JP2009513788A5 - - Google Patents
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- Publication number
- JP2009513788A5 JP2009513788A5 JP2008537915A JP2008537915A JP2009513788A5 JP 2009513788 A5 JP2009513788 A5 JP 2009513788A5 JP 2008537915 A JP2008537915 A JP 2008537915A JP 2008537915 A JP2008537915 A JP 2008537915A JP 2009513788 A5 JP2009513788 A5 JP 2009513788A5
- Authority
- JP
- Japan
- Prior art keywords
- silsesquioxane
- polymer
- organo
- titania
- titanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 21
- 238000000034 method Methods 0.000 claims 19
- 125000003118 aryl group Chemical group 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 6
- 125000003342 alkenyl group Chemical group 0.000 claims 5
- 239000006117 anti-reflective coating Substances 0.000 claims 5
- 125000002877 alkyl aryl group Chemical group 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 239000000010 aprotic solvent Substances 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 125000005842 heteroatom Chemical group 0.000 claims 3
- 239000000543 intermediate Substances 0.000 claims 3
- 238000004377 microelectronic Methods 0.000 claims 3
- 150000001282 organosilanes Chemical class 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- 229920002554 vinyl polymer Polymers 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 241000162682 Heterogen Species 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- -1 organo-silane compound Chemical class 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73153605P | 2005-10-28 | 2005-10-28 | |
| US60/731,536 | 2005-10-28 | ||
| PCT/US2006/041662 WO2007053396A2 (en) | 2005-10-28 | 2006-10-25 | Silsesquioxane-titania hybrid polymers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009513788A JP2009513788A (ja) | 2009-04-02 |
| JP2009513788A5 true JP2009513788A5 (enExample) | 2009-12-03 |
| JP5464855B2 JP5464855B2 (ja) | 2014-04-09 |
Family
ID=37898549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008537915A Expired - Fee Related JP5464855B2 (ja) | 2005-10-28 | 2006-10-25 | シルセスキオキサン−チタニアハイブリッドポリマー |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8865845B2 (enExample) |
| EP (1) | EP1943294B1 (enExample) |
| JP (1) | JP5464855B2 (enExample) |
| KR (1) | KR101322045B1 (enExample) |
| CN (1) | CN101300289B (enExample) |
| TW (1) | TWI443128B (enExample) |
| WO (1) | WO2007053396A2 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5581224B2 (ja) * | 2008-03-05 | 2014-08-27 | ダウ・コーニング・コーポレイション | シルセスキオキサン樹脂 |
| JP2010209288A (ja) * | 2009-03-12 | 2010-09-24 | Kagoshima Univ | 酸化チタンを含有する水溶性複合材料及びその製造方法 |
| JP5615620B2 (ja) * | 2010-08-09 | 2014-10-29 | 日東電工株式会社 | 金属酸化物粒子の製造方法 |
| CN101974028B (zh) * | 2010-09-28 | 2012-07-18 | 哈尔滨工业大学 | 含钛苯基半笼型倍半硅氧烷的制备方法 |
| CN102061111B (zh) * | 2010-10-27 | 2013-12-25 | 中山市旌旗纳米材料科技有限公司 | 自清洁陶瓷化纳米玻璃减反射涂料制造方法及其减反射膜制造方法 |
| US8257988B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | Method of making light emitting diodes |
| US8258636B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | High refractive index curable liquid light emitting diode encapsulant formulation |
| US8455607B2 (en) | 2011-08-17 | 2013-06-04 | Rohm And Haas Electronic Materials Llc | Curable liquid composite light emitting diode encapsulant |
| US8450445B2 (en) | 2011-08-17 | 2013-05-28 | Rohm And Haas Electronic Materials Llc | Light emitting diode manufacturing method |
| US9070548B2 (en) | 2012-03-06 | 2015-06-30 | Rohm And Haas Electronic Materials Llc | Metal hardmask compositions |
