JP2010087533A5 - - Google Patents

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Publication number
JP2010087533A5
JP2010087533A5 JP2010003894A JP2010003894A JP2010087533A5 JP 2010087533 A5 JP2010087533 A5 JP 2010087533A5 JP 2010003894 A JP2010003894 A JP 2010003894A JP 2010003894 A JP2010003894 A JP 2010003894A JP 2010087533 A5 JP2010087533 A5 JP 2010087533A5
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JP
Japan
Prior art keywords
template
substrate
medium
imprint
imprinted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010003894A
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English (en)
Japanese (ja)
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JP5249250B2 (ja
JP2010087533A (ja
Filing date
Publication date
Priority claimed from US11/155,941 external-priority patent/US7922474B2/en
Application filed filed Critical
Publication of JP2010087533A publication Critical patent/JP2010087533A/ja
Publication of JP2010087533A5 publication Critical patent/JP2010087533A5/ja
Application granted granted Critical
Publication of JP5249250B2 publication Critical patent/JP5249250B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010003894A 2005-02-17 2010-01-12 インプリント方法およびインプリント装置 Expired - Fee Related JP5249250B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/155,941 2005-02-17
US11/155,941 US7922474B2 (en) 2005-02-17 2005-02-17 Imprint lithography

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006039322A Division JP4459914B2 (ja) 2005-02-17 2006-02-16 インプリントリソグラフィ

Publications (3)

Publication Number Publication Date
JP2010087533A JP2010087533A (ja) 2010-04-15
JP2010087533A5 true JP2010087533A5 (enExample) 2010-06-17
JP5249250B2 JP5249250B2 (ja) 2013-07-31

Family

ID=36814864

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006039322A Expired - Fee Related JP4459914B2 (ja) 2005-02-17 2006-02-16 インプリントリソグラフィ
JP2010003894A Expired - Fee Related JP5249250B2 (ja) 2005-02-17 2010-01-12 インプリント方法およびインプリント装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2006039322A Expired - Fee Related JP4459914B2 (ja) 2005-02-17 2006-02-16 インプリントリソグラフィ

Country Status (2)

Country Link
US (1) US7922474B2 (enExample)
JP (2) JP4459914B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7789294B2 (en) * 2005-02-18 2010-09-07 Ebet Systems Pty Ltd System and method for monitoring a validator
JP4595120B2 (ja) * 2005-05-27 2010-12-08 独立行政法人産業技術総合研究所 裏面加圧によるインプリント方法及び装置
US7613538B2 (en) * 2006-07-24 2009-11-03 Hewlett-Packard Development Company, L.P. Compensation for distortion in contact lithography
WO2008097278A2 (en) * 2006-09-19 2008-08-14 Molecular Imprints, Inc. Etch-enhanced technique for lift-off patterning
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
NL2006929A (en) 2010-08-05 2012-02-13 Asml Netherlands Bv Imprint lithography.
JP5995567B2 (ja) * 2012-07-12 2016-09-21 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法

Family Cites Families (58)

