JP2009522781A - ボトムゲート型薄膜トランジスタ - Google Patents
ボトムゲート型薄膜トランジスタ Download PDFInfo
- Publication number
- JP2009522781A JP2009522781A JP2008548628A JP2008548628A JP2009522781A JP 2009522781 A JP2009522781 A JP 2009522781A JP 2008548628 A JP2008548628 A JP 2008548628A JP 2008548628 A JP2008548628 A JP 2008548628A JP 2009522781 A JP2009522781 A JP 2009522781A
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- Japan
- Prior art keywords
- polymer
- group
- transistor
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- unbranched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title description 14
- 229920000642 polymer Polymers 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000003989 dielectric material Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 9
- FMZQNTNMBORAJM-UHFFFAOYSA-N tri(propan-2-yl)-[2-[13-[2-tri(propan-2-yl)silylethynyl]pentacen-6-yl]ethynyl]silane Chemical compound C1=CC=C2C=C3C(C#C[Si](C(C)C)(C(C)C)C(C)C)=C(C=C4C(C=CC=C4)=C4)C4=C(C#C[Si](C(C)C)(C(C)C)C(C)C)C3=CC2=C1 FMZQNTNMBORAJM-UHFFFAOYSA-N 0.000 claims description 9
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims description 8
- 150000001336 alkenes Chemical class 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- DUIIPHYNGUDOIM-UHFFFAOYSA-N 2-(4-ethenylphenyl)acetonitrile Chemical compound C=CC1=CC=C(CC#N)C=C1 DUIIPHYNGUDOIM-UHFFFAOYSA-N 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000005233 alkylalcohol group Chemical group 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 125000001072 heteroaryl group Chemical group 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 229920000620 organic polymer Polymers 0.000 claims description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- -1 pentacene compound Chemical class 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000010345 tape casting Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002964 pentacenes Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- WJTZZPVVTSDNJJ-UHFFFAOYSA-N 2-fluorobenzenethiol Chemical compound FC1=CC=CC=C1S WJTZZPVVTSDNJJ-UHFFFAOYSA-N 0.000 description 1
- UNIJBMUBHBAUET-UHFFFAOYSA-N 3-(methylamino)propanenitrile Chemical compound CNCCC#N UNIJBMUBHBAUET-UHFFFAOYSA-N 0.000 description 1
- WHNPOQXWAMXPTA-UHFFFAOYSA-N 3-methylbut-2-enamide Chemical compound CC(C)=CC(N)=O WHNPOQXWAMXPTA-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000005213 alkyl heteroaryl group Chemical group 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 238000010128 melt processing Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- OKDQKPLMQBXTNH-UHFFFAOYSA-N n,n-dimethyl-2h-pyridin-1-amine Chemical compound CN(C)N1CC=CC=C1 OKDQKPLMQBXTNH-UHFFFAOYSA-N 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- OFIYHXOOOISSDN-UHFFFAOYSA-N tellanylidenegallium Chemical compound [Te]=[Ga] OFIYHXOOOISSDN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/623—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing five rings, e.g. pentacene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
- H10K10/488—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising a layer of composite material having interpenetrating or embedded materials, e.g. a mixture of donor and acceptor moieties, that form a bulk heterojunction
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/275,367 US7514710B2 (en) | 2005-12-28 | 2005-12-28 | Bottom gate thin film transistors |
| PCT/US2006/048804 WO2007078993A1 (en) | 2005-12-28 | 2006-12-21 | Bottom gate thin film transistors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009522781A true JP2009522781A (ja) | 2009-06-11 |
| JP2009522781A5 JP2009522781A5 (enExample) | 2010-02-12 |
Family
ID=38228545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008548628A Pending JP2009522781A (ja) | 2005-12-28 | 2006-12-21 | ボトムゲート型薄膜トランジスタ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7514710B2 (enExample) |
| EP (1) | EP1969621A4 (enExample) |
| JP (1) | JP2009522781A (enExample) |
| CN (1) | CN101346808B (enExample) |
| WO (1) | WO2007078993A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140035434A (ko) * | 2011-05-26 | 2014-03-21 | 센트리 포 프로세스 이노베이션 리미티드 | 트랜지스터 및 이의 제조 방법 |
| JP2014159405A (ja) * | 2013-12-27 | 2014-09-04 | Japan Science & Technology Agency | ペンタセンキノン誘導体及びその製造方法 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20051901A1 (it) * | 2005-10-10 | 2007-04-11 | St Microelectronics Srl | Processo di fabbricazione di tramsistori a film sottile in materiale organico e transistore |
| US20070146426A1 (en) * | 2005-12-28 | 2007-06-28 | Nelson Brian K | All-inkjet printed thin film transistor |
| KR100976572B1 (ko) * | 2008-02-26 | 2010-08-17 | 고려대학교 산학협력단 | 유기 박막 트랜지스터의 제조방법 |
| JP5406284B2 (ja) | 2008-06-11 | 2014-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 有機半導体の堆積のための混合溶媒系 |
| US7948016B1 (en) * | 2009-11-03 | 2011-05-24 | 3M Innovative Properties Company | Off-center deposition of organic semiconductor in an organic semiconductor device |
