JP2009533251A5 - - Google Patents

Download PDF

Info

Publication number
JP2009533251A5
JP2009533251A5 JP2009505432A JP2009505432A JP2009533251A5 JP 2009533251 A5 JP2009533251 A5 JP 2009533251A5 JP 2009505432 A JP2009505432 A JP 2009505432A JP 2009505432 A JP2009505432 A JP 2009505432A JP 2009533251 A5 JP2009533251 A5 JP 2009533251A5
Authority
JP
Japan
Prior art keywords
layer
rsa
surfactant composition
reactive surfactant
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009505432A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009533251A (ja
Filing date
Publication date
Priority claimed from US11/401,151 external-priority patent/US8124172B2/en
Application filed filed Critical
Publication of JP2009533251A publication Critical patent/JP2009533251A/ja
Publication of JP2009533251A5 publication Critical patent/JP2009533251A5/ja
Pending legal-status Critical Current

Links

JP2009505432A 2006-04-10 2007-04-10 閉じ込められた層の製造方法、およびそれを使用して製造されたデバイス Pending JP2009533251A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/401,151 US8124172B2 (en) 2006-03-02 2006-04-10 Process for making contained layers and devices made with same
PCT/US2007/008830 WO2007120654A2 (en) 2006-04-10 2007-04-10 Process for making contained layers and devices made with same

Publications (2)

Publication Number Publication Date
JP2009533251A JP2009533251A (ja) 2009-09-17
JP2009533251A5 true JP2009533251A5 (enExample) 2015-03-12

Family

ID=38610130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009505432A Pending JP2009533251A (ja) 2006-04-10 2007-04-10 閉じ込められた層の製造方法、およびそれを使用して製造されたデバイス

Country Status (6)

Country Link
US (3) US8124172B2 (enExample)
EP (1) EP2005498A4 (enExample)
JP (1) JP2009533251A (enExample)
KR (1) KR101391082B1 (enExample)
CN (1) CN101416327B (enExample)
WO (1) WO2007120654A2 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080286487A1 (en) * 2007-05-18 2008-11-20 Lang Charles D Process for making contained layers
KR20100106309A (ko) * 2007-10-15 2010-10-01 이 아이 듀폰 디 네모아 앤드 캄파니 용액 처리된 전자 소자
US20100224866A1 (en) * 2007-10-23 2010-09-09 E.I.Du Pont De Nemours And Company Ternary emissive layers for luminescent applications
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
US20090142556A1 (en) * 2007-11-29 2009-06-04 E. I. Du Pont De Nemours And Company Process for forming an organic electronic device including an organic device layer
US8040048B2 (en) * 2007-12-12 2011-10-18 Lang Charles D Process for forming an organic electronic device including an organic device layer
WO2009079327A1 (en) 2007-12-14 2009-06-25 E. I. Du Pont De Nemours And Company Backplane structures for electronic devices
US20100295036A1 (en) * 2008-02-01 2010-11-25 E.I. Du Pont De Nemours And Company Structure for making solution processed electronic devices
TW201005813A (en) * 2008-05-15 2010-02-01 Du Pont Process for forming an electroactive layer
US20110092076A1 (en) * 2008-05-19 2011-04-21 E.I. Du Pont De Nemours And Company Apparatus and method of vapor coating in an electronic device
US8759818B2 (en) 2009-02-27 2014-06-24 E I Du Pont De Nemours And Company Deuterated compounds for electronic applications
EP2404315A4 (en) 2009-03-06 2012-08-08 Du Pont METHOD FOR FORMING AN ELECTROACTIVE LAYER
WO2010104857A2 (en) 2009-03-09 2010-09-16 E. I. Du Pont De Nemours And Company Process for forming an electroactive layer
TW201114082A (en) 2009-03-09 2011-04-16 Du Pont Process for forming an electroactive layer
US8497495B2 (en) * 2009-04-03 2013-07-30 E I Du Pont De Nemours And Company Electroactive materials
GB0912034D0 (en) * 2009-07-10 2009-08-19 Cambridge Entpr Ltd Patterning
EP2459379A4 (en) * 2009-07-27 2015-05-06 Du Pont METHOD AND MATERIALS FOR PRODUCING RESTRICTED LAYERS AND DEVICES MADE THEREFOR
TWI385185B (zh) * 2009-07-29 2013-02-11 Ind Tech Res Inst 聚合物及包含其之光學元件及光電裝置
GB0913456D0 (en) 2009-08-03 2009-09-16 Cambridge Entpr Ltd Printed electronic device
KR20120091144A (ko) 2009-09-29 2012-08-17 이 아이 듀폰 디 네모아 앤드 캄파니 발광 응용을 위한 중수소화된 화합물
JP5784621B2 (ja) 2009-10-29 2015-09-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 電子用途用の重水素化合物
WO2012087955A1 (en) 2010-12-20 2012-06-28 E. I. Du Pont De Nemours And Company Compositions for electronic applications
US9444050B2 (en) 2013-01-17 2016-09-13 Kateeva, Inc. High resolution organic light-emitting diode devices, displays, and related method
US9614191B2 (en) 2013-01-17 2017-04-04 Kateeva, Inc. High resolution organic light-emitting diode devices, displays, and related methods
KR102472642B1 (ko) 2015-06-16 2022-11-30 삼성디스플레이 주식회사 유기 발광 표시 장치 및 이의 제조 방법
KR102431626B1 (ko) 2015-10-06 2022-08-11 삼성디스플레이 주식회사 발광 표시 장치 및 그 제조 방법
CN111081901A (zh) * 2018-11-26 2020-04-28 中国科学院苏州纳米技术与纳米仿生研究所 印刷电子器件的制备方法
WO2021251302A1 (ja) * 2020-06-10 2021-12-16 ダイキン工業株式会社 含フッ素化合物

