JP2010519771A5 - - Google Patents
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- JP2010519771A5 JP2010519771A5 JP2009551052A JP2009551052A JP2010519771A5 JP 2010519771 A5 JP2010519771 A5 JP 2010519771A5 JP 2009551052 A JP2009551052 A JP 2009551052A JP 2009551052 A JP2009551052 A JP 2009551052A JP 2010519771 A5 JP2010519771 A5 JP 2010519771A5
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- Prior art keywords
- spectrum
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- squares
- Prior art date
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- 238000001228 spectrum Methods 0.000 claims description 106
- 230000001186 cumulative effect Effects 0.000 claims description 27
- 238000005498 polishing Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 8
- 238000009825 accumulation Methods 0.000 claims 5
- 238000004590 computer program Methods 0.000 claims 4
- 238000004364 calculation method Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000002159 abnormal effect Effects 0.000 description 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US89148707P | 2007-02-23 | 2007-02-23 | |
| US60/891,487 | 2007-02-23 | ||
| PCT/US2008/054807 WO2008103964A2 (en) | 2007-02-23 | 2008-02-22 | Using spectra to determine polishing endpoints |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013127106A Division JP5774059B2 (ja) | 2007-02-23 | 2013-06-18 | スペクトルを使用した研磨終了点の決定 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010519771A JP2010519771A (ja) | 2010-06-03 |
| JP2010519771A5 true JP2010519771A5 (OSRAM) | 2014-05-29 |
| JP5654753B2 JP5654753B2 (ja) | 2015-01-14 |
Family
ID=39710785
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009551052A Active JP5654753B2 (ja) | 2007-02-23 | 2008-02-22 | スペクトルを使用した研磨終了点の決定 |
| JP2013127106A Active JP5774059B2 (ja) | 2007-02-23 | 2013-06-18 | スペクトルを使用した研磨終了点の決定 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013127106A Active JP5774059B2 (ja) | 2007-02-23 | 2013-06-18 | スペクトルを使用した研磨終了点の決定 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8569174B2 (OSRAM) |
| EP (1) | EP2125291A4 (OSRAM) |
| JP (2) | JP5654753B2 (OSRAM) |
| KR (3) | KR101504508B1 (OSRAM) |
| TW (1) | TWI445098B (OSRAM) |
| WO (1) | WO2008103964A2 (OSRAM) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8392012B2 (en) * | 2008-10-27 | 2013-03-05 | Applied Materials, Inc. | Multiple libraries for spectrographic monitoring of zones of a substrate during processing |
| US8260446B2 (en) | 2005-08-22 | 2012-09-04 | Applied Materials, Inc. | Spectrographic monitoring of a substrate during processing using index values |
| US7998358B2 (en) | 2006-10-31 | 2011-08-16 | Applied Materials, Inc. | Peak-based endpointing for chemical mechanical polishing |
| US8569174B2 (en) | 2007-02-23 | 2013-10-29 | Applied Materials, Inc. | Using spectra to determine polishing endpoints |
| US20090275265A1 (en) * | 2008-05-02 | 2009-11-05 | Applied Materials, Inc. | Endpoint detection in chemical mechanical polishing using multiple spectra |
| KR101834944B1 (ko) | 2008-09-04 | 2018-03-06 | 어플라이드 머티어리얼스, 인코포레이티드 | 프로세싱 동안 기판의 분광 모니터링의 이용에 의한 연마 속도들의 조정 |
