JP2010021243A5 - - Google Patents

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Publication number
JP2010021243A5
JP2010021243A5 JP2008178863A JP2008178863A JP2010021243A5 JP 2010021243 A5 JP2010021243 A5 JP 2010021243A5 JP 2008178863 A JP2008178863 A JP 2008178863A JP 2008178863 A JP2008178863 A JP 2008178863A JP 2010021243 A5 JP2010021243 A5 JP 2010021243A5
Authority
JP
Japan
Prior art keywords
plasma processing
dielectric plate
holding table
injector base
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008178863A
Other languages
English (en)
Japanese (ja)
Other versions
JP5304061B2 (ja
JP2010021243A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2008178863A external-priority patent/JP5304061B2/ja
Priority to JP2008178863A priority Critical patent/JP5304061B2/ja
Priority to US13/003,102 priority patent/US8800484B2/en
Priority to KR1020107028917A priority patent/KR101174277B1/ko
Priority to PCT/JP2009/060916 priority patent/WO2010004836A1/ja
Priority to CN200980125715.7A priority patent/CN102084469B/zh
Priority to TW098123004A priority patent/TWI425883B/zh
Publication of JP2010021243A publication Critical patent/JP2010021243A/ja
Publication of JP2010021243A5 publication Critical patent/JP2010021243A5/ja
Publication of JP5304061B2 publication Critical patent/JP5304061B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008178863A 2008-07-09 2008-07-09 プラズマ処理装置 Expired - Fee Related JP5304061B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2008178863A JP5304061B2 (ja) 2008-07-09 2008-07-09 プラズマ処理装置
CN200980125715.7A CN102084469B (zh) 2008-07-09 2009-06-16 等离子体处理装置
KR1020107028917A KR101174277B1 (ko) 2008-07-09 2009-06-16 플라즈마 처리 장치
PCT/JP2009/060916 WO2010004836A1 (ja) 2008-07-09 2009-06-16 プラズマ処理装置
US13/003,102 US8800484B2 (en) 2008-07-09 2009-06-16 Plasma processing apparatus
TW098123004A TWI425883B (zh) 2008-07-09 2009-07-08 Plasma processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008178863A JP5304061B2 (ja) 2008-07-09 2008-07-09 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2010021243A JP2010021243A (ja) 2010-01-28
JP2010021243A5 true JP2010021243A5 (https=) 2012-02-23
JP5304061B2 JP5304061B2 (ja) 2013-10-02

Family

ID=41705873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008178863A Expired - Fee Related JP5304061B2 (ja) 2008-07-09 2008-07-09 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5304061B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5955062B2 (ja) * 2011-04-25 2016-07-20 東京エレクトロン株式会社 プラズマ処理装置
JP5525504B2 (ja) 2011-11-08 2014-06-18 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5082229B2 (ja) * 2005-11-29 2012-11-28 東京エレクトロン株式会社 プラズマ処理装置
JP4833778B2 (ja) * 2006-02-13 2011-12-07 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN101772833B (zh) * 2008-02-20 2012-04-18 东京毅力科创株式会社 气体供给装置

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