JP5758577B2 - 高圧荷電粒子ビーム・システム - Google Patents

高圧荷電粒子ビーム・システム Download PDF

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Publication number
JP5758577B2
JP5758577B2 JP2009549224A JP2009549224A JP5758577B2 JP 5758577 B2 JP5758577 B2 JP 5758577B2 JP 2009549224 A JP2009549224 A JP 2009549224A JP 2009549224 A JP2009549224 A JP 2009549224A JP 5758577 B2 JP5758577 B2 JP 5758577B2
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Prior art keywords
sample
gas
chamber
sample chamber
charged particle
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Expired - Fee Related
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JP2009549224A
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English (en)
Japanese (ja)
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JP2010518583A (ja
JP2010518583A5 (enExample
Inventor
ラルフ・ウィリアム・ノウレス
ミロス・トス
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エフ・イ−・アイ・カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31732—Depositing thin layers on selected microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2009549224A 2007-02-06 2008-02-06 高圧荷電粒子ビーム・システム Expired - Fee Related JP5758577B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US90002807P 2007-02-06 2007-02-06
US60/900,028 2007-02-06
PCT/US2008/053223 WO2008098084A1 (en) 2007-02-06 2008-02-06 High pressure charged particle beam system

Publications (3)

Publication Number Publication Date
JP2010518583A JP2010518583A (ja) 2010-05-27
JP2010518583A5 JP2010518583A5 (enExample) 2010-07-08
JP5758577B2 true JP5758577B2 (ja) 2015-08-05

Family

ID=39682104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009549224A Expired - Fee Related JP5758577B2 (ja) 2007-02-06 2008-02-06 高圧荷電粒子ビーム・システム

Country Status (4)

Country Link
US (1) US8921811B2 (enExample)
EP (1) EP2109873B1 (enExample)
JP (1) JP5758577B2 (enExample)
WO (1) WO2008098084A1 (enExample)

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Also Published As

Publication number Publication date
EP2109873A4 (en) 2014-05-07
EP2109873A1 (en) 2009-10-21
US20110031394A1 (en) 2011-02-10
JP2010518583A (ja) 2010-05-27
EP2109873B1 (en) 2017-04-05
WO2008098084A1 (en) 2008-08-14
US8921811B2 (en) 2014-12-30

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