| US20100103422A1 (en) * | 2008-10-27 | 2010-04-29 | Applied Materials, Inc. | Goodness of fit in spectrographic monitoring of a substrate during processing |
| JP5774482B2 (ja) * | 2008-10-27 | 2015-09-09 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 処理中の基板の分光モニタリングにおける適合度 |
| US8628376B2 (en) * | 2008-11-07 | 2014-01-14 | Applied Materials, Inc. | In-line wafer thickness sensing |
| US8352061B2 (en) | 2008-11-14 | 2013-01-08 | Applied Materials, Inc. | Semi-quantitative thickness determination |
| WO2010062910A2 (en) * | 2008-11-26 | 2010-06-03 | Applied Materials, Inc. | Using optical metrology for feed back and feed forward process control |
| KR101956838B1 (ko) * | 2009-11-03 | 2019-03-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 시간에 대한 스펙트럼들 등고선 플롯들의 피크 위치를 이용한 종료점 방법 |
| JP5728239B2 (ja) * | 2010-03-02 | 2015-06-03 | 株式会社荏原製作所 | 研磨監視方法、研磨方法、研磨監視装置、および研磨装置 |
| TWI496661B (zh) * | 2010-04-28 | 2015-08-21 | Applied Materials Inc | 用於光學監測之參考光譜的自動產生 |
| US9579767B2 (en) * | 2010-04-28 | 2017-02-28 | Applied Materials, Inc. | Automatic generation of reference spectra for optical monitoring of substrates |
| JP6039545B2 (ja) * | 2010-05-05 | 2016-12-07 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 終点検出のためのスペクトル特徴部の動的または適応的な追跡 |
| US8190285B2 (en) * | 2010-05-17 | 2012-05-29 | Applied Materials, Inc. | Feedback for polishing rate correction in chemical mechanical polishing |
| US8666665B2 (en) * | 2010-06-07 | 2014-03-04 | Applied Materials, Inc. | Automatic initiation of reference spectra library generation for optical monitoring |
| JP2012019114A (ja) * | 2010-07-08 | 2012-01-26 | Tokyo Seimitsu Co Ltd | 研磨終点検出装置、及び研磨終点検出方法 |
| JP5612945B2 (ja) | 2010-07-23 | 2014-10-22 | 株式会社荏原製作所 | 基板の研磨の進捗を監視する方法および研磨装置 |
| US8954186B2 (en) | 2010-07-30 | 2015-02-10 | Applied Materials, Inc. | Selecting reference libraries for monitoring of multiple zones on a substrate |
| TWI521625B (zh) * | 2010-07-30 | 2016-02-11 | 應用材料股份有限公司 | 使用光譜監測來偵測層級清除 |
| US20120100781A1 (en) * | 2010-10-20 | 2012-04-26 | Jimin Zhang | Multiple matching reference spectra for in-situ optical monitoring |
| US8547538B2 (en) * | 2011-04-21 | 2013-10-01 | Applied Materials, Inc. | Construction of reference spectra with variations in environmental effects |
| US8755928B2 (en) * | 2011-04-27 | 2014-06-17 | Applied Materials, Inc. | Automatic selection of reference spectra library |
| US8942842B2 (en) | 2011-04-28 | 2015-01-27 | Applied Materials, Inc. | Varying optical coefficients to generate spectra for polishing control |
| WO2013133974A1 (en) | 2012-03-08 | 2013-09-12 | Applied Materials, Inc. | Fitting of optical model to measured spectrum |
| US9248544B2 (en) * | 2012-07-18 | 2016-02-02 | Applied Materials, Inc. | Endpoint detection during polishing using integrated differential intensity |
| US9221147B2 (en) * | 2012-10-23 | 2015-12-29 | Applied Materials, Inc. | Endpointing with selective spectral monitoring |
| US9227293B2 (en) * | 2012-11-21 | 2016-01-05 | Applied Materials, Inc. | Multi-platen multi-head polishing architecture |
