JP2010538160A5 - - Google Patents

Download PDF

Info

Publication number
JP2010538160A5
JP2010538160A5 JP2010523176A JP2010523176A JP2010538160A5 JP 2010538160 A5 JP2010538160 A5 JP 2010538160A5 JP 2010523176 A JP2010523176 A JP 2010523176A JP 2010523176 A JP2010523176 A JP 2010523176A JP 2010538160 A5 JP2010538160 A5 JP 2010538160A5
Authority
JP
Japan
Prior art keywords
circuit board
printed circuit
layer
metal
porphyrin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010523176A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010538160A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/074895 external-priority patent/WO2009029871A1/en
Publication of JP2010538160A publication Critical patent/JP2010538160A/ja
Publication of JP2010538160A5 publication Critical patent/JP2010538160A5/ja
Pending legal-status Critical Current

Links

JP2010523176A 2007-08-31 2008-08-29 興味ある分子の結合を促進するための表面処理方法、該方法により形成されたコーティングおよび装置 Pending JP2010538160A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US96946807P 2007-08-31 2007-08-31
PCT/US2008/074895 WO2009029871A1 (en) 2007-08-31 2008-08-29 Methods of treating a surface to promote binding of molecule(s) of interest, coatings and devices formed therefrom

Publications (2)

Publication Number Publication Date
JP2010538160A JP2010538160A (ja) 2010-12-09
JP2010538160A5 true JP2010538160A5 (enExample) 2011-10-13

Family

ID=40387851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010523176A Pending JP2010538160A (ja) 2007-08-31 2008-08-29 興味ある分子の結合を促進するための表面処理方法、該方法により形成されたコーティングおよび装置

Country Status (6)

