JP2010519397A5 - - Google Patents
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- JP2010519397A5 JP2010519397A5 JP2009551234A JP2009551234A JP2010519397A5 JP 2010519397 A5 JP2010519397 A5 JP 2010519397A5 JP 2009551234 A JP2009551234 A JP 2009551234A JP 2009551234 A JP2009551234 A JP 2009551234A JP 2010519397 A5 JP2010519397 A5 JP 2010519397A5
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- JP
- Japan
- Prior art keywords
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- organic
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 17
- 239000000178 monomer Substances 0.000 claims description 17
- 229920000642 polymer Polymers 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 15
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 12
- 230000007062 hydrolysis Effects 0.000 claims description 10
- 238000006460 hydrolysis reaction Methods 0.000 claims description 10
- 239000012429 reaction media Substances 0.000 claims description 9
- 125000005375 organosiloxane group Chemical group 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 7
- -1 hydroxyl compound Chemical class 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 4
- 150000002894 organic compounds Chemical group 0.000 claims description 3
- 150000004756 silanes Chemical class 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 2
- 150000008378 aryl ethers Chemical class 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 150000002440 hydroxy compounds Chemical class 0.000 claims 3
- 230000000379 polymerizing effect Effects 0.000 claims 3
- 239000004593 Epoxy Substances 0.000 claims 2
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical group 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 230000003301 hydrolyzing effect Effects 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims 2
- RKLROMDZXDQSDF-UHFFFAOYSA-N 1-phenylphenanthrene Chemical compound C1=CC=CC=C1C1=CC=CC2=C1C=CC1=CC=CC=C21 RKLROMDZXDQSDF-UHFFFAOYSA-N 0.000 claims 1
- UCMZDKNUMKBJAA-UHFFFAOYSA-N 2,2-diethoxyethenyl(methyl)silane Chemical compound C[SiH2]C=C(OCC)OCC UCMZDKNUMKBJAA-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 235000018936 Vitellaria paradoxa Nutrition 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 150000001735 carboxylic acids Chemical group 0.000 claims 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 150000003333 secondary alcohols Chemical class 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000003509 tertiary alcohols Chemical class 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- 150000003573 thiols Chemical group 0.000 claims 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 claims 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 46
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 44
- 239000011541 reaction mixture Substances 0.000 description 41
- 239000002904 solvent Substances 0.000 description 39
- 239000000463 material Substances 0.000 description 32
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 31
- 238000010992 reflux Methods 0.000 description 29
- 239000007787 solid Substances 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000000126 substance Substances 0.000 description 15
- 239000004810 polytetrafluoroethylene Substances 0.000 description 14
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 14
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 10
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 10
- 239000002243 precursor Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US89183207P | 2007-02-27 | 2007-02-27 | |
| US60/891,832 | 2007-02-27 | ||
| PCT/FI2008/050092 WO2008104641A2 (en) | 2007-02-27 | 2008-02-26 | Process for producing an organosiloxane polymer |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010519397A JP2010519397A (ja) | 2010-06-03 |
| JP2010519397A5 true JP2010519397A5 (enExample) | 2014-01-30 |
| JP5707042B2 JP5707042B2 (ja) | 2015-04-22 |
Family
ID=39721645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009551234A Expired - Fee Related JP5707042B2 (ja) | 2007-02-27 | 2008-02-26 | 有機シロキサン重合体の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8168740B2 (enExample) |
| EP (1) | EP2115037B1 (enExample) |
| JP (1) | JP5707042B2 (enExample) |
| TW (1) | TWI439494B (enExample) |
| WO (1) | WO2008104641A2 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI439494B (zh) * | 2007-02-27 | 2014-06-01 | Braggone Oy | 產生有機矽氧烷聚合物的方法 |
| WO2011125646A1 (ja) * | 2010-03-31 | 2011-10-13 | Jsr株式会社 | 硬化性樹脂組成物および発光装置 |
| JP2012022997A (ja) * | 2010-07-16 | 2012-02-02 | Jsr Corp | 発光素子および粒子含有層形成用組成物 |
