JP2010248552A - イリジウムめっき液及びそのめっき方法 - Google Patents
イリジウムめっき液及びそのめっき方法 Download PDFInfo
- Publication number
- JP2010248552A JP2010248552A JP2009097657A JP2009097657A JP2010248552A JP 2010248552 A JP2010248552 A JP 2010248552A JP 2009097657 A JP2009097657 A JP 2009097657A JP 2009097657 A JP2009097657 A JP 2009097657A JP 2010248552 A JP2010248552 A JP 2010248552A
- Authority
- JP
- Japan
- Prior art keywords
- iridium
- plating
- saturated
- plating solution
- cracks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 113
- 229910052741 iridium Inorganic materials 0.000 title claims abstract description 81
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 title claims abstract description 79
- 238000000034 method Methods 0.000 title claims abstract description 19
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 12
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000002504 iridium compounds Chemical class 0.000 claims abstract description 10
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 10
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 claims abstract description 9
- 229910052802 copper Inorganic materials 0.000 claims abstract description 8
- 229910052742 iron Inorganic materials 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001408 amides Chemical class 0.000 claims abstract description 5
- 239000004202 carbamide Substances 0.000 claims abstract description 5
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 5
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 238000003756 stirring Methods 0.000 claims abstract description 3
- 125000005843 halogen group Chemical group 0.000 claims abstract 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 claims abstract 2
- -1 monocarboxylic acid salt Chemical class 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 5
- 239000002184 metal Substances 0.000 description 25
- 229910052751 metal Inorganic materials 0.000 description 25
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 15
- 230000008021 deposition Effects 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 239000010931 gold Substances 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 238000001556 precipitation Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 239000010949 copper Substances 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 7
- 239000004327 boric acid Substances 0.000 description 7
- 229910001369 Brass Inorganic materials 0.000 description 6
- 239000010951 brass Substances 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- PRWXGRGLHYDWPS-UHFFFAOYSA-L sodium malonate Chemical compound [Na+].[Na+].[O-]C(=O)CC([O-])=O PRWXGRGLHYDWPS-UHFFFAOYSA-L 0.000 description 6
- IRJFCWPVAMSCQM-UHFFFAOYSA-H trisodium;iridium(3+);hexabromide Chemical compound [Na+].[Na+].[Na+].[Br-].[Br-].[Br-].[Br-].[Br-].[Br-].[Ir+3] IRJFCWPVAMSCQM-UHFFFAOYSA-H 0.000 description 6
- 235000006408 oxalic acid Nutrition 0.000 description 5
- POAPOGPNFCCSJW-UHFFFAOYSA-H Br[Ir](Br)(Br)(Br)(Br)Br.[Na] Chemical compound Br[Ir](Br)(Br)(Br)(Br)Br.[Na] POAPOGPNFCCSJW-UHFFFAOYSA-H 0.000 description 4
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 4
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 3