Country Link
US (1) US20090056991A1 (enExample)
EP (1) EP2188818A4 (enExample)
JP (1) JP2010538160A (enExample)
CN (1) CN101842856B (enExample)
TW (1) TW200932079A (enExample)
WO (1) WO2009029871A1 (enExample)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005723A1 (en) 2010-07-06 2012-01-12 Zettacore, Inc. Methods of treating copper surfaces for enhancing adhesion to organic substrates for use in printed circuit boards
KR101822118B1 (ko) 2010-07-06 2018-01-25 아토테크 도이칠란드 게엠베하 금속 표면의 처리 방법 및 그에 의해 형성된 장치
CN102386072B (zh) 2010-08-25 2016-05-04 株式会社半导体能源研究所 微晶半导体膜的制造方法及半导体装置的制造方法
US8647535B2 (en) 2011-01-07 2014-02-11 International Business Machines Corporation Conductive metal and diffusion barrier seed compositions, and methods of use in semiconductor and interlevel dielectric substrates
FI123323B (fi) * 2011-06-14 2013-02-28 Teknologian Tutkimuskeskus Vtt Piilokuvioiden muodostaminen huokoisille substraateille
GB201116025D0 (en) * 2011-09-16 2011-10-26 Surface Innovations Ltd Method
KR101331521B1 (ko) * 2011-09-23 2013-11-21 중앙대학교 산학협력단 그래핀 박막의 제조 방법
US8802568B2 (en) * 2012-09-27 2014-08-12 Sensirion Ag Method for manufacturing chemical sensor with multiple sensor cells
US10103297B2 (en) 2012-12-10 2018-10-16 Daktronics, Inc. Encapsulation of light-emitting elements on a display module
CN104937656B (zh) * 2012-12-10 2018-10-12 达科电子股份有限公司 显示模块上的发光元件的封装
CN103364940B (zh) * 2013-05-03 2016-08-03 南京晶奥微光电技术有限公司 一种pcb板上电润湿显示单元及其制备方法
JP5946802B2 (ja) * 2013-08-05 2016-07-06 イーサイオニック コーポレーション プリント配線板
EP3092278A4 (en) * 2014-01-07 2017-10-04 Orthobond, Inc. Surface adhesive for devices
JP5916159B2 (ja) * 2014-08-27 2016-05-11 田中貴金属工業株式会社 金属パターンの形成方法及び導電体
US10988844B2 (en) * 2015-01-20 2021-04-27 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
JP6069735B2 (ja) * 2015-02-20 2017-02-01 ナミックス株式会社 プリント配線板を製造する方法
JP6069736B2 (ja) * 2015-02-20 2017-02-01 ナミックス株式会社 プリント配線板
CN104945667A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的pps组合物
CN104961919A (zh) * 2015-07-11 2015-10-07 刘帅 改性lds添加剂及含该添加剂的聚芳酯组合物
CN104961918A (zh) * 2015-07-11 2015-10-07 刘帅 改性lds添加剂及含该添加剂的天然橡胶组合物
CN104961920A (zh) * 2015-07-11 2015-10-07 刘帅 改性lds添加剂及含该添加剂的tpae组合物
CN105001453A (zh) * 2015-07-11 2015-10-28 刘帅 改性lds添加剂及含该添加剂的pc组合物
CN105037807A (zh) * 2015-07-11 2015-11-11 刘帅 共改性lds添加剂及含该添加剂的tpae组合物
CN104961921A (zh) * 2015-07-11 2015-10-07 刘帅 改性lds添加剂及含该添加剂的abs组合物
CN104945673A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的丁苯橡胶组合物
CN104961914A (zh) * 2015-07-11 2015-10-07 刘帅 共改性lds添加剂及含该添加剂的tpee组合物
CN104945664A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的tpee组合物
CN104945671A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的聚砜组合物
CN104945662A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的peek组合物
CN104987535A (zh) * 2015-07-11 2015-10-21 刘帅 共改性lds添加剂及含该添加剂的聚芳酯组合物
CN105037806A (zh) * 2015-07-11 2015-11-11 刘帅 共改性lds添加剂及含该添加剂的丁苯橡胶组合物
CN104945670A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的tpo组合物
CN104961922A (zh) * 2015-07-11 2015-10-07 刘帅 共改性lds添加剂及含该添加剂的lcp组合物
CN104945665A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的天然橡胶组合物
CN105037809A (zh) * 2015-07-11 2015-11-11 刘帅 共改性lds添加剂及含该添加剂的pa66组合物
CN104987534A (zh) * 2015-07-11 2015-10-21 刘帅 改性lds添加剂及含该添加剂的热塑性pi组合物
CN104945672A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的热塑性pi组合物
CN104987533A (zh) * 2015-07-11 2015-10-21 刘帅 改性lds添加剂及含该添加剂的聚砜组合物
CN104945674A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的pp组合物
CN104961916A (zh) * 2015-07-11 2015-10-07 刘帅 改性lds添加剂及含该添加剂的lcp组合物
CN104987536A (zh) * 2015-07-11 2015-10-21 刘帅 改性lds添加剂及含该添加剂的tpo组合物
CN104961923A (zh) * 2015-07-11 2015-10-07 刘帅 共改性lds添加剂及含该添加剂的abs组合物
CN104945669A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的pps组合物
CN104945666A (zh) * 2015-07-11 2015-09-30 刘帅 共改性lds添加剂及含该添加剂的pp组合物
CN104961915A (zh) * 2015-07-11 2015-10-07 刘帅 共改性lds添加剂及含该添加剂的pc组合物
CN104945663A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的peek组合物
CN104945668A (zh) * 2015-07-11 2015-09-30 刘帅 改性lds添加剂及含该添加剂的pa66组合物
CN106567058B (zh) * 2015-10-09 2019-03-19 凯基有限公司 无铬环保镀金属膜结构系统
US9799593B1 (en) 2016-04-01 2017-10-24 Intel Corporation Semiconductor package substrate having an interfacial layer
CN106206252B (zh) * 2016-06-30 2019-06-21 上海交通大学 在半导体基材表面一步法化学接枝有机膜的方法
CN109267038B (zh) * 2018-10-24 2019-12-06 江苏菲沃泰纳米科技有限公司 一种耐磨自交联的纳米涂层及其制备方法
BR102019014681A2 (pt) * 2019-07-16 2021-01-26 Universidade De São Paulo - Usp processo de obtenção de superfícies poliméricas funcionalizadas com fotossensibilizadores, material polimérico funcionalizado e seu uso
JP7323409B2 (ja) * 2019-10-01 2023-08-08 東京エレクトロン株式会社 基板処理方法、及び、プラズマ処理装置
CN111755566B (zh) * 2020-06-15 2022-03-11 中国电子科技集团公司第十一研究所 一种硅基碲化镉复合衬底预处理方法
CN114121810B (zh) * 2020-08-27 2024-12-06 长鑫存储技术有限公司 半导体结构及其制备方法
CN117165945B (zh) * 2023-07-25 2024-03-12 中国船舶集团有限公司第七一九研究所 一种Laves相增强共晶高熵合金耐磨超疏水表面及其制备方法