| US20140191161A1 (en) * | 2011-07-07 | 2014-07-10 | Masaaki Amako | Curable Silicon Composition, Cured Product Thereof, And Optical Semiconductor Device |
| WO2013078448A1 (en) | 2011-11-23 | 2013-05-30 | Momentive Performance Materials, Inc. | Functionalized metal-containing particles and methods of making the same |
| CN104066796B (zh) | 2011-11-23 | 2017-02-22 | 莫门蒂夫性能材料股份有限公司 | 用于制备有机‑无机杂化材料的方法 |
| WO2013147336A1 (ko) * | 2012-03-27 | 2013-10-03 | 삼성정밀화학 주식회사 | 유기 실록산 수지 조성물, 그로부터 제조되는 막 구조물, 막 구조물의 제조방법 및 막 구조물을 포함하는 전자 소자 |
| JP6235471B2 (ja) * | 2012-06-20 | 2017-11-22 | 東京エレクトロン株式会社 | シーズニング方法、プラズマ処理装置及び製造方法 |
| JP6221279B2 (ja) * | 2013-03-18 | 2017-11-01 | 富士通株式会社 | レジスト組成物の製造方法及びパターン形成方法 |
| JP2015143292A (ja) * | 2014-01-31 | 2015-08-06 | 住友化学株式会社 | Ｕｖ−ｌｅｄ用ポリシルセスキオキサン系封止材組成物及びそのための溶媒の使用 |
| US9727087B2 (en) * | 2015-03-25 | 2017-08-08 | Intel Corporation | Facilitating dynamic detection and intelligent use of segmentation on flexible display screens |
| JP6615849B2 (ja) * | 2017-11-22 | 2019-12-04 | マクセルホールディングス株式会社 | モデル材用組成物 |
| WO2024002920A1 (en) | 2022-06-27 | 2024-01-04 | Merck Patent Gmbh | Composition |
| KR20250067877A (ko) | 2022-09-14 | 2025-05-15 | 메르크 파텐트 게엠베하 | 조성물 |
| CN120936943A (zh) | 2023-03-28 | 2025-11-11 | 默克专利股份有限公司 | 组合物 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH083074B2 (ja) * | 1986-11-18 | 1996-01-17 | 東京応化工業株式会社 | シリカ系被膜形成用塗布液 |
| JP3824334B2 (ja) * | 1995-08-07 | 2006-09-20 | 東京応化工業株式会社 | シリカ系被膜形成用塗布液及び被膜形成方法 |
| TW440600B (en) * | 1996-06-17 | 2001-06-16 | Sumitomo Chemical Co | Liquid coating composition for forming silicon-containing coating film |
| US6448331B1 (en) * | 1997-07-15 | 2002-09-10 | Asahi Kasei Kabushiki Kaisha | Alkoxysilane/organic polymer composition for thin insulating film production and use thereof |
| US6268457B1 (en) * | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
| WO2000077575A1 (en) * | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US6824879B2 (en) * | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| JP4195773B2 (ja) * | 2000-04-10 | 2008-12-10 | Ｊｓｒ株式会社 | 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜 |
| US6368400B1 (en) * | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US6406794B1 (en) * | 2001-02-08 | 2002-06-18 | Jsr Corporation | Film-forming composition |
| JP2003025510A (ja) * | 2001-07-16 | 2003-01-29 | Shin Etsu Chem Co Ltd | 反射防止性及び耐擦傷性を有する多層積層体 |
| CN1313371C (zh) * | 2001-09-17 | 2007-05-02 | 皇家飞利浦电子股份有限公司 | 含有中孔二氧化硅层的电子器件及制备该中孔二氧化硅层的组合物 |
| JP3631236B2 (ja) * | 2002-07-12 | 2005-03-23 | 東京応化工業株式会社 | シリカ系有機被膜の製造方法 |
| AU2003295517A1 (en) * | 2002-11-12 | 2004-06-03 | Honeywell International Inc | Anti-reflective coatings for photolithography and methods of preparation thereof |
| JP2005133060A (ja) * | 2003-10-29 | 2005-05-26 | Rohm & Haas Electronic Materials Llc | 多孔性材料 |
| JP5128044B2 (ja) * | 2003-12-10 | 2013-01-23 | 東京応化工業株式会社 | シリコン基板又は金属配線パターンが設けられたシリコン基板被覆用シリカ系被膜形成用材料の製造方法 |
| US20050196974A1 (en) * | 2004-03-02 | 2005-09-08 | Weigel Scott J. | Compositions for preparing low dielectric materials containing solvents |
| KR20120127515A (ko) * | 2004-05-26 | 2012-11-21 | 닛산 가가쿠 고교 가부시키 가이샤 | 면발광체 |
| JP4553113B2 (ja) * | 2004-06-10 | 2010-09-29 | 信越化学工業株式会社 | 多孔質膜形成用組成物、パターン形成方法、及び多孔質犠性膜 |
| JP4355939B2 (ja) * | 2004-07-23 | 2009-11-04 | Ｊｓｒ株式会社 | 半導体装置の絶縁膜形成用組成物およびシリカ系膜の形成方法 |
| US7294405B2 (en) * | 2004-08-26 | 2007-11-13 | 3M Innovative Properties Company | Antiglare coating and articles |
| JP4756128B2 (ja) * | 2004-10-20 | 2011-08-24 | 日揮触媒化成株式会社 | 半導体加工用保護膜形成用塗布液、その調製方法およびこれより得られる半導体加工用保護膜 |
| US20080260956A1 (en) | 2004-12-21 | 2008-10-23 | Haruaki Sakurai | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part |
| TWI391454B (zh) * | 2005-06-17 | 2013-04-01 | Nissan Chemical Ind Ltd | 用於形成膜之塗覆流體及其膜與形成膜之方法 |
| US7253226B1 (en) * | 2005-08-11 | 2007-08-07 | Aps Laboratory | Tractable silica sols and nanocomposites therefrom |
| TWI434891B (zh) * | 2007-02-22 | 2014-04-21 | Silecs Oy | 積體電路用高矽含量矽氧烷聚合物 |
| TWI439494B (zh) * | 2007-02-27 | 2014-06-01 | Braggone Oy | 產生有機矽氧烷聚合物的方法 |
-
2008
- 2008-02-25 TW TW97106505A patent/TWI439494B/zh not_active IP Right Cessation
- 2008-02-26 JP JP2009551234A patent/JP5707042B2/ja not_active Expired - Fee Related
- 2008-02-26 US US12/528,669 patent/US8168740B2/en not_active Expired - Fee Related
- 2008-02-26 WO PCT/FI2008/050092 patent/WO2008104641A2/en not_active Ceased
- 2008-02-26 EP EP08718545.0A patent/EP2115037B1/en not_active Not-in-force
-
2012
- 2012-04-30 US US13/460,218 patent/US9062229B2/en active Active
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