AU2008215944B2 - Method of treating a gas stream - Google Patents
Method of treating a gas stream Download PDFInfo
- Publication number
- AU2008215944B2 AU2008215944B2 AU2008215944A AU2008215944A AU2008215944B2 AU 2008215944 B2 AU2008215944 B2 AU 2008215944B2 AU 2008215944 A AU2008215944 A AU 2008215944A AU 2008215944 A AU2008215944 A AU 2008215944A AU 2008215944 B2 AU2008215944 B2 AU 2008215944B2
- Authority
- AU
- Australia
- Prior art keywords
- gas stream
- liquid
- gas
- pump
- liquid ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims abstract description 68
- 239000007789 gas Substances 0.000 claims abstract description 221
- 239000007788 liquid Substances 0.000 claims abstract description 133
- 238000000197 pyrolysis Methods 0.000 claims abstract description 28
- 239000007800 oxidant agent Substances 0.000 claims abstract description 22
- 230000001590 oxidative effect Effects 0.000 claims abstract description 22
- 230000002378 acidificating effect Effects 0.000 claims abstract description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 4
- 239000003054 catalyst Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 239000005864 Sulphur Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- 230000000717 retained effect Effects 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 231100001261 hazardous Toxicity 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 2
- -1 CF 4 Chemical class 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/10—Oxidants
- B01D2251/11—Air
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0702837.6A GB0702837D0 (en) | 2007-02-14 | 2007-02-14 | Method of treating a gas stream |
| GB0702837.6 | 2007-02-14 | ||
| PCT/GB2008/050045 WO2008099206A1 (en) | 2007-02-14 | 2008-01-23 | Method of treating a gas stream |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2008215944A1 AU2008215944A1 (en) | 2008-08-21 |
| AU2008215944B2 true AU2008215944B2 (en) | 2012-05-10 |
Family
ID=37908602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2008215944A Ceased AU2008215944B2 (en) | 2007-02-14 | 2008-01-23 | Method of treating a gas stream |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8394179B2 (https=) |
| EP (1) | EP2111283A1 (https=) |
| JP (1) | JP5264784B2 (https=) |
| KR (1) | KR20090110343A (https=) |
| CN (1) | CN101610829A (https=) |
| AU (1) | AU2008215944B2 (https=) |
| BR (1) | BRPI0807585A2 (https=) |
| EA (1) | EA200970762A1 (https=) |
| GB (1) | GB0702837D0 (https=) |
| TW (1) | TW200841925A (https=) |
| WO (1) | WO2008099206A1 (https=) |
| ZA (1) | ZA200904863B (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI123904B (fi) * | 2012-02-24 | 2013-12-13 | Teknologian Tutkimuskeskus Vtt | Menetelmä ja laitteisto pyrolyysinesteen valmistamiseksi |
| GB2513300B (en) * | 2013-04-04 | 2017-10-11 | Edwards Ltd | Vacuum pumping and abatement system |
| GB2540582A (en) * | 2015-07-22 | 2017-01-25 | Edwards Ltd | Apparatus for evacuating a corrosive effluent gas stream from a processing chamber |
| GB2540580A (en) | 2015-07-22 | 2017-01-25 | Edwards Ltd | Liquid ring pump |
| GB2540581A (en) * | 2015-07-22 | 2017-01-25 | Edwards Ltd | Abatement system |
| GB2561899B (en) | 2017-04-28 | 2020-11-04 | Edwards Ltd | Vacuum pumping system |
| US11905955B1 (en) * | 2019-05-01 | 2024-02-20 | Kashiyama Industries, Ltd. | Extending life cycles of vacuum pumps used in manufacturing processes |
| TWI699234B (zh) | 2019-11-21 | 2020-07-21 | 財團法人工業技術研究院 | 微粒捕集裝置 |
| US12515169B2 (en) * | 2020-06-26 | 2026-01-06 | Zimmer, Inc. | Vacuum generation process for deposition of biomedical implant materials |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11333247A (ja) * | 1998-05-28 | 1999-12-07 | Kanken Techno Kk | 半導体製造排ガスの除害方法及び除害装置 |
| WO2002062452A1 (en) * | 2001-01-19 | 2002-08-15 | Abb Gas Technology As | Method and device for processing gases, and use thereof |
| WO2006008521A1 (en) * | 2004-07-22 | 2006-01-26 | The Boc Group Plc | Gas abatement |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR6803024D0 (pt) * | 1967-12-15 | 1973-01-04 | Siemens Ag | Processo para a producao de hidrogenio |
| US4001332A (en) * | 1973-01-13 | 1977-01-04 | Hoechst Aktiengesellschaft | Process for compressing ketene |
| DE2832401C3 (de) * | 1978-07-24 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Flüssigkeitsringpumpenanordnung |
| DE3024352A1 (de) * | 1980-06-27 | 1982-01-21 | Karlheinz 8000 München Geiger | Verfahren und anlage zur gewinnung von brenngas durch ausfaulen organischer stoffe |
