JP2010505735A5 - - Google Patents
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- Publication number
- JP2010505735A5 JP2010505735A5 JP2009531812A JP2009531812A JP2010505735A5 JP 2010505735 A5 JP2010505735 A5 JP 2010505735A5 JP 2009531812 A JP2009531812 A JP 2009531812A JP 2009531812 A JP2009531812 A JP 2009531812A JP 2010505735 A5 JP2010505735 A5 JP 2010505735A5
- Authority
- JP
- Japan
- Prior art keywords
- suspension
- suspension according
- cerium
- solution
- average size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000725 suspension Substances 0.000 claims description 28
- 239000011164 primary particle Substances 0.000 claims description 8
- 239000000843 powder Substances 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims 11
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 11
- 238000000034 method Methods 0.000 claims 10
- 239000011163 secondary particle Substances 0.000 claims 7
- 239000000243 solution Substances 0.000 claims 6
- 239000007791 liquid phase Substances 0.000 claims 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 3
- 239000006185 dispersion Substances 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 3
- 229910002651 NO3 Inorganic materials 0.000 claims 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims 2
- 230000001747 exhibiting effect Effects 0.000 claims 2
- -1 nitrate ions Chemical class 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims 2
- 230000020477 pH reduction Effects 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 239000002244 precipitate Substances 0.000 claims 2
- 239000012266 salt solution Substances 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- 238000005406 washing Methods 0.000 claims 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0608838 | 2006-10-09 | ||
| FR0608838A FR2906800B1 (fr) | 2006-10-09 | 2006-10-09 | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage |
| PCT/EP2007/060549 WO2008043703A2 (fr) | 2006-10-09 | 2007-10-04 | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010505735A JP2010505735A (ja) | 2010-02-25 |
| JP2010505735A5 true JP2010505735A5 (https=) | 2014-03-13 |
| JP5586229B2 JP5586229B2 (ja) | 2014-09-10 |
Family
ID=38158014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009531812A Active JP5586229B2 (ja) | 2006-10-09 | 2007-10-04 | 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8317888B2 (https=) |
| EP (1) | EP2081871B1 (https=) |
| JP (1) | JP5586229B2 (https=) |
| KR (4) | KR20130045954A (https=) |
| CN (2) | CN102627310B (https=) |
| ES (1) | ES2628504T3 (https=) |
| FR (1) | FR2906800B1 (https=) |
| TW (1) | TWI367863B (https=) |
| WO (1) | WO2008043703A2 (https=) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009077412A2 (en) * | 2007-12-14 | 2009-06-25 | Akzo Nobel N.V. | Aqueous slurry comprising inorganic oxygen-containing particulates |
| KR101216373B1 (ko) * | 2008-02-12 | 2012-12-28 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 세리아 재료 및 그 형성 방법 |
| FR2935145B1 (fr) * | 2008-08-22 | 2010-09-03 | Rhodia Operations | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utlisation dans le polissage |
| JP5499556B2 (ja) * | 2008-11-11 | 2014-05-21 | 日立化成株式会社 | スラリ及び研磨液セット並びにこれらから得られるｃｍｐ研磨液を用いた基板の研磨方法及び基板 |
| JP5317118B2 (ja) * | 2009-07-29 | 2013-10-16 | 花王株式会社 | ポリフェノールの定量法 |
| KR101075966B1 (ko) | 2010-03-09 | 2011-10-21 | 주식회사 엘지화학 | 결정성 산화세륨 및 이의 제조 방법 |
| JP5582187B2 (ja) | 2010-03-12 | 2014-09-03 | 日立化成株式会社 | スラリ、研磨液セット、研磨液及びこれらを用いた基板の研磨方法 |
| KR101886892B1 (ko) | 2010-11-22 | 2018-08-08 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판 |
| US9988573B2 (en) | 2010-11-22 | 2018-06-05 | Hitachi Chemical Company, Ltd. | Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate |
| JP6044629B2 (ja) | 2012-02-21 | 2016-12-14 | 日立化成株式会社 | 研磨剤、研磨剤セット及び基体の研磨方法 |
| SG10201606827RA (en) | 2012-02-21 | 2016-10-28 | Hitachi Chemical Co Ltd | Polishing agent, polishing agent set, and substrate polishing method |
| JP5943073B2 (ja) * | 2012-05-22 | 2016-06-29 | 日立化成株式会社 | スラリー、研磨液セット、研磨液及び基体の研磨方法 |
| JP5943072B2 (ja) * | 2012-05-22 | 2016-06-29 | 日立化成株式会社 | スラリー、研磨液セット、研磨液及び基体の研磨方法 |
| US10557059B2 (en) | 2012-05-22 | 2020-02-11 | Hitachi Chemical Company, Ltd. | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
| KR102034330B1 (ko) * | 2012-05-22 | 2019-10-18 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체 |
| US10344183B2 (en) | 2013-12-16 | 2019-07-09 | Rhodia Operations | Liquid suspension of cerium oxide particles |
| RU2563015C2 (ru) * | 2014-01-30 | 2015-09-10 | Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет"(ООО НПК"Русредмет") | Способ выделения церия из нитратных растворов, содержащих сумму редкоземельных элементов |
| JP6169120B2 (ja) * | 2014-03-13 | 2017-07-26 | 第一稀元素化学工業株式会社 | セリウム含有溶液及びその製造方法 |
| JP6691061B2 (ja) * | 2014-06-24 | 2020-04-28 | ローディア オペレーションズ | 金属ドープ酸化セリウム組成物 |
| KR101773543B1 (ko) * | 2015-06-30 | 2017-09-01 | 유비머트리얼즈주식회사 | 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법 |
| WO2017050894A1 (en) | 2015-09-23 | 2017-03-30 | Rhodia Operations | Hydrophobically-modified cerium oxide particles and uses thereof |
| FR3041528A1 (fr) * | 2015-09-25 | 2017-03-31 | Rhodia Operations | Composition cosmetique photoprotectrice |
| FR3047737A1 (fr) * | 2016-02-17 | 2017-08-18 | Rhodia Operations | Composition fluide pour proteger le bois |
| FR3047736A1 (fr) * | 2016-02-17 | 2017-08-18 | Rhodia Operations | Composition de peinture formulee en phase aqueuse |
| JP2017228576A (ja) * | 2016-06-20 | 2017-12-28 | 日立化成株式会社 | 研磨液及び研磨方法 |
| WO2018100324A1 (fr) | 2016-12-02 | 2018-06-07 | Rhodia Operations | Suspension d'oxyde de cerium |
| JP6827318B2 (ja) * | 2016-12-28 | 2021-02-10 | 花王株式会社 | 酸化セリウム砥粒 |
| IL271182B2 (en) | 2017-06-15 | 2023-03-01 | Rhodia Operations | Cerium-based particles |
| FR3074162A1 (fr) | 2017-11-24 | 2019-05-31 | Rhodia Operations | Particules d'oxyde de cerium / silice |
| JP6939741B2 (ja) * | 2018-08-31 | 2021-09-22 | 信越化学工業株式会社 | 希土類化合物粒子の製造方法 |
| WO2020066786A1 (ja) | 2018-09-28 | 2020-04-02 | 花王株式会社 | 酸化珪素膜用研磨液組成物 |
| KR102282872B1 (ko) * | 2019-11-11 | 2021-07-28 | 주식회사 켐톤 | 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물 |
| CN114599754B (zh) | 2019-11-26 | 2024-09-13 | 罗地亚经营管理公司 | 基于铈的核-壳颗粒的液体分散体和粉末、其生产方法及其在抛光中的用途 |
| WO2021105174A1 (en) * | 2019-11-26 | 2021-06-03 | Rhodia Operations | Cerium based particles, process for producing the same and uses thereof in polishing |
| CN114671451A (zh) * | 2020-12-25 | 2022-06-28 | 安集微电子（上海）有限公司 | 一种氧化铈的合成方法及其使用方法 |
| KR20230154254A (ko) | 2021-03-12 | 2023-11-07 | 로디아 오퍼레이션스 | 산화세륨 입자, 이의 제조 공정 및 화학적 기계적 폴리싱에서의 이의 용도 |
| EP4304984A1 (en) | 2021-03-12 | 2024-01-17 | Rhodia Operations | Cerium oxide particles, making process thereof and use thereof in chemical mechanical polishing |
| JP7511105B2 (ja) | 2021-03-26 | 2024-07-05 | Ａｇｃ株式会社 | 化学強化ガラス及び化学強化ガラスの製造方法 |
| WO2022243280A1 (en) | 2021-05-17 | 2022-11-24 | Rhodia Operations | Liquid dispersion and powder of cerium based core-shell particles, process for producing the same and uses thereof in polishing |
| US12480009B2 (en) | 2021-07-30 | 2025-11-25 | Xheme Inc. | Nanoporous cerium oxide nanoparticle macro-structure |
| KR102679084B1 (ko) | 2021-08-30 | 2024-06-27 | 주식회사 케이씨텍 | 산화세륨 연마입자 및 연마 슬러리 조성물 |
| US12534630B2 (en) | 2022-01-26 | 2026-01-27 | Xheme, Inc. | Nanoporous cerium oxide nanoparticle macro-structures in paints and coatings |
