JP2009530800A - 持ち上がったリードによる電子デバイスの相互接続 - Google Patents
持ち上がったリードによる電子デバイスの相互接続 Download PDFInfo
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- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 238000009713 electroplating Methods 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000013078 crystal Substances 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
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- 239000002131 composite material Substances 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
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- 241000272168 Laridae Species 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
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- 239000011651 chromium Substances 0.000 description 1
- VNTLIPZTSJSULJ-UHFFFAOYSA-N chromium molybdenum Chemical compound [Cr].[Mo] VNTLIPZTSJSULJ-UHFFFAOYSA-N 0.000 description 1
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- 238000007906 compression Methods 0.000 description 1
- RYZVSJQWUZPQNI-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au].[Au] RYZVSJQWUZPQNI-UHFFFAOYSA-N 0.000 description 1
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- ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 1
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- QUCZBHXJAUTYHE-UHFFFAOYSA-N gold Chemical compound [Au].[Au] QUCZBHXJAUTYHE-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
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- 229910052703 rhodium Inorganic materials 0.000 description 1
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- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
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- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4853—Connection or disconnection of other leads to or from a metallisation, e.g. pins, wires, bumps
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07342—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/71—Means for bonding not being attached to, or not being formed on, the surface to be connected
- H01L24/72—Detachable connecting means consisting of mechanical auxiliary parts connecting the device, e.g. pressure contacts using springs or clips
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12032—Schottky diode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
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- H01L2924/1461—MEMS
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Abstract
Description
大まかに言えば、本開示はリードが形成される基板を処理する着想に基づいている。
ここで、ρPSは多孔性シリコンの密度であり、ρSiは単結晶シリコンの密度(すなわち、2.3g/cm3)である。多孔性シリコンの密度ρPSは次式を適用して測定できる。
ここで、値Ps(陽極プロセス前の下基板105の初期重量)、Pe(陽極プロセス後の下基板105の最終重量)及びd(多孔性シリコン領域120の深さ)は測定でき、値S(接触域117の範囲)は既知である。
