JP2010182672A - 質量分析装置における検出構成 - Google Patents
質量分析装置における検出構成 Download PDFInfo
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- JP2010182672A JP2010182672A JP2010013037A JP2010013037A JP2010182672A JP 2010182672 A JP2010182672 A JP 2010182672A JP 2010013037 A JP2010013037 A JP 2010013037A JP 2010013037 A JP2010013037 A JP 2010013037A JP 2010182672 A JP2010182672 A JP 2010182672A
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- 238000001514 detection method Methods 0.000 title claims description 17
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 39
- 150000002500 ions Chemical class 0.000 claims abstract description 39
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 102100025490 Slit homolog 1 protein Human genes 0.000 abstract description 7
- 101710123186 Slit homolog 1 protein Proteins 0.000 abstract description 7
- 238000009826 distribution Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 2
- 238000013459 approach Methods 0.000 description 9
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000001593 atomic mass spectrometry Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/025—Detectors specially adapted to particle spectrometers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
- H01J49/061—Ion deflecting means, e.g. ion gates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/20—Magnetic deflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/22—Electrostatic deflection
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
【解決手段】質量分析装置の検出器のダイナミックレンジを拡大する手法において、高い強度のビームの場合、イオンビームを検出するための手段が、コレクタスリット1の後に、小さい穴のグリッドまたはアレイであってよい減衰器4に設けられ、数分の1のイオンビームのみがこの中を通ってイオン検出器6に到達する。穴のアレイを使用することにより、記録される信号が、ビーム内のイオンの分布に影響を受けないことを確実にする。ビームは、信号が低い強度である場合、検出器にまっすぐに進む。
【選択図】図1
Description
Claims (6)
- イオンのビームがイオン増倍管に向かって一定の方向でそこから出現するイオンビーム画定スリットから一定の距離に配置されたイオン増倍検出手段を含む検出システムを備える質量分析装置であって、前記スリットと前記検出器の間に、作動されると前記スリットから検出器への前記ビームの経路を代替のこのような経路に偏向することができる偏向手段が配置され、前記2つの経路の一方に減衰器が配置される質量分析装置。
- 前記減衰器が、プレート内の小さな穴のアレイで構成される、請求項1に記載の質量分析装置。
- 前記アレイが、20から50mm2の全体の領域、および1:100より低い伝達率を有する、請求項2に記載の質量分析装置。
- 前記伝達率が1:1000である、請求項3に記載の質量分析装置。
- 前記プレートが、固いニッケル製であり、20−50ミクロンの厚みを有する、請求項3または4に記載の質量分析装置。
- 前記イオン増倍検出手段が、それぞれが、前記2つの経路のうちの一方に配置される
2つの別個のイオン検出器を含む、請求項1から5のいずれか一項に記載の質量分析装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0901840.9 | 2009-02-04 | ||
GB0901840.9A GB2467548B (en) | 2009-02-04 | 2009-02-04 | Detection arrangements in mass spectrometers |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010182672A true JP2010182672A (ja) | 2010-08-19 |
JP5686309B2 JP5686309B2 (ja) | 2015-03-18 |
Family
ID=40469586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010013037A Active JP5686309B2 (ja) | 2009-02-04 | 2010-01-25 | 質量分析装置における検出構成 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8084751B2 (ja) |
JP (1) | JP5686309B2 (ja) |
DE (1) | DE102010006731B4 (ja) |
FR (1) | FR2941815B1 (ja) |
GB (1) | GB2467548B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013532886A (ja) * | 2010-07-30 | 2013-08-19 | イオン−トフ テクノロジーズ ゲーエムベーハー | イオン又は後にイオン化される中性粒子を試料から検出する方法、質量分析計、及びその使用 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012023031A2 (en) * | 2010-08-19 | 2012-02-23 | Dh Technologies Development Pte. Ltd. | Method and system for increasing the dynamic range of ion detectors |
US8796620B2 (en) * | 2011-06-08 | 2014-08-05 | Mks Instruments, Inc. | Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens |
US8796638B2 (en) * | 2011-06-08 | 2014-08-05 | Mks Instruments, Inc. | Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens |
US20130015344A1 (en) * | 2011-07-15 | 2013-01-17 | Bruker Daltonics, Inc. | Background noise correction in quadrupole mass spectrometers |
EP2825871A4 (en) * | 2012-03-16 | 2015-09-09 | Analytik Jena Ag | IMPROVED INTERFACE FOR MASS SPECTROMETRY APPARATUS |
WO2015040392A1 (en) | 2013-09-20 | 2015-03-26 | Micromass Uk Limited | Ion inlet assembly |
CN106872559B (zh) * | 2017-03-17 | 2024-02-27 | 宁波大学 | 一种超分辨生物分子质谱成像装置及其工作方法 |
US11656371B1 (en) | 2020-06-09 | 2023-05-23 | El-Mul Technologies Ltd | High dynamic range detector with controllable photon flux functionality |
Citations (8)
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JPS6445050A (en) * | 1987-08-12 | 1989-02-17 | Hitachi Ltd | Mass spectrometer for secondary ion |
