JP2011049296A5 - - Google Patents

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Publication number
JP2011049296A5
JP2011049296A5 JP2009195538A JP2009195538A JP2011049296A5 JP 2011049296 A5 JP2011049296 A5 JP 2011049296A5 JP 2009195538 A JP2009195538 A JP 2009195538A JP 2009195538 A JP2009195538 A JP 2009195538A JP 2011049296 A5 JP2011049296 A5 JP 2011049296A5
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JP
Japan
Prior art keywords
exposure
maskless
exposure method
pattern
maskless exposure
Prior art date
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Pending
Application number
JP2009195538A
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English (en)
Japanese (ja)
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JP2011049296A (ja
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Priority to JP2009195538A priority Critical patent/JP2011049296A/ja
Priority claimed from JP2009195538A external-priority patent/JP2011049296A/ja
Publication of JP2011049296A publication Critical patent/JP2011049296A/ja
Publication of JP2011049296A5 publication Critical patent/JP2011049296A5/ja
Pending legal-status Critical Current

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JP2009195538A 2009-08-26 2009-08-26 マスクレス露光方法 Pending JP2011049296A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009195538A JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009195538A JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Publications (2)

Publication Number Publication Date
JP2011049296A JP2011049296A (ja) 2011-03-10
JP2011049296A5 true JP2011049296A5 (enExample) 2012-09-06

Family

ID=43835363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009195538A Pending JP2011049296A (ja) 2009-08-26 2009-08-26 マスクレス露光方法

Country Status (1)

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JP (1) JP2011049296A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013069860A (ja) * 2011-09-22 2013-04-18 Orc Manufacturing Co Ltd Ｌｅｄ光源装置および露光装置
KR101970685B1 (ko) 2012-08-09 2019-04-19 삼성전자 주식회사 패터닝 방법, 그 패터닝 방법을 이용한 반도체 소자 제조방법, 및 반도체 소자 제조장치
JP6113990B2 (ja) * 2012-10-01 2017-04-12 株式会社クラレ 微細構造体の製造方法
EP3062146B1 (en) 2013-10-25 2020-01-22 Nikon Corporation Laser device, and exposure device and inspection device provided with laser device
KR20160049171A (ko) 2014-10-24 2016-05-09 삼성디스플레이 주식회사 마스크리스 노광 장치, 마스크리스 노광 방법 및 이에 의해 제조되는 표시 기판
JP6662453B2 (ja) 2016-05-26 2020-03-11 株式会社ニコン パルス光生成装置、パルス光生成方法、パルス光生成装置を備えた露光装置および検査装置
JP6828742B2 (ja) 2016-05-26 2021-02-10 株式会社ニコン パルス光生成装置、パルス光生成方法、パルス光生成装置を備えた露光装置および検査装置
JP7121509B2 (ja) * 2018-03-19 2022-08-18 キヤノン株式会社 露光装置、露光方法、および物品製造方法
JP7542733B2 (ja) * 2020-09-18 2024-08-30 アプライド マテリアルズ インコーポレイテッド 二重露光を用いてデジタルリソグラフィのプロセスウィンドウ及び解像度を改善する方法
EP3989002A1 (en) * 2020-10-20 2022-04-27 Mycronic Ab Device and method for setting relative laser intensities

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004111701A1 (en) * 2003-06-12 2004-12-23 Micronic Laser Systems Ab Method for high precision printing of patterns
US6831768B1 (en) * 2003-07-31 2004-12-14 Asml Holding N.V. Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
JP2007522671A (ja) * 2004-02-25 2007-08-09 マイクロニック レーザー システムズ アクチボラゲット 光マスクレスリソグラフィにおいてパターンを露光し、マスクをエミュレートする方法
US7713667B2 (en) * 2004-11-30 2010-05-11 Asml Holding N.V. System and method for generating pattern data used to control a pattern generator
JPWO2007142350A1 (ja) * 2006-06-09 2009-10-29 株式会社ニコン パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法

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