もちろん、その地域の要求や特定の要求を満たすために、当業者は上述した解決策に対して多くの論理的かつ/又は物理的な変更及び改変を行うことができる。具体的には、好ましい態様に関して或る程度詳細に本発明を説明してきたが、他の態様のみならず形状及び詳細において様々な省略、置換及び変更が可能なことが分かる。特に、提案した解決策は、更に十分な理解を与えるべく上記の説明において述べられた特定の詳細(数値例など)を用いなくても実施可能である。逆に、不必要な詳細で記載を分かりにくくしないように、周知の特徴は省略又は簡略化した。また、開示した本発明の態様に関して記載された特定の要素及び/又は方法工程を、一般的な設計選択事項として他の態様に組み入れる得ることは明らかである。
110 前面
115 フォトレジストマスク
117 接触域
120 多孔性シリコン領域
125 前駆物質層
130 リード
135 接合接点
140 上基板
145 導体トラック
150 接合接点
Claims (26)
- 各リードが第1端部(130a)と第2端部(130b)とを有する複数のリード(130)を第1基板(105)の主面(110)上に形成する工程、
各リードの第2端部を第2基板(140)に結合する工程、及び
第1基板と第2基板の間でリード(130’)を伸ばすために第2基板と第1基板を離して間隔をあける工程、
を含む、電子デバイスを接触させるための相互接続要素(160;160’)の製造方法であって、
主面上のリードの付着力を制御するためにリードの形成前に主面を処理する工程を更に含むことを特徴とする前記製造方法。 - 主面を処理する前記工程が、主面上に1組の付着力増進領域(120)を形成する工程を含む請求項1に記載の製造方法。
- 第1基板(105)が単結晶シリコンから成り、また、付着力増進領域を形成する前記工程が、主面から第1基板中に延在する1組の多孔性シリコン領域(120)を形成する工程を含む請求項2に記載の製造方法。
- 多孔性シリコン領域(120)を形成する前記工程が、主面(110)から離れるにつれて減少する前記多孔度を有するように多孔性シリコン領域の多孔度を調節する工程を含む請求項3に記載の製造方法。
- 多孔度を調節する前記工程が、単結晶シリコンに対して40%〜90%の範囲にある最大値から0%〜70%の範囲にある最小値まで多孔度を低減させる工程を含む請求項4に記載の製造方法。
- 多孔性シリコン領域(120)を形成する前記工程が、時間の経過とともに減少する電流密度を用いる陽極プロセスをウェーハ(105)に行う工程を含む請求項4又は5に記載の製造方法。
- 陽極プロセスをウェーハ(105)に行う前記ステップが、電流密度を開始値から該開始値の5%〜20%に等しい終了値まで低減させる工程を含む請求項6に記載の製造方法。
- 各リード(130)が主面(110)の対応する接触域(117)に接触しており、また、付着力増進領域(120)を形成する前記工程が、各接触域の少なくとも1つの選択部分に付着力増進領域を形成する工程を含む請求項2〜7のいずれか一項に記載の製造方法。
- 主面を処理する前記工程が、各リード(130)の第1端部(130a)から第2端部(130b)に向けて付着力を低減させる工程を含む請求項1〜8のいずれか一項に記載の製造方法。
- 付着力を低減させる前記工程が、別の最大値から前記別の最大値の0.01%〜60%に等しい別の最小値まで低減させる工程を含む請求項9に記載の製造方法。
- 付着力を低減させる前記工程が、各リード(130)の第1端部(130a)から第2端部(130b)に向けて付着力増進領域(210)の濃度を低減させる工程を含む、請求項8に依存する場合において請求項9又は10に記載の製造方法。
- 主面(110)を処理する前記工程が、多孔性シリコン領域(120)上に金属層(125)をデポジットする工程を更に含む請求項3〜11のいずれか一項に記載の製造方法。
- 第1基板(105)と第2基板(140)の間に流動性絶縁体(155)を注入する工程、及び
リード(130’)を埋め込んだ絶縁層(155)を得るために絶縁体を硬化させる工程、
を更に含む請求項1〜12のいずれか一項に記載の製造方法。 - リード(430’)を形成する前記工程が、主面(410)上に複数の溝(412)を作る工程を含み、各リードの第1端部(430a)が対応する溝中に延在する請求項1〜13のいずれか一項に記載の製造方法。
- リード(430’)を形成する前記工程が、
前記溝(412)中に硬質の導体材料(430a)からなる少なくとも1つの層をデポジットする工程、及び
リードを完結すべく延性導体材料(430b)からなる少なくとも1つの層をデポジットする工程、
を更に含む請求項14に記載の製造方法。 - 前記硬質の導体材料が200ビッカースより大きい硬度を有し、前記延性導体材料が200ビッカースより小さい硬度を有する請求項15に記載の製造方法。
- 第1基板(105)を除去する工程を更に含む請求項1〜16のいずれか一項に記載の製造方法。
- 第1基板(405)を除去する前記工程が、
リード(430’)を保護ために第1基板に設けられているストップ層(411)に到達するまで第1基板をウェットエッチングする工程、及び
第1基板の残りの部分をドライエッチングする工程、
を含む請求項17に記載の製造方法。 - リード(430’)により保護されていない絶縁層(455)の外側部分を除去する工程を更に含む請求項17又は18に記載の製造方法。
- 絶縁層(455)の外側部分を除去する前記工程が、絶縁層の厚みの0.1%〜70%に等しい深さだけ前記外側部分を除去する工程を含む請求項19に記載の製造方法。
- 第2基板(140)を除去する工程を更に含む請求項1〜20のいずれか一項に記載の製造方法。
- 1組の相互接続された電子デバイス(310l、310u)を含む電子アセンブリ(300a)の製造方法であって、
少なくとも1つの第1電子デバイス(310l)の各第1端子(320l)を、請求項1〜21のいずれか一項に記載の方法を実行することにより製造された相互接続要素(160’)の対応するリード(130’)の第1端部(130a)に結合し且つ/又は少なくとも1つの第2電子デバイス(310u)の各第2端子(320u)を、前記相互接続要素(160’)の対応するリード(130’)の第2端部(130b)に結合する工程を含む前記製造方法。 - 試験される電子デバイスの対応する端子に接触するための複数のプローブ(465)を含んだ試験カード(460;460’)の製造方法であって、
