JP2009532898A - 自己整合相変化材料層を使用する相変化メモリ素子、ならびに、それを製造および使用する方法。 - Google Patents
自己整合相変化材料層を使用する相変化メモリ素子、ならびに、それを製造および使用する方法。 Download PDFInfo
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- JP2009532898A JP2009532898A JP2009504200A JP2009504200A JP2009532898A JP 2009532898 A JP2009532898 A JP 2009532898A JP 2009504200 A JP2009504200 A JP 2009504200A JP 2009504200 A JP2009504200 A JP 2009504200A JP 2009532898 A JP2009532898 A JP 2009532898A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
- H10N70/061—Patterning of the switching material
- H10N70/068—Patterning of the switching material by processes specially adapted for achieving sub-lithographic dimensions, e.g. using spacers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
- H10N70/8265—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices on sidewalls of dielectric structures, e.g. mesa or cup type devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8825—Selenides, e.g. GeSe
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8828—Tellurides, e.g. GeSbTe
Abstract
Description
相変化材料である。相変化材料層18の状態の切り替えは、相変化材料の体積の減少を伴うため、相状態混合(phase state mixing)が低減されるので、切り替えの安定性と一貫性のみならず繰り返し時間も改善され得る。
Claims (39)
- 第1の電極を支持する基板と、
前記第1の電極の上に配置された絶縁材料構成要素と、
前記第1の電極の上に、前記絶縁材料構成要素を取り囲んで配置された相変化材料層であって、前記第1の電極と電気的につながる下表面を有する、前記相変化材料層と、
前記相変化材料層の上表面と電気的につながる第2の電極と、
を含む、メモリ素子。 - 前記相変化材料層が、前記絶縁材料構成要素の側壁の上にだけ形成される、請求項1のメモリ素子。
- 前記絶縁材料構成要素の第1の表面が、前記相変化材料層の第1の表面に対して平坦である、請求項1のメモリ素子。
- 前記絶縁材料構成要素の第1の表面が、前記相変化材料層の第1の表面の下方にある、請求項1のメモリ素子。
- 前記第2の電極の第1の表面が、前記相変化材料層の第1の表面に対して平坦である、請求項4のメモリ素子。
- 前記相変化材料が、前記第1の電極の上にトレンチを形成し、前記絶縁材料構成要素が、前記トレンチ内に位置する、請求項1のメモリ素子。
- 前記相変化材料層が、第1、および、第2の直径を有する、請求項1のメモリ素子。
- 前記第1、および、第2の直径が異なる、請求項7のメモリ素子。
- 前記第1の直径が、前記第1の電極に近接する表面に相当し、前記第2の直径が、前記第2の電極に近接する表面に相当する、請求項7のメモリ素子。
- 前記相変化材料層が、約5.9X104nm3の全体積を有する、請求項1のメモリ素子。
- 前記相変化材料層が、約20nmから約200nmの範囲の直径を有する、請求項1のメモリ素子。
- 前記相変化材料層が、約25nmから約75nmの範囲の高さを有する、請求項1のメモリ素子。
- 前記相変化材料層が、約25Åから約200Åの範囲の横断面の厚さを有する、請求項1のメモリ素子。
- 前記相変化材料層が、ゲルマニウム・アンチモン・テルル、テルル化ゲルマニウム、GaSb、SbTe、InSb、InSe、InxSbyTez、SnxSbyTez、GaxSeyTez、InSbGe、AgInSbTe、GeSnSbTe、TexGeySbzSk、および、GeSbSeTeから成る群から選択された材料を含む、請求項1のメモリ素子。
- メモリアレイであって、複数のメモリ素子を含み、少なくとも1つのメモリ素子が、
第1の誘電層を支持する基板と、
前記第1の誘電層に関連して形成された第1の電極と、
前記誘電層を覆って形成され、前記第1の電極へのビアを有する第2の誘電層と、
前記ビアの内側に配置され、前記第1の電極と電気的につながる下表面を有する相変化材料層と、
前記相変化材料層の少なくとも側壁部分の上に形成された絶縁材料構成要素と、
前記相変化材料層の上表面と電気的につながる第2の電極と、
を含む、
メモリアレイ。 - 前記相変化材料層が、前記絶縁材料構成要素の側壁の上だけに形成される、請求項15のメモリアレイ。
- 前記絶縁材料構成要素の第1の表面が、前記相変化材料層の第1の表面に対して平坦である、請求項15のメモリアレイ。
- 前記絶縁材料構成要素の第1の表面が、前記相変化材料層の第1の表面の高さよりも低い高さを有する、請求項15のメモリアレイ。
- 前記相変化材料層が、前記第2の誘電層の側壁の内側と上に形成される、請求項15のメモリアレイ。
- 前記絶縁材料構成要素が、上面から見て円盤状の形状を有する、請求項15のメモリアレイ。
- プロセッサと、
少なくとも1つのメモリ素子を含む、メモリデバイスと、
を含む、プロセッサシステムであって、
前記メモリ素子が、
第1の電極を支持する基板と、
前記第1の電極の上に配置された絶縁材料構成要素と、
