SE0001367L - Apparatus and method for electrochemical processing of substrates - Google Patents
Apparatus and method for electrochemical processing of substratesInfo
- Publication number
- SE0001367L SE0001367L SE0001367A SE0001367A SE0001367L SE 0001367 L SE0001367 L SE 0001367L SE 0001367 A SE0001367 A SE 0001367A SE 0001367 A SE0001367 A SE 0001367A SE 0001367 L SE0001367 L SE 0001367L
- Authority
- SE
- Sweden
- Prior art keywords
- chamber
- substrate
- electrochemical processing
- electrolyte
- container
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/003—Electroplating using gases, e.g. pressure influence
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Automation & Control Theory (AREA)
- Weting (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
In a method for electrochemical processing of a substrate (S), use is made of an apparatus which comprises a container (1) having a chamber for holding an electrolyte, an electrode member (8) arranged in the chamber, and a substrate holder (60) arranged in the chamber and adapted to carry the substrate (S). A voltage source is connected to the electrode member (8) and the substrate holder (60) to establish, during processing, an electrical field in the electrolyte between the electrode member (8) and the substrate (S) carried by the substrate holder (60). A pressure control means is adapted to establish a subatmospheric pressure in the chamber during the electrochemical processing so that leakage of electrolyte from the container (1) to the surroundings is eliminated and so that the parts of the container (1) are automatically held together by the subatmospheric pressure in the chamber.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001367A SE0001367L (en) | 2000-04-13 | 2000-04-13 | Apparatus and method for electrochemical processing of substrates |
AU48968/01A AU4896801A (en) | 2000-04-13 | 2001-04-12 | Apparatus and method for electrochemical processing of substrates |
PCT/SE2001/000824 WO2001079592A1 (en) | 2000-04-13 | 2001-04-12 | Apparatus and method for electrochemical processing of substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001367A SE0001367L (en) | 2000-04-13 | 2000-04-13 | Apparatus and method for electrochemical processing of substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
SE0001367D0 SE0001367D0 (en) | 2000-04-13 |
SE0001367L true SE0001367L (en) | 2001-10-14 |
Family
ID=20279303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0001367A SE0001367L (en) | 2000-04-13 | 2000-04-13 | Apparatus and method for electrochemical processing of substrates |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU4896801A (en) |
SE (1) | SE0001367L (en) |
WO (1) | WO2001079592A1 (en) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1303793B1 (en) | 2000-07-17 | 2015-01-28 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
US6805054B1 (en) | 2003-05-14 | 2004-10-19 | Molecular Imprints, Inc. | Method, system and holder for transferring templates during imprint lithography processes |
US6951173B1 (en) | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
US7730834B2 (en) | 2004-03-04 | 2010-06-08 | Asml Netherlands B.V. | Printing apparatus and device manufacturing method |
US7676088B2 (en) | 2004-12-23 | 2010-03-09 | Asml Netherlands B.V. | Imprint lithography |
US7686970B2 (en) | 2004-12-30 | 2010-03-30 | Asml Netherlands B.V. | Imprint lithography |
US7490547B2 (en) | 2004-12-30 | 2009-02-17 | Asml Netherlands B.V. | Imprint lithography |
US7354698B2 (en) | 2005-01-07 | 2008-04-08 | Asml Netherlands B.V. | Imprint lithography |
US7922474B2 (en) | 2005-02-17 | 2011-04-12 | Asml Netherlands B.V. | Imprint lithography |
US7523701B2 (en) | 2005-03-07 | 2009-04-28 | Asml Netherlands B.V. | Imprint lithography method and apparatus |
US7611348B2 (en) | 2005-04-19 | 2009-11-03 | Asml Netherlands B.V. | Imprint lithography |
US7762186B2 (en) | 2005-04-19 | 2010-07-27 | Asml Netherlands B.V. | Imprint lithography |
US7442029B2 (en) | 2005-05-16 | 2008-10-28 | Asml Netherlands B.V. | Imprint lithography |
US20060267231A1 (en) | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
US7708924B2 (en) | 2005-07-21 | 2010-05-04 | Asml Netherlands B.V. | Imprint lithography |
US7692771B2 (en) | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
US7418902B2 (en) | 2005-05-31 | 2008-09-02 | Asml Netherlands B.V. | Imprint lithography including alignment |
US7377764B2 (en) | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
US7878791B2 (en) | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
US8011915B2 (en) | 2005-11-04 | 2011-09-06 | Asml Netherlands B.V. | Imprint lithography |
US7517211B2 (en) | 2005-12-21 | 2009-04-14 | Asml Netherlands B.V. | Imprint lithography |
US8318253B2 (en) | 2006-06-30 | 2012-11-27 | Asml Netherlands B.V. | Imprint lithography |
US8015939B2 (en) | 2006-06-30 | 2011-09-13 | Asml Netherlands B.V. | Imprintable medium dispenser |
US7854877B2 (en) | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
US8144309B2 (en) | 2007-09-05 | 2012-03-27 | Asml Netherlands B.V. | Imprint lithography |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE7603626L (en) * | 1975-03-27 | 1977-01-04 | Otto Alfred Becker | DEVICE FOR GALVANIZING METAL SURFACES, SEPARATELY AT CUTTING EDGE WITH STACKING CUTTING PLATES |
US4163705A (en) * | 1975-05-06 | 1979-08-07 | Korpi Teuvo Tapio | Apparatus for chemical and electrochemical treatment |
IT1177925B (en) * | 1984-07-24 | 1987-08-26 | Centro Speriment Metallurg | PROCEDURE FOR CONTINUOUS ELECTRODEPOSITION OF METALS WITH HIGH CURRENT DENISTA OF VERTICAL CELLS AND RELEVANT IMPLEMENTATION DEVICE |
FR2648157A1 (en) * | 1989-06-13 | 1990-12-14 | Traitement Surface Mecanique | Device making it possible to ensure homogeneous electrolytic deposition on cylindrical surfaces of large dimensions |
US5180438A (en) * | 1989-10-11 | 1993-01-19 | Hockh Metall-Reinigungsanlagen Gmbh | Cleaning and drying system |
SE467976B (en) * | 1991-02-20 | 1992-10-12 | Dcm Innovation Ab | DEVICE FOR ELECTRICAL PLATING, IN THE MANUFACTURE OF MATRISTS FOR THE MANUFACTURE OF EX EX CDS AND PROCEDURES FOR THE MANUFACTURE OF MATRICES BY THE DEVICE |
US5660699A (en) * | 1995-02-20 | 1997-08-26 | Kao Corporation | Electroplating apparatus |
JPH08283995A (en) * | 1995-04-13 | 1996-10-29 | Seikosha Co Ltd | Plating device |
US5522975A (en) * | 1995-05-16 | 1996-06-04 | International Business Machines Corporation | Electroplating workpiece fixture |
US5683564A (en) * | 1996-10-15 | 1997-11-04 | Reynolds Tech Fabricators Inc. | Plating cell and plating method with fluid wiper |
-
2000
- 2000-04-13 SE SE0001367A patent/SE0001367L/en not_active Application Discontinuation
-
2001
- 2001-04-12 WO PCT/SE2001/000824 patent/WO2001079592A1/en active Application Filing
- 2001-04-12 AU AU48968/01A patent/AU4896801A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2001079592A1 (en) | 2001-10-25 |
SE0001367D0 (en) | 2000-04-13 |
AU4896801A (en) | 2001-10-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NAV | Patent application has lapsed |