Family Cites Families (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532518A (en) * 1967-06-28 1970-10-06 Macdermid Inc Colloidal metal activating solutions for use in chemically plating nonconductors,and process of preparing such solutions
US3770598A (en) * 1972-01-21 1973-11-06 Oxy Metal Finishing Corp Electrodeposition of copper from acid baths
US3876513A (en) * 1972-06-26 1975-04-08 Oxy Metal Finishing Corp Electrodeposition of bright cobalt plate
US4073740A (en) * 1975-06-18 1978-02-14 Kollmorgen Technologies Corporation Composition for the activation of resinous bodies for adherent metallization
JPS5288772A (en) * 1976-01-20 1977-07-25 Matsushita Electric Industrial Co Ltd Method of producing printed circuit board
US4089686A (en) * 1976-04-19 1978-05-16 Western Electric Company, Inc. Method of depositing a metal on a surface
US4374709A (en) * 1980-05-01 1983-02-22 Occidental Chemical Corporation Process for plating polymeric substrates
US4446176A (en) * 1980-08-18 1984-05-01 David Hudson, Inc. Fluoroelastomer film compositions containing phenoxy resins and method for the preparation thereof
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
US4478883A (en) * 1982-07-14 1984-10-23 International Business Machines Corporation Conditioning of a substrate for electroless direct bond plating in holes and on surfaces of a substrate
US4608275A (en) * 1983-07-01 1986-08-26 Macdermid, Incorporated Oxidizing accelerator
US4554182A (en) * 1983-10-11 1985-11-19 International Business Machines Corporation Method for conditioning a surface of a dielectric substrate for electroless plating
US4448804A (en) * 1983-10-11 1984-05-15 International Business Machines Corporation Method for selective electroless plating of copper onto a non-conductive substrate surface
US4515829A (en) * 1983-10-14 1985-05-07 Shipley Company Inc. Through-hole plating
US4634468A (en) * 1984-05-07 1987-01-06 Shipley Company Inc. Catalytic metal of reduced particle size
US4555315A (en) * 1984-05-29 1985-11-26 Omi International Corporation High speed copper electroplating process and bath therefor
US4592852A (en) * 1984-06-07 1986-06-03 Enthone, Incorporated Composition and process for treating plastics with alkaline permanganate solutions
US4673459A (en) * 1985-06-18 1987-06-16 Kamyr, Inc. Radial configuration of evaporator heating elements and method
US4904506A (en) * 1986-01-03 1990-02-27 International Business Machines Corporation Copper deposition from electroless plating bath
US5389496A (en) * 1987-03-06 1995-02-14 Rohm And Haas Company Processes and compositions for electroless metallization
US4803097A (en) * 1987-04-20 1989-02-07 Allied-Signal Inc. Metal plating of plastic materials
US4810333A (en) * 1987-12-14 1989-03-07 Shipley Company Inc. Electroplating process
US4948707A (en) * 1988-02-16 1990-08-14 International Business Machines Corporation Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon
US5068013A (en) * 1988-08-23 1991-11-26 Shipley Company Inc. Electroplating composition and process
US5051154A (en) * 1988-08-23 1991-09-24 Shipley Company Inc. Additive for acid-copper electroplating baths to increase throwing power
US4919768A (en) * 1989-09-22 1990-04-24 Shipley Company Inc. Electroplating process
US5342501A (en) * 1989-11-21 1994-08-30 Eric F. Harnden Method for electroplating metal onto a non-conductive substrate treated with basic accelerating solutions for metal plating
US5015339A (en) * 1990-03-26 1991-05-14 Olin Hunt Sub Iii Corp. Process for preparing nonconductive substrates
US5318803A (en) * 1990-11-13 1994-06-07 International Business Machines Corporation Conditioning of a substrate for electroless plating thereon
JPH05202483A (ja) * 1991-04-25 1993-08-10 Shipley Co Inc 無電解金属化方法と組成物
JPH0525298A (ja) * 1991-06-19 1993-02-02 Kureha Chem Ind Co Ltd 樹脂成形品の金属化に好適な粗面化方法
US5207888A (en) * 1991-06-24 1993-05-04 Shipley Company Inc. Electroplating process and composition
US5227013A (en) * 1991-07-25 1993-07-13 Microelectronics And Computer Technology Corporation Forming via holes in a multilevel substrate in a single step
US5455072A (en) * 1992-11-18 1995-10-03 Bension; Rouvain M. Initiation and bonding of diamond and other thin films
US5419954A (en) * 1993-02-04 1995-05-30 The Alpha Corporation Composition including a catalytic metal-polymer complex and a method of manufacturing a laminate preform or a laminate which is catalytically effective for subsequent electroless metallization thereof
US5425873A (en) * 1994-04-11 1995-06-20 Shipley Company Llc Electroplating process
US5745984A (en) * 1995-07-10 1998-05-05 Martin Marietta Corporation Method for making an electronic module
