JP2010078482A - 質量分析用基板および質量分析方法 - Google Patents

質量分析用基板および質量分析方法 Download PDF

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Publication number
JP2010078482A
JP2010078482A JP2008247800A JP2008247800A JP2010078482A JP 2010078482 A JP2010078482 A JP 2010078482A JP 2008247800 A JP2008247800 A JP 2008247800A JP 2008247800 A JP2008247800 A JP 2008247800A JP 2010078482 A JP2010078482 A JP 2010078482A
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Japan
Prior art keywords
substrate
mass spectrometry
reflector
metal
sample
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Japanese (ja)
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JP2010078482A5 (enExample
Inventor
Morihito Ikeda
森人 池田
Naoki Murakami
直樹 村上
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2008247800A priority Critical patent/JP2010078482A/ja
Priority to US12/568,197 priority patent/US8008620B2/en
Publication of JP2010078482A publication Critical patent/JP2010078482A/ja
Publication of JP2010078482A5 publication Critical patent/JP2010078482A5/ja
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0409—Sample holders or containers
    • H01J49/0418—Sample holders or containers for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI] plates or surface enhanced laser desorption/ionisation [SELDI] plates

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP2008247800A 2008-09-26 2008-09-26 質量分析用基板および質量分析方法 Abandoned JP2010078482A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008247800A JP2010078482A (ja) 2008-09-26 2008-09-26 質量分析用基板および質量分析方法
US12/568,197 US8008620B2 (en) 2008-09-26 2009-09-28 Substrate for mass spectrometry and mass spectrometry method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008247800A JP2010078482A (ja) 2008-09-26 2008-09-26 質量分析用基板および質量分析方法

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JP2010078482A true JP2010078482A (ja) 2010-04-08
JP2010078482A5 JP2010078482A5 (enExample) 2011-03-17

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JP2008247800A Abandoned JP2010078482A (ja) 2008-09-26 2008-09-26 質量分析用基板および質量分析方法

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JP (1) JP2010078482A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014027652A1 (ja) * 2012-08-17 2014-02-20 独立行政法人科学技術振興機構 ラマン分光法を用いた生体分子の解析方法及び装置
JP2014153183A (ja) * 2013-02-08 2014-08-25 Nitto Denko Corp 表面支援レーザー脱離イオン化飛行時間型質量分析装置用イオン化支援部材
US9204803B2 (en) 2013-03-28 2015-12-08 Seiko Epson Corporation Optical device, detecting apparatus, and electronic apparatus

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7888127B2 (en) 2008-01-15 2011-02-15 Sequenom, Inc. Methods for reducing adduct formation for mass spectrometry analysis
TWI456195B (zh) * 2011-01-27 2014-10-11 Univ Nat Cheng Kung 生醫及微奈米結構物質感測晶片及其製備方法
RU2565328C1 (ru) * 2011-08-31 2015-10-20 Асахи Касеи И-Матириалс Корпорейшн Подложка для оптической системы и полупроводниковое светоизлучающее устройство
US9305756B2 (en) * 2013-03-13 2016-04-05 Agena Bioscience, Inc. Preparation enhancements and methods of use for MALDI mass spectrometry
KR20150107941A (ko) * 2014-03-13 2015-09-24 삼성전자주식회사 전기광학 모듈레이터 및 이를 포함하는 tft 어레이 검사 장치
CN110931344B (zh) * 2019-12-09 2022-06-03 广东省半导体产业技术研究院 一种用于质谱检测的介电型样品靶片及其制作方法

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WO2004051231A1 (ja) * 2002-11-29 2004-06-17 Nec Corporation 分離装置および分離方法
WO2004081555A1 (ja) * 2003-03-14 2004-09-23 Nec Corporation 質量分析システムおよび分析方法
JP2007024870A (ja) * 2005-06-14 2007-02-01 Fujifilm Holdings Corp センサ、センシング装置、及びセンシング方法
WO2007046162A1 (ja) * 2005-10-20 2007-04-26 Japan Science And Technology Agency 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置
JP2007171003A (ja) * 2005-12-22 2007-07-05 Fujifilm Corp 質量分析用基板並びに分析方法および装置
JP2008025989A (ja) * 2006-07-15 2008-02-07 Keio Gijuku 局在表面プラズモン共鳴法と質量分析法によるリガンドの分析方法及びそのためのセンサー素子
JP2008204654A (ja) * 2007-02-16 2008-09-04 Univ Of Tokyo Ｌｄｉプレート、レーザー脱離イオン化質量分析装置、レーザー脱離イオン化質量分析方法及びｌｄｉプレート製造方法

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WO1998010289A1 (en) * 1996-09-04 1998-03-12 The Penn State Research Foundation Self-assembled metal colloid monolayers
JP4536866B2 (ja) 1999-04-27 2010-09-01 キヤノン株式会社 ナノ構造体及びその製造方法
JP3387897B2 (ja) 1999-08-30 2003-03-17 キヤノン株式会社 構造体の製造方法、並びに該製造方法により製造される構造体及び該構造体を用いた構造体デバイス
US7517496B2 (en) * 2001-07-17 2009-04-14 Bio-Rad Laboratories, Inc. Latex based adsorbent chip
JP2008026109A (ja) 2006-07-20 2008-02-07 Fujifilm Corp 微細構造体及びその製造方法、センサデバイス及びラマン分光用デバイス

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004051231A1 (ja) * 2002-11-29 2004-06-17 Nec Corporation 分離装置および分離方法
WO2004081555A1 (ja) * 2003-03-14 2004-09-23 Nec Corporation 質量分析システムおよび分析方法
JP2007024870A (ja) * 2005-06-14 2007-02-01 Fujifilm Holdings Corp センサ、センシング装置、及びセンシング方法
WO2007046162A1 (ja) * 2005-10-20 2007-04-26 Japan Science And Technology Agency 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置
JP2007171003A (ja) * 2005-12-22 2007-07-05 Fujifilm Corp 質量分析用基板並びに分析方法および装置
JP2008025989A (ja) * 2006-07-15 2008-02-07 Keio Gijuku 局在表面プラズモン共鳴法と質量分析法によるリガンドの分析方法及びそのためのセンサー素子
JP2008204654A (ja) * 2007-02-16 2008-09-04 Univ Of Tokyo Ｌｄｉプレート、レーザー脱離イオン化質量分析装置、レーザー脱離イオン化質量分析方法及びｌｄｉプレート製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014027652A1 (ja) * 2012-08-17 2014-02-20 独立行政法人科学技術振興機構 ラマン分光法を用いた生体分子の解析方法及び装置
JPWO2014027652A1 (ja) * 2012-08-17 2016-07-28 国立研究開発法人科学技術振興機構 ラマン分光法を用いた生体分子の解析方法及び装置
US10338078B2 (en) 2012-08-17 2019-07-02 Japan Science And Technology Agency Method and apparatus for analyzing biomolecules using Raman spectroscopy
JP2014153183A (ja) * 2013-02-08 2014-08-25 Nitto Denko Corp 表面支援レーザー脱離イオン化飛行時間型質量分析装置用イオン化支援部材
US9204803B2 (en) 2013-03-28 2015-12-08 Seiko Epson Corporation Optical device, detecting apparatus, and electronic apparatus

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US8008620B2 (en) 2011-08-30
US20100078552A1 (en) 2010-04-01

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