JP2010505977A - フェニルグリオキシレート型の光開始剤を含む光硬化性組成物 - Google Patents

フェニルグリオキシレート型の光開始剤を含む光硬化性組成物 Download PDF

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Publication number
JP2010505977A
JP2010505977A JP2009530842A JP2009530842A JP2010505977A JP 2010505977 A JP2010505977 A JP 2010505977A JP 2009530842 A JP2009530842 A JP 2009530842A JP 2009530842 A JP2009530842 A JP 2009530842A JP 2010505977 A JP2010505977 A JP 2010505977A
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JP
Japan
Prior art keywords
alkyl
phenyl
substituted
optionally
optionally substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2009530842A
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English (en)
Japanese (ja)
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JP2010505977A5 (enExample
Inventor
ロジャース，ジョナサン
ベンコフ，ヨハネス
パウエル，カーリン
ユング，トゥニヤ
ディートリカー，クルト
ハヨ，パスカル
ビルボーム，ジャン−リュク
ヴォーゲル，トーマス
ヒュースラー，リナルド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2010505977A publication Critical patent/JP2010505977A/ja
Publication of JP2010505977A5 publication Critical patent/JP2010505977A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/76—Unsaturated compounds containing keto groups
    • C07C59/90—Unsaturated compounds containing keto groups containing singly bound oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/10—Systems containing only non-condensed rings with a five-membered ring the ring being unsaturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2009530842A 2006-10-03 2007-09-24 フェニルグリオキシレート型の光開始剤を含む光硬化性組成物 Pending JP2010505977A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06121655 2006-10-03
PCT/EP2007/060093 WO2008040650A2 (en) 2006-10-03 2007-09-24 Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type

Publications (2)

Publication Number Publication Date
JP2010505977A true JP2010505977A (ja) 2010-02-25
JP2010505977A5 JP2010505977A5 (enExample) 2010-11-11

Family

ID=37642478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009530842A Pending JP2010505977A (ja) 2006-10-03 2007-09-24 フェニルグリオキシレート型の光開始剤を含む光硬化性組成物

Country Status (5)

Country Link
US (1) US20100022676A1 (enExample)
EP (1) EP2069866A2 (enExample)
JP (1) JP2010505977A (enExample)
CN (1) CN101523289A (enExample)
WO (1) WO2008040650A2 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014534A (ja) * 2011-07-04 2013-01-24 Daicel Corp ベンゾイルギ酸化合物、及びその製造方法
JP2013241006A (ja) * 2012-05-17 2013-12-05 Xerox Corp デジタルオフセット印刷適用のためのインク
KR20200107879A (ko) * 2019-03-08 2020-09-16 조병묵 낚시용 축광 도료 조성물
JP2020532567A (ja) * 2017-09-06 2020-11-12 常州強力電子新材料股▲分▼有限公司ＣＨＡＮＧＺＨＯＵ ＴＲＯＮＬＹ ＮＥＷ ＥＬＥＣＴＲＯＮＩＣ ＭＡＴＥＲＩＡＬＳ Ｃｏ．， Ｌｔｄ． スルホニウム塩光開始剤、その製造方法、それを含む光硬化性組成物及びその適用
JP2023502311A (ja) * 2019-10-11 2023-01-24 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ Ｌｅｄ光硬化用のクマリングリオキシレート

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US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
DK2388239T3 (da) 2010-05-20 2017-04-24 Draka Comteq Bv Hærdningsapparat, der anvender vinklede UV-LED'er
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
CN102442909B (zh) * 2010-06-25 2013-10-30 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
CN102002022B (zh) * 2010-10-29 2013-05-08 苏州凯康化工科技有限公司 一种月桂酸改性环氧丙烯酸酯及其制备方法和应用
CN102746785B (zh) * 2011-04-19 2014-12-17 比亚迪股份有限公司 一种双重固化涂料组合物及其固化方法
ITVA20120010A1 (it) * 2012-05-03 2013-11-04 Lamberti Spa Alfa-dichetoni per fotopolimerizzazioni tramite led
ITVA20120041A1 (it) * 2012-10-22 2014-04-23 Lamberti Spa 3-chetocumarine per fotopolimerizzazioni tramite led
US8916334B2 (en) 2013-01-28 2014-12-23 Hewlett-Packard Development Company, L.P. Micro-composite material for three-dimensional printing
DE102014103923A1 (de) * 2013-04-05 2014-10-09 Fischerwerke Gmbh & Co. Kg Kunstharz-Verklebungsmittel mit biogenen reaktiven Verdünnern und Harzen
KR101391225B1 (ko) * 2013-09-05 2014-05-07 동우 화인켐 주식회사 비표시부 차광 패턴 형성용 감광성 수지 조성물
US9422436B2 (en) * 2014-01-13 2016-08-23 Xerox Corporation Methods for producing inks
MX2016016633A (es) 2014-06-23 2017-06-06 Carbon Inc Resinas de poliuretano que tienen multiples mecanismos de endurecimiento para usarse en la produccion de objetos tridimensionales.
CN105517648B (zh) 2014-12-10 2017-06-20 互应化学工业株式会社 液体阻焊剂组合物和被覆印刷线路板
DE102015121562B4 (de) * 2015-12-10 2021-05-06 Coroplast Fritz Müller Gmbh & Co. Kg Hochtemperaturbeständiges farbiges, insbesondere orangefarbiges, Klebeband, Verfahren zu seiner Herstellung, Verwendung eines Trägers zu seiner Herstellung sowie Verwendung des Klebebandes zur Herstellung von Kabelbäumen
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
CN107239002B (zh) * 2017-07-07 2019-12-06 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN109503735A (zh) * 2017-09-15 2019-03-22 常州强力先端电子材料有限公司 光引发剂、包含其的光固化组合物及其应用
CN111433268B (zh) 2017-11-29 2022-07-05 康宁股份有限公司 高度负载的无机填充的水性树脂体系
EP3597669A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
EP3597668A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
CN110804337A (zh) * 2019-11-06 2020-02-18 甘肃天后光学科技有限公司 隐形眼镜彩色油墨、所用光亮剂及其制备方法
DE102022000134A1 (de) 2022-01-15 2023-07-20 Polystal Composites Gmbh Verfahren zur Härtung eines Glasfasercompositmaterials
CN117865923A (zh) * 2024-01-08 2024-04-12 湖北固润科技股份有限公司 甲酰甲酸香豆素化合物、其制备方法和用途以及包含其的光引发剂组合物和可光固化组合物
CN120865455A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光固化组合物及其应用
CN120865125A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光引发剂及其制备方法和应用

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014534A (ja) * 2011-07-04 2013-01-24 Daicel Corp ベンゾイルギ酸化合物、及びその製造方法
JP2013241006A (ja) * 2012-05-17 2013-12-05 Xerox Corp デジタルオフセット印刷適用のためのインク
JP2020532567A (ja) * 2017-09-06 2020-11-12 常州強力電子新材料股▲分▼有限公司ＣＨＡＮＧＺＨＯＵ ＴＲＯＮＬＹ ＮＥＷ ＥＬＥＣＴＲＯＮＩＣ ＭＡＴＥＲＩＡＬＳ Ｃｏ．， Ｌｔｄ． スルホニウム塩光開始剤、その製造方法、それを含む光硬化性組成物及びその適用
JP7025531B2 (ja) 2017-09-06 2022-02-24 常州強力電子新材料股▲分▼有限公司 スルホニウム塩光開始剤、その製造方法、それを含む光硬化性組成物及びその適用
US11535590B2 (en) 2017-09-06 2022-12-27 Changzhou Tronly New Electronic Materials Co., Ltd. Sulfonium salt photoinitiator, preparation method therefor, photocurable composition comprising sulfonium salt photoinitiator, and use thereof
KR20200107879A (ko) * 2019-03-08 2020-09-16 조병묵 낚시용 축광 도료 조성물
KR102406534B1 (ko) * 2019-03-08 2022-06-07 조병묵 낚시용 축광 도료 조성물
JP2023502311A (ja) * 2019-10-11 2023-01-24 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ Ｌｅｄ光硬化用のクマリングリオキシレート
JP7697458B2 (ja) 2019-10-11 2025-06-24 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ Ｌｅｄ光硬化用のクマリングリオキシレート

Also Published As

Publication number Publication date
CN101523289A (zh) 2009-09-02
EP2069866A2 (en) 2009-06-17
US20100022676A1 (en) 2010-01-28
WO2008040650A2 (en) 2008-04-10
WO2008040650A3 (en) 2009-01-08

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