JPH02295055A (ja) * | 1989-05-08 | 1990-12-05 | Hitachi Ltd | プラズマイオン化質量分析装置 |
JPH03138850A (ja) * | 1989-10-23 | 1991-06-13 | Hitachi Ltd | 2次イオン質量分析装置 |
JPH04112443A (ja) * | 1990-09-01 | 1992-04-14 | Hitachi Ltd | 二次イオン質量分析装置 |
JP2003509812A (ja) * | 1999-09-03 | 2003-03-11 | サーモ マスラボ リミテッド | 高ダイナミックレンジ質量分析計 |
JP2006071365A (ja) * | 2004-08-31 | 2006-03-16 | National Institute Of Advanced Industrial & Technology | 低速陽電子ビーム装置 |
JP2007526458A (ja) * | 2004-03-04 | 2007-09-13 | エムディーエス インコーポレイテッド ドゥーイング ビジネス スルー イッツ エムディーエス サイエックス ディヴィジョン | 試料を質量分析するための方法およびシステム |
JP2008282571A (ja) * | 2007-05-08 | 2008-11-20 | Shimadzu Corp | 飛行時間型質量分析計 |
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US3898456A (en) * | 1974-07-25 | 1975-08-05 | Us Energy | Electron multiplier-ion detector system |
DE3430984A1 (de) * | 1984-08-23 | 1986-03-06 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zur registrierung von teilchen oder quanten mit hilfe eines detektors |
JPH0466862A (ja) * | 1990-07-06 | 1992-03-03 | Hitachi Ltd | 高感度元素分析法及び装置 |
US5220167A (en) * | 1991-09-27 | 1993-06-15 | Carnegie Institution Of Washington | Multiple ion multiplier detector for use in a mass spectrometer |
JP2990321B2 (ja) * | 1993-03-09 | 1999-12-13 | セイコーインスツルメンツ株式会社 | 誘導プラズマ質量分析装置 |
US5463219A (en) | 1994-12-07 | 1995-10-31 | Mds Health Group Limited | Mass spectrometer system and method using simultaneous mode detector and signal region flags |
AUPO663497A0 (en) * | 1997-05-07 | 1997-05-29 | Varian Australia Pty Ltd | Detector system for mass spectrometer |
JP3497367B2 (ja) * | 1998-01-21 | 2004-02-16 | 日本電子株式会社 | イオン・ニュートラルセパレータ |
US6091068A (en) * | 1998-05-04 | 2000-07-18 | Leybold Inficon, Inc. | Ion collector assembly |
GB2382921B (en) | 2000-11-29 | 2003-10-29 | Micromass Ltd | Mass spectrometer and methods of mass spectrometry |
GB2381373B (en) * | 2001-05-29 | 2005-03-23 | Thermo Masslab Ltd | Time of flight mass spectrometer and multiple detector therefor |
US6933497B2 (en) * | 2002-12-20 | 2005-08-23 | Per Septive Biosystems, Inc. | Time-of-flight mass analyzer with multiple flight paths |
DE102004061442B4 (de) | 2004-12-17 | 2017-01-19 | Thermo Fisher Scientific (Bremen) Gmbh | Verfahren und Vorrichtung zur Messung von Ionen |
GB2446005B (en) * | 2007-01-23 | 2012-03-21 | Superion Ltd | Apparatus and method relating to removal of selected particles from a charged particle beam |
-
2009
- 2009-02-04 GB GB0901840.9A patent/GB2467548B/en active Active
-
2010
- 2010-01-14 FR FR1050236A patent/FR2941815B1/fr active Active
- 2010-01-25 JP JP2010013037A patent/JP5686309B2/ja active Active
- 2010-02-03 US US12/656,549 patent/US8084751B2/en not_active Expired - Fee Related
- 2010-02-03 DE DE102010006731.8A patent/DE102010006731B4/de active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6445050A (en) * | 1987-08-12 | 1989-02-17 | Hitachi Ltd | Mass spectrometer for secondary ion |
JPH02295055A (ja) * | 1989-05-08 | 1990-12-05 | Hitachi Ltd | プラズマイオン化質量分析装置 |
JPH03138850A (ja) * | 1989-10-23 | 1991-06-13 | Hitachi Ltd | 2次イオン質量分析装置 |
JPH04112443A (ja) * | 1990-09-01 | 1992-04-14 | Hitachi Ltd | 二次イオン質量分析装置 |
JP2003509812A (ja) * | 1999-09-03 | 2003-03-11 | サーモ マスラボ リミテッド | 高ダイナミックレンジ質量分析計 |
JP2007526458A (ja) * | 2004-03-04 | 2007-09-13 | エムディーエス インコーポレイテッド ドゥーイング ビジネス スルー イッツ エムディーエス サイエックス ディヴィジョン | 試料を質量分析するための方法およびシステム |
JP2006071365A (ja) * | 2004-08-31 | 2006-03-16 | National Institute Of Advanced Industrial & Technology | 低速陽電子ビーム装置 |
JP2008282571A (ja) * | 2007-05-08 | 2008-11-20 | Shimadzu Corp | 飛行時間型質量分析計 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013532886A (ja) * | 2010-07-30 | 2013-08-19 | イオン−トフ テクノロジーズ ゲーエムベーハー | イオン又は後にイオン化される中性粒子を試料から検出する方法、質量分析計、及びその使用 |
JP2015084347A (ja) * | 2010-07-30 | 2015-04-30 | イオン−トフ テクノロジーズ ゲーエムベーハー | イオン又は後にイオン化される中性粒子を試料から検出する方法、質量分析計、及びその使用 |
Also Published As
Publication number | Publication date |
---|---|
DE102010006731B4 (de) | 2014-05-15 |
US20100193677A1 (en) | 2010-08-05 |
GB2467548A (en) | 2010-08-11 |
GB0901840D0 (en) | 2009-03-11 |
FR2941815B1 (fr) | 2013-09-06 |
DE102010006731A1 (de) | 2010-08-19 |
DE102010006731A8 (de) | 2010-12-30 |
FR2941815A1 (fr) | 2010-08-06 |
GB2467548B (en) | 2013-02-27 |
JP5686309B2 (ja) | 2015-03-18 |
US8084751B2 (en) | 2011-12-27 |
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