| US8450779B2 (en) * | 2010-03-08 | 2013-05-28 | International Business Machines Corporation | Graphene based three-dimensional integrated circuit device |
| GB201108865D0 (en) | 2011-05-26 | 2011-07-06 | Ct For Process Innovation The Ltd | Semiconductor compounds |
| GB2491810B (en) | 2011-05-31 | 2018-03-21 | Smartkem Ltd | Organic semiconductor compositions |
| GB201203159D0 (en) * | 2012-02-23 | 2012-04-11 | Smartkem Ltd | Organic semiconductor compositions |
| FR3002366A1 (fr) * | 2013-02-20 | 2014-08-22 | Commissariat Energie Atomique | Dispositif electronique comprenant une couche en un materiau semi-conducteur et son procede de fabrication |
| CN103151461A (zh) * | 2013-02-27 | 2013-06-12 | 京东方科技集团股份有限公司 | 一种有机薄膜晶体管及其制备方法和制备装置 |
| CN103255480B (zh) * | 2013-04-27 | 2015-12-02 | 中国科学院合肥物质科学研究院 | 大尺寸6,13-双(三异丙基甲硅烷基乙炔基)并五苯薄晶体的制备方法 |
| CN105493303B (zh) * | 2013-08-28 | 2019-02-22 | 斯马特凯姆有限公司 | 聚合物有机半导体组合物 |
| GB2542563A (en) * | 2015-09-22 | 2017-03-29 | Cambridge Display Tech Ltd | Pentacene derivatives with C-alkyne solubilising units and their applications as small molecule organic semiconductors |
| US11258017B2 (en) | 2016-04-27 | 2022-02-22 | Wuhan Xinqu Chuangrou Optoelectronics Technology Co., Ltd | Semiconducting compositions comprising semiconducting polymers |
| CN111416039A (zh) | 2019-01-07 | 2020-07-14 | 纽多维有限公司 | 制剂和层 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040222412A1 (en) * | 2003-05-08 | 2004-11-11 | 3M Innovative Properties Company | Organic polymers, electronic devices, and methods |
| WO2005055248A2 (en) * | 2003-11-28 | 2005-06-16 | Merck Patent Gmbh | Organic semiconducting layer formulations comprising polyacenes and organic binder polymers |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6326640B1 (en) * | 1996-01-29 | 2001-12-04 | Motorola, Inc. | Organic thin film transistor with enhanced carrier mobility |
| DE69840914D1 (de) | 1997-10-14 | 2009-07-30 | Patterning Technologies Ltd | Methode zur Herstellung eines elektrischen Kondensators |
| KR100552866B1 (ko) * | 2001-08-09 | 2006-02-20 | 아사히 가세이 가부시키가이샤 | 유기 반도체 소자 |
| US6690029B1 (en) | 2001-08-24 | 2004-02-10 | University Of Kentucky Research Foundation | Substituted pentacenes and electronic devices made with substituted pentacenes |
| JP2005505142A (ja) | 2001-10-01 | 2005-02-17 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電子デバイス及び構成並びに方法 |
| US6963080B2 (en) | 2001-11-26 | 2005-11-08 | International Business Machines Corporation | Thin film transistors using solution processed pentacene precursor as organic semiconductor |
| EP2204861A1 (en) * | 2001-12-19 | 2010-07-07 | Merck Patent GmbH | Organic field effect transistor with an organic dielectric |
| EP1434282A3 (en) * | 2002-12-26 | 2007-06-27 | Konica Minolta Holdings, Inc. | Protective layer for an organic thin-film transistor |
| US6861664B2 (en) * | 2003-07-25 | 2005-03-01 | Xerox Corporation | Device with n-type semiconductor |
| US7700366B2 (en) * | 2003-12-04 | 2010-04-20 | Massachusetts Institute Of Technology | Fluorescent, semi-conductive polymers, and devices comprising them |
| US7655809B2 (en) * | 2004-05-18 | 2010-02-02 | University Of Ottawa | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| US7319153B2 (en) * | 2005-07-29 | 2008-01-15 | 3M Innovative Properties Company | 6,13-Bis(thienyl)pentacene compounds |
-
2005
- 2005-12-28 US US11/275,367 patent/US7514710B2/en not_active Expired - Fee Related
-
2006
- 2006-12-21 EP EP06847918A patent/EP1969621A4/en not_active Withdrawn
- 2006-12-21 JP JP2008548628A patent/JP2009522781A/ja active Pending
- 2006-12-21 WO PCT/US2006/048804 patent/WO2007078993A1/en not_active Ceased
- 2006-12-21 CN CN2006800492813A patent/CN101346808B/zh not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040222412A1 (en) * | 2003-05-08 | 2004-11-11 | 3M Innovative Properties Company | Organic polymers, electronic devices, and methods |
| JP2007538381A (ja) * | 2003-05-08 | 2007-12-27 | スリーエム イノベイティブ プロパティズ カンパニー | 有機高分子、電子デバイス、および方法 |
| WO2005055248A2 (en) * | 2003-11-28 | 2005-06-16 | Merck Patent Gmbh | Organic semiconducting layer formulations comprising polyacenes and organic binder polymers |
| JP2007519227A (ja) * | 2003-11-28 | 2007-07-12 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | 有機半導体層およびその改善 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140035434A (ko) * | 2011-05-26 | 2014-03-21 | 센트리 포 프로세스 이노베이션 리미티드 | 트랜지스터 및 이의 제조 방법 |
| JP2014516210A (ja) * | 2011-05-26 | 2014-07-07 | センター フォー プロセス イノベーション リミテッド | トランジスタ及びその形成方法 |
| KR101987209B1 (ko) * | 2011-05-26 | 2019-06-10 | 뉴드라이브 리미티드 | 트랜지스터 및 이의 제조 방법 |
| JP2014159405A (ja) * | 2013-12-27 | 2014-09-04 | Japan Science & Technology Agency | ペンタセンキノン誘導体及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US7514710B2 (en) | 2009-04-07 |
| EP1969621A4 (en) | 2011-08-24 |
| CN101346808A (zh) | 2009-01-14 |
| WO2007078993A1 (en) | 2007-07-12 |
| CN101346808B (zh) | 2010-05-26 |
| EP1969621A1 (en) | 2008-09-17 |
| US20070158643A1 (en) | 2007-07-12 |
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