US5648125A (en) * 1995-11-16 1997-07-15 Cane; Frank N. Electroless plating process for the manufacture of printed circuit boards
US5721014A (en) * 1995-12-19 1998-02-24 Surface Tek Specialty Products, Inc. Composition and method for reducing copper oxide to metallic copper
EP0927060B1 (en) * 1996-09-23 2009-04-01 Best Vascular, Inc. Intraluminal radiation treatment system
TW409261B (en) * 1998-01-13 2000-10-21 Toppan Printing Co Ltd A electrode plate with transmission-type or reflection-type multilayer electroconductive film, and the process for producing the electrode plate
US6284317B1 (en) * 1998-04-17 2001-09-04 Massachusetts Institute Of Technology Derivatization of silicon surfaces
JP4013352B2 (ja) * 1998-09-24 2007-11-28 松下電工株式会社 樹脂基材表面への金属膜形成方法
US6344309B2 (en) * 1998-10-22 2002-02-05 Shin-Etsu Chemical Co., Ltd. Polysilane composition for forming a coating suitable for bearing a metal pattern, metal pattern forming method, wiring board preparing method
US6221653B1 (en) * 1999-04-27 2001-04-24 Agilent Technologies, Inc. Method of performing array-based hybridization assays using thermal inkjet deposition of sample fluids
WO2001003126A2 (en) * 1999-07-01 2001-01-11 The Regents Of The University Of California High density non-volatile memory device
US6324091B1 (en) * 2000-01-14 2001-11-27 The Regents Of The University Of California Tightly coupled porphyrin macrocycles for molecular memory storage
US6208553B1 (en) * 1999-07-01 2001-03-27 The Regents Of The University Of California High density non-volatile memory device incorporating thiol-derivatized porphyrins
US6381169B1 (en) * 1999-07-01 2002-04-30 The Regents Of The University Of California High density non-volatile memory device
US6294392B1 (en) 1999-07-21 2001-09-25 The Regents Of The University Of California Spatially-encoded analyte detection
JP2001091745A (ja) * 1999-09-22 2001-04-06 Nitto Denko Corp 複合位相差板、光学補償偏光板及び液晶表示装置
US6272038B1 (en) * 2000-01-14 2001-08-07 North Carolina State University High-density non-volatile memory devices incorporating thiol-derivatized porphyrin trimers
JP2003520384A (ja) * 2000-01-14 2003-07-02 ノース・キャロライナ・ステイト・ユニヴァーシティ 連結されたサンドイッチ型配位化合物のポリマーを担持する基板およびそれを使用する方法
US6212093B1 (en) * 2000-01-14 2001-04-03 North Carolina State University High-density non-volatile memory devices incorporating sandwich coordination compounds
FR2804973B1 (fr) * 2000-02-11 2002-09-20 Univ Paris 7 Denis Diderot Materiau metallique dont la surface est modifiee, son procede de preparation et utilisation du materiau modifie
JP2002041276A (ja) 2000-07-24 2002-02-08 Sony Corp 対話型操作支援システム及び対話型操作支援方法、並びに記憶媒体
JP2002080997A (ja) * 2000-09-11 2002-03-22 Matsushita Electric Ind Co Ltd 回路基板用金属箔の製造方法、多層回路基板およびその製造方法
US20040161545A1 (en) * 2000-11-28 2004-08-19 Shipley Company, L.L.C. Adhesion method
US7112366B2 (en) * 2001-01-05 2006-09-26 The Ohio State University Chemical monolayer and micro-electronic junctions and devices containing same
US6451685B1 (en) * 2001-02-05 2002-09-17 Micron Technology, Inc. Method for multilevel copper interconnects for ultra large scale integration
WO2002067641A1 (en) * 2001-02-21 2002-08-29 Kaneka Corporation Wiring board, process for producing the same, polyimide film for use in the wiring board, and etchant for use in the process
WO2002077633A1 (en) 2001-03-23 2002-10-03 The Regents Of The University Of California Open circuit potential amperometry and voltammetry
US6642376B2 (en) * 2001-04-30 2003-11-04 North Carolina State University Rational synthesis of heteroleptic lanthanide sandwich coordination complexes
JP4997670B2 (ja) * 2001-06-29 2012-08-08 日本電気株式会社 共重合高分子膜の作製方法、前記形成方法で作製される共重合高分子膜、共重合高分子膜を利用する半導体装置
US20040231141A1 (en) * 2001-07-06 2004-11-25 Masaru Nishinaka Laminate and its producing method
AU2002355856A1 (en) * 2001-08-03 2003-02-17 Elisha Holding Llc An electroless process for treating metallic surfaces and products formed thereby
DE10140246A1 (de) * 2001-08-09 2003-03-06 Forsch Pigmente Und Lacke E V Verfahren zur Behandlung von Oberflächen von Substraten
FR2829046B1 (fr) * 2001-08-28 2005-01-14 Commissariat Energie Atomique Procede de greffage et de croissance d'un film organique conducteur sur une surface
CN1179613C (zh) * 2001-09-20 2004-12-08 联华电子股份有限公司 一种改善有机低介电常数层附着力的表面处理方法
US6765069B2 (en) * 2001-09-28 2004-07-20 Biosurface Engineering Technologies, Inc. Plasma cross-linked hydrophilic coating
US7074519B2 (en) 2001-10-26 2006-07-11 The Regents Of The University Of California Molehole embedded 3-D crossbar architecture used in electrochemical molecular memory device
US7348206B2 (en) * 2001-10-26 2008-03-25 The Regents Of The University Of California Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications
US6674121B2 (en) * 2001-12-14 2004-01-06 The Regents Of The University Of California Method and system for molecular charge storage field effect transistor
CN100395059C (zh) * 2001-12-18 2008-06-18 旭化成株式会社 金属氧化物分散体、由其得到的金属薄膜和生产该金属薄膜的方法
US6728129B2 (en) 2002-02-19 2004-04-27 The Regents Of The University Of California Multistate triple-decker dyads in three distinct architectures for information storage applications
JP4241098B2 (ja) * 2002-03-05 2009-03-18 日立化成工業株式会社 金属張積層板、これを用いたプリント配線板およびその製造方法
TW573451B (en) * 2002-03-05 2004-01-21 Hitachi Chemical Co Ltd Metal foil with resin and metal-clad laminate, and printed wiring board using the same and method for production thereof
JP2004006700A (ja) * 2002-03-27 2004-01-08 Seiko Epson Corp 表面処理方法、表面処理基板、膜パターンの形成方法、電気光学装置の製造方法、電気光学装置、及び電子機器
JP2004006672A (ja) * 2002-04-19 2004-01-08 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
US6850096B2 (en) * 2002-05-10 2005-02-01 Yoshio Nishida Interpolating sense amplifier circuits and methods of operating the same
US6900126B2 (en) * 2002-11-20 2005-05-31 International Business Machines Corporation Method of forming metallized pattern
US6958270B2 (en) 2002-12-17 2005-10-25 North Carolina State University Methods of fabricating crossbar array microelectronic electrochemical cells
US6944047B2 (en) 2002-12-19 2005-09-13 North Carolina State University Variable-persistence molecular memory devices and methods of operation thereof
FR2851258B1 (fr) * 2003-02-17 2007-03-30 Commissariat Energie Atomique Procede de revetement d'une surface, fabrication d'interconnexion en microelectronique utilisant ce procede, et circuits integres
FR2851181B1 (fr) * 2003-02-17 2006-05-26 Commissariat Energie Atomique Procede de revetement d'une surface
DE10315877B4 (de) 2003-04-08 2005-11-17 Roche Diagnostics Gmbh Krankheitsverlaufkontrolle
AU2004256392B2 (en) * 2003-04-28 2009-10-01 Oned Material Llc Super-hydrophobic surfaces, methods of their construction and uses therefor
US7312100B2 (en) * 2003-05-27 2007-12-25 The North Carolina State University In situ patterning of electrolyte for molecular information storage devices
US7332599B2 (en) * 2003-06-06 2008-02-19 North Carolina State University Methods and intermediates for the synthesis of dipyrrin-substituted porphyrinic macrocycles
US7026716B2 (en) * 2003-06-06 2006-04-11 Rensselaer Polytechnic Institute Self-assembled sub-nanolayers as interfacial adhesion enhancers and diffusion barriers
US6943054B2 (en) * 2003-07-25 2005-09-13 The Regents Of The University Of California Attachment of organic molecules to group III, IV or V substrates
US7223628B2 (en) * 2003-07-25 2007-05-29 The Regents Of The University Of California High temperature attachment of organic molecules to substrates
US7056648B2 (en) * 2003-09-17 2006-06-06 International Business Machines Corporation Method for isotropic etching of copper
US7324385B2 (en) 2004-01-28 2008-01-29 Zettacore, Inc. Molecular memory
US7307870B2 (en) 2004-01-28 2007-12-11 Zettacore, Inc. Molecular memory devices and methods
US20050162895A1 (en) * 2004-01-28 2005-07-28 Kuhr Werner G. Molecular memory arrays and devices
US7695756B2 (en) 2004-04-29 2010-04-13 Zettacore, Inc. Systems, tools and methods for production of molecular memory
FR2868085B1 (fr) * 2004-03-24 2006-07-14 Alchimer Sa Procede de revetement selectif d'une surface composite, fabrication d'interconnexions en microelectronique utilisant ce procede, et circuits integres
EP1581031B1 (en) 2004-03-25 2010-10-06 FUJIFILM Corporation Methods of forming a pattern and a conductive pattern
KR100638620B1 (ko) * 2004-09-23 2006-10-26 삼성전기주식회사 임베디드 수동소자용 인쇄회로기판재료
WO2006058034A2 (en) * 2004-11-22 2006-06-01 Intermolecular, Inc. Molecular self-assembly in substrate processing
US7566971B2 (en) * 2005-05-27 2009-07-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US8173630B2 (en) 2005-06-03 2012-05-08 The Regents Of The University Of California Multipodal tethers for high-density attachment of redox-active moieties to substrates
KR100716304B1 (ko) * 2005-06-30 2007-05-08 엘지.필립스 엘시디 주식회사 액정 표시 장치용 인쇄판 및 그의 제조 방법
JP2007073834A (ja) * 2005-09-08 2007-03-22 Shinko Electric Ind Co Ltd 絶縁樹脂層上の配線形成方法
US20080131709A1 (en) * 2006-09-28 2008-06-05 Aculon Inc. Composite structure with organophosphonate adherent layer and method of preparing
US8167684B2 (en) * 2006-10-24 2012-05-01 Cabot Microelectronics Corporation Chemical mechanical polishing slurry, its preparation method, and use for the same
US8540899B2 (en) * 2007-02-07 2013-09-24 Esionic Es, Inc. Liquid composite compositions using non-volatile liquids and nanoparticles and uses thereof

