JP2010526106A5 - - Google Patents

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Publication number
JP2010526106A5
JP2010526106A5 JP2010506709A JP2010506709A JP2010526106A5 JP 2010526106 A5 JP2010526106 A5 JP 2010526106A5 JP 2010506709 A JP2010506709 A JP 2010506709A JP 2010506709 A JP2010506709 A JP 2010506709A JP 2010526106 A5 JP2010526106 A5 JP 2010526106A5
Authority
JP
Japan
Prior art keywords
sulfonamido
dibenzo
furan
acid
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2010506709A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010526106A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/062593 external-priority patent/WO2008137816A2/en
Publication of JP2010526106A publication Critical patent/JP2010526106A/ja
Publication of JP2010526106A5 publication Critical patent/JP2010526106A5/ja
Withdrawn legal-status Critical Current

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JP2010506709A 2007-05-04 2008-05-05 マトリックスメタロプロテアーゼインヒビターとしての三環式化合物 Withdrawn JP2010526106A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92756307P 2007-05-04 2007-05-04
PCT/US2008/062593 WO2008137816A2 (en) 2007-05-04 2008-05-05 Tricyclic compounds as matrix metalloproteinase inhibitors

Publications (2)

Publication Number Publication Date
JP2010526106A JP2010526106A (ja) 2010-07-29
JP2010526106A5 true JP2010526106A5 (enExample) 2012-05-17

Family

ID=39944224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010506709A Withdrawn JP2010526106A (ja) 2007-05-04 2008-05-05 マトリックスメタロプロテアーゼインヒビターとしての三環式化合物

Country Status (11)

Country Link
US (1) US20100227859A1 (enExample)
EP (1) EP2144893A2 (enExample)
JP (1) JP2010526106A (enExample)
AR (1) AR066412A1 (enExample)
CA (1) CA2685389A1 (enExample)
CL (1) CL2008001257A1 (enExample)
MX (1) MX2009011749A (enExample)
PA (1) PA8779101A1 (enExample)
PE (1) PE20090223A1 (enExample)
TW (1) TW200900397A (enExample)
WO (1) WO2008137816A2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007100670A1 (en) * 2006-02-22 2007-09-07 Vertex Pharmaceuticals Incorporated Spiro condensed piperidnes as modulators of muscarinic receptors
US9273021B2 (en) 2009-02-05 2016-03-01 Trustees Of Boston College Dibenzofuran derivatives as inhibitors of fructose 1,6-bisphosphatase and methods of use thereof
SG175047A1 (en) * 2009-04-06 2011-11-28 Schering Corp Indole derivatives and methods for antiviral treatment
US10377734B2 (en) 2013-02-08 2019-08-13 Mitsubishi Gas Chemical Company, Inc. Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition
CN105377851B (zh) * 2013-03-11 2018-07-20 密执安州立大学董事会 Bet布罗莫结构域抑制剂和使用这些抑制剂的治疗方法
EP2907512A1 (en) 2014-02-14 2015-08-19 Commissariat A L'energie Atomique Et Aux Energies Alternatives Inhibitors of MMP-12 as antiviral Agents
WO2016104214A1 (ja) 2014-12-25 2016-06-30 三菱瓦斯化学株式会社 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法及び精製方法
CN107428717B (zh) 2015-03-31 2021-04-23 三菱瓦斯化学株式会社 抗蚀剂组合物、抗蚀图案形成方法、及用于其的多酚化合物
WO2016158168A1 (ja) * 2015-03-31 2016-10-06 三菱瓦斯化学株式会社 化合物、レジスト組成物及びそれを用いるレジストパターン形成方法
CN107949808B (zh) 2015-08-31 2021-10-22 三菱瓦斯化学株式会社 光刻用下层膜形成材料、光刻用下层膜形成用组合物、光刻用下层膜及其制造方法
EP3346334B1 (en) 2015-08-31 2020-08-12 Mitsubishi Gas Chemical Company, Inc. Use of a composition for forming a photoresist underlayer film for lithography, photoresist underlayer film for lithography and method for producing same, and resist pattern forming method
KR102687507B1 (ko) 2015-09-10 2024-07-24 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 수지, 레지스트 조성물 또는 감방사선성 조성물, 레지스트 패턴 형성방법, 아몰퍼스막의 제조방법, 리소그래피용 하층막 형성재료, 리소그래피용 하층막 형성용 조성물, 회로패턴의 형성방법 및 정제방법
US10042251B2 (en) 2016-09-30 2018-08-07 Rohm And Haas Electronic Materials Llc Zwitterionic photo-destroyable quenchers
GB201617339D0 (en) 2016-10-12 2016-11-23 Lytix Biopharma As Therapeutic compounds
KR102435507B1 (ko) * 2019-07-31 2022-08-24 일동제약(주) 신규 벤조퓨란 유도체 및 이의 용도
CN113929645B (zh) * 2021-12-15 2022-03-11 长沙普济生物科技股份有限公司 一种光催化合成苯并呋喃基氨基酸表面活性剂的方法
CN117045635A (zh) * 2022-05-13 2023-11-14 中国海洋大学 一种3-苯基二苯并呋喃类化合物在药物中的应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU735013B2 (en) * 1996-09-04 2001-06-28 Warner-Lambert Company Matrix metalloproteinase inhibitors and their therapeutic uses
KR20000068415A (ko) * 1996-09-04 2000-11-25 로즈 암스트롱, 크리스틴 에이. 트러트웨인 매트릭스 메탈로프로테이나제 억제용 화합물 및 방법
ATE260251T1 (de) * 1999-08-18 2004-03-15 Warner Lambert Co Hydroxamsäurederivate als matrix- metalloproteinase-inhibitoren
MXPA01013172A (es) * 2001-02-14 2002-08-21 Warner Lambert Co Inhibidores sulfonamida de metaloproteinasa de matriz.
US20030157110A1 (en) * 2002-01-07 2003-08-21 Millennium Pharmaceuticals, Inc. Methods for the treatment of metabolic disorders, including obesity and diabetes
CA2667644A1 (en) * 2006-10-27 2008-05-15 Wyeth Tricyclic compounds as matrix metalloproteinase inhibitors

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