CN101610829A - 处理气体物流的方法 - Google Patents
处理气体物流的方法 Download PDFInfo
- Publication number
- CN101610829A CN101610829A CNA2008800051909A CN200880005190A CN101610829A CN 101610829 A CN101610829 A CN 101610829A CN A2008800051909 A CNA2008800051909 A CN A2008800051909A CN 200880005190 A CN200880005190 A CN 200880005190A CN 101610829 A CN101610829 A CN 101610829A
- Authority
- CN
- China
- Prior art keywords
- gas
- gas stream
- pump
- liquid
- equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000007789 gas Substances 0.000 claims abstract description 192
- 239000007788 liquid Substances 0.000 claims abstract description 80
- 238000000197 pyrolysis Methods 0.000 claims abstract description 41
- 239000002737 fuel gas Substances 0.000 claims abstract description 34
- 230000001590 oxidative effect Effects 0.000 claims abstract description 23
- 239000007800 oxidant agent Substances 0.000 claims abstract description 22
- 238000000926 separation method Methods 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 15
- 239000012530 fluid Substances 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000002378 acidificating effect Effects 0.000 claims abstract description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 5
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 238000007599 discharging Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 7
- 230000003197 catalytic effect Effects 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 239000005864 Sulphur Substances 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000002245 particle Substances 0.000 abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- 238000000605 extraction Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000010926 purge Methods 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/10—Oxidants
- B01D2251/11—Air
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0702837.6A GB0702837D0 (en) | 2007-02-14 | 2007-02-14 | Method of treating a gas stream |
| GB0702837.6 | 2007-02-14 | ||
| PCT/GB2008/050045 WO2008099206A1 (en) | 2007-02-14 | 2008-01-23 | Method of treating a gas stream |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101610829A true CN101610829A (zh) | 2009-12-23 |
Family
ID=37908602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008800051909A Pending CN101610829A (zh) | 2007-02-14 | 2008-01-23 | 处理气体物流的方法 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8394179B2 (https=) |
| EP (1) | EP2111283A1 (https=) |
| JP (1) | JP5264784B2 (https=) |
| KR (1) | KR20090110343A (https=) |
| CN (1) | CN101610829A (https=) |
| AU (1) | AU2008215944B2 (https=) |
| BR (1) | BRPI0807585A2 (https=) |
| EA (1) | EA200970762A1 (https=) |
| GB (1) | GB0702837D0 (https=) |
| TW (1) | TW200841925A (https=) |
| WO (1) | WO2008099206A1 (https=) |
| ZA (1) | ZA200904863B (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107847858A (zh) * | 2015-07-22 | 2018-03-27 | 爱德华兹有限公司 | 用于排空来自处理室的腐蚀性流出气体流的装置 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI123904B (fi) * | 2012-02-24 | 2013-12-13 | Teknologian Tutkimuskeskus Vtt | Menetelmä ja laitteisto pyrolyysinesteen valmistamiseksi |
| GB2513300B (en) * | 2013-04-04 | 2017-10-11 | Edwards Ltd | Vacuum pumping and abatement system |
| GB2540580A (en) | 2015-07-22 | 2017-01-25 | Edwards Ltd | Liquid ring pump |
| GB2540581A (en) * | 2015-07-22 | 2017-01-25 | Edwards Ltd | Abatement system |
| GB2561899B (en) | 2017-04-28 | 2020-11-04 | Edwards Ltd | Vacuum pumping system |
| US11905955B1 (en) * | 2019-05-01 | 2024-02-20 | Kashiyama Industries, Ltd. | Extending life cycles of vacuum pumps used in manufacturing processes |
| TWI699234B (zh) | 2019-11-21 | 2020-07-21 | 財團法人工業技術研究院 | 微粒捕集裝置 |
| US12515169B2 (en) * | 2020-06-26 | 2026-01-06 | Zimmer, Inc. | Vacuum generation process for deposition of biomedical implant materials |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR6803024D0 (pt) * | 1967-12-15 | 1973-01-04 | Siemens Ag | Processo para a producao de hidrogenio |
| US4001332A (en) * | 1973-01-13 | 1977-01-04 | Hoechst Aktiengesellschaft | Process for compressing ketene |
| DE2832401C3 (de) * | 1978-07-24 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Flüssigkeitsringpumpenanordnung |
| DE3024352A1 (de) * | 1980-06-27 | 1982-01-21 | Karlheinz 8000 München Geiger | Verfahren und anlage zur gewinnung von brenngas durch ausfaulen organischer stoffe |
| JPH0714451B2 (ja) * | 1988-05-23 | 1995-02-22 | 日本電気株式会社 | 廃ガス処理方法 |
| JPH05154334A (ja) * | 1991-12-11 | 1993-06-22 | Fujitsu Ltd | 半導体製造装置の排気ポンプシステム |
| US5178823A (en) * | 1992-03-12 | 1993-01-12 | Container Products Corp. | Decontamination apparatus |
| US5287589A (en) * | 1992-08-31 | 1994-02-22 | Container Products Corp. | Self-contained cleaning and retrieval apparatus |
| US5817284A (en) * | 1995-10-30 | 1998-10-06 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6083572A (en) * | 1998-02-27 | 2000-07-04 | Hewlett-Packard Company | Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition |
| JP3866412B2 (ja) * | 1998-05-28 | 2007-01-10 | カンケンテクノ株式会社 | 半導体製造排ガスの除害方法及び除害装置 |
| US6368567B2 (en) * | 1998-10-07 | 2002-04-09 | Applied Materials, Inc. | Point-of-use exhaust by-product reactor |
| GB9902099D0 (en) * | 1999-01-29 | 1999-03-24 | Boc Group Plc | Vacuum pump systems |
| JP3976459B2 (ja) * | 1999-11-18 | 2007-09-19 | 株式会社荏原製作所 | フッ素含有化合物を含む排ガスの処理方法及び装置 |
| JP2001293335A (ja) * | 2000-04-12 | 2001-10-23 | Ebara Corp | フッ素含有化合物を含む排ガスの処理方法 |
| AU2001284325A1 (en) | 2000-08-31 | 2002-03-13 | Barthlo Von_Moltitz Harmse | A method of treating an effluent gas stream, and apparatus for use in such method |
| NO20010345L (no) * | 2001-01-19 | 2002-07-22 | Abb Gas Technology As | Fremgangsmåte og anordning til behandling av gasser, samt anvendelse derav |
| AU2002303842A1 (en) * | 2001-05-22 | 2002-12-03 | Reflectivity, Inc. | A method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants |
| CN100488598C (zh) | 2001-12-04 | 2009-05-20 | 株式会社荏原制作所 | 处理废气的方法和装置 |
| JP2005131509A (ja) * | 2003-10-29 | 2005-05-26 | Unisem Co Ltd | 廃ガス処理処置及び廃ガス処理方法 |
| CA2574188A1 (en) * | 2004-07-16 | 2006-01-26 | Cipla Limited | Anti-histaminic composition |
| GB0416385D0 (en) * | 2004-07-22 | 2004-08-25 | Boc Group Plc | Gas abatement |
| JP4218618B2 (ja) * | 2004-09-10 | 2009-02-04 | 株式会社日立製作所 | 排ガス分解処理装置 |
| GB0505852D0 (en) | 2005-03-22 | 2005-04-27 | Boc Group Plc | Method of treating a gas stream |
-
2007
- 2007-02-14 GB GBGB0702837.6A patent/GB0702837D0/en not_active Ceased
-
2008
- 2008-01-23 KR KR1020097016882A patent/KR20090110343A/ko not_active Ceased
- 2008-01-23 AU AU2008215944A patent/AU2008215944B2/en not_active Ceased
- 2008-01-23 US US12/526,485 patent/US8394179B2/en not_active Expired - Fee Related
- 2008-01-23 BR BRPI0807585-9A patent/BRPI0807585A2/pt not_active IP Right Cessation
- 2008-01-23 EP EP08702128A patent/EP2111283A1/en not_active Withdrawn
- 2008-01-23 EA EA200970762A patent/EA200970762A1/ru unknown
- 2008-01-23 CN CNA2008800051909A patent/CN101610829A/zh active Pending
- 2008-01-23 WO PCT/GB2008/050045 patent/WO2008099206A1/en not_active Ceased
- 2008-01-23 JP JP2009549479A patent/JP5264784B2/ja not_active Expired - Fee Related
- 2008-02-12 TW TW097104859A patent/TW200841925A/zh unknown
-
2009
- 2009-07-10 ZA ZA200904863A patent/ZA200904863B/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107847858A (zh) * | 2015-07-22 | 2018-03-27 | 爱德华兹有限公司 | 用于排空来自处理室的腐蚀性流出气体流的装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8394179B2 (en) | 2013-03-12 |
| ZA200904863B (en) | 2010-04-28 |
| AU2008215944A1 (en) | 2008-08-21 |
| AU2008215944B2 (en) | 2012-05-10 |
| EP2111283A1 (en) | 2009-10-28 |
| JP5264784B2 (ja) | 2013-08-14 |
| US20100101414A1 (en) | 2010-04-29 |
| BRPI0807585A2 (pt) | 2014-07-01 |
| GB0702837D0 (en) | 2007-03-28 |
| WO2008099206A1 (en) | 2008-08-21 |
| KR20090110343A (ko) | 2009-10-21 |
| TW200841925A (en) | 2008-11-01 |
| JP2010517769A (ja) | 2010-05-27 |
| EA200970762A1 (ru) | 2009-12-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20091223 |