ja) | 有機el素子及びその製造方法 | |
JP4226185B2 (ja) | 発光素子の製造方法 | |
CN110383434A (zh) | 有源矩阵基板的制造方法、有机el显示装置的制造方法以及有源矩阵基板 | |
WO2013150560A1 (ja) | 有機elデバイスの製造方法および有機elデバイス | |
JP2009031584A (ja) | 有機elディスプレイ及びその製造方法 | |
JP2008124340A (ja) | 薄膜トランジスタ及びその製造方法 | |
KR20140071091A (ko) | 마스크 기판의 제조 방법 및 이를 이용하여 유기전계발광 표시장치를 제조하는 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111129 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111206 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120306 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120904 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20120921 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120926 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151102 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5119428 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |