|
JP3187014B2
(ja)
*
|
1990-01-24 |
2001-07-11 |
ホーヤ株式会社 |
レンズ成形用型
|
|
US5512131A
(en)
|
1993-10-04 |
1996-04-30 |
President And Fellows Of Harvard College |
Formation of microstamped patterns on surfaces and derivative articles
|
|
JP2691148B2
(ja)
*
|
1995-08-22 |
1997-12-17 |
エドカ工業株式会社 |
シート状レンズの製法
|
|
US6309580B1
(en)
|
1995-11-15 |
2001-10-30 |
Regents Of The University Of Minnesota |
Release surfaces, particularly for use in nanoimprint lithography
|
|
US6482742B1
(en)
|
2000-07-18 |
2002-11-19 |
Stephen Y. Chou |
Fluid pressure imprint lithography
|
|
US20040036201A1
(en)
|
2000-07-18 |
2004-02-26 |
Princeton University |
Methods and apparatus of field-induced pressure imprint lithography
|
|
US6518189B1
(en)
|
1995-11-15 |
2003-02-11 |
Regents Of The University Of Minnesota |
Method and apparatus for high density nanostructures
|
|
US5772905A
(en)
|
1995-11-15 |
1998-06-30 |
Regents Of The University Of Minnesota |
Nanoimprint lithography
|
|
EP1003078A3
(en)
|
1998-11-17 |
2001-11-07 |
Corning Incorporated |
Replicating a nanoscale pattern
|
|
US6334960B1
(en)
|
1999-03-11 |
2002-01-01 |
Board Of Regents, The University Of Texas System |
Step and flash imprint lithography
|
|
SE515607C2
(sv)
|
1999-12-10 |
2001-09-10 |
Obducat Ab |
Anordning och metod vid tillverkning av strukturer
|
|
US6165911A
(en)
|
1999-12-29 |
2000-12-26 |
Calveley; Peter Braden |
Method of patterning a metal layer
|
|
EP1257878B1
(en)
|
2000-01-21 |
2006-07-05 |
Obducat Aktiebolag |
A mold for nano imprinting
|
|
SE515785C2
(sv)
|
2000-02-23 |
2001-10-08 |
Obducat Ab |
Anordning för homogen värmning av ett objekt och användning av anordningen
|
|
SE515962C2
(sv)
|
2000-03-15 |
2001-11-05 |
Obducat Ab |
Anordning för överföring av mönster till objekt
|
|
SE0001367L
(sv)
|
2000-04-13 |
2001-10-14 |
Obducat Ab |
Apparat och förfarande för elektrokemisk bearbetning av substrat
|
|
SE0001368L
(sv)
|
2000-04-13 |
2001-10-14 |
Obducat Ab |
Apparat och förfarande för elektrokemisk bearbetning av substrat
|
|
SE516194C2
(sv)
|
2000-04-18 |
2001-12-03 |
Obducat Ab |
Substrat för samt process vid tillverkning av strukturer
|
|
US6365059B1
(en)
|
2000-04-28 |
2002-04-02 |
Alexander Pechenik |
Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
|
|
SE516414C2
(sv)
|
2000-05-24 |
2002-01-15 |
Obducat Ab |
Metod vid tillverkning av en mall, samt mallen tillverkad därav
|
|
US6921615B2
(en)
|
2000-07-16 |
2005-07-26 |
Board Of Regents, The University Of Texas System |
High-resolution overlay alignment methods for imprint lithography
|
|
EP2270592B1
(en)
|
2000-07-17 |
2015-09-02 |
Board of Regents, The University of Texas System |
Method of forming a pattern on a substrate
|
|
US7211214B2
(en)
|
2000-07-18 |
2007-05-01 |
Princeton University |
Laser assisted direct imprint lithography
|
|
US6954275B2
(en)
|
2000-08-01 |
2005-10-11 |
Boards Of Regents, The University Of Texas System |
Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
|
|
SE519478C2
(sv)
|
2000-09-19 |
2003-03-04 |
Obducat Ab |
Etsförfarande, såväl som ramelement, mask och förtillverkat substratelement för användning i sådan etsning
|
|
JP2004523906A
(ja)
|
2000-10-12 |
2004-08-05 |
ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム |
室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
|
|
US6964793B2
(en)
|
2002-05-16 |
2005-11-15 |
Board Of Regents, The University Of Texas System |
Method for fabricating nanoscale patterns in light curable compositions using an electric field
|
|
US6847433B2
(en)
|
2001-06-01 |
2005-01-25 |
Agere Systems, Inc. |