| JPH0714451B2 (ja) * | 1988-05-23 | 1995-02-22 | 日本電気株式会社 | 廃ガス処理方法 |
| JPH05154334A (ja) * | 1991-12-11 | 1993-06-22 | Fujitsu Ltd | 半導体製造装置の排気ポンプシステム |
| US5178823A (en) * | 1992-03-12 | 1993-01-12 | Container Products Corp. | Decontamination apparatus |
| US5287589A (en) * | 1992-08-31 | 1994-02-22 | Container Products Corp. | Self-contained cleaning and retrieval apparatus |
| US5817284A (en) * | 1995-10-30 | 1998-10-06 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6083572A (en) * | 1998-02-27 | 2000-07-04 | Hewlett-Packard Company | Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition |
| US6368567B2 (en) * | 1998-10-07 | 2002-04-09 | Applied Materials, Inc. | Point-of-use exhaust by-product reactor |
| GB9902099D0 (en) * | 1999-01-29 | 1999-03-24 | Boc Group Plc | Vacuum pump systems |
| JP3976459B2 (ja) * | 1999-11-18 | 2007-09-19 | 株式会社荏原製作所 | フッ素含有化合物を含む排ガスの処理方法及び装置 |
| JP2001293335A (ja) * | 2000-04-12 | 2001-10-23 | Ebara Corp | フッ素含有化合物を含む排ガスの処理方法 |
| AU2001284325A1 (en) | 2000-08-31 | 2002-03-13 | Barthlo Von_Moltitz Harmse | A method of treating an effluent gas stream, and apparatus for use in such method |
| AU2002303842A1 (en) * | 2001-05-22 | 2002-12-03 | Reflectivity, Inc. | A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants |
| CN100488598C (zh) | 2001-12-04 | 2009-05-20 | 株式会社荏原制作所 | 处理废气的方法和装置 |
| JP2005131509A (ja) * | 2003-10-29 | 2005-05-26 | Unisem Co Ltd | 廃ガス処理処置及び廃ガス処理方法 |
| CA2574188A1 (en) * | 2004-07-16 | 2006-01-26 | Cipla Limited | Anti-histaminic composition |
| JP4218618B2 (ja) * | 2004-09-10 | 2009-02-04 | 株式会社日立製作所 | 排ガス分解処理装置 |
| GB0505852D0 (en) | 2005-03-22 | 2005-04-27 | Boc Group Plc | Method of treating a gas stream |
-
2007
- 2007-02-14 GB GBGB0702837.6A patent/GB0702837D0/en not_active Ceased
-
2008
- 2008-01-23 KR KR1020097016882A patent/KR20090110343A/ko not_active Ceased
- 2008-01-23 AU AU2008215944A patent/AU2008215944B2/en not_active Ceased
- 2008-01-23 US US12/526,485 patent/US8394179B2/en not_active Expired - Fee Related
- 2008-01-23 BR BRPI0807585-9A patent/BRPI0807585A2/pt not_active IP Right Cessation
- 2008-01-23 EP EP08702128A patent/EP2111283A1/en not_active Withdrawn
- 2008-01-23 EA EA200970762A patent/EA200970762A1/ru unknown
- 2008-01-23 CN CNA2008800051909A patent/CN101610829A/zh active Pending
- 2008-01-23 WO PCT/GB2008/050045 patent/WO2008099206A1/en not_active Ceased
- 2008-01-23 JP JP2009549479A patent/JP5264784B2/ja not_active Expired - Fee Related
- 2008-02-12 TW TW097104859A patent/TW200841925A/zh unknown
-
2009
- 2009-07-10 ZA ZA200904863A patent/ZA200904863B/xx unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11333247A (ja) * | 1998-05-28 | 1999-12-07 | Kanken Techno Kk | 半導体製造排ガスの除害方法及び除害装置 |
| WO2002062452A1 (en) * | 2001-01-19 | 2002-08-15 | Abb Gas Technology As | Method and device for processing gases, and use thereof |
| WO2006008521A1 (en) * | 2004-07-22 | 2006-01-26 | The Boc Group Plc | Gas abatement |
Also Published As
| Publication number | Publication date |
|---|---|
| US8394179B2 (en) | 2013-03-12 |
| ZA200904863B (en) | 2010-04-28 |
| AU2008215944A1 (en) | 2008-08-21 |
| EP2111283A1 (en) | 2009-10-28 |
| JP5264784B2 (ja) | 2013-08-14 |
| US20100101414A1 (en) | 2010-04-29 |
| BRPI0807585A2 (pt) | 2014-07-01 |
| GB0702837D0 (en) | 2007-03-28 |
| WO2008099206A1 (en) | 2008-08-21 |
| KR20090110343A (ko) | 2009-10-21 |
| TW200841925A (en) | 2008-11-01 |
| JP2010517769A (ja) | 2010-05-27 |
| CN101610829A (zh) | 2009-12-23 |
| EA200970762A1 (ru) | 2009-12-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2008215944B2 (en) | Method of treating a gas stream | |
| CN107847858B (zh) | 用于排空来自处理室的腐蚀性流出气体流的装置 | |
| KR102066409B1 (ko) | 배기 가스의 감압 제해 장치 | |
| TWI400354B (zh) | 處理氣流的方法 | |
| EP3325133B1 (en) | Abatement system | |
| WO2010054175A2 (en) | Abatement system having enhanced effluent scrub and moisture control | |
| US20100074821A1 (en) | Apparatus and method for treating a gas stream | |
| TWI674921B (zh) | 排氣之減壓除害裝置 | |
| KR102114039B1 (ko) | 증착 공정 가스와 클리닝 가스를 분리 처리하는 하이브리드 스크러버 및 상기 하이브리드 스크러버의 운용 시스템 | |
| TWI669151B (zh) | 排氣之減壓除害方法及其裝置 | |
| JP2013044479A (ja) | 塩化珪素化合物を含む排ガスの浄化方法 | |
| JP2018083140A (ja) | 排ガスの減圧除害方法及びその装置 | |
| WO2006016105A1 (en) | Method and apparatus for purifying a noble gas containing a halogen compound |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FGA | Letters patent sealed or granted (standard patent) | ||
| MK14 | Patent ceased section 143(a) (annual fees not paid) or expired |