回路化ボード(440)を、請求項1〜21のいずれか一項に記載の方法を実行することにより製造される相互接続要素のリード(430’)の第2端部(430b)に結合する工程を含み、リードの第1端部(430a)が前記プローブを形成する前記製造方法。 - 電子デバイスを接触させるための相互接続要素(160;160’)であって、請求項1〜21のいずれか一項に記載の方法により得られる前記相互接続要素。
- 1組の相互接続された電子デバイス(310l、310l;140)を含む電子アセンブリ(300a;300ab)であって、請求項22に記載の方法により得られる前記電子アセンブリ。
- 電子デバイスを試験するためのテストボード(460;460’)であって、請求項23に記載の方法により得られる前記テストボード。
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IT000478A ITMI20060478A1 (it) | 2006-03-16 | 2006-03-16 | Sistema per contattare dispositivim elettronici e relativo metodo di produzione basato su filo conduttore annegato in materiale isolante |
ITMI2006A000478 | 2006-03-16 | ||
PCT/EP2007/052497 WO2007104799A1 (en) | 2006-03-16 | 2007-03-16 | Interconnection of electronic devices with raised leads |
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JP2009530800A true JP2009530800A (ja) | 2009-08-27 |
JP5043870B2 JP5043870B2 (ja) | 2012-10-10 |
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EP (1) | EP2002471B1 (ja) |
JP (1) | JP5043870B2 (ja) |
CN (1) | CN101405852B (ja) |
AT (1) | ATE484846T1 (ja) |
DE (1) | DE602007009810D1 (ja) |
ES (1) | ES2359919T3 (ja) |
IT (1) | ITMI20060478A1 (ja) |
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IT1395336B1 (it) | 2009-01-20 | 2012-09-14 | Rise Technology S R L | Dispositivo di contatto elastico per componenti elettronici a colonne collassanti |
DE102009008152A1 (de) * | 2009-02-09 | 2010-08-19 | Nb Technologies Gmbh | Siliziumsolarzelle |
US8278748B2 (en) | 2010-02-17 | 2012-10-02 | Maxim Integrated Products, Inc. | Wafer-level packaged device having self-assembled resilient leads |
ITMI20100407A1 (it) | 2010-03-12 | 2011-09-13 | Rise Technology S R L | Cella foto-voltaica con regioni di semiconduttore poroso per ancorare terminali di contatto |
US8940616B2 (en) * | 2012-07-27 | 2015-01-27 | Globalfoundries Singapore Pte. Ltd. | Bonding method using porosified surfaces for making stacked structures |
US8679902B1 (en) | 2012-09-27 | 2014-03-25 | International Business Machines Corporation | Stacked nanowire field effect transistor |
US9126452B2 (en) * | 2013-07-29 | 2015-09-08 | Xerox Corporation | Ultra-fine textured digital lithographic imaging plate and method of manufacture |
EP3286801B1 (en) * | 2015-04-20 | 2022-12-28 | InterDigital Madison Patent Holdings, SAS | Strain relief antenna wiring connector in an electronic device |
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ATE484846T1 (de) | 2010-10-15 |
CN101405852B (zh) | 2011-04-13 |
US20090309098A1 (en) | 2009-12-17 |
PL2002471T3 (pl) | 2011-05-31 |
US7892954B2 (en) | 2011-02-22 |
ES2359919T3 (es) | 2011-05-30 |
ITMI20060478A1 (it) | 2007-09-17 |
DE602007009810D1 (de) | 2010-11-25 |
WO2007104799A1 (en) | 2007-09-20 |
JP5043870B2 (ja) | 2012-10-10 |
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