JP2010514089A5 - - Google Patents

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Publication number
JP2010514089A5
JP2010514089A5 JP2009543093A JP2009543093A JP2010514089A5 JP 2010514089 A5 JP2010514089 A5 JP 2010514089A5 JP 2009543093 A JP2009543093 A JP 2009543093A JP 2009543093 A JP2009543093 A JP 2009543093A JP 2010514089 A5 JP2010514089 A5 JP 2010514089A5
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JP
Japan
Prior art keywords
voltage
line
word line
threshold voltage
ranges
Prior art date
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Application number
JP2009543093A
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English (en)
Japanese (ja)
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JP2010514089A (ja
JP5166442B2 (ja
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Publication date
Priority claimed from US11/614,879 external-priority patent/US7944749B2/en
Priority claimed from US11/614,884 external-priority patent/US7623389B2/en
Application filed filed Critical
Priority claimed from PCT/US2007/087481 external-priority patent/WO2008079725A2/en
Publication of JP2010514089A publication Critical patent/JP2010514089A/ja
Publication of JP2010514089A5 publication Critical patent/JP2010514089A5/ja
Application granted granted Critical
Publication of JP5166442B2 publication Critical patent/JP5166442B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009543093A 2006-12-21 2007-12-13 不揮発性メモリセルの低電圧プログラミングの方法およびシステム Expired - Fee Related JP5166442B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/614,879 US7944749B2 (en) 2006-12-21 2006-12-21 Method of low voltage programming of non-volatile memory cells
US11/614,884 US7623389B2 (en) 2006-12-21 2006-12-21 System for low voltage programming of non-volatile memory cells
US11/614,879 2006-12-21
US11/614,884 2006-12-21
PCT/US2007/087481 WO2008079725A2 (en) 2006-12-21 2007-12-13 Method and system of low voltage programming of non-volatile memory cells

Publications (3)

Publication Number Publication Date
JP2010514089A JP2010514089A (ja) 2010-04-30
JP2010514089A5 true JP2010514089A5 (enExample) 2011-01-27
JP5166442B2 JP5166442B2 (ja) 2013-03-21

Family

ID=39462459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009543093A Expired - Fee Related JP5166442B2 (ja) 2006-12-21 2007-12-13 不揮発性メモリセルの低電圧プログラミングの方法およびシステム

Country Status (5)

Country Link
EP (1) EP2102868B1 (enExample)
JP (1) JP5166442B2 (enExample)
KR (1) KR101402076B1 (enExample)
TW (1) TWI412040B (enExample)
WO (1) WO2008079725A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5657063B2 (ja) * 2013-07-01 2015-01-21 ウィンボンド エレクトロニクス コーポレーション 半導体記憶装置
US10332593B2 (en) * 2015-09-14 2019-06-25 Toshiba Memory Corporation Semiconductor memory device configured to sense memory cell threshold voltages in ascending order
US10707226B1 (en) * 2019-06-26 2020-07-07 Sandisk Technologies Llc Source side program, method, and apparatus for 3D NAND

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002056316A1 (en) * 2001-01-12 2002-07-18 Hitachi, Ltd. Nonvolatile semiconductor storage device
US6522585B2 (en) 2001-05-25 2003-02-18 Sandisk Corporation Dual-cell soft programming for virtual-ground memory arrays
KR100454117B1 (ko) 2001-10-22 2004-10-26 삼성전자주식회사 소노스 게이트 구조를 갖는 낸드형 비휘발성 메모리소자의구동방법
KR100502412B1 (ko) * 2002-10-23 2005-07-19 삼성전자주식회사 불 휘발성 반도체 메모리 장치 및 그것의 프로그램 방법
US6822909B1 (en) * 2003-04-24 2004-11-23 Advanced Micro Devices, Inc. Method of controlling program threshold voltage distribution of a dual cell memory device
US7057940B2 (en) 2003-08-19 2006-06-06 Powerchip Semiconductor Corp. Flash memory cell, flash memory cell array and manufacturing method thereof
KR100642187B1 (ko) * 2003-09-08 2006-11-10 가부시끼가이샤 도시바 불휘발성 반도체 기억 장치, 전자 카드 및 전자 장치
US7002843B2 (en) 2004-01-27 2006-02-21 Sandisk Corporation Variable current sinking for coarse/fine programming of non-volatile memory
US20060017085A1 (en) * 2004-07-26 2006-01-26 Prateep Tuntasood NAND flash memory with densely packed memory gates and fabrication process
JP4902972B2 (ja) * 2005-07-15 2012-03-21 ルネサスエレクトロニクス株式会社 不揮発性記憶素子の制御方法
JP2007058964A (ja) * 2005-08-23 2007-03-08 Renesas Technology Corp 不揮発性半導体記憶装置

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