| US20140242881A1 (en) * | 2013-02-27 | 2014-08-28 | Applied Materials, Inc. | Feed forward parameter values for use in theoretically generating spectra |
| TWI635929B (zh) | 2013-07-11 | 2018-09-21 | 日商荏原製作所股份有限公司 | 研磨裝置及研磨狀態監視方法 |
| JP6195754B2 (ja) * | 2013-07-19 | 2017-09-13 | 株式会社荏原製作所 | 研磨装置および研磨状態監視方法 |
| US10502694B2 (en) | 2013-08-06 | 2019-12-10 | Kla-Tencor Corporation | Methods and apparatus for patterned wafer characterization |
| US10399203B2 (en) * | 2014-04-22 | 2019-09-03 | Ebara Corporation | Polishing method and polishing apparatus |
| US20160013085A1 (en) * | 2014-07-10 | 2016-01-14 | Applied Materials, Inc. | In-Situ Acoustic Monitoring of Chemical Mechanical Polishing |
| US20160033958A1 (en) * | 2014-08-01 | 2016-02-04 | Globalfoundries Inc. | Endpoint determination using individually measured target spectra |
| TWI816620B (zh) * | 2017-04-21 | 2023-09-21 | 美商應用材料股份有限公司 | 使用神經網路來監測的拋光裝置 |
| JP6902452B2 (ja) * | 2017-10-19 | 2021-07-14 | 株式会社荏原製作所 | 研磨装置 |
| TWI845444B (zh) | 2018-04-03 | 2024-06-11 | 美商應用材料股份有限公司 | 針對墊子厚度使用機器學習及補償的拋光裝置、拋光系統、方法及電腦儲存媒體 |
| WO2020067914A1 (en) | 2018-09-26 | 2020-04-02 | Applied Materials, Inc. | Compensation for substrate doping in edge reconstruction for in-situ electromagnetic inductive monitoring |
| JP7086835B2 (ja) * | 2018-12-28 | 2022-06-20 | 株式会社荏原製作所 | 研磨レシピ決定装置 |
| CN110181984A (zh) * | 2019-06-03 | 2019-08-30 | 泉州龙捷园林古建工程有限公司 | 一种于板材上制作图文的方法 |
| US11282755B2 (en) | 2019-08-27 | 2022-03-22 | Applied Materials, Inc. | Asymmetry correction via oriented wafer loading |
| CN115038549B (zh) | 2020-06-24 | 2024-03-12 | 应用材料公司 | 使用研磨垫磨损补偿的基板层厚度确定 |
| JP2025522492A (ja) * | 2022-06-22 | 2025-07-15 | アプライド マテリアルズ インコーポレイテッド | 研磨プロセス制御用ウインドウ論理 |
Family Cites Families (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7004A (en) * | 1850-01-08 | Connecting ctjttees to shafts of boeing instetjments | ||
| US5893796A (en) | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
| US5747380A (en) | 1996-02-26 | 1998-05-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Robust end-point detection for contact and via etching |
| US6489624B1 (en) | 1997-07-18 | 2002-12-03 | Nikon Corporation | Apparatus and methods for detecting thickness of a patterned layer |
| US6271047B1 (en) | 1998-05-21 | 2001-08-07 | Nikon Corporation | Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same |
| US6361646B1 (en) | 1998-06-08 | 2002-03-26 | Speedfam-Ipec Corporation | Method and apparatus for endpoint detection for chemical mechanical polishing |
| TW398036B (en) | 1998-08-18 | 2000-07-11 | Promos Technologies Inc | Method of monitoring of chemical mechanical polishing end point and uniformity |
| IL125964A (en) | 1998-08-27 | 2003-10-31 | Tevet Process Control Technolo | Method and apparatus for measuring the thickness of a transparent film, particularly of a photoresist film on a semiconductor substrate |
| US6159073A (en) | 1998-11-02 | 2000-12-12 | Applied Materials, Inc. | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing |
| WO2000026613A1 (en) | 1998-11-02 | 2000-05-11 | Applied Materials, Inc. | Optical monitoring of radial ranges in chemical mechanical polishing a metal layer on a substrate |
