JP2010161284A5 - - Google Patents

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Publication number
JP2010161284A5
JP2010161284A5 JP2009003560A JP2009003560A JP2010161284A5 JP 2010161284 A5 JP2010161284 A5 JP 2010161284A5 JP 2009003560 A JP2009003560 A JP 2009003560A JP 2009003560 A JP2009003560 A JP 2009003560A JP 2010161284 A5 JP2010161284 A5 JP 2010161284A5
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JP
Japan
Prior art keywords
transistor
dielectric constant
high dielectric
region
semiconductor substrate
Prior art date
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Application number
JP2009003560A
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English (en)
Japanese (ja)
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JP2010161284A (ja
JP5289069B2 (ja
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Priority to JP2009003560A priority Critical patent/JP5289069B2/ja
Priority claimed from JP2009003560A external-priority patent/JP5289069B2/ja
Priority to US12/628,283 priority patent/US8174049B2/en
Publication of JP2010161284A publication Critical patent/JP2010161284A/ja
Publication of JP2010161284A5 publication Critical patent/JP2010161284A5/ja
Application granted granted Critical
Publication of JP5289069B2 publication Critical patent/JP5289069B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009003560A 2009-01-09 2009-01-09 半導体装置およびその製造方法 Active JP5289069B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009003560A JP5289069B2 (ja) 2009-01-09 2009-01-09 半導体装置およびその製造方法
US12/628,283 US8174049B2 (en) 2009-01-09 2009-12-01 Semiconductor device and method of fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009003560A JP5289069B2 (ja) 2009-01-09 2009-01-09 半導体装置およびその製造方法

Publications (3)

Publication Number Publication Date
JP2010161284A JP2010161284A (ja) 2010-07-22
JP2010161284A5 true JP2010161284A5 (enExample) 2011-07-07
JP5289069B2 JP5289069B2 (ja) 2013-09-11

Family

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Family Applications (1)

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JP2009003560A Active JP5289069B2 (ja) 2009-01-09 2009-01-09 半導体装置およびその製造方法

Country Status (2)

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US (1) US8174049B2 (enExample)
JP (1) JP5289069B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5238627B2 (ja) * 2009-06-26 2013-07-17 株式会社東芝 半導体装置およびその製造方法
US8354719B2 (en) * 2010-02-18 2013-01-15 GlobalFoundries, Inc. Finned semiconductor device with oxygen diffusion barrier regions, and related fabrication methods
JP2011176173A (ja) * 2010-02-25 2011-09-08 Renesas Electronics Corp 半導体装置及びその製造方法
JP5427153B2 (ja) * 2010-09-28 2014-02-26 パナソニック株式会社 半導体装置
US8603875B2 (en) * 2010-10-28 2013-12-10 Texas Instruments Incorporated CMOS process to improve SRAM yield
US20120139057A1 (en) * 2010-12-07 2012-06-07 Toshiba America Electronic Components, Inc. Semiconductor device and method of fabricating the same
US20130049134A1 (en) * 2011-08-30 2013-02-28 Renesas Electronics Corporation Semiconductor device and method of making same
US8698252B2 (en) 2012-04-26 2014-04-15 Taiwan Semiconductor Manufacturing Company, Ltd. Device for high-K and metal gate stacks
US20150021698A1 (en) * 2013-07-18 2015-01-22 International Business Machines Corporation Intrinsic Channel Planar Field Effect Transistors Having Multiple Threshold Voltages
US10395199B1 (en) 2014-10-17 2019-08-27 Jpmorgan Chase Bank, N.A. Method and system for ATM cash servicing and optimization
CN108389835B (zh) * 2017-02-03 2020-10-09 中芯国际集成电路制造(上海)有限公司 半导体结构及其形成方法
US12446338B2 (en) * 2021-03-26 2025-10-14 Taiwan Semiconductor Manufacturing Company, Ltd. Method for manufacturing image sensor including forming FinFET transfer gate having a plurality of channel fins above a p-type region
US11843001B2 (en) 2021-05-14 2023-12-12 Samsung Electronics Co., Ltd. Devices including stacked nanosheet transistors
TW202249290A (zh) * 2021-05-14 2022-12-16 南韓商三星電子股份有限公司 奈米薄片電晶體裝置及其形成方法
US12170322B2 (en) 2021-05-14 2024-12-17 Samsung Electronics Co., Ltd. Devices including stacked nanosheet transistors

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100307625B1 (ko) * 1998-07-21 2001-12-17 윤종용 서로다른질소농도를갖는게이트절연막을갖춘반도체소자및그제조방법
JP4895430B2 (ja) * 2001-03-22 2012-03-14 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
JP4163169B2 (ja) * 2004-10-29 2008-10-08 株式会社ルネサステクノロジ 半導体装置およびその製造方法
JP4128574B2 (ja) 2005-03-28 2008-07-30 富士通株式会社 半導体装置の製造方法
JP4704101B2 (ja) * 2005-05-06 2011-06-15 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP4528727B2 (ja) * 2006-01-23 2010-08-18 株式会社東芝 半導体装置の製造方法
JP2009212450A (ja) 2008-03-06 2009-09-17 Toshiba Corp 半導体装置およびその製造方法

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