* Cited by examiner, † Cited by third party
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JP3187014B2 (ja) * 1990-01-24 2001-07-11 ホーヤ株式会社 レンズ成形用型
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
JP2691148B2 (ja) * 1995-08-22 1997-12-17 エドカ工業株式会社 シート状レンズの製法
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US20030080471A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
EP1003078A3 (en) 1998-11-17 2001-11-07 Corning Incorporated Replicating a nanoscale pattern
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US6165911A (en) 1999-12-29 2000-12-26 Calveley; Peter Braden Method of patterning a metal layer
AU2001228987A1 (en) 2000-01-21 2001-07-31 Obducat Aktiebolag A mold for nano imprinting
SE515785C2 (sv) 2000-02-23 2001-10-08 Obducat Ab Anordning för homogen värmning av ett objekt och användning av anordningen
SE515962C2 (sv) 2000-03-15 2001-11-05 Obducat Ab Anordning för överföring av mönster till objekt
SE0001367L (sv) 2000-04-13 2001-10-14 Obducat Ab Apparat och förfarande för elektrokemisk bearbetning av substrat
SE0001368L (sv) 2000-04-13 2001-10-14 Obducat Ab Apparat och förfarande för elektrokemisk bearbetning av substrat
SE516194C2 (sv) 2000-04-18 2001-12-03 Obducat Ab Substrat för samt process vid tillverkning av strukturer
US6365059B1 (en) 2000-04-28 2002-04-02 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
SE516414C2 (sv) 2000-05-24 2002-01-15 Obducat Ab Metod vid tillverkning av en mall, samt mallen tillverkad därav
EP2264522A3 (en) 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Method of forming a pattern on a substrate
CN1262883C (zh) 2000-07-17 2006-07-05 得克萨斯州大学系统董事会 影印用于平版印刷工艺中的自动化液体分配的方法和系统
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
EP1309897A2 (en) 2000-08-01 2003-05-14 Board Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
SE519478C2 (sv) 2000-09-19 2003-03-04 Obducat Ab Etsförfarande, såväl som ramelement, mask och förtillverkat substratelement för användning i sådan etsning
AU2001297642A1 (en) 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6847433B2 (en) 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
SE519573C2 (sv) 2001-07-05 2003-03-11 Obducat Ab Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
JP3588633B2 (ja) 2001-09-04 2004-11-17 独立行政法人産業技術総合研究所 インプリントリソグラフィー用移動ステージ
US7144539B2 (en) 2002-04-04 2006-12-05 Obducat Ab Imprint method and device
WO2003099536A1 (en) 2002-05-24 2003-12-04 Chou Stephen Y Methods and apparatus of field-induced pressure imprint lithography
US7252492B2 (en) 2002-06-20 2007-08-07 Obducat Ab Devices and methods for aligning a stamp and a substrate
JP2004034300A (ja) * 2002-06-28 2004-02-05 Elionix Kk 微小型押成形装置
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
TWI277836B (en) * 2002-10-17 2007-04-01 Adv Lcd Tech Dev Ct Co Ltd Method and apparatus for forming pattern on thin-substrate or the like
US6755984B2 (en) 2002-10-24 2004-06-29 Hewlett-Packard Development Company, L.P. Micro-casted silicon carbide nano-imprinting stamp
US6916511B2 (en) 2002-10-24 2005-07-12 Hewlett-Packard Development Company, L.P. Method of hardening a nano-imprinting stamp
JP4317375B2 (ja) * 2003-03-20 2009-08-19 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US20040209123A1 (en) 2003-04-17 2004-10-21 Bajorek Christopher H. Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
TW568349U (en) 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
TW570290U (en) 2003-05-02 2004-01-01 Ind Tech Res Inst Uniform pressing device for nanometer transfer-print
US6829988B2 (en) * 2003-05-16 2004-12-14 Suss Microtec, Inc. Nanoimprinting apparatus and method
JP2005085965A (ja) * 2003-09-08 2005-03-31 Canon Inc 近接場露光用マスク、近接場露光方法、及び近接場露光装置
JP2005101201A (ja) 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP4455092B2 (ja) * 2004-02-20 2010-04-21 キヤノン株式会社 加工装置及び加工方法
US7168939B2 (en) * 2004-02-26 2007-01-30 Hitachi Global Storage Technologies Netherlands Bv System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning
WO2005119802A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
JP4304139B2 (ja) 2004-09-30 2009-07-29 株式会社東芝 インプリント装置
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
JP3958344B2 (ja) * 2005-06-07 2007-08-15 キヤノン株式会社 インプリント装置、インプリント方法及びチップの製造方法
US7207871B1 (en) * 2005-10-06 2007-04-24 Applied Materials, Inc. Carrier head with multiple chambers
US7618752B2 (en) * 2006-10-12 2009-11-17 Hewlett-Packard Development Company, L.P. Deformation-based contact lithography systems, apparatus and methods

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