| CN103013112A (zh) * | 2012-11-21 | 2013-04-03 | 无锡南理工科技发展有限公司 | 一种改性纳米二氧化钛/热固性树脂复合材料及其制备方法 |
| US9201305B2 (en) * | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| JP6323456B2 (ja) * | 2013-09-11 | 2018-05-16 | Jsr株式会社 | 多層レジストプロセス用無機膜形成組成物及びパターン形成方法 |
| US9006355B1 (en) | 2013-10-04 | 2015-04-14 | Burning Bush Group, Llc | High performance silicon-based compositions |
| WO2019023178A1 (en) * | 2017-07-28 | 2019-01-31 | Avery Dennison Corporation | PRESSURE-SENSITIVE ADHESIVES AND HYPERRAMIFIED SILSESQUIOXANE CORE ARTICLES AND METHODS OF MAKING SAME |
| CN109265696B (zh) * | 2018-09-27 | 2021-08-20 | 佛山一宇卫士陶瓷材料有限公司 | 一种陶瓷减水剂的制备方法 |
| CN109867788A (zh) * | 2019-03-18 | 2019-06-11 | 台州学院 | 一种有机硅-二氧化钛复合材料的制备方法 |
| CN111004506B (zh) * | 2019-12-23 | 2023-03-10 | 哈尔滨工业大学 | 一种具有抗紫外辐照特性的改性氰酸酯树脂制备方法 |
| JP7605421B2 (ja) * | 2020-12-07 | 2024-12-24 | 株式会社ダイセル | チタン含有複合材料 |
| CN113445303A (zh) * | 2021-07-09 | 2021-09-28 | 广西五行材料科技有限公司 | 一种用于皮革、纺织品除甲醛杀菌的纳米材料及其制备方法 |
| CN115678494B (zh) * | 2022-09-09 | 2024-02-09 | 宁波聚力新材料科技有限公司 | 一种耐高温硅酮胶及其制备方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615272A (en) | 1968-11-04 | 1971-10-26 | Dow Corning | Condensed soluble hydrogensilsesquioxane resin |
| US5100503A (en) * | 1990-09-14 | 1992-03-31 | Ncr Corporation | Silica-based anti-reflective planarizing layer |
| US5484867A (en) * | 1993-08-12 | 1996-01-16 | The University Of Dayton | Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments |
| JPH07331173A (ja) * | 1995-02-21 | 1995-12-19 | Toray Ind Inc | 光学材料形成用塗液組成物および光学材料 |
| US5973095A (en) | 1997-04-21 | 1999-10-26 | Alliedsignal, Inc. | Synthesis of hydrogensilsesquioxane and organohydridosiloxane resins |
| US6316167B1 (en) | 2000-01-10 | 2001-11-13 | International Business Machines Corporation | Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof |
| US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
| KR100804873B1 (ko) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 ｓｏｇ 반사방지 코팅 |
| US6420088B1 (en) | 2000-06-23 | 2002-07-16 | International Business Machines Corporation | Antireflective silicon-containing compositions as hardmask layer |
| US6891237B1 (en) | 2000-06-27 | 2005-05-10 | Lucent Technologies Inc. | Organic semiconductor device having an active dielectric layer comprising silsesquioxanes |
| US20040048194A1 (en) | 2002-09-11 | 2004-03-11 | International Business Machines Corporation | Mehod for forming a tunable deep-ultraviolet dielectric antireflection layer for image transfer processing |
| TW593455B (en) | 2003-02-14 | 2004-06-21 | Chung Hwa Chemical Ind Works L | Polysilsesquioxane-metal alkoxide hybrid film material, its preparation and use |
| JP2005173552A (ja) | 2003-11-20 | 2005-06-30 | Tokyo Ohka Kogyo Co Ltd | リソグラフィー用下層膜形成材料およびこれを用いた配線形成方法 |
-
2006
- 2006-10-25 JP JP2008537915A patent/JP5464855B2/ja not_active Expired - Fee Related
- 2006-10-25 CN CN200680040434.8A patent/CN101300289B/zh not_active Expired - Fee Related
- 2006-10-25 EP EP06817377.2A patent/EP1943294B1/en not_active Not-in-force
- 2006-10-25 WO PCT/US2006/041662 patent/WO2007053396A2/en not_active Ceased
- 2006-10-25 US US12/091,811 patent/US8865845B2/en not_active Expired - Fee Related
- 2006-10-25 KR KR1020087012622A patent/KR101322045B1/ko not_active Expired - Fee Related
- 2006-10-27 TW TW95139723A patent/TWI443128B/zh not_active IP Right Cessation
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