JP2010285403A - 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 - Google Patents

架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 Download PDF

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JP2010285403A
JP2010285403A JP2009141844A JP2009141844A JP2010285403A JP 2010285403 A JP2010285403 A JP 2010285403A JP 2009141844 A JP2009141844 A JP 2009141844A JP 2009141844 A JP2009141844 A JP 2009141844A JP 2010285403 A JP2010285403 A JP 2010285403A
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resist underlayer
underlayer film
photoresist
crosslinking agent
forming composition
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JP2009141844A
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JP2010285403A5 (fr
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Takahiro Kishioka
岸岡　　高広
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Nissan Chemical Corp
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Nissan Chemical Corp
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Priority to JP2009141844A priority Critical patent/JP2010285403A/ja
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Publication of JP2010285403A5 publication Critical patent/JP2010285403A5/ja
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  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2009141844A 2009-06-15 2009-06-15 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物 Pending JP2010285403A (ja)

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JP2009141844A JP2010285403A (ja) 2009-06-15 2009-06-15 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物

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JP2009141844A JP2010285403A (ja) 2009-06-15 2009-06-15 架橋剤及び該架橋剤を含有するレジスト下層膜形成組成物

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JP2010285403A true JP2010285403A (ja) 2010-12-24
JP2010285403A5 JP2010285403A5 (fr) 2012-06-21

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011012098A (ja) * 2009-06-30 2011-01-20 Tokyo Ohka Kogyo Co Ltd 接着剤組成物および接着フィルム
JP2013145368A (ja) * 2011-12-16 2013-07-25 Jsr Corp レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法
JP2017119670A (ja) * 2015-12-24 2017-07-06 信越化学工業株式会社 有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法
JP2017226837A (ja) * 2016-06-21 2017-12-28 東京応化工業株式会社 樹脂の製造方法、及び相分離構造を含む構造体の製造方法
US10444628B2 (en) * 2015-12-24 2019-10-15 Shin-Etsu Chemical Co., Ltd. Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
KR20220152194A (ko) 2020-03-10 2022-11-15 디아이씨 가부시끼가이샤 (메타)아크릴레이트 수지, 활성 에너지선 경화성 (메타)아크릴레이트 수지 조성물, 및 레지스트 하층막, 그리고 (메타)아크릴레이트 수지의 제조 방법
KR20230021721A (ko) 2020-09-28 2023-02-14 디아이씨 가부시끼가이샤 페놀성 수산기 함유 수지, 알칼리 현상성 레지스트용 수지 조성물, 및 레지스트 경화성 수지 조성물, 그리고, 페놀성 수산기 함유 수지의 제조 방법
KR20230051687A (ko) 2020-12-15 2023-04-18 디아이씨 가부시끼가이샤 중합성 화합물, 활성 에너지선 경화성 수지 조성물, 경화물, 레지스트용 조성물, 및 레지스트막

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08151479A (ja) * 1994-11-30 1996-06-11 Mitsubishi Chem Corp 架橋剤
JP2008501985A (ja) * 2004-03-25 2008-01-24 エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション 光結像性ポジ型底面反射防止膜
JP2009292982A (ja) * 2008-06-06 2009-12-17 Daicel Chem Ind Ltd リソグラフィー用重合体並びにその製造方法
JP2010047637A (ja) * 2008-08-19 2010-03-04 Daicel Chem Ind Ltd リソグラフィー用重合体の製造方法、及びパターン形成方法
JP2010113035A (ja) * 2008-11-04 2010-05-20 Daicel Chem Ind Ltd 下層膜用重合体、下層膜用組成物及び半導体の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08151479A (ja) * 1994-11-30 1996-06-11 Mitsubishi Chem Corp 架橋剤
JP2008501985A (ja) * 2004-03-25 2008-01-24 エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション 光結像性ポジ型底面反射防止膜
JP2009292982A (ja) * 2008-06-06 2009-12-17 Daicel Chem Ind Ltd リソグラフィー用重合体並びにその製造方法
JP2010047637A (ja) * 2008-08-19 2010-03-04 Daicel Chem Ind Ltd リソグラフィー用重合体の製造方法、及びパターン形成方法
JP2010113035A (ja) * 2008-11-04 2010-05-20 Daicel Chem Ind Ltd 下層膜用重合体、下層膜用組成物及び半導体の製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011012098A (ja) * 2009-06-30 2011-01-20 Tokyo Ohka Kogyo Co Ltd 接着剤組成物および接着フィルム
JP2013145368A (ja) * 2011-12-16 2013-07-25 Jsr Corp レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法
JP2017119670A (ja) * 2015-12-24 2017-07-06 信越化学工業株式会社 有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法
US10429739B2 (en) 2015-12-24 2019-10-01 Shin-Etsu Chemical Co., Ltd. Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
US10444628B2 (en) * 2015-12-24 2019-10-15 Shin-Etsu Chemical Co., Ltd. Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
JP2017226837A (ja) * 2016-06-21 2017-12-28 東京応化工業株式会社 樹脂の製造方法、及び相分離構造を含む構造体の製造方法
JP7126338B2 (ja) 2016-06-21 2022-08-26 東京応化工業株式会社 樹脂の製造方法、及び相分離構造を含む構造体の製造方法
KR20220152194A (ko) 2020-03-10 2022-11-15 디아이씨 가부시끼가이샤 (메타)아크릴레이트 수지, 활성 에너지선 경화성 (메타)아크릴레이트 수지 조성물, 및 레지스트 하층막, 그리고 (메타)아크릴레이트 수지의 제조 방법
KR20230021721A (ko) 2020-09-28 2023-02-14 디아이씨 가부시끼가이샤 페놀성 수산기 함유 수지, 알칼리 현상성 레지스트용 수지 조성물, 및 레지스트 경화성 수지 조성물, 그리고, 페놀성 수산기 함유 수지의 제조 방법
KR20230051687A (ko) 2020-12-15 2023-04-18 디아이씨 가부시끼가이샤 중합성 화합물, 활성 에너지선 경화성 수지 조성물, 경화물, 레지스트용 조성물, 및 레지스트막

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