WO2010005201A3 - 폐가스 분해용 플라즈마 반응기와 이를 이용한 가스 스크러버 - Google Patents

폐가스 분해용 플라즈마 반응기와 이를 이용한 가스 스크러버 Download PDF

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Publication number
WO2010005201A3
WO2010005201A3 PCT/KR2009/003578 KR2009003578W WO2010005201A3 WO 2010005201 A3 WO2010005201 A3 WO 2010005201A3 KR 2009003578 W KR2009003578 W KR 2009003578W WO 2010005201 A3 WO2010005201 A3 WO 2010005201A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma reactor
scrubber
gas
plasma
same
Prior art date
Application number
PCT/KR2009/003578
Other languages
English (en)
French (fr)
Other versions
WO2010005201A2 (ko
Inventor
김익년
김홍진
Original Assignee
Kim Ik Nyeon
Kim Hong Jin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kim Ik Nyeon, Kim Hong Jin filed Critical Kim Ik Nyeon
Publication of WO2010005201A2 publication Critical patent/WO2010005201A2/ko
Publication of WO2010005201A3 publication Critical patent/WO2010005201A3/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/10—Oxidants
    • B01D2251/102—Oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B01D2251/202—Hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B01D2251/208—Hydrocarbons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/806—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

본 발명은 반도체 산업을 포함한 각종 산업으로부터 배출되는 대기오염 유해가스를 제거하기 위한 플라즈마 반응기와 이를 이용한 스크러버에 관한 것으로, 더욱 상세하게는 유해가스가 배출되는 배출구와 통상의 습식 스크러버 사이에 설치되는 글라이딩 플라즈마 반응기와 초고주파 플라즈마 반웅기, 상기 플라즈마 반응기들로부터 발생된 플라즈마 화염으로 상기 유해가스를 통과시켜 유해가스를 제거하는 플라즈마 가스 스크러버를 제공하게 된다.
PCT/KR2009/003578 2008-07-07 2009-07-01 폐가스 분해용 플라즈마 반응기와 이를 이용한 가스 스크러버 WO2010005201A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080065326A KR100951631B1 (ko) 2008-07-07 2008-07-07 폐가스 분해용 플라즈마 반응기와 이를 이용한 가스스크러버
KR10-2008-0065326 2008-07-07

Publications (2)

Publication Number Publication Date
WO2010005201A2 WO2010005201A2 (ko) 2010-01-14
WO2010005201A3 true WO2010005201A3 (ko) 2010-04-22

Family

ID=41507554

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/003578 WO2010005201A2 (ko) 2008-07-07 2009-07-01 폐가스 분해용 플라즈마 반응기와 이를 이용한 가스 스크러버

Country Status (3)

Country Link
KR (1) KR100951631B1 (ko)
TW (1) TWI356728B (ko)
WO (1) WO2010005201A2 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101609474B1 (ko) 2014-10-14 2016-04-05 (주)트리플코어스코리아 화학기상증착장치 가스처리 시스템 및 처리방법
KR102280380B1 (ko) * 2015-09-03 2021-07-22 인투코어테크놀로지 주식회사 유도 결합 플라즈마 장치
KR102035218B1 (ko) 2018-05-30 2019-10-22 (주)퓨어플라텍 가스처리용 마이크로웨이브식 플라즈마 장치 및 이를 위한 스월 발생기
KR102044446B1 (ko) 2018-08-16 2019-11-14 (주)퓨어플라텍 가스처리용 마이크로웨이브식 플라즈마 장치
US20200312629A1 (en) * 2019-03-25 2020-10-01 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
US10832893B2 (en) 2019-03-25 2020-11-10 Recarbon, Inc. Plasma reactor for processing gas
KR102249085B1 (ko) * 2020-10-15 2021-05-07 김형석 배기가스 또는 오염공기 처리를 위한 알에프 플라즈마 장치
KR102244519B1 (ko) * 2020-10-26 2021-04-26 김형석 대면적 방전공간 형성이 가능한 알에프 플라즈마 소각장치
KR102253706B1 (ko) 2021-02-09 2021-05-18 주식회사 코비플라텍 회전형 벌크 플라즈마 발생장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133494A (ja) * 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
KR20060095594A (ko) * 2005-02-28 2006-09-01 엄환섭 반도체 세정 폐가스 제거를 위한 플라즈마 스크러버
KR100695036B1 (ko) * 2006-02-20 2007-03-14 엄환섭 고온 대용량 플라즈마 가스 스크러버
KR100743042B1 (ko) * 2007-01-31 2007-07-26 한국기계연구원 플라즈마 반응기를 이용한 디젤엔진 배기가스의 저감시스템

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133494A (ja) * 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
KR20060095594A (ko) * 2005-02-28 2006-09-01 엄환섭 반도체 세정 폐가스 제거를 위한 플라즈마 스크러버
KR100695036B1 (ko) * 2006-02-20 2007-03-14 엄환섭 고온 대용량 플라즈마 가스 스크러버
KR100743042B1 (ko) * 2007-01-31 2007-07-26 한국기계연구원 플라즈마 반응기를 이용한 디젤엔진 배기가스의 저감시스템

Also Published As

Publication number Publication date
WO2010005201A2 (ko) 2010-01-14
KR20100005334A (ko) 2010-01-15
KR100951631B1 (ko) 2010-04-09
TWI356728B (en) 2012-01-21
TW201008632A (en) 2010-03-01

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