SE0001368L - Apparatus and method for electrochemical processing of substrates - Google Patents

Apparatus and method for electrochemical processing of substrates

Info

Publication number
SE0001368L
SE0001368L SE0001368A SE0001368A SE0001368L SE 0001368 L SE0001368 L SE 0001368L SE 0001368 A SE0001368 A SE 0001368A SE 0001368 A SE0001368 A SE 0001368A SE 0001368 L SE0001368 L SE 0001368L
Authority
SE
Sweden
Prior art keywords
substrate
chamber
electrode member
electrolyte
substrate holder
Prior art date
Application number
SE0001368A
Other languages
Unknown language ( )
Swedish (sv)
Other versions
SE0001368D0 (en
Inventor
Mats Haallberg
Lennart Olsson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001368A priority Critical patent/SE0001368L/en
Publication of SE0001368D0 publication Critical patent/SE0001368D0/en
Priority to PCT/SE2001/000822 priority patent/WO2001079591A1/en
Priority to AU48966/01A priority patent/AU4896601A/en
Publication of SE0001368L publication Critical patent/SE0001368L/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

In a method for electrochemical processing of a substrate (S), use is made of an apparatus which comprises a container (1) having a chamber for holding an electrolyte, an electrode member (8) arranged in the chamber, and a substrate holder (60) arranged in the chamber and adapted to carry the substrate (S). A voltage source is connected to the electrode member (8) and the substrate holder (60) to establish, during processing, an electrical field in the electrolyte between the electrode member (8) and the substrate (S) carried by the substrate holder (60). The apparatus also comprises a turbulence generator (12) with a stirring portion which is rotatable in the chamber between the electrode member (8) and the substrate holder (60), to achieve an optional degree of turbulence between the electrode member (8) and the substrate (S), independently of a possible flow of electrolyte through the chamber, and to minimise concentration gradients in the electrolyte.
SE0001368A 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates SE0001368L (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates
PCT/SE2001/000822 WO2001079591A1 (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates
AU48966/01A AU4896601A (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates

Publications (2)

Publication Number Publication Date
SE0001368D0 SE0001368D0 (en) 2000-04-13
SE0001368L true SE0001368L (en) 2001-10-14

Family

ID=20279304

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001368A SE0001368L (en) 2000-04-13 2000-04-13 Apparatus and method for electrochemical processing of substrates

Country Status (3)

Country Link
AU (1) AU4896601A (en)
SE (1) SE0001368L (en)
WO (1) WO2001079591A1 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002006902A2 (en) 2000-07-17 2002-01-24 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
SG11201400494TA (en) * 2011-09-08 2014-09-26 Clear Metals Inc Forming an oxide layer on a flat conductive surface

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE7603626L (en) * 1975-03-27 1977-01-04 Otto Alfred Becker DEVICE FOR GALVANIZING METAL SURFACES, SEPARATELY AT CUTTING EDGE WITH STACKING CUTTING PLATES
US4163705A (en) * 1975-05-06 1979-08-07 Korpi Teuvo Tapio Apparatus for chemical and electrochemical treatment
IT1177925B (en) * 1984-07-24 1987-08-26 Centro Speriment Metallurg PROCEDURE FOR CONTINUOUS ELECTRODEPOSITION OF METALS WITH HIGH CURRENT DENISTA OF VERTICAL CELLS AND RELEVANT IMPLEMENTATION DEVICE
FR2648157A1 (en) * 1989-06-13 1990-12-14 Traitement Surface Mecanique Device making it possible to ensure homogeneous electrolytic deposition on cylindrical surfaces of large dimensions
US5180438A (en) * 1989-10-11 1993-01-19 Hockh Metall-Reinigungsanlagen Gmbh Cleaning and drying system
SE467976B (en) * 1991-02-20 1992-10-12 Dcm Innovation Ab DEVICE FOR ELECTRICAL PLATING, IN THE MANUFACTURE OF MATRISTS FOR THE MANUFACTURE OF EX EX CDS AND PROCEDURES FOR THE MANUFACTURE OF MATRICES BY THE DEVICE
US5660699A (en) * 1995-02-20 1997-08-26 Kao Corporation Electroplating apparatus
JPH08283995A (en) * 1995-04-13 1996-10-29 Seikosha Co Ltd Plating device
US5522975A (en) * 1995-05-16 1996-06-04 International Business Machines Corporation Electroplating workpiece fixture
US5683564A (en) * 1996-10-15 1997-11-04 Reynolds Tech Fabricators Inc. Plating cell and plating method with fluid wiper

Also Published As

Publication number Publication date
WO2001079591A1 (en) 2001-10-25
SE0001368D0 (en) 2000-04-13
AU4896601A (en) 2001-10-30

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