SE0001368D0 - Apparatus and method for electrochemical processing of substrates - Google Patents

Apparatus and method for electrochemical processing of substrates

Info

Publication number
SE0001368D0
SE0001368D0 SE0001368A SE0001368A SE0001368D0 SE 0001368 D0 SE0001368 D0 SE 0001368D0 SE 0001368 A SE0001368 A SE 0001368A SE 0001368 A SE0001368 A SE 0001368A SE 0001368 D0 SE0001368 D0 SE 0001368D0
Authority
SE
Sweden
Prior art keywords
substrate
chamber
electrode member
electrolyte
substrate holder
Prior art date
Application number
SE0001368A
Other languages
Swedish (sv)
Other versions
SE0001368L (en
Inventor
Mats Haallberg
Lennart Olsson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001368A priority Critical patent/SE0001368L/en
Publication of SE0001368D0 publication Critical patent/SE0001368D0/en
Priority to AU48966/01A priority patent/AU4896601A/en
Priority to PCT/SE2001/000822 priority patent/WO2001079591A1/en
Publication of SE0001368L publication Critical patent/SE0001368L/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

In a method for electrochemical processing of a substrate (S), use is made of an apparatus which comprises a container (1) having a chamber for holding an electrolyte, an electrode member (8) arranged in the chamber, and a substrate holder (60) arranged in the chamber and adapted to carry the substrate (S). A voltage source is connected to the electrode member (8) and the substrate holder (60) to establish, during processing, an electrical field in the electrolyte between the electrode member (8) and the substrate (S) carried by the substrate holder (60). The apparatus also comprises a turbulence generator (12) with a stirring portion which is rotatable in the chamber between the electrode member (8) and the substrate holder (60), to achieve an optional degree of turbulence between the electrode member (8) and the substrate (S), independently of a possible flow of electrolyte through the chamber, and to minimise concentration gradients in the electrolyte.
SE0001368A 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates SE0001368L (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates
AU48966/01A AU4896601A (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates
PCT/SE2001/000822 WO2001079591A1 (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates

Publications (2)

Publication Number Publication Date
SE0001368D0 true SE0001368D0 (en) 2000-04-13
SE0001368L SE0001368L (en) 2001-10-14

Family

ID=20279304

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates

Country Status (3)

Country Link
AU (1) AU4896601A (en)
SE (1) SE0001368L (en)
WO (1) WO2001079591A1 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1303793B1 (en) 2000-07-17 2015-01-28 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
JP2014525517A (en) * 2011-09-08 2014-09-29 クリア メタルズ インコーポレイテッド Formation of an oxide layer on a flat conductive surface

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE7603626L (en) * 1975-03-27 1977-01-04 Otto Alfred Becker DEVICE FOR GALVANIZING METAL SURFACES, SEPARATELY AT CUTTING EDGE WITH STACKING CUTTING PLATES
US4163705A (en) * 1975-05-06 1979-08-07 Korpi Teuvo Tapio Apparatus for chemical and electrochemical treatment
IT1177925B (en) * 1984-07-24 1987-08-26 Centro Speriment Metallurg PROCEDURE FOR CONTINUOUS ELECTRODEPOSITION OF METALS WITH HIGH CURRENT DENISTA OF VERTICAL CELLS AND RELEVANT IMPLEMENTATION DEVICE
FR2648157A1 (en) * 1989-06-13 1990-12-14 Traitement Surface Mecanique Device making it possible to ensure homogeneous electrolytic deposition on cylindrical surfaces of large dimensions
US5180438A (en) * 1989-10-11 1993-01-19 Hockh Metall-Reinigungsanlagen Gmbh Cleaning and drying system
SE467976B (en) * 1991-02-20 1992-10-12 Dcm Innovation Ab DEVICE FOR ELECTRICAL PLATING, IN THE MANUFACTURE OF MATRISTS FOR THE MANUFACTURE OF EX EX CDS AND PROCEDURES FOR THE MANUFACTURE OF MATRICES BY THE DEVICE
US5660699A (en) * 1995-02-20 1997-08-26 Kao Corporation Electroplating apparatus
JPH08283995A (en) * 1995-04-13 1996-10-29 Seikosha Co Ltd Plating device
US5522975A (en) * 1995-05-16 1996-06-04 International Business Machines Corporation Electroplating workpiece fixture
US5683564A (en) * 1996-10-15 1997-11-04 Reynolds Tech Fabricators Inc. Plating cell and plating method with fluid wiper

Also Published As

Publication number Publication date
WO2001079591A1 (en) 2001-10-25
SE0001368L (en) 2001-10-14
AU4896601A (en) 2001-10-30

Similar Documents

Publication Publication Date Title
SE0001368D0 (en) Apparatus and method for electrochemical processing of substrates
SE0001367D0 (en) Apparatus and method for electrochemical processing of substrates
DK505489A (en) APPARATUS AND PROCEDURE FOR INDICATING ACCESSIBILITY FOR THE CREATION OF THE NON-RESTRICTION AND FOR DEHYDRATION, IN PARTICULAR HUMANS
ATE272732T1 (en) ANODIC OXIDATION APPARATUS AND APPARATUS AND METHOD ASSOCIATED THEREOF
ATE252730T1 (en) CELL FOR ELECTROCHEMILUMINESCENCE WITH POTENTIAL-FREE REACTION ELECTRODES
EP1734111B1 (en) Cell fusion device, and method for cell fusion using the same
ATE459976T1 (en) FAIMS APPARATUS AND METHOD USING A CARRIER GAS OF MIXED COMPOSITION
IL102486A (en) Method and apparatus for detection of nucleic acid sequences with a nucleic acid probe
ATE314869T1 (en) DISPOSABLE SET FOR CIRCULAR WASHING OF BLOOD CELLS
ATE267897T1 (en) METHOD AND DEVICE FOR CLEANING AND/OR COATING METAL SURFACES USING ELECTROPLASMA TECHNOLOGY
DE60317080D1 (en) METHOD AND DEVICE FOR ELECTROMECHANICAL AND / OR ELECTROCHEMICAL MECHANICAL REMOVAL OF CONDUCTIVE MATERIAL FROM A MICROELECTRONIC SUBSTRATE
DE3663744D1 (en) A flow chamber device for flow cytometers
AU2003221802A1 (en) Selectively aligning nanometer-scale components using ac fields
EP0922955A3 (en) Ion concentration and pH measurement
ES2040751T3 (en) METHOD AND APPARATUS FOR THE DETERMINATION OF ELECTROCHEMICALLY ACTIVE COMPONENTS IN A PROCESS CURRENT.
GB2336161B (en) Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method
ATE281513T1 (en) DEVICE FOR ELECTROPORATION WITH CONTINUOUS CONTROL OF CELL PERMEABILITY
DE69028137D1 (en) Plating process
EP1179616A3 (en) Method and apparatuses for electrochemically treating an article
ATE227611T1 (en) METHOD AND DEVICE FOR TREATING SUBSTRATES
NO910817L (en) PROCEDURE AND APPARATUS FOR STUDYING AND QUANTIFYING INTERACTIONAL EFFECTS ON CONNECTIONS ON BIOLOGICAL CELLS.
Raptis et al. Applications of electroporation of adherent cells in situ, on a partly conductive slide
JPS57158395A (en) Method and apparatus for preventing plating on back side in electroplating
JPH0134114Y2 (en)
EP1093157A3 (en) Substrate processing method and apparatus

Legal Events

Date Code Title Description
NAV Patent application has lapsed