JP5707042B2 - 有機シロキサン重合体の製造方法 - Google Patents

有機シロキサン重合体の製造方法 Download PDF

Info

Publication number
JP5707042B2
JP5707042B2 JP2009551234A JP2009551234A JP5707042B2 JP 5707042 B2 JP5707042 B2 JP 5707042B2 JP 2009551234 A JP2009551234 A JP 2009551234A JP 2009551234 A JP2009551234 A JP 2009551234A JP 5707042 B2 JP5707042 B2 JP 5707042B2
Authority
JP
Japan
Prior art keywords
mol
group
organic
monomer
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009551234A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010519397A5 (enExample
JP2010519397A (ja
Inventor
カルカイネン アリ
カルカイネン アリ
Original Assignee
オプティチューン オサケ ユキチュア
オプティチューン オサケ ユキチュア
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by オプティチューン オサケ ユキチュア, オプティチューン オサケ ユキチュア filed Critical オプティチューン オサケ ユキチュア
Publication of JP2010519397A publication Critical patent/JP2010519397A/ja
Publication of JP2010519397A5 publication Critical patent/JP2010519397A5/ja
Application granted granted Critical
Publication of JP5707042B2 publication Critical patent/JP5707042B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2009551234A 2007-02-27 2008-02-26 有機シロキサン重合体の製造方法 Expired - Fee Related JP5707042B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US89183207P 2007-02-27 2007-02-27
US60/891,832 2007-02-27
PCT/FI2008/050092 WO2008104641A2 (en) 2007-02-27 2008-02-26 Process for producing an organosiloxane polymer

Publications (3)

Publication Number Publication Date
JP2010519397A JP2010519397A (ja) 2010-06-03
JP2010519397A5 JP2010519397A5 (enExample) 2014-01-30
JP5707042B2 true JP5707042B2 (ja) 2015-04-22

Family

ID=39721645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009551234A Expired - Fee Related JP5707042B2 (ja) 2007-02-27 2008-02-26 有機シロキサン重合体の製造方法

Country Status (5)

Country Link
US (2) US8168740B2 (enExample)
EP (1) EP2115037B1 (enExample)
JP (1) JP5707042B2 (enExample)
TW (1) TWI439494B (enExample)
WO (1) WO2008104641A2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI439494B (zh) * 2007-02-27 2014-06-01 布勒岡股份有限公司 產生有機矽氧烷聚合物的方法
WO2011125646A1 (ja) * 2010-03-31 2011-10-13 Jsr株式会社 硬化性樹脂組成物および発光装置
JP2012022997A (ja) * 2010-07-16 2012-02-02 Jsr Corp 発光素子および粒子含有層形成用組成物
WO2013005858A1 (ja) * 2011-07-07 2013-01-10 東レ・ダウコーニング株式会社 硬化性シリコーン組成物、その硬化物、および光半導体装置
EP2782965A4 (en) 2011-11-23 2015-07-01 Momentive Performance Mat Inc PROCESS FOR THE PREPARATION OF ORGANIC-INORGANIC HYBRID MATERIALS
KR20140094621A (ko) 2011-11-23 2014-07-30 모멘티브 퍼포먼스 머티리얼즈 인크. 관능화된 금속-함유 입자 및 그 제조방법
WO2013147336A1 (ko) * 2012-03-27 2013-10-03 삼성정밀화학 주식회사 유기 실록산 수지 조성물, 그로부터 제조되는 막 구조물, 막 구조물의 제조방법 및 막 구조물을 포함하는 전자 소자
JP6235471B2 (ja) * 2012-06-20 2017-11-22 東京エレクトロン株式会社 シーズニング方法、プラズマ処理装置及び製造方法
JP6221279B2 (ja) * 2013-03-18 2017-11-01 富士通株式会社 レジスト組成物の製造方法及びパターン形成方法
JP2015143292A (ja) * 2014-01-31 2015-08-06 住友化学株式会社 Ｕｖ−ｌｅｄ用ポリシルセスキオキサン系封止材組成物及びそのための溶媒の使用
US9727087B2 (en) * 2015-03-25 2017-08-08 Intel Corporation Facilitating dynamic detection and intelligent use of segmentation on flexible display screens
JP6615849B2 (ja) * 2017-11-22 2019-12-04 マクセルホールディングス株式会社 モデル材用組成物
EP4543987A1 (en) 2022-06-27 2025-04-30 Merck Patent GmbH Composition
CN119923448A (zh) 2022-09-14 2025-05-02 默克专利股份有限公司 组合物
JP2026511211A (ja) 2023-03-28 2026-04-10 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 組成物

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083074B2 (ja) * 1986-11-18 1996-01-17 東京応化工業株式会社 シリカ系被膜形成用塗布液
JP3824334B2 (ja) * 1995-08-07 2006-09-20 東京応化工業株式会社 シリカ系被膜形成用塗布液及び被膜形成方法
TW440600B (en) * 1996-06-17 2001-06-16 Sumitomo Chemical Co Liquid coating composition for forming silicon-containing coating film
US6448331B1 (en) * 1997-07-15 2002-09-10 Asahi Kasei Kabushiki Kaisha Alkoxysilane/organic polymer composition for thin insulating film production and use thereof
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) * 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
JP2003502449A (ja) * 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
JP4195773B2 (ja) * 2000-04-10 2008-12-10 Ｊｓｒ株式会社 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US6406794B1 (en) * 2001-02-08 2002-06-18 Jsr Corporation Film-forming composition
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
JP2005503664A (ja) * 2001-09-17 2005-02-03 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 電子デバイスおよび組成物
JP3631236B2 (ja) * 2002-07-12 2005-03-23 東京応化工業株式会社 シリカ系有機被膜の製造方法
WO2004044025A2 (en) * 2002-11-12 2004-05-27 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
JP2005133060A (ja) * 2003-10-29 2005-05-26 Rohm & Haas Electronic Materials Llc 多孔性材料
JP5128044B2 (ja) * 2003-12-10 2013-01-23 東京応化工業株式会社 シリコン基板又は金属配線パターンが設けられたシリコン基板被覆用シリカ系被膜形成用材料の製造方法
US20050196974A1 (en) * 2004-03-02 2005-09-08 Weigel Scott J. Compositions for preparing low dielectric materials containing solvents
WO2005115740A1 (ja) * 2004-05-26 2005-12-08 Nissan Chemical Industries, Ltd. 面発光体
JP4553113B2 (ja) * 2004-06-10 2010-09-29 信越化学工業株式会社 多孔質膜形成用組成物、パターン形成方法、及び多孔質犠性膜
JP4355939B2 (ja) * 2004-07-23 2009-11-04 Ｊｓｒ株式会社 半導体装置の絶縁膜形成用組成物およびシリカ系膜の形成方法
US7294405B2 (en) * 2004-08-26 2007-11-13 3M Innovative Properties Company Antiglare coating and articles
JP4756128B2 (ja) * 2004-10-20 2011-08-24 日揮触媒化成株式会社 半導体加工用保護膜形成用塗布液、その調製方法およびこれより得られる半導体加工用保護膜
US20080260956A1 (en) 2004-12-21 2008-10-23 Haruaki Sakurai Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part
US7550040B2 (en) * 2005-06-17 2009-06-23 Nissan Chemical Industries, Ltd. Coating fluid for forming film, and film thereof and film-forming process
US7253226B1 (en) 2005-08-11 2007-08-07 Aps Laboratory Tractable silica sols and nanocomposites therefrom
TWI434891B (zh) * 2007-02-22 2014-04-21 賽倫斯股份有限公司 積體電路用高矽含量矽氧烷聚合物
TWI439494B (zh) * 2007-02-27 2014-06-01 布勒岡股份有限公司 產生有機矽氧烷聚合物的方法

Also Published As

Publication number Publication date
US9062229B2 (en) 2015-06-23
US20120302688A1 (en) 2012-11-29
US8168740B2 (en) 2012-05-01
EP2115037B1 (en) 2016-04-20
EP2115037A2 (en) 2009-11-11
US20100016488A1 (en) 2010-01-21
TWI439494B (zh) 2014-06-01
WO2008104641A2 (en) 2008-09-04
WO2008104641A3 (en) 2009-02-26
JP2010519397A (ja) 2010-06-03
TW200902595A (en) 2009-01-16

Similar Documents

Publication Publication Date Title
US9062229B2 (en) Organosiloxane polymer compositions
US8304161B2 (en) Silsesquioxane resins
US8809482B2 (en) Silsesquioxane resins
US7833696B2 (en) Method for forming anti-reflective coating
EP2220165B1 (en) Siloxane polymer compositions and methods of using the same
KR20110096155A (ko) 습식 에칭가능한 반사방지 코팅
JP5587791B2 (ja) シルセスキオキサン樹脂
JP2010519397A5 (enExample)
JP7793183B2 (ja) 機能性ハイドロジェンシルセスキオキサン樹脂とその使用
US20160252814A1 (en) Novel siloxane polymer compositions
JP4881396B2 (ja) 反射防止膜材料
JP2009540084A (ja) 反射防止被膜用の無機−有機混成重合体組成物
KR20090127140A (ko) 집적 회로용의 실리콘 고함량 실록산 폴리머
TW202231737A (zh) 樹脂組成物、固化膜、固化膜的製造方法、附多層膜之基板、附圖案之基板的製造方法、光敏性樹脂組成物、圖案固化膜的製造方法、聚合物的製造方法以及樹脂組成物的製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110217

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130517

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130604

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130904

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130911

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20131204

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140617

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140909

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140917

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141216

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20150113

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150203

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150302

R150 Certificate of patent or registration of utility model

Ref document number: 5707042

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees