JP2010517769A5 - - Google Patents

Download PDF

Info

Publication number
JP2010517769A5
JP2010517769A5 JP2009549479A JP2009549479A JP2010517769A5 JP 2010517769 A5 JP2010517769 A5 JP 2010517769A5 JP 2009549479 A JP2009549479 A JP 2009549479A JP 2009549479 A JP2009549479 A JP 2009549479A JP 2010517769 A5 JP2010517769 A5 JP 2010517769A5
Authority
JP
Japan
Prior art keywords
gas stream
liquid
pump
gas
gaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009549479A
Other languages
English (en)
Japanese (ja)
Other versions
JP5264784B2 (ja
JP2010517769A (ja
Filing date
Publication date
Priority claimed from GBGB0702837.6A external-priority patent/GB0702837D0/en
Application filed filed Critical
Publication of JP2010517769A publication Critical patent/JP2010517769A/ja
Publication of JP2010517769A5 publication Critical patent/JP2010517769A5/ja
Application granted granted Critical
Publication of JP5264784B2 publication Critical patent/JP5264784B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2009549479A 2007-02-14 2008-01-23 ガス流を処理する方法 Expired - Fee Related JP5264784B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0702837.6 2007-02-14
GBGB0702837.6A GB0702837D0 (en) 2007-02-14 2007-02-14 Method of treating a gas stream
PCT/GB2008/050045 WO2008099206A1 (en) 2007-02-14 2008-01-23 Method of treating a gas stream

Publications (3)

Publication Number Publication Date
JP2010517769A JP2010517769A (ja) 2010-05-27
JP2010517769A5 true JP2010517769A5 (https=) 2011-03-10
JP5264784B2 JP5264784B2 (ja) 2013-08-14

Family

ID=37908602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009549479A Expired - Fee Related JP5264784B2 (ja) 2007-02-14 2008-01-23 ガス流を処理する方法

Country Status (12)

Country Link
US (1) US8394179B2 (https=)
EP (1) EP2111283A1 (https=)
JP (1) JP5264784B2 (https=)
KR (1) KR20090110343A (https=)
CN (1) CN101610829A (https=)
AU (1) AU2008215944B2 (https=)
BR (1) BRPI0807585A2 (https=)
EA (1) EA200970762A1 (https=)
GB (1) GB0702837D0 (https=)
TW (1) TW200841925A (https=)
WO (1) WO2008099206A1 (https=)
ZA (1) ZA200904863B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI123904B (fi) * 2012-02-24 2013-12-13 Teknologian Tutkimuskeskus Vtt Menetelmä ja laitteisto pyrolyysinesteen valmistamiseksi
GB2513300B (en) * 2013-04-04 2017-10-11 Edwards Ltd Vacuum pumping and abatement system
GB2540582A (en) * 2015-07-22 2017-01-25 Edwards Ltd Apparatus for evacuating a corrosive effluent gas stream from a processing chamber
GB2540580A (en) 2015-07-22 2017-01-25 Edwards Ltd Liquid ring pump
GB2540581A (en) * 2015-07-22 2017-01-25 Edwards Ltd Abatement system
GB2561899B (en) 2017-04-28 2020-11-04 Edwards Ltd Vacuum pumping system
US11905955B1 (en) * 2019-05-01 2024-02-20 Kashiyama Industries, Ltd. Extending life cycles of vacuum pumps used in manufacturing processes
TWI699234B (zh) 2019-11-21 2020-07-21 財團法人工業技術研究院 微粒捕集裝置
US12515169B2 (en) * 2020-06-26 2026-01-06 Zimmer, Inc. Vacuum generation process for deposition of biomedical implant materials

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR6803024D0 (pt) * 1967-12-15 1973-01-04 Siemens Ag Processo para a producao de hidrogenio
US4001332A (en) * 1973-01-13 1977-01-04 Hoechst Aktiengesellschaft Process for compressing ketene
DE2832401C3 (de) * 1978-07-24 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Flüssigkeitsringpumpenanordnung
DE3024352A1 (de) * 1980-06-27 1982-01-21 Karlheinz 8000 München Geiger Verfahren und anlage zur gewinnung von brenngas durch ausfaulen organischer stoffe
JPH0714451B2 (ja) * 1988-05-23 1995-02-22 日本電気株式会社 廃ガス処理方法
JPH05154334A (ja) * 1991-12-11 1993-06-22 Fujitsu Ltd 半導体製造装置の排気ポンプシステム
US5178823A (en) * 1992-03-12 1993-01-12 Container Products Corp. Decontamination apparatus
US5287589A (en) * 1992-08-31 1994-02-22 Container Products Corp. Self-contained cleaning and retrieval apparatus
US5817284A (en) * 1995-10-30 1998-10-06 Central Glass Company, Limited Method for decomposing halide-containing gas
US6083572A (en) * 1998-02-27 2000-07-04 Hewlett-Packard Company Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition
JP3866412B2 (ja) * 1998-05-28 2007-01-10 カンケンテクノ株式会社 半導体製造排ガスの除害方法及び除害装置
US6368567B2 (en) * 1998-10-07 2002-04-09 Applied Materials, Inc. Point-of-use exhaust by-product reactor
GB9902099D0 (en) * 1999-01-29 1999-03-24 Boc Group Plc Vacuum pump systems
JP3976459B2 (ja) * 1999-11-18 2007-09-19 株式会社荏原製作所 フッ素含有化合物を含む排ガスの処理方法及び装置
JP2001293335A (ja) * 2000-04-12 2001-10-23 Ebara Corp フッ素含有化合物を含む排ガスの処理方法
AU2001284325A1 (en) 2000-08-31 2002-03-13 Barthlo Von_Moltitz Harmse A method of treating an effluent gas stream, and apparatus for use in such method
NO20010345L (no) * 2001-01-19 2002-07-22 Abb Gas Technology As Fremgangsmåte og anordning til behandling av gasser, samt anvendelse derav
WO2002095800A2 (en) * 2001-05-22 2002-11-28 Reflectivity, Inc. A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
WO2003047729A1 (en) 2001-12-04 2003-06-12 Ebara Corporation Method and apparatus for treating exhaust gas
JP2005131509A (ja) * 2003-10-29 2005-05-26 Unisem Co Ltd 廃ガス処理処置及び廃ガス処理方法
ZA200701036B (en) * 2004-07-16 2008-05-28 Cipla Ltd Anti-histaminic composition
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
JP4218618B2 (ja) * 2004-09-10 2009-02-04 株式会社日立製作所 排ガス分解処理装置
GB0505852D0 (en) 2005-03-22 2005-04-27 Boc Group Plc Method of treating a gas stream

Similar Documents

Publication Publication Date Title
JP2010517769A5 (https=)
AU2008215944B2 (en) Method of treating a gas stream
JP2007208042A5 (https=)
US9956525B2 (en) Apparatus for purifying waste gases for integrated semiconductor
WO2010047970A3 (en) Method and apparatus for removing photoresist
GB2481144A (en) Reactive chemical containment system
EA201170274A1 (ru) Устройство и способ выделения сероводорода из потока природного газа
EP3325133B1 (en) Abatement system
TWI456085B (zh) 成膜裝置及成膜方法
WO2012018375A3 (en) Plasma mediated ashing processes
WO2010005201A3 (ko) 폐가스 분해용 플라즈마 반응기와 이를 이용한 가스 스크러버
WO2014143731A3 (en) Method for the surface chemical functionalization of nano- and micro-sized solid particles
US7060235B2 (en) Method for processing perfluorocompounds exhaust
JP6419776B2 (ja) 真空ポンピング・除害システム
JPWO2018216446A1 (ja) 排ガスの減圧除害装置
JP6595148B2 (ja) 排ガスの減圧除害装置
TWI359691B (en) Gas separating device and gas separating method
TW200631647A (en) Processing method of exhaust gas and processing apparatus of exhaust gas
EP1716910B1 (fr) Procédé et installation d'épuration de fumées contenant des polluants acides
CN111826637B (zh) 气体输送系统、半导体设备和气体输送方法
KR101514449B1 (ko) 육불화황(sf6) 농축 및 열분해장치
TW200412409A (en) Vortex-type reaction chamber toxic gas treatment device and method
KR100743399B1 (ko) 반도체 제조공정에서 발생하는 염소가스와 과불화물의처리장치
RU2016103933A (ru) Способ и устройство для очистки отходящего воздуха, полученного при переработке древесины
TW200827016A (en) Treatment method and system of semiconductor processing tail gas including emission gas and dust