前記第1の電極の上に、前記絶縁材料構成要素を取り囲んで配置された、相変化材料層であって、前記第1の電極と電気的につながる下表面を有する、前記相変化材料層と、
前記相変化材料層の上表面と電気的につながる第2の電極と、
を含む、
プロセッサシステム。 - 前記相変化材料層が、前記絶縁材料構成要素の側壁の上にだけ形成される請求項21のプロセッサシステム。
- 前記絶縁材料構成要素の第1の表面が、前記相変化材料層の第1の表面の下方にある、請求項21のプロセッサシステム。
- 前記第2の電極が、前記絶縁材料構成要素の上に形成され、前記第2の電極の第1の表面が、前記相変化材料層の第1の表面に対して平坦である、請求項23のプロセッサシステム。
- 前記相変化材料層が、前記第1の電極の上にトレンチを形成し、前記絶縁材料構成要素が、前記トレンチの内側に位置する、請求項21のプロセッサシステム。
- 前記絶縁材料構成要素が、前記第1の電極に近接する表面に相当する第1の直径と、前記第2の電極と近接する表面に相当する第2の直径とを有する、請求項21のプロセッサシステム。
- メモリ素子を形成する方法であって、
前記メモリ素子を形成する方法が、
基板の上に第1の電極を形成するステップと、
前記第1の電極の上に絶縁材料構成要素を形成するステップと、
前記第1の電極の上に、前記絶縁材料構成要素を取り囲んで相変化材料層を形成するステップであって、前記相変化材料が、前記第1の電極と電気的につながる下表面を有する、前記相変化材料を形成する前記ステップと、
前記相変化材料層の上表面と電気的につながる、第2の電極を形成するステップと、
を含む、
メモリ素子を形成する方法。 - 前記絶縁材料構成要素が、前記第1の電極の上に堆積され、前記相変化材料層が、前記絶縁材料構成要素の側壁の上にだけ形成される、請求項27の方法。
- 前記相変化材料層が、前記第1の電極の上に堆積され、前記絶縁材料構成要素が、前記相変化材料層の第1の表面の上と、前記相変化材料層の側壁の上に形成される、請求項27の方法。
- 前記相変化材料層が、前記第2の電極の側壁の上に形成される、請求項27の方法。
- 前記絶縁層が、傾斜側壁を有するようにエッチングされる、請求項27の方法。
- 前記第1の電極が、第1の誘電層のビア内に形成される、請求項27の方法。
- 前記相変化材料層が、前記第1の誘電層の上に形成される第2の誘電層に形成されたビアの側壁の上に形成される、請求項27の方法。
- 前記相変化材料層が、前記第2の誘電層の上表面の一部分の上に形成される、請求項33の方法。
- 前記相変化材料層が、約20nmから約200nmの範囲の直径を有するように形成される、請求項27の方法。
- 前記相変化材料層が、約25nmから約75nmの範囲の高さを有する、請求項27の方法。
- 前記相変化材料層が、約25Åから約200Åの範囲の横断面の厚さを有する、請求項27の方法。
- メモリアレイであって、
複数のメモリ素子を含み、少なくとも1つのメモリ素子が、
第1の電極を支持する基板と、
前記第1の電極の上に配置される、絶縁材料構成要素と、
前記第1の電極の上に、前記絶縁材料構成要素を少なくとも部分的に取り囲んで配置される相変化材料層であって、前記第1の電極と電気的につながる下表面を有する、前記
相変化材料層と、
前記相変化材料層の上表面と電気的につながる第2の電極と、
を含む、メモリアレイ。 - 前記相変化材料層が、前記絶縁材料構成要素を完全に取り囲む、請求項38のメモリアレイ。
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US11/396,616 US7812334B2 (en) | 2006-04-04 | 2006-04-04 | Phase change memory elements using self-aligned phase change material layers and methods of making and using same |
US11/396,616 | 2006-04-04 | ||
PCT/US2007/007188 WO2007126690A2 (en) | 2006-04-04 | 2007-03-23 | Phase change memory elements using self- aligned phase change material layers and methods of making and using same |
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KR (1) | KR101067969B1 (ja) |
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US20090166605A1 (en) | 2009-07-02 |
KR101067969B1 (ko) | 2011-09-26 |
KR20090005131A (ko) | 2009-01-12 |
JP5360496B2 (ja) | 2013-12-04 |
EP2325911A2 (en) | 2011-05-25 |
EP2325911A3 (en) | 2011-07-06 |
US20130248810A1 (en) | 2013-09-26 |
EP2325911B1 (en) | 2015-08-19 |
WO2007126690A3 (en) | 2007-12-21 |
US20070246766A1 (en) | 2007-10-25 |
US8674334B2 (en) | 2014-03-18 |
CN101416326B (zh) | 2011-08-17 |
US7812334B2 (en) | 2010-10-12 |
WO2007126690A2 (en) | 2007-11-08 |
ATE517441T1 (de) | 2011-08-15 |
EP2005495B1 (en) | 2011-07-20 |
US20110227029A1 (en) | 2011-09-22 |
CN101416326A (zh) | 2009-04-22 |
US7968862B2 (en) | 2011-06-28 |
EP2005495A2 (en) | 2008-12-24 |
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