JP2010518583A5 - - Google Patents

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Publication number
JP2010518583A5
JP2010518583A5 JP2009549224A JP2009549224A JP2010518583A5 JP 2010518583 A5 JP2010518583 A5 JP 2010518583A5 JP 2009549224 A JP2009549224 A JP 2009549224A JP 2009549224 A JP2009549224 A JP 2009549224A JP 2010518583 A5 JP2010518583 A5 JP 2010518583A5
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Japan
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sample
gas
chamber
optical device
sample chamber
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JP2009549224A
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English (en)
Japanese (ja)
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JP5758577B2 (ja
JP2010518583A (ja
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Priority claimed from PCT/US2008/053223 external-priority patent/WO2008098084A1/en
Publication of JP2010518583A publication Critical patent/JP2010518583A/ja
Publication of JP2010518583A5 publication Critical patent/JP2010518583A5/ja
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Publication of JP5758577B2 publication Critical patent/JP5758577B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009549224A 2007-02-06 2008-02-06 高圧荷電粒子ビーム・システム Expired - Fee Related JP5758577B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US90002807P 2007-02-06 2007-02-06
US60/900,028 2007-02-06
PCT/US2008/053223 WO2008098084A1 (en) 2007-02-06 2008-02-06 High pressure charged particle beam system

Publications (3)

Publication Number Publication Date
JP2010518583A JP2010518583A (ja) 2010-05-27
JP2010518583A5 true JP2010518583A5 (enExample) 2010-07-08
JP5758577B2 JP5758577B2 (ja) 2015-08-05

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JP2009549224A Expired - Fee Related JP5758577B2 (ja) 2007-02-06 2008-02-06 高圧荷電粒子ビーム・システム

Country Status (4)

Country Link
US (1) US8921811B2 (enExample)
EP (1) EP2109873B1 (enExample)
JP (1) JP5758577B2 (enExample)
WO (1) WO2008098084A1 (enExample)

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