JP2010511857A - X線用のビームフィルタ - Google Patents
X線用のビームフィルタ Download PDFInfo
- Publication number
- JP2010511857A JP2010511857A JP2009538845A JP2009538845A JP2010511857A JP 2010511857 A JP2010511857 A JP 2010511857A JP 2009538845 A JP2009538845 A JP 2009538845A JP 2009538845 A JP2009538845 A JP 2009538845A JP 2010511857 A JP2010511857 A JP 2010511857A
- Authority
- JP
- Japan
- Prior art keywords
- beam filter
- radiation
- radiation source
- filter according
- absorber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 claims abstract description 71
- 238000001514 detection method Methods 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000010521 absorption reaction Methods 0.000 claims abstract description 16
- 239000006096 absorbing agent Substances 0.000 claims description 24
- 238000001228 spectrum Methods 0.000 claims description 15
- 125000006850 spacer group Chemical group 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 230000000873 masking effect Effects 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 239000011133 lead Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 238000003780 insertion Methods 0.000 claims description 2
- 230000037431 insertion Effects 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 230000002745 absorbent Effects 0.000 abstract description 34
- 239000002250 absorbent Substances 0.000 abstract description 34
- 230000003595 spectral effect Effects 0.000 abstract description 13
- 239000000203 mixture Substances 0.000 abstract description 5
- 238000005452 bending Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000011358 absorbing material Substances 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000006261 foam material Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Optical Filters (AREA)
- Materials For Medical Uses (AREA)
Abstract
Description
−スペーサーシート112の厚さに対し(シート面に対し垂直に測定される)高い吸収性のシート111の厚さを変更すること、
−スタック100全体を傾けること、
−前記吸収シート111の適切な変形
により変更されることができる。
Claims (10)
- 放射線源、特にX線源と検出領域との間に挿入するためのビームフィルタであり、
前記ビームフィルタが働く位置において、前記検出領域の異なる点にある前記放射線源の放射線放出領域の異なる小部分をマスキングする少なくとも1つの吸収体を有するビームフィルタ。 - 前記放射線源により放出された放射線の全スペクトルにわたり高い吸収性を持つ材料、好ましくは高い原子番号を持つ材料、最も好ましくはモリブデン、タングステン、金、鉛、プラチナ、タンタル及びレニウムからなる集合から選択される材料を有することを特徴とする請求項1に記載のビームフィルタ。
- 吸収シートとして成形され、スタック内において中間領域と一緒に配される複数の前記吸収体を有することを特徴とする請求項1に記載のビームフィルタ。
- 前記中間領域は、前記吸収シートの材料、特にポリマーよりもかなり低い前記放射線源の放射線に対する減衰係数を持つスペーサー材料で充填されることを特徴とする請求項3に記載のビームフィルタ。
- 前記吸収シートは、少なくとも1つの共通点で交差する平面にあることを特徴とする請求項3に記載のビームフィルタ。
- 少なくとも1つの吸収シートは、所与の点に対し半径方向に測定されるように変動する幅を持つことを特徴とする請求項3に記載のビームフィルタ。
- 前記幅は、前記吸収シートの中心領域において最小値を取ることを特徴とする請求項6に記載のビームフィルタ。
- 前記吸収シートは、変動する厚さを持つことを特徴とする請求項3に記載のビームフィルタ。
- 前記第1の吸収体に対し移動可能であり、前記放射線源から前記検出領域の方向に見たとき、前記第1の吸収体と一列に配される第2の吸収体を有することを特徴とする請求項1に記載のビームフィルタ。
- 請求項1に記載の放射線源及びビームフィルタを有する、特にCTスキャナであるX線装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06125335.7 | 2006-12-04 | ||
EP06125335 | 2006-12-04 | ||
PCT/IB2007/054865 WO2008068690A2 (en) | 2006-12-04 | 2007-11-30 | Beam filter, particularly for x-rays, that does not change the beam's spectral composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010511857A true JP2010511857A (ja) | 2010-04-15 |
JP5355413B2 JP5355413B2 (ja) | 2013-11-27 |
Family
ID=39433004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009538845A Expired - Fee Related JP5355413B2 (ja) | 2006-12-04 | 2007-11-30 | X線用のビームフィルタ及びビームフィルタを有するx線装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8031840B2 (ja) |
EP (1) | EP2102871B1 (ja) |
JP (1) | JP5355413B2 (ja) |
CN (1) | CN101548339B (ja) |
AT (1) | ATE495529T1 (ja) |
DE (1) | DE602007011985D1 (ja) |
WO (1) | WO2008068690A2 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011110223A (ja) * | 2009-11-27 | 2011-06-09 | Ge Medical Systems Global Technology Co Llc | ビーム形成x線フィルタおよびこれを使ったx線ct装置 |
US8263954B2 (en) | 2010-11-16 | 2012-09-11 | Mitsubishi Electric Corporation | Bolus, bolus manufacturing method, particle beam therapy system, and treatment planning apparatus |
WO2012174246A2 (en) * | 2011-06-17 | 2012-12-20 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
JP2014520363A (ja) * | 2011-06-06 | 2014-08-21 | コーニンクレッカ フィリップス エヌ ヴェ | 複数の焦点スポットx線放射線フィルタリング |
US9414792B2 (en) | 2011-06-17 | 2016-08-16 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
US9521982B2 (en) | 2011-06-17 | 2016-12-20 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4911373B2 (ja) | 2009-11-26 | 2012-04-04 | 横河電機株式会社 | X線測定装置 |
EP2677935A1 (en) | 2011-02-22 | 2014-01-01 | Koninklijke Philips N.V. | Detection apparatus |
DE102011006421A1 (de) * | 2011-03-30 | 2012-10-04 | Siemens Aktiengesellschaft | Digitaler Röntgendetektor |
US9357973B2 (en) * | 2011-06-30 | 2016-06-07 | Koninklijke Philips N.V. | X-ray beam transmission profile shaper |
WO2014087283A1 (en) * | 2012-12-03 | 2014-06-12 | Koninklijke Philips N.V. | Translating x-ray beam transmission profile shaper |
US9775572B2 (en) * | 2012-12-05 | 2017-10-03 | Koninklijke Philips N.V. | Radiation beam intensity profile shaper |
GB201308876D0 (en) | 2013-05-16 | 2013-07-03 | Ibex Innovations Ltd | X-Ray imaging apparatus and methods |
GB201308818D0 (en) | 2013-05-16 | 2013-07-03 | Ibex Innovations Ltd | X-ray detector apparatus |
GB201308851D0 (en) | 2013-05-16 | 2013-07-03 | Ibex Innovations Ltd | Multi-spectral x-ray detection apparatus |
KR102171020B1 (ko) | 2013-10-16 | 2020-10-29 | 삼성전자주식회사 | 엑스레이 흡수 필터를 갖는 엑스레이 시스템, 반도체 패키지, 및 트레이 |
CN105916443B (zh) * | 2014-01-14 | 2022-03-22 | 皇家飞利浦有限公司 | 用于x射线成像装置的具有衰减元件的x射线发射设备 |
WO2016062504A1 (en) * | 2014-10-21 | 2016-04-28 | Koninklijke Philips N.V. | Dynamic beam shaper |
CN107810538B (zh) * | 2015-06-29 | 2021-11-02 | 皇家飞利浦有限公司 | 用于生成和准直x射线束的系统 |
RU168369U1 (ru) * | 2016-03-31 | 2017-01-30 | Общество с ограниченной ответственностью Совместное русско-французское предприятие "СпектрАп" | Рентгеновский фильтр |
EP3509492B1 (en) * | 2016-09-08 | 2021-12-15 | Koninklijke Philips N.V. | Source grating for x-ray imaging |
WO2020097800A1 (zh) * | 2018-11-13 | 2020-05-22 | 西安大医集团有限公司 | 滤光器、放射线扫描装置及放射线扫描方法 |
EP3834731A1 (en) * | 2019-12-12 | 2021-06-16 | Koninklijke Philips N.V. | Combined k-edge filters for dose reduction in x-ray imaging |
Citations (5)
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JPH05281159A (ja) * | 1992-02-06 | 1993-10-29 | Philips Gloeilampenfab:Nv | 弾性的散乱x線量のパルス伝送スペクトルを測定する装置 |
EP1045398A2 (en) * | 1999-04-12 | 2000-10-18 | General Electric Company | Radiation imager collimator |
EP1182671A2 (en) * | 2000-08-24 | 2002-02-27 | General Electric Company | X-ray anti-scatter grid |
JP2005121865A (ja) * | 2003-10-16 | 2005-05-12 | New Industry Research Organization | 三次元微細構造体加工用x線マスク及びその製造方法 |
WO2005087106A1 (en) * | 2004-03-10 | 2005-09-22 | Philips Intellectual Property & Standards Gmbh | Focused coherent-scatter computer tomography |
Family Cites Families (11)
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DE9017465U1 (de) * | 1990-12-24 | 1991-04-04 | Transformatoren- und Röntgenwerk GmbH i.L., 01139 Dresden | Einrichtung zur Herstellung streustrahlenarmer Röntgenbilder |
DE4222227A1 (de) * | 1992-07-07 | 1994-01-13 | Philips Patentverwaltung | Anordnung zum Messen des Impulsübertragsspektrums von elastisch gestreuten Röntgenquanten |
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EP1277214A1 (en) | 2000-04-17 | 2003-01-22 | Koninklijke Philips Electronics N.V. | X-ray apparatus provided with a filter with a dynamically adjustable absorption |
DE10154461B4 (de) * | 2001-11-08 | 2005-12-15 | Siemens Ag | Vorrichtung zum Filtern eines Strahlenbündels |
JP4041025B2 (ja) | 2003-07-15 | 2008-01-30 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | X線分布調整フィルタ装置およびそれを用いたx線ct装置 |
US6990171B2 (en) * | 2003-10-27 | 2006-01-24 | General Electric Company | System and method of determining a user-defined region-of-interest of an imaging subject for x-ray flux management control |
CN2824991Y (zh) * | 2005-10-10 | 2006-10-11 | 姚毅 | 肿瘤放射治疗用的高分辨率多叶光栅 |
-
2007
- 2007-11-30 US US12/517,262 patent/US8031840B2/en active Active
- 2007-11-30 DE DE602007011985T patent/DE602007011985D1/de active Active
- 2007-11-30 CN CN2007800446858A patent/CN101548339B/zh active Active
- 2007-11-30 EP EP07827089A patent/EP2102871B1/en not_active Not-in-force
- 2007-11-30 WO PCT/IB2007/054865 patent/WO2008068690A2/en active Application Filing
- 2007-11-30 JP JP2009538845A patent/JP5355413B2/ja not_active Expired - Fee Related
- 2007-11-30 AT AT07827089T patent/ATE495529T1/de not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH05281159A (ja) * | 1992-02-06 | 1993-10-29 | Philips Gloeilampenfab:Nv | 弾性的散乱x線量のパルス伝送スペクトルを測定する装置 |
EP1045398A2 (en) * | 1999-04-12 | 2000-10-18 | General Electric Company | Radiation imager collimator |
EP1182671A2 (en) * | 2000-08-24 | 2002-02-27 | General Electric Company | X-ray anti-scatter grid |
JP2005121865A (ja) * | 2003-10-16 | 2005-05-12 | New Industry Research Organization | 三次元微細構造体加工用x線マスク及びその製造方法 |
WO2005087106A1 (en) * | 2004-03-10 | 2005-09-22 | Philips Intellectual Property & Standards Gmbh | Focused coherent-scatter computer tomography |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011110223A (ja) * | 2009-11-27 | 2011-06-09 | Ge Medical Systems Global Technology Co Llc | ビーム形成x線フィルタおよびこれを使ったx線ct装置 |
US8263954B2 (en) | 2010-11-16 | 2012-09-11 | Mitsubishi Electric Corporation | Bolus, bolus manufacturing method, particle beam therapy system, and treatment planning apparatus |
JP2014520363A (ja) * | 2011-06-06 | 2014-08-21 | コーニンクレッカ フィリップス エヌ ヴェ | 複数の焦点スポットx線放射線フィルタリング |
WO2012174246A2 (en) * | 2011-06-17 | 2012-12-20 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
WO2012174246A3 (en) * | 2011-06-17 | 2013-06-13 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
US9414792B2 (en) | 2011-06-17 | 2016-08-16 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
US9521982B2 (en) | 2011-06-17 | 2016-12-20 | The Board Of Trustees Of The Leland Stanford Junior University | Computed tomography system with dynamic bowtie filter |
Also Published As
Publication number | Publication date |
---|---|
WO2008068690A2 (en) | 2008-06-12 |
WO2008068690A3 (en) | 2008-08-14 |
US8031840B2 (en) | 2011-10-04 |
JP5355413B2 (ja) | 2013-11-27 |
DE602007011985D1 (de) | 2011-02-24 |
CN101548339B (zh) | 2012-06-20 |
EP2102871B1 (en) | 2011-01-12 |
EP2102871A2 (en) | 2009-09-23 |
US20100074393A1 (en) | 2010-03-25 |
ATE495529T1 (de) | 2011-01-15 |
CN101548339A (zh) | 2009-09-30 |
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