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
US5435887A (en) 1993-11-03 1995-07-25 Massachusetts Institute Of Technology Methods for the fabrication of microstructure arrays
DE19500912A1 (de) 1995-01-13 1996-07-18 Basf Ag Elektrolumineszierende Anordnung
JPH09203803A (ja) * 1996-01-25 1997-08-05 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
US6495624B1 (en) 1997-02-03 2002-12-17 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
JP4413035B2 (ja) * 1997-08-08 2010-02-10 大日本印刷株式会社 パターン形成体およびパターン形成方法
US6303238B1 (en) 1997-12-01 2001-10-16 The Trustees Of Princeton University OLEDs doped with phosphorescent compounds
US6736985B1 (en) * 1999-05-05 2004-05-18 Agere Systems Inc. High-resolution method for patterning a substrate with micro-printing
DE60031729T2 (de) 1999-05-13 2007-09-06 The Trustees Of Princeton University Lichtemittierende, organische, auf elektrophosphoreszenz basierende anordnung mit sehr hoher quantenausbeute
JP3980801B2 (ja) * 1999-09-16 2007-09-26 株式会社東芝 三次元構造体およびその製造方法
EP2270895A3 (en) 1999-12-01 2011-03-30 The Trustees of Princeton University Complexes for OLEDs
JP2001237069A (ja) * 2000-02-23 2001-08-31 Dainippon Printing Co Ltd Ｅｌ素子およびその製造方法
KR20010085420A (ko) * 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
US7074640B2 (en) * 2000-06-06 2006-07-11 Simon Fraser University Method of making barrier layers
US6670645B2 (en) 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
JP4442533B2 (ja) * 2000-08-29 2010-03-31 ダイキン工業株式会社 含フッ素不飽和化合物
US6875523B2 (en) 2001-07-05 2005-04-05 E. I. Du Pont De Nemours And Company Photoactive lanthanide complexes with phosphine oxides, phosphine oxide-sulfides, pyridine N-oxides, and phosphine oxide-pyridine N-oxides, and devices made with such complexes
EP1406909A1 (en) 2001-07-18 2004-04-14 E.I. Du Pont De Nemours And Company Luminescent lanthanide complexes with imine ligands and devices made with such complexes
US6656611B2 (en) 2001-07-20 2003-12-02 Osram Opto Semiconductors Gmbh Structure-defining material for OLEDs
CN1254510C (zh) 2001-07-26 2006-05-03 日产化学工业株式会社 聚酰胺酸树脂组合物
US7166368B2 (en) 2001-11-07 2007-01-23 E. I. Du Pont De Nemours And Company Electroluminescent platinum compounds and devices made with such compounds
JP4231645B2 (ja) 2001-12-12 2009-03-04 大日本印刷株式会社 パターン形成体の製造方法
IL158314A0 (en) 2001-12-26 2004-05-12 Du Pont Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
US6955773B2 (en) 2002-02-28 2005-10-18 E.I. Du Pont De Nemours And Company Polymer buffer layers and their use in light-emitting diodes
GB0207134D0 (en) * 2002-03-27 2002-05-08 Cambridge Display Tech Ltd Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained
JP4092261B2 (ja) 2002-08-02 2008-05-28 三星エスディアイ株式会社 基板の製造方法及び有機エレクトロルミネッセンス素子の製造方法
US6963005B2 (en) 2002-08-15 2005-11-08 E. I. Du Pont De Nemours And Company Compounds comprising phosphorus-containing metal complexes
US6780511B2 (en) * 2002-09-05 2004-08-24 Borden Chemical, Inc. N-substituted arylamino-phenol-formaldehyde condensates
US7098060B2 (en) 2002-09-06 2006-08-29 E.I. Du Pont De Nemours And Company Methods for producing full-color organic electroluminescent devices
CN1681869B (zh) 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
US7431866B2 (en) 2002-09-24 2008-10-07 E. I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
DE60318884T2 (de) 2002-11-06 2009-01-22 Asahi Glass Co., Ltd. Barriererippe und Verfahren zu deren Herstellung
JP2004177793A (ja) * 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
JP2004234901A (ja) * 2003-01-28 2004-08-19 Seiko Epson Corp ディスプレイ基板、有機ｅｌ表示装置、ディスプレイ基板の製造方法および電子機器
JPWO2004070836A1 (ja) * 2003-02-06 2006-06-01 株式会社Ｎｅｏｍａｘマテリアル 気密封止用キャップおよびその製造方法
JP2004294878A (ja) * 2003-03-27 2004-10-21 Seiko Epson Corp 微細構造物の製造方法、デバイス、光学素子、集積回路及び電子機器
US7098525B2 (en) * 2003-05-08 2006-08-29 3M Innovative Properties Company Organic polymers, electronic devices, and methods
US7102155B2 (en) 2003-09-04 2006-09-05 Hitachi, Ltd. Electrode substrate, thin film transistor, display device and their production
JP4632193B2 (ja) * 2003-09-18 2011-02-16 大日本印刷株式会社 パターニング用基板の製造方法
JP4152852B2 (ja) * 2003-09-30 2008-09-17 東京応化工業株式会社 吐出ノズル式塗布法用ポジ型ホトレジスト組成物及びレジストパターンの形成方法
JP4784723B2 (ja) * 2003-12-24 2011-10-05 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
US7067841B2 (en) 2004-04-22 2006-06-27 E. I. Du Pont De Nemours And Company Organic electronic devices
JP2006024535A (ja) * 2004-07-09 2006-01-26 Seiko Epson Corp 有機薄膜素子の製造方法、電気光学装置の製造方法及び電子機器の製造方法

Similar Documents

Publication Publication Date Title
KR101391082B1 (ko) 구속된 층의 제조 공정 및 이에 의해 제조된 소자
US8592239B2 (en) Process and materials for making contained layers and devices made with same
JP5727368B2 (ja) 電子デバイスにおける気相コーティングの装置および方法
KR20100111315A (ko) 용액 처리된 전자 소자를 제조하기 위한 구조물
JP5457337B2 (ja) 閉じ込め層の製造方法
KR20100106309A (ko) 용액 처리된 전자 소자
US20080087882A1 (en) Process for making contained layers and devices made with same
JP2013048118A (ja) 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス
US20090142556A1 (en) Process for forming an organic electronic device including an organic device layer
US20110260137A1 (en) Process for making contained layers and devices made with same