Similar Documents

Publication Publication Date Title
JP2010538160A5 (enExample)
JP2010506400A5 (enExample)
TWI569705B (zh) 多層印刷配線板的製造方法及以該製造方法所得之多層印刷配線板
JP2008544551A5 (enExample)
JP2009509752A5 (enExample)
WO2008126426A1 (ja) 導電性物質吸着性樹脂フイルム、導電性物質吸着性樹脂フイルムの製造方法、それを用いた金属層付き樹脂フイルム、及び、金属層付き樹脂フイルムの製造方法
JP2008540167A5 (enExample)
JP2010507258A5 (enExample)
TWI456271B (zh) 線柵偏光板及其製造方法
JP2010534413A5 (enExample)
JP2010507261A5 (enExample)
JP2010505978A5 (enExample)
ATE514320T1 (de) Mehrschichtiges keramiksubstrat, elektronische komponente und verfahren zur herstellung eines mehrschichtigen keramiksubstrats
JP2010219210A5 (ja) 半導体装置
JP2009141121A5 (enExample)
JP2010082857A5 (enExample)
JP2008282842A5 (enExample)
WO2011155750A3 (ko) 평판 스피커용 다층 구조의 보이스 필름
JP2014501448A5 (enExample)
JP2006253185A5 (ja) 金属層付き積層フィルム
JP2007176169A5 (enExample)
JP2009523633A5 (enExample)
WO2007140477A3 (en) Polyimide insulative layers in multi-layered printed electronic features
WO2008101946A3 (en) Film and method for producing said film
JP2007522673A5 (enExample)