| US6908374B2 (en) | 1998-12-01 | 2005-06-21 | Nutool, Inc. | Chemical mechanical polishing endpoint detection |
| JP2000183001A (ja) | 1998-12-10 | 2000-06-30 | Okamoto Machine Tool Works Ltd | ウエハの研磨終点検出方法およびそれに用いる化学機械研磨装置 |
| US6204922B1 (en) | 1998-12-11 | 2001-03-20 | Filmetrics, Inc. | Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample |
| US6184985B1 (en) | 1998-12-11 | 2001-02-06 | Filmetrics, Inc. | Spectrometer configured to provide simultaneous multiple intensity spectra from independent light sources |
| US6172756B1 (en) | 1998-12-11 | 2001-01-09 | Filmetrics, Inc. | Rapid and accurate end point detection in a noisy environment |
| US6190234B1 (en) | 1999-01-25 | 2001-02-20 | Applied Materials, Inc. | Endpoint detection with light beams of different wavelengths |
| JP2000310512A (ja) | 1999-04-28 | 2000-11-07 | Hitachi Ltd | 薄膜の膜厚計測方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその装置 |
| JP3327289B2 (ja) | 2000-03-29 | 2002-09-24 | 株式会社ニコン | 工程終了点測定装置及び測定方法及び研磨装置及び半導体デバイス製造方法及び信号処理プログラムを記録した記録媒体 |
| US6358327B1 (en) | 1999-06-29 | 2002-03-19 | Applied Materials, Inc. | Method for endpoint detection using throttle valve position |
| US6340602B1 (en) | 1999-12-10 | 2002-01-22 | Sensys Instruments | Method of measuring meso-scale structures on wafers |
| US6399501B2 (en) * | 1999-12-13 | 2002-06-04 | Applied Materials, Inc. | Method and apparatus for detecting polishing endpoint with optical monitoring |
| JP3259225B2 (ja) | 1999-12-27 | 2002-02-25 | 株式会社ニコン | 研磨状況モニタ方法及びその装置、研磨装置、プロセスウエハ、半導体デバイス製造方法、並びに半導体デバイス |
| JP2001287159A (ja) | 2000-04-05 | 2001-10-16 | Nikon Corp | 表面状態測定方法及び測定装置及び研磨装置及び半導体デバイス製造方法 |
| WO2002014840A2 (en) | 2000-08-10 | 2002-02-21 | Sensys Instruments Corporation | Database interpolation method for optical measurement of diffractive microstructures |
| WO2002065545A2 (en) | 2001-02-12 | 2002-08-22 | Sensys Instruments Corporation | Overlay alignment metrology using diffraction gratings |
| US6676482B2 (en) | 2001-04-20 | 2004-01-13 | Speedfam-Ipec Corporation | Learning method and apparatus for predictive determination of endpoint during chemical mechanical planarization using sparse sampling |
| JP2002359217A (ja) | 2001-05-31 | 2002-12-13 | Omron Corp | 研磨終点検出方法およびその装置 |
| US6762838B2 (en) | 2001-07-02 | 2004-07-13 | Tevet Process Control Technologies Ltd. | Method and apparatus for production line screening |
| JP3932836B2 (ja) | 2001-07-27 | 2007-06-20 | 株式会社日立製作所 | 薄膜の膜厚計測方法及びその装置並びにそれを用いたデバイスの製造方法 |
| US6678046B2 (en) | 2001-08-28 | 2004-01-13 | Therma-Wave, Inc. | Detector configurations for optical metrology |
| US6618130B2 (en) | 2001-08-28 | 2003-09-09 | Speedfam-Ipec Corporation | Method and apparatus for optical endpoint detection during chemical mechanical polishing |
| US6898596B2 (en) | 2001-10-23 | 2005-05-24 | Therma-Wave, Inc. | Evolution of library data sets |
| US6678055B2 (en) | 2001-11-26 | 2004-01-13 | Tevet Process Control Technologies Ltd. | Method and apparatus for measuring stress in semiconductor wafers |