- 150000002763 monocarboxylic acids Chemical class 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- BKLCQTJLGBIHJV-UHFFFAOYSA-H Br[Ir](Br)(Br)(Br)(Br)Br Chemical compound Br[Ir](Br)(Br)(Br)(Br)Br BKLCQTJLGBIHJV-UHFFFAOYSA-H 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 2
- 229940044175 cobalt sulfate Drugs 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- MEYVLGVRTYSQHI-UHFFFAOYSA-L cobalt(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Co+2].[O-]S([O-])(=O)=O MEYVLGVRTYSQHI-UHFFFAOYSA-L 0.000 description 2
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 2
- 235000019262 disodium citrate Nutrition 0.000 description 2
- 239000002526 disodium citrate Substances 0.000 description 2
- CEYULKASIQJZGP-UHFFFAOYSA-L disodium;2-(carboxymethyl)-2-hydroxybutanedioate Chemical compound [Na+].[Na+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O CEYULKASIQJZGP-UHFFFAOYSA-L 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 150000002503 iridium Chemical class 0.000 description 2
- SURQXAFEQWPFPV-UHFFFAOYSA-L iron(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Fe+2].[O-]S([O-])(=O)=O SURQXAFEQWPFPV-UHFFFAOYSA-L 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZYSSNSIOLIJYRF-UHFFFAOYSA-H Cl[Ir](Cl)(Cl)(Cl)(Cl)Cl Chemical compound Cl[Ir](Cl)(Cl)(Cl)(Cl)Cl ZYSSNSIOLIJYRF-UHFFFAOYSA-H 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YYPRCEMOTKNKRB-UHFFFAOYSA-H [Na].Cl[Ir](Cl)(Cl)(Cl)(Cl)Cl Chemical compound [Na].Cl[Ir](Cl)(Cl)(Cl)(Cl)Cl YYPRCEMOTKNKRB-UHFFFAOYSA-H 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- JQAZQSHUPWSSPF-UHFFFAOYSA-H iridium hexafluoride Chemical compound F[Ir](F)(F)(F)(F)F JQAZQSHUPWSSPF-UHFFFAOYSA-H 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
【解決手段】本発明は、アニオン成分がハロゲンであるイリジウム(III)錯塩に、飽和モノカルボン酸、飽和モノカルボン酸塩、飽和ジカルボン酸、飽和ジカルボン酸塩、飽和ヒドロキシカルボン酸、飽和ヒドロキシカルボン酸塩、アミド、尿素からなる群より選ばれた一種以上の化合物を加えて撹拌して得られるイリジウム化合物を用いるイリジウムめっき液において、Fe、Co、Ni、Cuの少なくとも一種以上を含有することを特徴とするものとした。
【選択図】なし
Description
この実施例1では、イリジウムめっき液にFeを添加した場合について説明する。この実施例1の液組成は次の通りである。
15g/L(イリジウム金属換算)
ホウ酸 40g/L
マロン酸二ナトリウム 0.02mol/L
硫酸鉄7水和物 0.01g/L(鉄金属換算)
この実施例2では、イリジウムめっき液にCoを添加した場合について説明する。この実施例2の液組成は次の通りである。
15g/L(イリジウム金属換算)
ホウ酸 40g/L
クエン酸二ナトリウム 0.05mol/L
硫酸コバルト7水和物 0.5g/L(コバルト金属換算)
この実施例3では、イリジウムめっき液にNiを添加した場合について説明する。この実施例3の液組成は次の通りである。
15g/L(イリジウム金属換算)
ホウ酸 40g/L
シュウ酸 0.05mol/L
硫酸ニッケル6水和物 0.5g/L(ニッケル金属換算)
この実施例4では、イリジウムめっき液にCuを添加した場合について説明する。この実施例4の液組成は次の通りである。
15g/L(イリジウム金属換算)
ホウ酸 40g/L
酢酸 0.02mol/L
硫酸銅5水和物 0.01g/L(銅金属換算)
この実施例5では、イリジウムめっき液にCoを添加した場合について説明する。この実施例5の液組成は次の通りである。
5g/L(イリジウム金属換算)
ホウ酸 20g/L
マロン酸二ナトリウム 0.10mol/L
硫酸コバルト7水和物 0.5g/L(コバルト金属換算)
この実施例6では、イリジウムめっき液にNiを添加し、めっき条件を変化させた場合について説明する。この実施例6の液組成は次の通りである。
10g/L(イリジウム金属換算)
ホウ酸 30g/L
シュウ酸 0.05mol/L
硫酸ニッケル6水和物 0.5g/L(ニッケル金属換算)
Claims (3)
- アニオン成分がハロゲンであるイリジウム(III)錯塩に、飽和モノカルボン酸、飽和モノカルボン酸塩、飽和ジカルボン酸、飽和ジカルボン酸塩、飽和ヒドロキシカルボン酸、飽和ヒドロキシカルボン酸塩、アミド、尿素からなる群より選ばれた一種以上の化合物を加えて撹拌して得られるイリジウム化合物を用いるイリジウムめっき液において、
Fe、Co、Ni、Cuの少なくとも一種以上を含有することを特徴とするイリジウムめっき液。 - Fe、Co、Ni、Cuの少なくとも一種以上の含有量は、0.01g/L〜10g/Lである請求項1記載のイリジウムめっき液。
- 請求項1または請求項2に記載のめっき液を使用し、pH1〜8、温度50〜98℃、電流密度0.01〜3.0A/dm2の条件でめっきするイリジウムめっき方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009097657A JP4855494B2 (ja) | 2009-04-14 | 2009-04-14 | イリジウムめっき液及びそのめっき方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009097657A JP4855494B2 (ja) | 2009-04-14 | 2009-04-14 | イリジウムめっき液及びそのめっき方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010248552A true JP2010248552A (ja) | 2010-11-04 |