Holder, system, and process for improving overlay in lithography
|
|
SE519573C2
(sv)
|
2001-07-05 |
2003-03-11 |
Obducat Ab |
Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
|
|
JP3588633B2
(ja)
|
2001-09-04 |
2004-11-17 |
独立行政法人産業技術総合研究所 |
インプリントリソグラフィー用移動ステージ
|
|
US20030080472A1
(en)
|
2001-10-29 |
2003-05-01 |
Chou Stephen Y. |
Lithographic method with bonded release layer for molding small patterns
|
|
US7144539B2
(en)
|
2002-04-04 |
2006-12-05 |
Obducat Ab |
Imprint method and device
|
|
EP1509379B1
(en)
|
2002-05-24 |
2012-02-29 |
Stephen Y. Chou |
Methods and apparatus of field-induced pressure imprint lithography
|
|
US7252492B2
(en)
|
2002-06-20 |
2007-08-07 |
Obducat Ab |
Devices and methods for aligning a stamp and a substrate
|
|
JP2004034300A
(ja)
*
|
2002-06-28 |
2004-02-05 |
Elionix Kk |
微小型押成形装置
|
|
US7077992B2
(en)
|
2002-07-11 |
2006-07-18 |
Molecular Imprints, Inc. |
Step and repeat imprint lithography processes
|
|
US6908861B2
(en)
|
2002-07-11 |
2005-06-21 |
Molecular Imprints, Inc. |
Method for imprint lithography using an electric field
|
|
US7070405B2
(en)
|
2002-08-01 |
2006-07-04 |
Molecular Imprints, Inc. |
Alignment systems for imprint lithography
|
|
US7027156B2
(en)
|
2002-08-01 |
2006-04-11 |
Molecular Imprints, Inc. |
Scatterometry alignment for imprint lithography
|
|
TWI277836B
(en)
*
|
2002-10-17 |
2007-04-01 |
Adv Lcd Tech Dev Ct Co Ltd |
Method and apparatus for forming pattern on thin-substrate or the like
|
|
US6916511B2
(en)
|
2002-10-24 |
2005-07-12 |
Hewlett-Packard Development Company, L.P. |
Method of hardening a nano-imprinting stamp
|
|
US6755984B2
(en)
|
2002-10-24 |
2004-06-29 |
Hewlett-Packard Development Company, L.P. |
Micro-casted silicon carbide nano-imprinting stamp
|
|
JP4317375B2
(ja)
*
|
2003-03-20 |
2009-08-19 |
株式会社日立製作所 |
ナノプリント装置、及び微細構造転写方法
|
|
WO2004086471A1
(en)
|
2003-03-27 |
2004-10-07 |
Korea Institute Of Machinery & Materials |
Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
|
|
US20040209123A1
(en)
|
2003-04-17 |
2004-10-21 |
Bajorek Christopher H. |
Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
|
|
TW568349U
(en)
|
2003-05-02 |
2003-12-21 |
Ind Tech Res Inst |
Parallelism adjusting device for nano-transferring
|
|
TW570290U
(en)
|
2003-05-02 |
2004-01-01 |
Ind Tech Res Inst |
Uniform pressing device for nanometer transfer-print
|
|
US6829988B2
(en)
*
|
2003-05-16 |
2004-12-14 |
Suss Microtec, Inc. |
Nanoimprinting apparatus and method
|
|
JP2005085965A
(ja)
*
|
2003-09-08 |
2005-03-31 |
Canon Inc |
近接場露光用マスク、近接場露光方法、及び近接場露光装置
|
|
JP2005101201A
(ja)
|
2003-09-24 |
2005-04-14 |
Canon Inc |
ナノインプリント装置
|
|
JP4455092B2
(ja)
*
|
2004-02-20 |
2010-04-21 |
キヤノン株式会社 |
加工装置及び加工方法
|
|
US7168939B2
(en)
*
|
2004-02-26 |
2007-01-30 |
Hitachi Global Storage Technologies Netherlands Bv |
System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning
|
|
WO2005119802A2
(en)
|
2004-05-28 |
2005-12-15 |
Board Of Regents, The University Of Texas System |
Adaptive shape substrate support system and method
|
|
JP4304139B2
(ja)
|
2004-09-30 |
2009-07-29 |
株式会社東芝 |
インプリント装置
|
|
US7922474B2
(en)
*
|
2005-02-17 |
2011-04-12 |
Asml Netherlands B.V. |
Imprint lithography
|
|
JP3958344B2
(ja)
*
|
2005-06-07 |
2007-08-15 |
キヤノン株式会社 |
インプリント装置、インプリント方法及びチップの製造方法
|
|
US7207871B1
(en)
*
|
2005-10-06 |
2007-04-24 |
Applied Materials, Inc. |
Carrier head with multiple chambers
|
|
US7618752B2
(en)
*
|
2006-10-12 |
2009-11-17 |
Hewlett-Packard Development Company, L.P. |
Deformation-based contact lithography systems, apparatus and methods
|