| WO2023145572A1 (ja) | 2022-01-28 | 2023-08-03 | Ａｇｃ株式会社 | 研磨剤、研磨剤用添加液および研磨方法 |
| JPWO2024053390A1 (https=) | 2022-09-07 | 2024-03-14 | ||
| CN115403063B (zh) * | 2022-09-30 | 2024-08-06 | 深圳市聚芯半导体材料有限公司 | 一种二氧化铈颗粒及其制备方法和应用 |
| KR20250091253A (ko) | 2022-10-20 | 2025-06-20 | 에이지씨 가부시키가이샤 | 연마 방법 및 반도체 부품의 제조 방법 |
| CN118725745A (zh) * | 2023-03-31 | 2024-10-01 | 华为技术有限公司 | 分散液及其应用 |
| WO2025131949A1 (en) | 2023-12-18 | 2025-06-26 | Specialty Operations France | Composition comprising sulfide solid material comprising alkali metal, p, s and halogen elements |
| WO2025133362A1 (en) | 2023-12-21 | 2025-06-26 | Specialty Operations France | Cerium oxide/polyoxometalate particle dispersions and their use in the preparation of proton exchange membranes or electrocatalyst layers |
| WO2025132262A1 (en) | 2023-12-21 | 2025-06-26 | Rhodia Operations | Aqueous dispersion comprising particles of cerium oxide with adsorbed polyoxometalates species thereon, process for producing the same and use thereof in polishing |
| WO2025190482A1 (en) * | 2024-03-13 | 2025-09-18 | Rhodia Operations | Cerium oxide particles with cotrolled microstructure |
| CN120864546B (zh) * | 2025-09-25 | 2026-01-06 | 包头稀土研究院 | 降低纳米氧化铈的松装密度的方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2617153B1 (fr) * | 1987-06-26 | 1991-04-05 | Rhone Poulenc Chimie | Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques |
| JP2746861B2 (ja) * | 1995-11-20 | 1998-05-06 | 三井金属鉱業株式会社 | 酸化セリウム超微粒子の製造方法 |
| US5962343A (en) * | 1996-07-30 | 1999-10-05 | Nissan Chemical Industries, Ltd. | Process for producing crystalline ceric oxide particles and abrasive |
| US6045716A (en) * | 1997-03-12 | 2000-04-04 | Strasbaugh | Chemical mechanical polishing apparatus and method |
| SG72802A1 (en) * | 1997-04-28 | 2000-05-23 | Seimi Chem Kk | Polishing agent for semiconductor and method for its production |
| GB9903519D0 (en) * | 1999-02-16 | 1999-04-07 | Europ Economic Community | Precipitation process |
| JP4544379B2 (ja) * | 1999-06-28 | 2010-09-15 | 日産化学工業株式会社 | ガラス製ハードディスク用研磨剤 |
| EP1201725A4 (en) * | 1999-06-28 | 2007-09-12 | Nissan Chemical Ind Ltd | ABRASIVE COMPOUND FOR HARD DISK GLASS TRAY |
| JP2003257910A (ja) * | 2001-12-28 | 2003-09-12 | Fujikoshi Mach Corp | 基板における銅層の研磨方法 |
| AU2003275697A1 (en) * | 2002-10-28 | 2004-05-13 | Nissan Chemical Industries, Ltd. | Cerium oxide particles and process for the production thereof |
| DE10251029A1 (de) * | 2002-11-02 | 2004-05-19 | Degussa Ag | Pyrogen hergestelltes Ceroxid |
| US8685123B2 (en) * | 2005-10-14 | 2014-04-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
-
2006
- 2006-10-09 FR FR0608838A patent/FR2906800B1/fr not_active Expired - Fee Related
-
2007
- 2007-10-04 KR KR1020137009798A patent/KR20130045954A/ko not_active Withdrawn
- 2007-10-04 ES ES07820926.9T patent/ES2628504T3/es active Active
- 2007-10-04 EP EP07820926.9A patent/EP2081871B1/fr active Active
- 2007-10-04 CN CN201210075352.4A patent/CN102627310B/zh active Active
- 2007-10-04 KR KR1020137032326A patent/KR101475174B1/ko active Active
- 2007-10-04 CN CN200780037633.8A patent/CN101522567B/zh active Active
- 2007-10-04 JP JP2009531812A patent/JP5586229B2/ja active Active
- 2007-10-04 KR KR1020097007237A patent/KR101139110B1/ko active Active
- 2007-10-04 US US12/444,746 patent/US8317888B2/en active Active
- 2007-10-04 WO PCT/EP2007/060549 patent/WO2008043703A2/fr not_active Ceased
- 2007-10-04 KR KR1020127002406A patent/KR20120030575A/ko not_active Withdrawn
- 2007-10-08 TW TW096137695A patent/TWI367863B/zh active
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