SE0001367L - Apparat och förfarande för elektrokemisk bearbetning av substrat - Google Patents

Apparat och förfarande för elektrokemisk bearbetning av substrat

Info

Publication number
SE0001367L
SE0001367L SE0001367A SE0001367A SE0001367L SE 0001367 L SE0001367 L SE 0001367L SE 0001367 A SE0001367 A SE 0001367A SE 0001367 A SE0001367 A SE 0001367A SE 0001367 L SE0001367 L SE 0001367L
Authority
SE
Sweden
Prior art keywords
chamber
substrate
electrochemical processing
electrolyte
container
Prior art date
Application number
SE0001367A
Other languages
English (en)
Other versions
SE0001367D0 (sv
Inventor
Mats Haallberg
Lennart Olsson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001367A priority Critical patent/SE0001367L/sv
Publication of SE0001367D0 publication Critical patent/SE0001367D0/sv
Priority to AU48968/01A priority patent/AU4896801A/en
Priority to PCT/SE2001/000824 priority patent/WO2001079592A1/en
Publication of SE0001367L publication Critical patent/SE0001367L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Weting (AREA)
  • Electroplating Methods And Accessories (AREA)
SE0001367A 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat SE0001367L (sv)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat
AU48968/01A AU4896801A (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates
PCT/SE2001/000824 WO2001079592A1 (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat

Publications (2)

Publication Number Publication Date
SE0001367D0 SE0001367D0 (sv) 2000-04-13
SE0001367L true SE0001367L (sv) 2001-10-14

Family

ID=20279303

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat

Country Status (3)

Country Link
AU (1) AU4896801A (sv)
SE (1) SE0001367L (sv)
WO (1) WO2001079592A1 (sv)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001277907A1 (en) 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7611348B2 (en) 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE7603626L (sv) * 1975-03-27 1977-01-04 Otto Alfred Becker Anordning for att galvanisera metallytor, serskilt vid snittkantytor hos genom stapling tillskurna platar
US4163705A (en) * 1975-05-06 1979-08-07 Korpi Teuvo Tapio Apparatus for chemical and electrochemical treatment
IT1177925B (it) * 1984-07-24 1987-08-26 Centro Speriment Metallurg Procedimento per elettrodeposizione in continuo di metalli ad elevata denista' di corrente di celle verticali e relativo dispositivo di attuazione
FR2648157A1 (fr) * 1989-06-13 1990-12-14 Traitement Surface Mecanique Dispositif permettant d'assurer un depot electrolytique homogene sur des surfaces cylindriques de grandes dimensions
US5180438A (en) * 1989-10-11 1993-01-19 Hockh Metall-Reinigungsanlagen Gmbh Cleaning and drying system
SE467976B (sv) * 1991-02-20 1992-10-12 Dcm Innovation Ab Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen
US5660699A (en) * 1995-02-20 1997-08-26 Kao Corporation Electroplating apparatus
JPH08283995A (ja) * 1995-04-13 1996-10-29 Seikosha Co Ltd メッキ装置
US5522975A (en) * 1995-05-16 1996-06-04 International Business Machines Corporation Electroplating workpiece fixture
US5683564A (en) * 1996-10-15 1997-11-04 Reynolds Tech Fabricators Inc. Plating cell and plating method with fluid wiper

Also Published As

Publication number Publication date
SE0001367D0 (sv) 2000-04-13
WO2001079592A1 (en) 2001-10-25
AU4896801A (en) 2001-10-30

Similar Documents

Publication Publication Date Title
SE0001367L (sv) Apparat och förfarande för elektrokemisk bearbetning av substrat
SE0001368D0 (sv) Apparat och förfarande för elektrokemisk bearbetning av substrat
EP1286382A3 (en) Atmospheric pressure plasma treatment apparatus and method
TW357392B (en) Method and apparatus for removal of excessive material from perimeter of the substrate and method of application using the apparatus
MY126731A (en) Lower electrode design for higher uniformity
EP1875987A3 (en) Method and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate
AU4582100A (en) Apparatus for, and method of, introducing a substance into an object
GB9322966D0 (en) Method for making a semiconductor and apparatus for the same
TW363219B (en) Anodizing apparatus and apparatus and method associated with the same
TW200606502A (en) An apparatus for manufacturing a bonded substrate
EP1207546A3 (en) Apparatus and method for plasma-treating of a substrate
ATE332235T1 (de) Flüssigkeitsausstosskopf
WO2002078043A3 (en) Beam processing apparatus
AU7419000A (en) Method and device for taking measurements of cells which are contained in a liquid environment
AU2156402A (en) A method and apparatus for isolation of ionic species from a liquid
WO2003010809A1 (fr) Dispositif de traitement au plasma et table de montage de substrat
EP1047126A3 (en) Method and apparatus for controlling chucking force in an electrostatic chuck
WO2004108299A3 (en) Porous electrospray emitter
DK0975818T3 (da) Fremgangsmåde og anordning til PVD belægning
TW353192B (en) Plasma processing apparatus avoiding discharges in association with secondary potentials
MY120869A (en) Plasma treatment apparatus and method
CA2354925A1 (en) Apparatus and method for coating substrates
ID16828A (id) Alat untuk pelayanan basah lapisan-lapisan bawah
TW200517529A (en) Plating method and apparatus
CN110085502A (zh) 控制等离子体处理装置的方法和等离子体处理装置

Legal Events

Date Code Title Description
NAV Patent application has lapsed