JP2010520465A5 - - Google Patents

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Publication number
JP2010520465A5
JP2010520465A5 JP2009552039A JP2009552039A JP2010520465A5 JP 2010520465 A5 JP2010520465 A5 JP 2010520465A5 JP 2009552039 A JP2009552039 A JP 2009552039A JP 2009552039 A JP2009552039 A JP 2009552039A JP 2010520465 A5 JP2010520465 A5 JP 2010520465A5
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JP
Japan
Prior art keywords
ion beam
ion
sample
range
plane
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JP2009552039A
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English (en)
Japanese (ja)
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JP5249955B2 (ja
JP2010520465A (ja
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Priority claimed from PCT/CH2008/000085 external-priority patent/WO2008106815A2/de
Publication of JP2010520465A publication Critical patent/JP2010520465A/ja
Publication of JP2010520465A5 publication Critical patent/JP2010520465A5/ja
Application granted granted Critical
Publication of JP5249955B2 publication Critical patent/JP5249955B2/ja
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JP2009552039A 2007-03-06 2008-03-03 電子顕微鏡検鏡用試料の作製法 Active JP5249955B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH3582007 2007-03-06
CH358/07 2007-03-06
PCT/CH2008/000085 WO2008106815A2 (de) 2007-03-06 2008-03-03 Verfahren zur herstellung einer probe für die elektronenmikroskopie

Publications (3)

Publication Number Publication Date
JP2010520465A JP2010520465A (ja) 2010-06-10
JP2010520465A5 true JP2010520465A5 (enExample) 2011-01-13
JP5249955B2 JP5249955B2 (ja) 2013-07-31

Family

ID=38042823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009552039A Active JP5249955B2 (ja) 2007-03-06 2008-03-03 電子顕微鏡検鏡用試料の作製法

Country Status (4)

Country Link
US (1) US8168960B2 (enExample)
EP (1) EP2132550B1 (enExample)
JP (1) JP5249955B2 (enExample)
WO (1) WO2008106815A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201002645D0 (en) 2010-02-17 2010-03-31 Univ Lancaster Method and apparatus for ion beam polishing
AT509608B1 (de) 2010-12-23 2011-10-15 Leica Mikrosysteme Gmbh Vorrichtung und verfahren zur kühlung von proben während einer einer ionenstrahlpräparation
AT510606B1 (de) 2011-02-09 2012-05-15 Leica Mikrosysteme Gmbh Vorrichtung und verfahren zur probenpräparation
DE102011111190A1 (de) * 2011-08-25 2013-02-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Präparation einer Probe für die Mikrostrukturdiagnostik
JP2013243307A (ja) * 2012-05-22 2013-12-05 Toshiba Corp 半導体製造装置および半導体装置の製造方法
DE102013012225A1 (de) * 2013-07-23 2015-01-29 Carl Zeiss Microscopy Gmbh Verfahren zur TEM-Lamellen-Herstellung und Anordnung für TEM-Lamellen-Schutzvorrichtung
CN103792123B (zh) * 2014-02-25 2016-01-27 山西太钢不锈钢股份有限公司 一种透射电子显微镜观察用钢铁样品的制备方法
US9911573B2 (en) 2014-03-09 2018-03-06 Ib Labs, Inc. Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
US10354836B2 (en) * 2014-03-09 2019-07-16 Ib Labs, Inc. Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
DE102015219298B4 (de) * 2015-10-06 2019-01-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Präparation einer Probe für die Mikrostrukturdiagnostik sowie Probe für die Mikrostrukturdiagnostik
CN105699149A (zh) * 2016-04-05 2016-06-22 工业和信息化部电子第五研究所 芯片失效分析过程中的剥层方法
US10417881B2 (en) * 2016-05-02 2019-09-17 Norman R. Byrne Wireless status indicator light
US12020893B2 (en) * 2020-01-29 2024-06-25 Hitachi High-Tech Corporation Ion milling device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064228A (ja) * 1983-09-20 1985-04-12 Nec Corp 透過型電子顕微鏡試料の作製方法及びその作製装置
US5009743A (en) 1989-11-06 1991-04-23 Gatan Incorporated Chemically-assisted ion beam milling system for the preparation of transmission electron microscope specimens
US5825035A (en) * 1993-03-10 1998-10-20 Hitachi, Ltd. Processing method and apparatus using focused ion beam generating means
JPH0817800A (ja) * 1994-06-29 1996-01-19 Hitachi Ltd 集束イオンビーム装置およびそれを用いた試料加工方法
US5472566A (en) * 1994-11-14 1995-12-05 Gatan, Inc. Specimen holder and apparatus for two-sided ion milling system
DE29507225U1 (de) * 1995-04-29 1995-07-13 Grünewald, Wolfgang, Dr.rer.nat., 09122 Chemnitz Ionenstrahlpräparationsvorrichtung für die Elektronenmikroskopie
JP2001077058A (ja) * 1999-09-08 2001-03-23 Seiko Instruments Inc 集束イオンビームを用いた加工方法
US6768110B2 (en) 2000-06-21 2004-07-27 Gatan, Inc. Ion beam milling system and method for electron microscopy specimen preparation
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
US7053370B2 (en) * 2001-10-05 2006-05-30 Canon Kabushiki Kaisha Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
US7002152B2 (en) * 2003-02-15 2006-02-21 Bal-Tec Ag Sample preparation for transmission electron microscopy
US20040222082A1 (en) * 2003-05-05 2004-11-11 Applied Materials, Inc. Oblique ion milling of via metallization
US6784427B1 (en) 2003-07-31 2004-08-31 Bal-Tec Ag Samples for transmission electron microscopy
ATE459091T1 (de) * 2004-07-01 2010-03-15 Fei Co Methode zum entfernen einer mikroskopischen probe von einem substrat
JP4878135B2 (ja) * 2005-08-31 2012-02-15 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム装置及び試料加工方法

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