| WO2003058687A1 (en) * | 2001-12-31 | 2003-07-17 | Tokyo Electron Limited | Method of detecting, identifying and correcting process performance |
| US6942546B2 (en) | 2002-01-17 | 2005-09-13 | Asm Nutool, Inc. | Endpoint detection for non-transparent polishing member |
| US6813034B2 (en) | 2002-02-05 | 2004-11-02 | Therma-Wave, Inc. | Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements |
| US6806948B2 (en) | 2002-03-29 | 2004-10-19 | Lam Research Corporation | System and method of broad band optical end point detection for film change indication |
| US6947135B2 (en) | 2002-07-01 | 2005-09-20 | Therma-Wave, Inc. | Reduced multicubic database interpolation method for optical measurement of diffractive microstructures |
| JP4542324B2 (ja) | 2002-10-17 | 2010-09-15 | 株式会社荏原製作所 | 研磨状態監視装置及びポリッシング装置 |
| US6885467B2 (en) | 2002-10-28 | 2005-04-26 | Tevet Process Control Technologies Ltd. | Method and apparatus for thickness decomposition of complicated layer structures |
| US8257546B2 (en) * | 2003-04-11 | 2012-09-04 | Applied Materials, Inc. | Method and system for monitoring an etch process |
| JP4996245B2 (ja) * | 2003-04-29 | 2012-08-08 | アノト アクティエボラーク | 位置復号のための方法、装置、コンピュータプログラム及び記憶媒体 |
| US7097537B1 (en) | 2003-08-18 | 2006-08-29 | Applied Materials, Inc. | Determination of position of sensor measurements during polishing |
| JP4464642B2 (ja) | 2003-09-10 | 2010-05-19 | 株式会社荏原製作所 | 研磨状態監視装置、研磨状態監視方法、研磨装置及び研磨方法 |
| JP2005159203A (ja) | 2003-11-28 | 2005-06-16 | Hitachi Ltd | 膜厚計測方法及びその装置、研磨レート算出方法並びにcmp加工方法及びその装置 |
| US7255771B2 (en) | 2004-03-26 | 2007-08-14 | Applied Materials, Inc. | Multiple zone carrier head with flexible membrane |
| US7120553B2 (en) | 2004-07-22 | 2006-10-10 | Applied Materials, Inc. | Iso-reflectance wavelengths |
| WO2007024807A2 (en) | 2005-08-22 | 2007-03-01 | Applied Materials, Inc. | Apparatus and methods for spectrum based monitoring of chemical mechanical polishing |
| US7406394B2 (en) | 2005-08-22 | 2008-07-29 | Applied Materials, Inc. | Spectra based endpointing for chemical mechanical polishing |
| US7306507B2 (en) * | 2005-08-22 | 2007-12-11 | Applied Materials, Inc. | Polishing pad assembly with glass or crystalline window |
| KR101398567B1 (ko) * | 2005-08-22 | 2014-05-22 | 어플라이드 머티어리얼스, 인코포레이티드 | 화학적 기계적 폴리싱의 스펙트럼 기반 모니터링을 위한 장치 및 방법 |
| US8569174B2 (en) | 2007-02-23 | 2013-10-29 | Applied Materials, Inc. | Using spectra to determine polishing endpoints |
-
2008
- 2008-02-22 US US12/036,174 patent/US8569174B2/en active Active
- 2008-02-22 WO PCT/US2008/054807 patent/WO2008103964A2/en not_active Ceased
- 2008-02-22 KR KR1020097019664A patent/KR101504508B1/ko active Active
- 2008-02-22 EP EP08730580.1A patent/EP2125291A4/en not_active Withdrawn
- 2008-02-22 TW TW97106349A patent/TWI445098B/zh active
- 2008-02-22 KR KR1020157033828A patent/KR101643992B1/ko active Active
- 2008-02-22 JP JP2009551052A patent/JP5654753B2/ja active Active
- 2008-02-22 KR KR1020147032982A patent/KR101678082B1/ko active Active
-
2013
- 2013-06-18 JP JP2013127106A patent/JP5774059B2/ja active Active
- 2013-09-30 US US14/041,113 patent/US9142466B2/en active Active
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