JP4855494B2 JP4855494B2 (ja) | 2012-01-18 |
Family
ID=43311205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009097657A Active JP4855494B2 (ja) | 2009-04-14 | 2009-04-14 | イリジウムめっき液及びそのめっき方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4855494B2 (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06316786A (ja) * | 1993-04-30 | 1994-11-15 | Electroplating Eng Of Japan Co | 水溶性イリジウムめっき浴及びそのめっき方法 |
JPH10237686A (ja) * | 1997-02-20 | 1998-09-08 | Electroplating Eng Of Japan Co | 白金イリジウム合金めっき |
JP2000034593A (ja) * | 1998-07-14 | 2000-02-02 | Daiwa Kasei Kenkyusho:Kk | 金属を還元析出させるための水溶液 |
JP2003183875A (ja) * | 2001-10-02 | 2003-07-03 | Shipley Co Llc | 基体上に金属層を堆積させるためのメッキ浴および方法 |
JP2007039778A (ja) * | 2005-08-05 | 2007-02-15 | Nisshin Kasei Kk | イリジウムめっき液およびイリジウムめっき方法 |
JP2008088519A (ja) * | 2006-10-03 | 2008-04-17 | Nisshin Kasei Kk | イリジウム・コバルト合金めっき液 |
-
2009
- 2009-04-14 JP JP2009097657A patent/JP4855494B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06316786A (ja) * | 1993-04-30 | 1994-11-15 | Electroplating Eng Of Japan Co | 水溶性イリジウムめっき浴及びそのめっき方法 |
JPH10237686A (ja) * | 1997-02-20 | 1998-09-08 | Electroplating Eng Of Japan Co | 白金イリジウム合金めっき |
JP2000034593A (ja) * | 1998-07-14 | 2000-02-02 | Daiwa Kasei Kenkyusho:Kk | 金属を還元析出させるための水溶液 |
JP2003183875A (ja) * | 2001-10-02 | 2003-07-03 | Shipley Co Llc | 基体上に金属層を堆積させるためのメッキ浴および方法 |
JP2007039778A (ja) * | 2005-08-05 | 2007-02-15 | Nisshin Kasei Kk | イリジウムめっき液およびイリジウムめっき方法 |
JP2008088519A (ja) * | 2006-10-03 | 2008-04-17 | Nisshin Kasei Kk | イリジウム・コバルト合金めっき液 |
Also Published As
Publication number | Publication date |
---|---|
JP4855494B2 (ja) | 2012-01-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6298530B2 (ja) | 無電解ニッケルめっき液、及び無電解ニッケルめっき方法 | |
CN102892924B (zh) | 包括β-氨基酸的电解质以及用于沉积金属层的方法 | |
TW200401051A (en) | Electroless nickel plating solutions | |
JP5452458B2 (ja) | ニッケルめっき液及びニッケルめっき方法 | |
TWI445839B (zh) | 無電解純鈀鍍敷液 | |
JP4855494B2 (ja) | イリジウムめっき液及びそのめっき方法 | |
JP2013108170A (ja) | 無電解パラジウムめっき液 | |
TWI807443B (zh) | 無電解鍍鎳浴 | |
JP5363142B2 (ja) | 錫めっき皮膜の成膜方法 | |
CN102482793A (zh) | 含锡合金电镀浴及使用该电镀浴的电解电镀方法和沉积有该电解镀层的基体 | |
TW200848542A (en) | Method for surface treatment of aluminum or aluminum alloy | |
TWI495767B (zh) | 銥鍍覆液及其鍍覆方法 | |
JP4273085B2 (ja) | 白金−コバルト合金めっき液及びめっき方法 | |
KR20120029634A (ko) | 이리듐 도금액 및 그 도금 방법 | |
JP5025815B1 (ja) | 硬質金めっき液 | |
JP5602790B2 (ja) | 無電解めっき浴および無電解めっき膜 | |
JP5435669B2 (ja) | ニッケル鉄合金めっき液 | |
JP6218473B2 (ja) | 無電解Ni−P−Snめっき液 | |
JP2004323963A (ja) | 金めっき液 | |
JP2004076026A (ja) | 電解硬質金めっき液及びそれを用いためっき方法 | |
JP2005256045A (ja) | 白金−鉄合金膜形成用のめっき液及びめっき方法 | |
US20120073980A1 (en) | Iridium plating solution and method of plating using the same | |
TW201932476A (zh) | 無電鍍金鍍浴 | |
JP2013144835A (ja) | 無電解Ni−P−Snめっき液 | |
JP2018095926A (ja) | 無電解ニッケル−リンめっき浴 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100817 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110815 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110818 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111004 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111024 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111026 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141104 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4855494 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |